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Study of sputtered
257
HfO 2
C. T . K u o a n d R . K w o r
Department of Electrical and Computer Engineering, University of Colorado at Colorado Springs, Colorado Springs, CO 80933 (USA)
K. M. Jones
National Renewable Energy Laboratory, Golden, CO 80401 (USA)
Abstract
Thin HfO2 films were deposited on Si(100) wafers by magnetron sputtering, followedby a high temperature anneal in oxygen.
Structure evolution and/or allotropic transformation occurred during the annealing process. A very thin well-definedSiO2 layer
was also formed at the HfO2-Si interface as a result of annealing. The HfO2/SiO2film showed a high dielectricconstant, very
low leakage current, extremelyhigh dielectricstrength, low dielectricloss, well-behavedcapacitance-voltage characteristics and
good stability, making it a viable candidate for applications in very-large-scaleand ultralarge-scale integration circuits.
1. Introduction
In view of the low dielectric constant and the physical
thickness limit of thin SiO2 films, high dielectric constant materials are being evaluated for applications in
very-large-scale integration (VLSI) and ultralarge-scale
integration (ULSI) circuits and scaled-down dynamic
random access memories (DRAMs) with densities beyond 4 Mbits. Refractory oxides have attracted considerable attention because of their high dielectric
constants, stability and structure simplicity. To date, a
substantial amount of research has been done on Ta205
[1, 2], ZrO2 [3] and Y 2 0 3 [4, 5] films, whereas work on
HfO2 [6] and La20 3 [7] has been somewhat limited.
Previous research indicated that these films have a good
potential and thus more study is needed. In this work,
a comprehensive investigation of HfO2 films has been
conducted. In particular, the properties of the films
have been studied to determine the deposition parameters necessary to create the optimum HfO2 films.
2. Experimental procedure
HfO2 films (200-300/~) were formed on 4 in Si(100)
wafers with resistivity in the range 1-10 ~ cm by either
r.f. magnetron reactive sputtering (in pure oxygen) of a
hafnium target with 99.9% purity (method A) or by r.f.
sputtering (in argon) of a HfO2 target with a purity of
99.95% (method B). In both cases, the sputtering was
followed by a high temperature oxygen anneal to densify the as-deposited films. Either dry or wet oxygen can
be used as the annealing ambient. Suitable post-
0040-6090/92/$5.00
deposition oxygen annealing temperatures were determined by comparing the refractive index data, accumulation capacitances (obtained from capacitance vs. bias
voltage ( C - V ) plots by the mercury probe technique)
and X-ray diffraction patterns (using Cu K0q radiation at 35 kV). The choice of annealing temperature
and time will be discussed in some detail in the
next section. The structure of the resultant films was
investigated by cross-sectional transmission electron microscopy (TEM). Metal-insulator-semiconductor capacitor (MIS-C) devices were fabricated to evaluate the
electrical properties of these HfO2 films, including the
dielectric constant, interface state density, dissipation
factor, dielectric strength and resistivity. After HfO2
film formation, an aluminum film with a thickness of
8000 A was sputtered and then patterned into four
differently sized circular dots (areas equal to
2.3 x 10 - 3 cm 2, 1.3 x 10 -3 cm 2, 5.76 10 - 4 cm 2 and
1.44 10-4cm 2) as the front-side electrodes. Subsequently, the back-side oxide was removed by dipping
the substrate in 10% H F (front-side aluminum patterns
were protected with photoresist). Aluminum was then
sputtered to form the back-side electrode. Finally, the
wafer was subjected to 350-450 C sintering in argon
for 30 min to improve the contacts.
258
TABLE 1. Refractive index dependence on oxygen annealing temperature and time for r.f. reactive sputtering of hafnium target (as-deposited film thickness, about 255 .~)
Sample
Vl-0a
Vl-1
VI-2
VI-3
VI-4
Vl-5
VI-6
Vl-7
Annealing
ambient
Wet 0 2
Wet 02
Wet 02
Wet 02
Wet 0 2
Wet 0 z
Wet 02
Annealing
temperature
(of)
Annealing
time
(h)
Refractive
index
-400
500
600
700
800
800
900
-1
1
1
1
1
1
1.756 + 0.008
1.765 + 0.008
1.778 ___0.004
1.790 _ 0.015
1.815 _+0.005
1.809 4- 0.018
1.745 + 0.008
1.708 + 0.012
TABLE 2. Refractive index dependence on oxygen annealing temperature and time for r.f. sputtering of HfO2 target (as-deposited film
thickness, about 325/k)
V5-0a
V5-1
V5-2
V5-3
V5-4
V5-5
V5-6
V5-7
Annealing
ambient
Annealing
temperature
(of)
Annealing
time
(h)
Dry
Dry
Dry
Dry
Dry
Dry
Dry
400
500
600
700
800
900
900
1
1
1
1
1
02
O2
02
02
02
02
02
AnnealingTime = 1 hr.
1.0
o
o
-o
Sample
1.5
Refractive
index
1.837 + 0.005
1.934 + 0.001
1.942 + 0.006
1.952 + 0.002
1.964 -I-0.006
1.927 ___0.001
1.920 + 0.002
1.913 ___0.001
[]
[]
0.5
o Method A -255/~
i
u Method B -325/~
I
o
400
500
600
700
800
900
10o0
Annealing Temperature, C
Fig. 1. Normalized accumulation capacitance vs. annealing temperature for the films deposited by methods A and B.
259
(-1 3)
2.25
1.43
%
100
90
HfO 2
SiO 2
Si
(a)
500 h
90
80
80
70
70
60
60
50
50
40
40
30
30
20
20
10
10
I
15
HfO 2
SiO 2
Si
(b)
I
250 A
2.25
1.43
%
100
90
(-1,1,1)
80
80
70
70
60
60
50
50
40 ~
40
30
30
20
lO
10
15
40
65
40
2.25
J
1.43
I
%
/ 100
L 90
M(-I,I,1)
65
vary from about 160,~ (400-600 C) to about 210215 A (700-900 C), using the Scherrer formula [8]
160
140
I~
I~ 80
70
I,I,I)
50
60-8
3040
;Clhr
0.92
t - (f12 _ B 2) 1/2 c o s 0B
(1)
20 0 ~
15
As deposited
, . . . I.
',
40
10
_
i
~1
65
260
CPS 5.90
500
2.25
1.43
%
100
(-1,1,1)
450
90
400
80
350
300
(1,1,1)
(-2,2,2)
250
too0,
0.08 -
8001
0.10
= 1 MHz
Frequency
C-V
70
~ 0.06 -
60
.g
50
-~ 0.O4 -
6001
40(
200
0.02 -
150
100
50
0
15
40
I 10
,
20C "I
-5 -4 -3 -2 -1
Bias (V)
65
and B are about 25/~min -1 and 20/kmin -1 respectively. As expected, the rate is affected by the annealing
temperature and time, as summarized in Table 3. Generally, the etching rate decreases with increasing annealing temperature, indicating the film-densifying effect of
the annealing (although the etching rate from reactive
ion etching (RIE) does not seem to depend very much
on film density). From the table, it can also be seen that
the etching rate of the HfO2 film made by method B is
lower than those made by method A, indicating a
higher density for the films obtained by method B.
Apart from HF, the HfO2 formed by both methods are
quite insensitive to many acids or bases. They cannot be
etched by hot H2SO 4 or HNO3, boiling HC1, hot
CH3COOH or cold NH4OH.
3.3. Electrical properties of HfO 2 films
A1/HfO2/SiO2/Si MIS capacitors with an HfO2 thickness ranging from 200 to 300 ,~ have been characterized. Figures 7 and 8 indicate the typical 1 MHz C - V
and dissipation factor-voltage ( D - V ) curves and
quasi-static C - V curve. A typical current-voltage ( I V) curve for A1/HfO2/SiO2/Si capacitors is shown in
Fig. 9. Through the C-V, D - V, and I - V curves, such
parameters as the dielectric constant e, mobile ion, fixed
surface charge and interface state density, dissipation
Film formation
method
CF 4 and H2(RIE )
CF4 and H2(RIE )
A
B
10% H F
10% HF
A
B
500 C
700 C
800 C
900 C
~28
~22
.~28
~22
~20
~ 18
~20
~ 18
---
~ 120
30 - 40
20 - 30
~ 20
260
600
500
400
300
"~ 200
1oo
-4
-2
0
Voltage(V)
10
10 .9
1613
-5
-10
-15
-20
-25
-30
(v)
1
%A
dsio2
eHfO2 CaccdHfo2 dHfo2~sio2
261
(2)
where Ca~ refers to the accumulation capacitance observed from 1 MHz C - V curves, CHfo2 pertains to the
capacitance of HfO2 films ei~fo2and dHfo2 are the dielectric constant and thickness of HfO2 films respectively, A
is the capacitor area, e0 is the permittivity in vacuum,
and esio2 and dsio2 indicate the dielectric constant and
thickness respectively of SiO2 layers.
T h e dielectric constants obtained were 12 + 1 and
17 + 2 for HfO2 film produced by methods A and B
respectively. It was found that the dielectric constant of
HfO2 films provided by method B is higher than that of
HfO2 films by method A, verifying that the films with a
262
1.5
1.0
)-
0.5
10
HfO 2
~290 ,~,
SiO 2
~ 50 /~
105
106
10
Frequency in Hz
vs.
I = aV2 e x p ( - ~ )
(3)
-0.032-
263
0.001V
|
10 -s
-0.034 10 -9
m Third R a m p
Second Ramp
First Ramp
,
j
-0.036
1040
10-it
-0.038
10-,2
.m0
llmm
-0.040
10-13
-0.042
10"t4
8
10
12
14
16
18
20
10
Voltage (V)
2O
Fig. l 1. Fowler-Nordheimtunnelingconductionthroughthe HfO2/ Fig. 12. Typical sequential ramp I-V curves for AI/HfO2/SiO2/Si
SiO2 layer.
capacitors.
264
The charge trapping at the oxide-semiconductor interface or in the oxide bulk is also negligible, as revealed by the hysteresis observation of both the high
frequency and the quasi-static C - V curves. Here, either
a non-hysteretic or a slightly hysteretic C - V curve was
seen for the HfO2/SiO2 films.
3.3.10. Stability
A comparison of C - V and D - V characteristics measured shortly after the MIS capacitor was made with
those obtained 3 months later showed that there is no
dielectric degradation. I - V characteristics also showed
no sign of deterioration. All these phenomena lead to
the conclusion that the HfO2 films formed by methods
A and B have a good stability.
4. Conclusion
In the present work, H f O 2 films with thickness between 200 and 300 A were deposited on silicon substrates by either r.f. sputtering of hafnium in oxygen or
r.f. sputtering of HfO2 in argon, followed by a high
temperature anneal in oxygen. A very thin well-defined
SiO2 layer was formed at the HfO2-Si interface during
annealing. At the same time, a structure evolution for
the HfO2 film also occurred. Comprehensive characterization has revealed that these films have very good
physical, mechanical and electrical properties. The
HfO2/SiO2 system has high dielectric constant (compared with SiO2), high dielectric strength, low dielectric
loss, low leakage current, well-behaved C - V characteristics and good stability. The film fabrication process is
simple and compatible with the conventional integrated-circuit processing. The HfO2/SiO2 system thus
deserved further study and consideration as a potential
candidate for applications in VLSI and ULSI circuits.
Acknowledgments
The authors wish to thank Dr. L. Kammerdiner of
Ramtron Corporation for his help with the XRD analysis, and Dr. T. L. Hwang, Dr. L. W. Yang and Mr. Y.
Chang of Ford Microelectronics, Inc., for their support
in reactive ion etching. Thanks are also due to Mr.
Steve Jernigan for his technical assistance in the sputtering processes.
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