Brandon Davis MEEN 446 Cathodic Arc Deposition

Principle of Operation:
Cathodic Arc Deposition is a widely used industrial-scale process for
applying high quality thin film coatings. The process is based on low-voltage and
high current cathodic arc physics that produce a dense, and highly ionized plasma.
Cathodic Arc Deposition is characterized by a nearly 100% ionized deposition
plasma with relatively high-energy deposition ions. The Cathodic Arc Deposition
process works under vacuum conditions, using specially designed deposition heads.
Cathodic Arc Deposition can be operated in two modes, which are either DC or
pulsed modes.
How it works:
A power supply applies a voltage, which produces an arc discharge between an
anode and cathode. The arc current is concentrated over a small surface area on the
cathode, which creates an extremely high current density at what are usually called
cathode spots. This high current density also produces an extremely high power
density that produces a localized phase transformation of the solid target (the
cathode material) to an almost 100% ionized deposition plasma. The plasma then
expands rapidly into the ambient vacuum towards the substrate.

Figure: Cathodic Arc Deposition Machine

Brandon Davis MEEN 446 Cathodic Arc Deposition

Type:
Cathodic Arc Deposition is considered to be a type of Physical Vapor Deposition
coating technique (PVD). The term PVD denotes vacuum deposition processes where
the coating material is evaporated or removed by various mechanisms (resistant heating,
ablation, etc.), and the vapor phase is transported to the substrate forming a coating. Also
During the PVD process, evaporated atoms travel from the source material to the
substrate in a straight path. These processes are considered to be line of sight
processes. PVD coating processes generally take place between temperatures of 200C to
500C to minimize stresses associated with thermal expansion.
Examples of PVD Processes:

Electron beam physical vapor deposition: material is heated to a high vapor

pressure by electron bombardment in "high" vacuum and is transported by
diffusion to be deposited by condensation on the (cooler) work piece.
Evaporative deposition: material to be deposited is heated to a high vapor pressure
by electrically resistive heating in "low" vacuum.[1] [2]
Pulse Laser Deposition: High-power laser ablates material from the target into a
vapor.
Sputter deposition: low plasma discharge (usually localized around the "target" by
a magnet) bombards the material sputtering some away as a vapor for subsequent
deposition.

Application:
Cathodic arc deposition is used to synthesize extremely hard film to protect the
surface of cutting tools and extend their life significantly. A wide variety of thin hard
film, super hard coatings, and nano-composite coatings can be synthesized by this
type of deposition.
Examples of surfaces and coatings made using Cathodic Arc Deposition:

Figure 2: Titanium-Nitride covered parts

Brandon Davis MEEN 446 Cathodic Arc Deposition

Figure 3: Drill Bits covered in Chromium Nitride

Below are some of the advantages and disadvantages of the Cathodic Arc Deposition
process.
Advantages of Cathodic arc Deposition:
1. High level of atom ionization in the plasma
2. As a result of the high level of energy produced by this process, materials can
be co-evaporated at the same rate, thus producing stoichiometric compounds
3. Better adhesion can be achieved as a result of the intermixed reaction zone
Disadvantages of Cathodic Arc Deposition:
1. Macro-particles of metals and liquid droplets (1-15 m) during flash
evaporation occur
2. Coating complex geometries can be difficult due to line-of-site process
Overall this manufacturing process has changed the way that high quality films can
be applied. Although this method is not full proof the benefits greatly outweigh the
flaws.
References:
"AC-Cathodic Arc." Materials & Manufacturing. Penn State ARL, n.d. Web. 28 Apr. 2014.
"Acree Technologies Inc." Cathodic Arc Deposition. N.p., n.d. Web. 28 Apr. 2014.
"Cathodic Arc Deposition." Wikipedia. Wikimedia Foundation, 18 Apr. 2014. Web. 28 Apr. 2014.
"Physical Vapor Deposition." Wikipedia. Wikimedia Foundation, 18 Apr. 2014. Web. 28 Apr. 2014.