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ABSTRACT
In this paper we introduce the III-V photonic integration
platforms
for
emerging
applications
beyond
telecommunications. Recent achievements in the InP
generic and InP membrane platforms for wireless and
sensing applications are reviewed. The realized chips
show the great potential of the InP-based photonic
integration due to its full functionality, high flexibility and
high performance.
Keywords: Photonic integrated circuits (PIC); indium
phosphide (InP); generic integration; InP membrane on
Si (IMOS); wireless communication; optical sensing
1. INTRODUCTION
Photonic integrated circuits (PICs) based on the indium
phosphide (InP) material system [1-3] have been playing
a crucial role in the telecommunication industry. The
flexible bandgap engineering and high light emission
efficiency in this III-V material system have enabled
high-speed transceivers, coarse and dense wavelength
division multiplexing (WDM) and advanced coherent
communication technologies for the 1550 nm
wavelength band.
The concept of a generic photonic integration foundry,
with its rapid development in recent years [1], further
opens up the accessibility of InP PICs to a large number
of small and medium-sized enterprises (SMEs) and
universities worldwide. One of the most successful
examples is the Joint European Platform for InP-based
Photonic Integrated Components and Circuits (JePPIX)
[4], within which generic InP-based integration
platforms are developed by Europes key players. The
central idea in JePPIX is the multi-project wafer (MPW)
run which allows the participants to benefit from the
reduced cost and throughput time [1]. Within the
foundry MPW run, the users can choose among
standardized building blocks (BBs) to assemble complex
circuits and functionalities. With the performance
guaranteed for each BB, a high reliability of the entire
chip is obtained.
Ch.3
133 GHz
(a) (b)
(c) (d)
200 GHz
Ch.1
Ch.2
Ch.4
Ch.4
Ch.4
Path-4
Path-1
Path-0
In-0
500m
80
Path-4
60
40
20
0
Path-0
Wavelength (nm)
(a)
(b)
0.8
Responsivity (A/ W)
66 GHz
0.7
0.6
0V
1V
2V
3V
Black: TE
Red: TM
0.5
0.4
0.3
0.2
0.1
0.0
1.45
1.50
1.55
1.60
(m)
1.65
1.70
1.75
(c)
Fig. 4. (a) The QD tunabe laser [19] and (b) Coarse tuning of the QD
tunable laser over 60 nm band. (c) The ultra-wide spectral response of
the QD photodetector [20].
-1
Fig. 5. (a) The fabricated 2 m tuneble laser chip [22]. The chip is
wire-bonded to PCB for automated control. (b) The coarse tuning of the
laser across 31 nm range.
-2
-3
-4
-2 V
-3 V
-4 V
-5
Photonics
CMOS
Electronics
5 m
-6
(a)
(b)
10
20
30
40
50
60
70
Frequency (GHz)
Fig. 7. (a) The UTC photodetector on the InP membrane. (b) The
frequency response of the UTC photodetector at three different reverse
bias conditions.
p-contact
100 m
0.012
1540nm
1550nm
1560nm
0.009
0.006
0.003
-4.5
-4.0
-3.5
-3.0
-2.5
-2.0
-1.5
(b)
4. CONCLUSION
In conclusion, we have presented our recent
advancements in InP photonic integration platforms, for
beyond-telecom applications. The mature technology,
standardized building blocks, complete photonic
functionalities in the InP generic platform have enabled
great opportunities for microwave photonics. The
flexibility of material-level and device-level innovations
further opens up new functionalities in microwave and
sensing applications. Furthermore, the development of
an InP membrane platform reveals its unique advantage
in terahertz wave generation and optical wireless
communications.
5. ACKNOWLEDGMENTS