You are on page 1of 48

Commerce Control List Supplement No.

1 to Part 774 Category 3page 1

CATEGORY 3 - ELECTRONICS NP applies to pulse discharge NP Column 1


A. SYSTEMS, EQUIPMENT AND capacitors in 3A001.e.2 and
COMPONENTS superconducting solenoidal
electromagnets in 3A001.e.3
Note 1: The control status of equipment and that meet or exceed the technical
components described in 3A001 or 3A002, other parameters in 3A201.a and
than those described in 3A001.a.3 to 3A201.b, respectively
3A001.a.10, 3A001.a.12 or 3A001.a.13, which
are specially designed for or which have the AT applies to entire entry AT Column 1
same functional characteristics as other
equipment is determined by the control status of License Exceptions
the other equipment.
LVS: N/A for MT or NP
Note 2: The control status of integrated Yes for:
circuits described in 3A001.a.3 to 3A001.a.9, $1500: 3A001.c
3A001.a.12 or 3A001.a.13 that are unalterably $3000: 3A001.b.1, b.2, b.3, b.9, .d, .e, .f,
programmed or designed for a specific function and .g
for other equipment is determined by the control $5000: 3A001.a (except a.1.a and a.5.a
status of the other equipment. when controlled for MT), and .b.4 to b.7
GBS: Yes for 3A001.a.1.b, a.2 to a.13
N.B.: When the manufacturer or applicant (except .a.5.a when controlled for MT),
cannot determine the control status of the other b.2, b.8 (except for TWTAs exceeding
equipment, the control status of the integrated 18 GHz), b.9., b.10, .g, and .h.
circuits is determined in 3A001.a.3 to CIV: Yes for 3A001.a.3, a.7, and a.11.
3A001.a.9, 3A001.a.12 and 3A001.a.13.
List of Items Controlled

3A001 Electronic components and specially Unit: Number.


designed components therefor, as follows (see Related Controls: 1.) The following
List of Items Controlled). commodities are under the export licensing
authority of the Department of State,
License Requirements Directorate of Defense Trade Controls (22
CFR part 121) when space qualified and
Reason for Control: NS, MT, NP, AT operating at frequencies higher than 31.8 GHz:
helix tubes (traveling wave tubes (TWT))
Control(s) Country Chart defined in 3A001.b.1.a.4.c; microwave solid
state amplifiers defined in 3A001.b.4.b
NS applies to entire entry NS Column 2 traveling wave tube amplifiers (TWTA)
defined in 3A001.b.8; and derivatives thereof;
MT applies to 3A001.a.1.a MT Column 1 2.) The following commodities are also under
when usable in missiles; the export licensing authority of the
and to 3A001.a.5.a when Department of State, Directorate of Defense
designed or modified for Trade Controls (22 CFR part 121): (a) Space
military use, hermetically qualified solar cells, coverglass-
sealed and rated for operation interconnect-cells or covered-interconnect-
in the temperature range from cells (CIC) assemblies, solar arrays and/or
below -54C to above +125C. solar panels, with a minimum average
efficiency of 31% or greater measured at an

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 2

operating temperature of 301 K (28C) under - Multichip integrated circuits


simulated AM0 illumination with an - Film type integrated circuits, including
irradiance of 1,367 Watts per square meter silicon-on-sapphire integrated circuits
(W/m2), and associated solar concentrators, - Optical integrated circuits
power conditioners and/or controllers, bearing
and power transfer assemblies, and a.1. Integrated circuits designed or rated as
deployment hardware/systems; (b) Radiation- radiation hardened to withstand any of the
hardened microelectronic circuits controlled following:
by Category XV (d) of the United States
Munitions List (USML); and (c) All a.1.a. A total dose of 5 x 103 Gy (Si), or
specifically designed or modified systems or higher;
subsystems, components, parts, accessories,
attachments, and associated equipment a.1.b. A dose rate upset of 5 x 106 Gy (Si)/s,
controlled by Category XV (e) of the USML. or higher; or
See also 3A101, 3A201, and 3A991. 3.) See
ECCN 3A982.a for discrete microwave a.1.c. A fluence (integrated flux) of neutrons
transistors not controlled by paragraph.b.3 of (1 MeV equivalent) of 5 x 1013 n/cm or higher
this entry. 4.) Packaged microwave on silicon, or its equivalent for other materials;
monolithic integrated circuits (packaged
MMIC) power amplifiers that operate within Note: 3A001.a.1.c does not apply to Metal
the frequency range specified in 3A982.b and Insulator Semiconductors (MIS).
that have the dimensional and output power
characteristics specified for packaged MMIC a.2. Microprocessor microcircuits,
power amplifiers specified in ECCN 3A982 microcomputer microcircuits, microcontroller
are controlled by ECCN3A982 even if such microcircuits, storage integrated circuits
packaged MMIC power amplifiers also manufactured from a compound semiconductor,
operate within the frequency range specified analog-to-digital converters, digital-to-analog
in ECCN3A001.b.2.a. converters, electro-optical or optical integrated
circuits designed for signal processing, field
Related Definitions: For the purposes of programmable logic devices, custom integrated
integrated circuits in 3A001.a.1, 5 x 103 circuits for which either the function is unknown
Gy(Si) = 5 x 105 Rads (Si); 5 x 106 Gy (Si)/s = or the control status of the equipment in which
5 x 108 Rads (Si)/s. the integrated circuit will be used in unknown,
Items: Fast Fourier Transform (FFT) processors,
electrical erasable programmable read-only
a. General purpose integrated circuits, as memories (EEPROMs), flash memories or static
follows: random-access memories (SRAMs), having any
of the following:
Note 1: The control status of wafers (finished
or unfinished), in which the function has been a.2.a. Rated for operation at an ambient
determined, is to be evaluated against the temperature above 398 K (+125C);
parameters of 3A001.a.
a.2.b. Rated for operation at an ambient
Note 2: Integrated circuits include the temperature below 218 K (-55C); or
following types:
a.2.c. Rated for operation over the entire
- Monolithic integrated circuits ambient temperature range from 218 K (-55C)
- Hybrid integrated circuits to 398 K (125C);

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 3

equal to the resolution of the ADC.


Note: 3A001.a.2 does not apply to integrated
circuits for civil automobile or railway train 3. The output rate is the maximum output rate
applications. of the converter, regardless of architecture or
oversampling.
a.3. Microprocessor microcircuits,
microcomputer microcircuits and 4. For multiple channel ADCs, the outputs
microcontroller microcircuits, manufactured are not aggregated and the output rate is the
from a compound semiconductor and operating maximum output rate of any single channel.
at a clock frequency exceeding 40 MHz;
5. For interleaved ADCs or for multiple
Note: 3A001.a.3 includes digital signal channel ADCs that are specified to have an
processors, digital array processors and digital interleaved mode of operation, the outputs are
coprocessors. aggregated and the output rate is the maximum
combined total output rate of all of the outputs.
a.4. [RESERVED] 6. Vendors may also refer to the output rate
as sampling rate, conversion rate or throughput
a.5. Analog-to-Digital Converter (ADC) and rate. It is often specified in megahertz (MHz) or
Digital-to-Analog Converter (DAC) integrated mega samples per second (MSPS).
circuits, as follows:
7. For the purpose of measuring output rate,
a.5.a. ADCs having any of the following: one output word per second is equivalent to one
Hertz or one sample per second.
a.5.a.1. A resolution of 8 bit or more,
but less than 10 bit, with an output rate greater 8. Multiple channel ADCs are defined as
than 500 million words per second; devices which integrate more than one ADC,
designed so that each ADC has a separate
a.5.a.2. A resolution of 10 bit or more, but analog input.
less than 12 bit, with an output rate greater than
300 million words per second; 9. Interleaved ADCs are defined as devices
which have multiple ADC units that sample the
a.5.a.3. A resolution of 12 bit with an output same analog input at different times such that
rate greater than 200 million words per second; when the outputs are aggregated, the analog
input has been effectively sampled and
a.5.a.4. A resolution of more than 12 bit but converted at a higher sampling rate.
equal to or less than 14 bit with an output rate
greater than 125 million words per second; or a.5.b. Digital-to-Analog Converters (DAC)
having any of the following:
a.5.a.5. A resolution of more than 14 bit with
an output rate greater than 20 million words per a.5.b.1. A resolution of 10 bit or more
second; with an adjusted update rate of 3,500 MSPS or
greater; or
Technical Notes:
a.5.b.2. A resolution of 12-bit or more
1. A resolution of n bit corresponds to a with an adjusted update rate of equal to or
quantization of 2n levels. greater than 1,250 MSPS and having any of the
following:
2. The number of bits in the output word is

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 4

a.5.b.2.a. A settling time less than 9 ns to maximum DAC clock rate for DAC clock input.
0.024 % of full scale from a full scale step; or
a.6. Electro-optical and optical integrated
a.5.b.2.b. A Spurious Free Dynamic circuits, designed for signal processing and
Range (SFDR) greater than 68 dBc (carrier) having all of the following:
when synthesizing a full scale analog signal of
100 MHz or the highest full scale analog signal a.6.a. One or more than one internal laser
frequency specified below 100 MHz. diode;

Technical Notes a.6.b. One or more than one internal light


detecting element; and
1. Spurious Free Dynamic Range (SFDR) is
defined as the ratio of the RMS value of the a.6.c. Optical waveguides;
carrier frequency (maximum signal component)
at the input of the DAC to the RMS value of the a.7. Field programmable logic devices having
next largest noise or harmonic distortion any of the following:
component at its output.
a.7.a. A maximum number of digital
2. SFDR is determined directly from the input/outputs greater than 200; or
specification table or from the characterization
plots of SFDR versus frequency. a.7.b. A system gate count of greater than
230,000;
3. A signal is defined to be full scale when its
amplitude is greater than -3 dBfs (full scale). Note: 3A001.a.7 includes:

4. Adjusted update rate for DACs is: -Simple Programmable Logic Devices
(SPLDs)
a. For conventional (non-interpolating) -Complex Programmable Logic Devices
DACs, the adjusted update rate is the rate at (CPLDs)
which the digital signal is converted to an
analog signal and the output analog values are -Field Programmable Gate Arrays (FPGAs)
changed by the DAC. For DACs where the
interpolation mode may be bypassed -Field Programmable Logic Arrays (FPLAs)
(interpolation factor of one), the DAC should be
considered as a conventional (non- -Field Programmable Interconnects (FPICs)
interpolating) DAC.
Technical Notes:
b. For interpolating DACs (oversampling
DACs), the adjusted update rate is defined as 1. Field programmable logic devices are
the DAC update rate divided by the smallest also known as field programmable gate or field
interpolating factor. For interpolating DACs, programmable logic arrays.
the adjusted update rate may be referred to by
different terms including: 2. Maximum number of digital input/outputs
in 3A001.a.7.a is also referred to as maximum
input data rate user input/outputs or maximum available input/
input word rate outputs, whether the integrated circuit is
input sample rate packaged or bare die.
maximum total input bus rate

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 5

a.8. [RESERVED] more;

a.9. Neural network integrated circuits; Technical Note: The DAC clock
frequency may be specified as the master clock
a.10. Custom integrated circuits for which the frequency or the input clock frequency.
function is unknown, or the control status of the
equipment in which the integrated circuits will b. Microwave or millimeter wave components,
be used is unknown to the manufacturer, having as follows:
any of the following:
b.1. Electronic vacuum tubes and cathodes, as
a.10.a. More than 1,500 terminals; follows:

a.10.b. A typical basic gate propagation Note 1: 3A001.b.1 does not control tubes
delay time of less than 0.02 ns; or designed or rated for operation in any frequency
band and having all of the following:
a.10.c. An operating frequency exceeding 3
GHz; a. Does not exceed 31.8 GHz; and

a.11. Digital integrated circuits, other than b. Is allocated by the ITU for radio-
those described in 3A001.a.3 to 3A001.a.10 and communications services, but not for radio-
3A001.a.12, based upon any compound determination.
semiconductor and having any of the following:
Note 2: 3A001.b.1 does not control non-
a.11.a. An equivalent gate count of more than space-qualified tubes having all the
3,000 (2 input gates); or following:

a.11.b. A toggle frequency exceeding 1.2 a. An average output power equal to or less
GHz; than 50 W; and

a.12. Fast Fourier Transform (FFT) processors b. Designed or rated for operation in any
having a rated execution time for an N-point frequency band and having all of the following:
complex FFT of less than (N log2 N)/20,480 ms,
where N is the number of points; 1. Exceeds 31.8 GHz but does not exceed
43.5 GHz; and
Technical Note: When N is equal to 1,024
points, the formula in 3A001.a.12 gives an 2. Is allocated by the ITU for radio-
execution time of 500 s. communications services, but not for radio-
determination.
a.13. Direct Digital Synthesizer (DDS)
integrated circuits having any of the following: b.1.a. Traveling wave tubes, pulsed or
continuous wave, as follows:
a.13.a. A Digital-to-Analog Converter
(DAC) clock frequency of 3.5 GHz or more and b.1.a.1. Tubes operating at frequencies
a DAC resolution of 10 bit or more, but less than exceeding 31.8 GHz;
12 bit; or
b.1.a.2. Tubes having a cathode heater
a.13.b. A DAC clock frequency of 1.25 element with a turn on time to rated RF power of
GHz or more and a DAC resolution of 12 bit or less than 3 seconds;

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 6

fractional bandwidth greater than 10%;


b.1.a.3. Coupled cavity tubes, or derivatives
thereof, with a fractional bandwidth of more b.2.d. Rated for operation at
than 7% or a peak power exceeding 2.5 kW; frequencies exceeding 31.8 GHz up to and
including 37.5 GHz and with an average output
b.1.a.4. Helix tubes, or derivatives thereof, power greater than 0.1 nW;
having any of the following:
b.2.e. Rated for operation at
b.1.a.4.a. An instantaneous bandwidth frequencies exceeding 37.5 GHz up to and
of more than one octave, and average power including 43.5 GHz and with an average output
(expressed in kW) times frequency (expressed in power greater than 0.25W (24 dBm) with a
GHz) of more than 0.5; fractional bandwidth greater than 10%; or

b.1.a.4.b. An instantaneous bandwidth b.2.f. Rated for operation at


of one octave or less, and average power frequencies exceeding 43.5 GHz and with an
(expressed in kW) times frequency (expressed in average output power greater than 0.1 nW.
GHz) of more than 1; or
Note 1: [RESERVED]
b.1.a.4.c. Being space-qualified;
Note 2: The control status of the MMIC
b.1.b. Crossed-field amplifier tubes with a whose rated operating frequency includes
gain of more than 17 dB; frequencies listed in more than one frequency
range, as defined by 3A001.b.2.a through
b.1.c. Impregnated cathodes designed for 3A001.b.2.f, is determined by the lowest average
electronic tubes producing a continuous output power control threshold.
emission current density at rated operating
conditions exceeding 5 A/cm2; Note 3: Notes 1 and 2 following the Category
3 heading for product group A. Systems,
b.2. Microwave Monolithic Integrated Equipment, and Components mean that
Circuits (MMIC) power amplifiers having any 3A001.b.2 does not control MMICs if they are
of the following: specially designed for other applications, e.g.,
telecommunications, radar, automobiles.
b.2.a. Rated for operation at
frequencies exceeding 3.2 GHz up to and b.3. Discrete microwave transistors having any
including 6.8 GHz and with an average output of the following:
power greater than 4W (36 dBm) with a
fractional bandwidth greater than 15%; b.3.a. Rated for operation at
frequencies exceeding 3.2 GHz up to and
b.2.b. Rated for operation at including 6.8 GHz and having an average output
frequencies exceeding 6.8 GHz up to and power greater than 60W (47.8 dBm);
including 16 GHz and with an average output
power greater than 1W (30 dBm) with a b.3.b. Rated for operation at
fractional bandwidth greater than 10%; frequencies exceeding 6.8 GHz up to and
including 31.8 GHz and having an average
b.2.c. Rated for operation at output power greater than 20W (43 dBm);
frequencies exceeding 16 GHz up to and
including 31.8 GHz and with an average output b.3.c. Rated for operation at
power greater than 0.8W (29 dBm) with a frequencies exceeding 31.8 GHz up to and

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 7

including 37.5 GHz and having an average frequencies exceeding 43.5 GHz and with an
output power greater than 0.5W (27 dBm); average output power greater than 0.1 nW; or

b.3.d. Rated for operation at b.4.f. Rated for operation at


frequencies exceeding 37.5 GHz up to and frequencies above 3.2 GHz and all of the
including 43.5 GHz and having an average following:
output power greater than 1W (30 dBm); or
b.4.f.1. An average output power (in
b.3.e. Rated for operation at watts), P, greater than 150 divided by the
frequencies exceeding 43.5 GHz and with an maximum operating frequency (in GHz) squared
average output power greater than 0.1 nW; [P > 150 W*GHz2/fGHz2];

Note: The control status of a b.4.f.2. A fractional bandwidth of 5%


transistor whose rated operating frequency or greater; and
includes frequencies listed in more than one
frequency range, as defined by 3A001.b.3.a b.4.f.3. Any two sides perpendicular to
through 3A001.b.3.e, is determined by the lowest one another with length d (in cm) equal to or
average output power control threshold. less than 15 divided by the lowest operating
frequency in GHz [d 15 cm*GHz/ fGHz];
b.4. Microwave solid state amplifiers and
microwave assemblies/modules containing Technical Note: 3.2 GHz should be used as
microwave solid state amplifiers, having any of the lowest operating frequency (fGHz) in the
the following: formula in 3A001.b.4.f.3., for amplifiers that
have a rated operation range extending
b.4.a. Rated for operation at downward to 3.2 GHz and below
frequencies exceeding 3.2 GHz up to and [d15cm*GHz/3.2 fGHz].
including 6.8 GHz and with an average output
power greater than 60W (47.8 dBm) with a N.B.: MMIC power amplifiers should be
fractional bandwidth greater than 15%; evaluated against the criteria in 3A001.b.2.

b.4.b. Rated for operation at Note 1: [RESERVED]


frequencies exceeding 6.8 GHz up to and
including 31.8 GHz and with an average output Note 2: The control status of an item whose
power greater than 15W (42 dBm) with a rated operating frequency includes frequencies
fractional bandwidth greater than 10%; listed in more than one frequency range, as
defined by 3A001.b.4.a through 3A001.b.4.e, is
b.4.c. Rated for operation at determined by the lowest average output power
frequencies exceeding 31.8 GHz up to and control threshold.
including 37.5 GHz and with an average output
power greater than 0.1 nW; b.5. Electronically or magnetically tunable
band-pass or band-stop filters, having more than
b.4.d. Rated for operation at 5 tunable resonators capable of tuning across a
frequencies exceeding 37.5 GHz up to and 1.5:1 frequency band (fmax/fmin) in less than 10 s
including 43.5 GHz and with an average output and having any of the following:
power greater than 1W (30 dBm) with a
fractional bandwidth greater than 10%; b.5.a. A band-pass bandwidth of more than
0.5% of center frequency; or
b.4.e. Rated for operation at

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 8

b.5.b. A band-stop bandwidth of less than b.9.c.2. A frequency greater than 18 GHz;
0.5% of center frequency;
Technical Notes:
b.6. [RESERVED]
1. To calculate the volume in 3A001.b.9.b.,
b.7. Converters and harmonic mixers, the following example is provided: for a
designed to extend the frequency range of maximum rated power of 20 W, the volume
equipment described in 3A002.c, 3A002.d, would be: 20 W X 10 cm3/W = 200 cm3.
3A002.e or 3A002.f beyond the limits stated
therein; 2. The turn-on time in 3A001.b.9.a. refers to
the time from fully-off to fully operational, i.e., it
b.8. Microwave power amplifiers containing includes the warm-up time of the MPM.
tubes controlled by 3A001.b.1 and having all of
the following: b.10. Oscillators or oscillator assemblies,
specified to operate with all of the following:
b.8.a. Operating frequencies above 3 GHz;
b.10.a. A single sideband (SSB) phase
b.8.b. An average output power to mass ratio noise, in dBc/Hz, better than -(126+20 log10F-20
exceeding 80 W/kg; and log10f) for 10 Hz <F<10 kHz; and

b.8.c. A volume of less than 400 cm3; b.10.b. A single sideband (SSB) phase
noise, in dBc/Hz, better than -(114+20 log10F-20
Note: 3A001.b.8 does not control equipment log10f) for 10 kHz < F < 500 kHz;
designed or rated for operation in any frequency
band which is allocated by the ITU for radio- Technical Note: In 3A001.b.10., F is the
communications services, but not for radio- offset from the operating frequency in Hz and f
determination. is the operating frequency in MHz.

b.9. Microwave power modules (MPM), b.11. Frequency synthesizer electronic


consisting of, at least, a traveling wave tube, a assemblies having a frequency switching
microwave monolithic integrated circuit and time as specified by any of the following:
an integrated electronic power conditioner and
having all of the following: b.11.a. Less than 312 ps;

b.9.a. A turn-on time from off to fully b.11.b. Less than 100 s for any
operational in less than 10 seconds; frequency change exceeding 1.6 GHz within the
synthesized frequency range exceeding 3.2 GHz
b.9.b. A volume less than the maximum rated but not exceeding 10.6 GHz;
power in Watts multiplied by 10 cm3/W; and
b.11.c. Less than 250 s for any
b.9.c. An instantaneous bandwidth greater frequency change exceeding 550 MHz within
than 1 octave (fmax. > 2fmin,) and having any of the synthesized frequency range exceeding 10.6
the following: GHz but not exceeding 31.8 GHz;

b.9.c.1. For frequencies equal to or less b.11.d. Less than 500 s for any
than 18 GHz, an RF output power greater than frequency change exceeding 550 MHz within
100 W; or the synthesized frequency range exceeding 31.8
GHz but not exceeding 43.5 GHz; or

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 9

b.11.e. Less than 1 ms for any c.1.c.1. A product of the maximum delay
frequency change exceeding 550 MHz within time and the bandwidth (time in s and
the synthesized frequency range exceeding 43.5 bandwidth in MHz) of more than 100;
GHz but not exceeding 56 GHz;
c.1.c.2. A dispersive delay of more than 10
b.11.f. Less than 1 ms for any s; or
frequency change exceeding 2.2 GHz within the
synthesized frequency range exceeding 56 GHz c.1.c.3. A frequency side-lobe rejection
but not exceeding 70 GHz; or exceeding 65 dB and a bandwidth greater than
100 MHz;
b.11.g. Less than 1 ms within the
synthesized frequency range exceeding 70 GHz; Technical Note: Frequency side-lobe
rejection is the maximum rejection value
N.B.: For general purpose signal specified in data sheet.
analyzers, signal generators, network
analyzers and microwave test receivers, see c.2. Bulk (volume) acoustic wave devices that
3A002.c, 3A002.d, 3A002.e and 3A002.f, permit the direct processing of signals at
respectively. frequencies exceeding 6 GHz;

c. Acoustic wave devices as follows and c.3. Acoustic-optic signal processing


specially designed components therefor: devices employing interaction between acoustic
waves (bulk wave or surface wave) and light
c.1. Surface acoustic wave and surface waves that permit the direct processing of
skimming (shallow bulk) acoustic wave signals or images, including spectral analysis,
devices , having any of the following: correlation or convolution;

c.1.a. A carrier frequency exceeding 6 GHz; Note: 3A001.c does not control acoustic wave
devices that are limited to a single band pass,
c.1.b. A carrier frequency exceeding 1 GHz, low pass, high pass or notch filtering, or
but not exceeding 6 GHz and having any of the resonating function.
following:
d. Electronic devices and circuits containing
c.1.b.1. A frequency side-lobe rejection components, manufactured from
exceeding 65 dB; superconductive materials, specially designed
for operation at temperatures below the critical
c.1.b.2. A product of the maximum delay temperature of at least one of the
time and the bandwidth (time in s and superconductive constituents and having any
bandwidth in MHz) of more than 100; of the following:

c.1.b.3. A bandwidth greater than 250 d.1. Current switching for digital circuits
MHz; or using superconductive gates with a product of
delay time per gate (in seconds) and power
c.1.b.4. A dispersive delay of more than 10 dissipation per gate (in watts) of less than 10-14
s; or J; or

c.1.c. A carrier frequency of 1 GHz or less d.2. Frequency selection at all frequencies
and having any of the following: using resonant circuits with Q-values exceeding

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 10

10,000; than 5 kV;

e. High energy devices as follows: e.2.a.2. An energy density equal to or more


than 250 J/kg; and
e.1. Cells as follows:
e.2.a.3. A total energy equal to or more than
e.1.a. Primary cells having an energy 25 kJ;
density exceeding 550 Wh/kg at 293 K (20C);
e.2.b. Capacitors with a repetition rate of 10
e.1.b. Secondary cells having an energy Hz or more (repetition rated capacitors) and
density exceeding 300 Wh/kg at 293 K (20C); having all of the following:

Technical Notes: e.2.b.1. A voltage rating equal to or more


than 5 kV;
1. For the purpose of 3A001.e.1., energy
density (Wh/kg) is calculated from the nominal e.2.b.2. An energy density equal to or more
voltage multiplied by the nominal capacity in than 50 J/kg;
ampere-hours (Ah) divided by the mass in
kilograms. If the nominal capacity is not stated, e.2.b.3. A total energy equal to or more
energy density is calculated from the nominal than 100 J; and
voltage squared then multiplied by the discharge e.2.b.4. A charge/discharge cycle life equal
duration in hours divided by the discharge load to or more than 10,000;
in Ohms and the mass in kilograms.
e.3. Superconductive electromagnets and
2. For the purpose of 3A001.e.1., a cell is solenoids, specially designed to be fully charged
defined as an electrochemical device, which has or discharged in less than one second and having
positive and negative electrodes, an electrolyte, all of the following:
and is a source of electrical energy. It is the
basic building block of a battery. Note: 3A001.e.3 does not control
superconductive electromagnets or solenoids
3. For the purpose of 3A001.e.1.a., a primary specially designed for Magnetic Resonance
cell is a cell that is not designed to be charged Imaging (MRI) medical equipment.
by any other source.
e.3.a. Energy delivered during the discharge
4. For the purpose of 3A001.e.1.b., a exceeding 10 kJ in the first second;
secondary cell is a cell that is designed to be
charged by an external electrical source. e.3.b. Inner diameter of the current carrying
windings of more than 250 mm; and
Note: 3A001.e. does not control batteries,
including single-cell batteries. e.3.c. Rated for a magnetic induction of
more than 8 T or overall current density in the
e.2. High energy storage capacitors as follows: winding of more than 300 A/mm2;

e.2.a. Capacitors with a repetition rate of less e.4. Solar cells, cell-interconnect-coverglass
than 10 Hz (single shot capacitors) and having (CIC) assemblies, solar panels, and solar arrays,
all of the following: which are space-qualified, having a minimum
average efficiency exceeding 20% at an
e.2.a.1. A voltage rating equal to or more operating temperature of 301 K (28C) under

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 11

simulated AM0 illumination with an irradiance - Solidtrons


of 1,367 Watts per square meter (W/m2);
Note 2: 3A001.g. does not control thyristor
Technical Note: AM0, or Air Mass Zero, devices and thyristor modules incorporated
refers to the spectral irradiance of sun light in into equipment designed for civil railway or
the earths outer atmosphere when the distance civil aircraft applications.
between the earth and sun is one astronomical
unit (AU). Technical Note: For the purposes of 3A001.g,
a thyristor module contains one or more
f. Rotary input type absolute position encoders thyristor devices.
having an accuracy equal to or less (better) than
1.0 second of arc; h. Solid-state power semiconductor switches,
diodes, or modules, having all of the
g. Solid-state pulsed power switching thyristor following:
devices and thyristor modules, using either
electrically, optically, or electron radiation h.1. Rated for a maximum operating junction
controlled switch methods and having any of the temperature greater than 488 K (215C);
following:
h.2. Repetitive peak off-state voltage
g.1. A maximum turn-on current rate of rise (blocking voltage) exceeding 300 V; and
(di/dt) greater than 30,000 A/s and off-state
voltage greater than 1,100 V; or h.3. Continuous current greater than 1 A.

g.2. A maximum turn-on current rate of rise Technical Note: For the purposes of
(di/dt) greater than 2,000 A/s and having all of 3A001.h, modules contain one or more solid-
the following: state power semiconductor switches or diodes.

g.2.a. An off-state peak voltage equal Note 1: Repetitive peak off-state voltage in
to or greater than 3,000 V; and 3A001.h includes drain to source voltage,
collector to emitter voltage, repetitive peak
g.2.b. A peak (surge) current equal to reverse voltage and peak repetitive off-state
or greater than 3,000 A; blocking voltage.

Note 1: 3A001.g. includes: Note 2: 3A001.h. includes:

- Silicon Controlled Rectifiers (SCRs) - Junction Field Effect Transistors (JFETs)

- Electrical Triggering Thyristors (ETTs) - Vertical Junction Field Effect Transistors


(VJFETs)
- Light Triggering Thyristors (LTTs)
- Metal Oxide Semiconductor Field Effect
- Integrated Gate Commutated Thyristors Transistors (MOSFETs)
(IGCTs)
- Double Diffused Metal Oxide
- Gate Turn-off Thyristors (GTOs) Semiconductor Field Effect Transistor
(DMOSFET)
- MOS Controlled Thyristors (MCTs)
- Insulated Gate Bipolar Transistor (IGBT)

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 12

following conditions are met: (1)


- High Electron Mobility Transistors Bandwidths do not exceed: 4 MHz per
(HEMTs) track and have up to 28 tracks or 2 MHz
per track and have up to 42 tracks; (2)
- Bipolar Junction Transistors (BJTs) Tape speed does not exceed 6.1 m/s; (3)
They are not designed for underwater
- Thyristors and Silicon Controlled use; (4) They are not ruggedized for
Rectifiers (SCRs) military use; and (5) Recording density
does not exceed 653.2 magnetic flux
- Gate Turn-Off Thyristors (GTOs) sine waves per mm).
STA: License Exception STA may not be used
to ship any item in 3A002.g.1to any of
- Emitter Turn-Off Thyristors (ETOs) the eight destinations listed in
740.20(c)(2) of the EAR.
- PiN Diodes
List of Items Controlled
- Schottky Diodes
Unit: Number
Note 3: 3A001.h. does not apply to switches, Related Controls: Space-qualified atomic
diodes, or modules incorporated into frequency standards defined in 3A002.g.1 are
equipment designed for civil automobile, civil subject to the export licensing authority of the
railway, or civil aircraft applications. Department of State, Directorate of Defense
Trade Controls (22 CFR part 121.1, Category
XV). See also 3A292 and 3A992.
3A002 General purpose electronic equipment Related Definitions: Constant percentage
and accessories therefor, as follows (see List bandwidth filters are also known as octave or
of Items Controlled). fractional octave filters.
Items:
License Requirements
a. Recording equipment as follows and specially
Reason for Control: NS, AT designed test tape therefor:

Control(s) Country Chart a.1. Analog instrumentation magnetic tape


recorders, including those permitting the
NS applies to entire entry NS Column 2 recording of digital signals (e.g., using a high
density digital recording (HDDR) module),
AT applies to entire entry AT Column 1 having any of the following:

License Requirement Notes: See 743.1 of a.1.a. A bandwidth exceeding 4 MHz per
the EAR for reporting requirements for exports electronic channel or track;
under License Exceptions.
a.1.b. A bandwidth exceeding 2 MHz per
License Exceptions electronic channel or track and having more than
42 tracks; or
LVS: $3000: 3A002.a, .e, .f, .g;
$5000: 3A002.c to .d a.1.c. A time displacement (base) error,
GBS: Yes for 3A002.a.1. measured in accordance with applicable IRIG or
CIV: Yes for 3A002.a.1 (provided all of the EIA documents, of less than 0.1 s;

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 13

a.5.b. A continuous throughput of 2 Gbit/s


Note: Analog magnetic tape recorders or more;
specially designed for civilian video purposes
are not considered to be instrumentation tape Technical Notes: 1. For those instruments
recorders. with a parallel bus architecture, the
continuous throughput rate is the highest word
a.2. Digital video magnetic tape recorders rate multiplied by the number of bits in a word.
having a maximum digital interface transfer rate
exceeding 360 Mbit/s; 2. Continuous throughput is the fastest data
rate the instrument can output to mass storage
Note: 3A002.a.2 does not control digital video without the loss of any information while
magnetic tape recorders specially designed for sustaining the sampling rate and analog-to-
television recording using a signal format, digital conversion.
which may include a compressed signal format,
standardized or recommended by the ITU, the a.6. Digital instrumentation data recorders
IEC, the SMPTE, the EBU , the ETSI, or the using magnetic disk storage technique and
IEEE for civil television applications. having all of the following:

a.3. Digital instrumentation magnetic tape data a.6.a. Digitizing rate equal to or more than
recorders employing helical scan techniques or 100 million samples per second and a resolution
fixed head techniques and having any of the of 8 bits or more; and
following:
a.6.b. A continuous throughput of 1 Gbit/s
a.3.a. A maximum digital interface transfer or more;
rate exceeding 175 Mbit/s; or
b. [RESERVED]
a.3.b. Being space-qualified;
c. Radio-frequency signal analyzers as
Note: 3A002.a.3 does not control analog follows:
magnetic tape recorders equipped with HDDR
conversion electronics and configured to record c.1. Signal analyzers having a 3 dB
only digital data. resolution bandwidth (RBW) exceeding 10 MHz
anywhere within the frequency range exceeding
a.4. Equipment having a maximum digital 31.8 GHz but not exceeding 37.5 GHz;
interface transfer rate exceeding 175 Mbit/s and
designed to convert digital video magnetic tape c.2. Signal analyzers having Displayed
recorders for use as digital instrumentation data Average Noise Level (DANL) less (better) than
recorders; 150 dBm/Hz anywhere within the frequency
range exceeding 43.5 GHz but not exceeding 70
a.5. Waveform digitizers and transient GHz;
recorders, having all of the following:
c.3. Signal analysershaving a frequency
N.B.: See also 3A292. exceeding 70 GHz;

a.5.a. Digitizing rates equal to or more than c.4. Dynamic signal analyzers having a
200 million samples per second and a resolution real-time bandwidth exceeding 40 MHz;
of 10 bits or more; and
Note: 3A002.c.4 does not control those

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 14

dynamic signal analyzers using only constant frequency change exceeding 550 MHz within
percentage bandwidth filters (also known as the synthesized frequency range exceeding 43.5
octave or fractional octave filters). GHz but not exceeding 56 GHz; or

d. Frequency synthesized signal generators d.3.f. Less than 1 ms for any frequency
producing output frequencies, the accuracy and change exceeding 2.2 GHz within the
short term and long term stability of which are synthesized frequency range exceeding 56 GHz
controlled, derived from or disciplined by the but not exceeding 70 GHz;
internal master reference oscillator, and having
any of the following: d.4. Single sideband (SSB) phase noise, in
dBc/Hz, specified as being all of the following:
d.1. Specified to generate pulses having all of
the following, anywhere within the synthesized d.4.a. Less (better) than - (126+20
frequency range exceeding 31.8 GHz but not log10 F-20 log10f) for 10 Hz <F<10 kHz
exceeding 70 GHz: anywhere within the synthesized frequency
range exceeding 3.2 GHz but not exceeding 70
d.1.a. 'Pulse duration' of less than 100 GHz; and
ns; and
d.4.b. Less (better) than - (114+20
d.1.b. On/off ratio equal to or log10 F-20 log10f) for 10 kHz <F< 500 kHz
exceeding 65 dB; anywhere within the synthesized frequency
range exceeding 3.2 GHz but not exceeding 70
d.2. An output power exceeding 100 mW (20 GHz; or
dBm) anywhere within the synthesized
frequency range exceeding 43.5 GHz but not Technical Note: In 3A002.d.4, F is the
exceeding 70 GHz; offset from the operating frequency in Hz and f
is the operating frequency in MHz.
d.3. A frequency switching time as specified
by any of the following: d.5. A maximum synthesized frequency
exceeding 70 GHz;
d.3.a. Less than 312 ps;
Note 1: For the purpose of 3A002.d, frequency
d.3.b. Less than 100 s for any synthesized signal generators include arbitrary
frequency change exceeding 1.6 GHz within the waveform and function generators.
synthesized frequency range exceeding 3.2 GHz
but not exceeding 10.6 GHz; Note 2: 3A002.d does not control equipment in
which the output frequency is either produced by
d.3.c. Less than 250 s for any the addition or subtraction of two or more
frequency change exceeding 550 MHz within crystal oscillator frequencies, or by an addition
the synthesized frequency range exceeding 10.6 or subtraction followed by a multiplication of
GHz but not exceeding 31.8 GHz; the result.

d.3.d. Less than 500 s for any Technical Notes:


frequency change exceeding 550 MHz within
the synthesized frequency range exceeding 31.8 1. The maximum synthesized frequency of an
GHz but not exceeding 43.5 GHz; arbitrary waveform or function generator is
calculated by dividing the sample rate, in
d.3.e. Less than 1 ms for any samples/second, by a factor of 2.5.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 15

systems employing closed loop fluid handling


2. For the purposes of 3A002.d.1.a, pulse and reconditioning equipment in a sealed
duration is defined as the time interval between enclosure where a dielectric fluid is sprayed
the leading edge of the pulse achieving 90% of onto electronic components using specially
the peak and the trailing edge of the pulse designed spray nozzles that are designed to
achieving 10% of the peak. maintain electronic components within their
operating temperature range, and specially
e. Network analyzers having any of the designed components therefor.
following:
License Requirements
e.1. Output power exceeding 31.62 mW (15
dBm) anywhere within the operating frequency Reason for Control: NS, AT
range exceeding 43.5 GHz but not exceeding 70
GHz; or Control(s) Country Chart

e.2. Maximum operating frequency exceeding NS applies to entire entry NS Column 2


70 GHz;
AT applies to entire entry AT Column 1
f. Microwave test receivers having all of the
following: License Exceptions

f.1. A maximum operating frequency LVS: N/A


exceeding 70 GHz; and GBS: N/A
CIV: N/A
f.2. Being capable of measuring amplitude and
phase simultaneously; List of Items Controlled

g. Atomic frequency standards being any of the Unit: Number of systems, components in $
following: Related Controls: N/A
Related Definitions: N/A
g.1. Space-qualified; Items:

g.2. Non-rubidium and having a long-term The list of items controlled is contained in the
stability less (better) than 1 x 10-11/month; or ECCN heading.

g.3. Non-space-qualified and having all of


the following: 3A101 Electronic equipment, devices and
components, other than those controlled by
g.3.a. Being a rubidium standard; 3A001, as follows (see List of Items
Controlled).
g.3.b. Long-term stability less (better)
than 1 x 10-11/month; and License Requirements

g.3.c. Total power consumption of Reason for Control: MT, AT


less than 1 Watt.
Control(s) Country Chart

3A003 Spray cooling thermal management MT applies to entire entry MT Column 1

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 16

AT applies to entire entry AT Column 1


AT applies to entire entry AT Column 1
License Exceptions
License Exceptions
LVS: N/A
LVS: N/A GBS: N/A
GBS: N/A CIV: N/A
CIV: N/A
List of Items Controlled
List of Items Controlled
Unit: Number
Unit: Number Related Controls: (1) See ECCNs 3E001
Related Controls: Items controlled in (development and production) and
3A101.a are subject to the export licensing 3E201 (use) for technology for items
authority of the U.S. Department of State, controlled under this entry. (2) Also see
Directorate of Defense Trade Controls (See 3A001.e.2 (capacitors) and 3A001.e.3
22 CFR part 121). (superconducting electromagnets). (3)
Related Definitions: N/A Superconducting electromagnets specially
Items: designed or prepared for use in separating
uranium isotopes are subject to the export
a. Analog-to-digital converters, usable in licensing authority of the Nuclear
missiles, designed to meet military Regulatory Commission (see 10 CFR part
specifications for ruggedized equipment; 110).
Related Definitions: N/A
b. Accelerators capable of delivering Items:
electromagnetic radiation produced by
bremsstrahlung from accelerated electrons of 2 a. Pulse discharge capacitors having either of
MeV or greater, and systems containing those the following sets of characteristics:
accelerators, usable for the missiles or the
subsystems of missiles. a.1. Voltage rating greater than 1.4 kV, energy
storage greater than 10 J, capacitance greater
Note: 3A101.b above does not include than 0.5 F, and series inductance less than 50
equipment specially designed for medical nH; or
purposes.
a.2. Voltage rating greater than 750 V,
capacitance greater than 0.25 F, and series
3A201 Electronic components, other than inductance less than 10 nH;
those controlled by 3A001, as follows (see List
of Items Controlled). b. Superconducting solenoidal electromagnets
having all of the following characteristics:
License Requirements
b.1. Capable of creating magnetic fields
Reason for Control: NP, AT greater than 2 T;

Control(s) Country Chart b.2. A ratio of length to inner diameter greater


than 2;
NP applies to entire entry NP Column 1
b.3. Inner diameter greater than 300 mm; and

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 17

2. Peak power = (peak potential in volts) x


b.4. Magnetic field uniform to better than 1% (peak beam current in amperes).
over the central 50% of the inner volume;
3. In machines based on microwave
Note: 3A201.b does not control magnets accelerating cavities, the time duration of the
specially designed for and exported as parts beam pulse is the lesser of 1 s or the duration
of medical nuclear magnetic resonance (NMR) of the bunched beam packet resulting from one
imaging systems. The phrase as part of does microwave modulator pulse.
not necessarily mean physical part in the same
shipment; separate shipments from different 4. In machines based on microwave
sources are allowed, provided the related export accelerating cavities, the peak beam current is
documents clearly specify that the shipments are the average current in the time duration of a
dispatched as part of the imaging systems. bunched beam packet.

c. Flash X-ray generators or pulsed electron


accelerators having either of the following sets 3A225 Frequency changers (also known as
of characteristics: converters or inverters) or generators, other
than those described in 0B001.c.11, having all
c.1. An accelerator peak electron energy of of the following characteristics (see List of
500 keV or greater, but less than 25 MeV, and Items Controlled).
with a figure of merit (K) of 0.25 or greater;
or License Requirements

c.2. An accelerator peak electron energy of 25 Reason for Control: NP, AT


MeV or greater, and a peak power greater than
50 MW; Control(s) Country Chart

Note: 3A201.c does not control accelerators NP applies to entire entry NP Column 1
that are component parts of devices designed for
purposes other than electron beam or X-ray AT applies to entire entry AT Column 1
radiation (electron microscopy, for example)
nor those designed for medical purposes. License Exceptions

Technical Notes: LVS: N/A


GBS: N/A
1. The figure of merit K is defined as: K = CIV: N/A
1.7 x 103V2.65Q. V is the peak electron energy in List of Items Controlled
million electron volts. If the accelerator beam
pulse duration is less than or equal to 1 s, then Unit: Number
Q is the total accelerated charge in Coulombs. Related Controls: (1) See ECCNs 3E001
If the accelerator beam pulse duration is greater (development and production) and 3E201
than 1 s, then Q is the maximum accelerated (use) for technology for items controlled
charge in 1 s. Q equals the intergral of i with under this entry. (2) Frequency changers (also
respect to t, over the lesser of 1 s or the time known as converters or inverters) specially
duration of the beam pulse (Q = idt), where i is designed or prepared for use in separating
beam current in amperes and t is time in uranium isotopes are subject to the export
seconds. licensing authority of the Nuclear Regulatory
Commission (see 10 CFR part 110).

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 18

Related Definitions: N/A Items:


Items:
a. Capable of continuously producing, over a
a. A multiphase output capable of providing a time period of 8 hours, 100 V or greater with
power of 40 W or more; current output of 500 A or greater; and

b. Capable of operating in the frequency range b. Current or voltage stability better than 0.1%
between 600 and 2000 Hz; over a time period of 8 hours.

c. Total harmonic distortion below 10%; and


3A227 High-voltage direct current power
d. Frequency control better than 0.1%. supplies, other than those described in
0B001.j.5, having both of the following
characteristics (see List of Items Controlled).
3A226 High-power direct current power
supplies, other than those described in License Requirements
0B001.j.6, having both of the following
characteristics (see List of Items Controlled). Reason for Control: NP, AT

License Requirements Control(s) Country Chart

Reason for Control: NP, AT NP applies to entire entry NP Column 1

Control(s) Country Chart AT applies to entire entry AT Column 1

NP applies to entire entry NP Column 1 License Exceptions

AT applies to entire entry AT Column 1 LVS: N/A


GBS: N/A
License Exceptions CIV: N/A

LVS: N/A List of Items Controlled


GBS: N/A
CIV: N/A Unit: $ value
Related Controls: (1) See ECCNs 3E001
List of Items Controlled (development and production) and 3E201
(use) for technology for items controlled
Unit: $ value under this entry. (2) Also see ECCN 3A226.
Related Controls: (1) See ECCNs 3E001 (3) Direct current power supplies specially
(development and production) and 3E201 designed or prepared for use in separating
(use) for technology for items controlled uranium isotopes are subject to the export
under this entry. (2) Also see ECCN 3A227. licensing authority of the Nuclear Regulatory
(3) Direct current power supplies specially Commission (see 10 CFR part 110).
designed or prepared for use in separating Related Definitions: N/A
uranium isotopes are subject to the export Items:
licensing authority of the Nuclear Regulatory
Commission (see 10 CFR part 110). a. Capable of continuously producing, over a
Related Definitions: N/A time period of 8 hours, 20 kV or greater with

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 19

current output of 1 A or greater; and


Technical Note: 3A228.a includes gas krytron
b. Current or voltage stability better than 0.1% tubes and vacuum sprytron tubes.
over a time period of 8 hours.
b. Triggered spark-gaps having both of the
following characteristics:
3A228 Switching devices, as follows (see List
of Items Controlled). b.1. An anode delay time of 15s or less; and
License Requirements
b.2. Rated for a peak current of 500 A or
Reason for Control: NP, AT more.

Control(s) Country Chart c. Modules or assemblies with a fast switching


function having all of the following
NP applies to entire entry NP Column 1 characteristics:

AT applies to entire entry AT Column 1 c.1. Anode peak voltage rating greater than
2 kV;
License Exceptions
c.2. Anode peak current rating of 500 A or
LVS: N/A more; and
GBS: N/A
CIV: N/A c.3. Turn-on time of 1s or less.

List of Items Controlled


3A229 Firing sets and equivalent high-
Unit: Number current pulse generators (for detonators
Related Controls: (1) See ECCNs 3E001 controlled by 3A232), as follows (see List of
(development and production) and 3E201 Items Controlled).
(use) for technology for items controlled
under this entry. (2) Also see ECCN 3A991.k. License Requirements
Related Definitions: N/A
Items: Reason for Control: NP, AT

a. Cold-cathode tubes, whether gas filled or not, Control(s) Country Chart


operating similarly to a spark gap, having all of
the following characteristics: NP applies to entire entry NP Column 1

a.1. Containing three or more electrodes; AT applies to entire entry AT Column 1

a.2. Anode peak voltage rating of 2.5 kV or License Exceptions


more;
LVS: N/A
a.3. Anode peak current rating of 100 A or GBS: N/A
more; and CIV: N/A

a.4. Anode delay time of 10 s List of Items Controlled


or less.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 20

Unit: Number 3A230 High-speed pulse generators having


Related Controls: (1) See ECCNs 3E001 and both of the following characteristics (see List
1E001 (development and production) and of Items Controlled).
3E201 and 1E201 (use) for technology for
items controlled under this entry. (2) High License Requirements
explosives and related equipment for military
use are subject to the export licensing Reason for Control: NP, AT
authority of the U.S. Department of State,
Directorate of Defense Trade Controls (see 22 Control(s) Country Chart
CFR part 121).
Related Definitions: In 3A229.b.5, rise time NP applies to entire entry NP Column 1
is defined as the time interval from 10% to
90% current amplitude when driving a AT applies to entire entry AT Column 1
resistive load.
ECCN Controls: 3A229.b includes xenon License Exceptions
flash-lamp drivers.
Items: LVS: N/A
GBS: N/A
a. Explosive detonator firing sets designed to CIV: N/A
drive multiple controlled detonators controlled
by 3A232; List of Items Controlled

b. Modular electrical pulse generators (pulsers) Unit: Number


having all of the following characteristics: Related Controls: See ECCNs 3E001
(development and production) and 3E201
b.1. Designed for portable, mobile, or (use) for technology for items controlled
ruggedized use; under this entry.
Related Definitions: In 3A230.b, pulse
b.2. Enclosed in a dust-tight enclosure; transition time is defined as the time interval
between 10% and 90% voltage amplitude.
b.3. Capable of delivering their energy in less Items:
than 15 s ;
a. Output voltage greater than 6 V into a
b.4. Having an output greater than 100 A; resistive load of less than 55 ohms; and

b.5. Having a rise time of less than 10 s b. Pulse transition time less than 500 ps.
into loads of less than 40 ohms;

b.6. No dimension greater than 254 mm; 3A231 Neutron generator systems, including
tubes, having both of the following
b.7. Weight less than 25 kg; and characteristics (see List of Items Controlled).
License Requirements
b.8. Specified for use over an extended
temperature range 223 K (-50C) to 373 K Reason for Control: NP, AT
(100C) or specified as suitable for aerospace
applications. Control(s) Country Chart

NP applies to entire entry NP Column 1

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 21

AT applies to entire entry AT Column 1 Unit: Number


Related Controls: (1) See 1A007 for
License Exceptions electrically driven explosive detonators. (2)
See ECCNs 3E001 (development and
LVS: N/A production) and 3E201 (use) for
GBS: N/A technology for items controlled under this
CIV: N/A entry. (3) High explosives and related
equipment for military use are subject to the
List of Items Controlled export licensing authority of the U.S.
Department of State, Directorate of Defense
Unit: Number; parts and accessories in Trade Controls (see 22 CFR part 121).
$ value Related Definitions: N/A
Related Controls: See ECCNs 3E001 ECCN Controls: This entry does not control
(development and production) and 3E201 detonators using only primary explosives,
(use) for technology for items controlled such as lead azide.
under this entry. Items:
Related Definitions: N/A
Items: a. [RESERVED]

a. Designed for operation without an external b. Arrangements using single or multiple


vacuum system; and detonators designed to nearly simultaneously
initiate an explosive surface over an area greater
b. Utilizing electrostatic acceleration to induce a than 5,000 mm2 from a single firing signal with
tritium-deuterium nuclear reaction. an initiation timing spread over the surface of
less than 2.5 s.

3A232 Detonators and multipoint initiation Technical Note: The word initiator is
systems, as follows (see List of Items sometimes used in place of the word detonator.
Controlled).

License Requirements 3A233 Mass spectrometers, other than those


described in 0B002.g, capable of measuring
Reason for Control: NP, AT ions of 230 atomic mass units or greater and
having a resolution of better than 2 parts in
Control(s) Country Chart 230, and ion sources therefor.

NP applies to entire entry NP Column 1 License Requirements

AT applies to entire entry AT Column 1 Reason for Control: NP, AT

License Exceptions Control(s) Country Chart

LVS: N/A NP applies to entire entry NP Column 1


GBS: N/A
CIV: N/A AT applies to entire entry AT Column 1

List of Items Controlled License Exceptions

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 22

LVS: N/A
GBS: N/A 3A292 Oscilloscopes and transient recorders
CIV: N/A other than those controlled by 3A002.a.5, and
specially designed components therefor.
List of Items Controlled
License Requirements
Unit: Number
Related Controls: (1) See ECCNs 3E001 Reason for Control: NP, AT
(development and production) and 3E201
(use) for technology for items controlled Control(s) Country Chart
under this entry. (2) Mass spectrometers
specially designed or prepared for analyzing NP applies to entire entry NP Column 2
on-line samples of UF6 gas streams are subject
to the export licensing authority of the Nuclear AT applies to entire entry AT Column 1
Regulatory Commission (see 10 CFR part
110). License Exceptions
Related Definitions: N/A
Items: LVS: N/A
GBS: N/A
a. Inductively coupled plasma mass CIV: N/A
spectrometers (ICP/MS);
List of Items Controlled
b. Glow discharge mass spectrometers
(GDMS); Unit: Number
Related Controls: See ECCN 3E292
c. Thermal ionization mass spectrometers (development, production, and use) for
(TIMS); technology for items controlled under this
entry.
d. Electron bombardment mass spectrometers Related Definitions: Bandwidth is defined as
that have a source chamber constructed from, the band of frequencies over which the
lined with or plated with materials resistant to deflection on the cathode ray tube does not fall
UF6; below 70.7% of that at the maximum point
measured with a constant input voltage to the
e. Molecular beam mass spectrometers having oscilloscope amplifier.
either of the following characteristics: Items:

e.1. A source chamber constructed from, lined a. Non-modular analog oscilloscopes having a
with or plated with stainless steel or bandwidth of 1 GHz or greater;
molybdenum and equipped with a cold trap
capable of cooling to 193 K (-80C) or less; or b. Modular analog oscilloscope systems having
either of the following characteristics:
e.2. A source chamber constructed from, lined
with or plated with materials resistant to UF6; b.1. A mainframe with a bandwidth of 1 GHz
or greater; or
f. Mass spectrometers equipped with a
microfluorination ion source designed for b.2. Plug-in modules with an individual
actinides or actinide fluorides. bandwidth of 4 GHz or greater;

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 23

Related Controls: N/A


c. Analog sampling oscilloscopes for the Related Definitions: N/A
analysis of recurring phenomena with an Items:
effective bandwidth greater than 4 GHz;
The list of items controlled is contained in the
d. Digital oscilloscopes and transient recorders, ECCN heading.
using analog-to-digital conversion techniques,
capable of storing transients by sequentially
sampling single-shot inputs at successive 3A981 Polygraphs (except biomedical
intervals of less than 1 ns (greater than 1 giga- recorders designed for use in medical
sample per second), digitizing to 8 bits or greater facilities for monitoring biological and
resolution and storing 256 or more samples. neurophysical responses); fingerprint
analyzers, cameras and equipment, n.e.s.;
Note: Specially designed components automated fingerprint and identification
controlled by this item are the following, for retrieval systems, n.e.s.; psychological stress
analog oscilloscopes: analysis equipment; electronic monitoring
restraint devices; and specially designed parts
1. Plug-in units; and accessories, n.e.s.

2. External amplifiers; License Requirements

3. Pre-amplifiers; Reason for Control: CC

4. Sampling devices; Control(s) Country Chart

5. Cathode ray tubes. CC applies to entire entry CC Column 1

License Exceptions
3A980 Voice print identification and analysis
equipment and parts, n.e.s. LVS: N/A
GBS: N/A
License Requirements CIV: N/A

Reason for Control: CC List of Items Controlled

Control(s) Country Chart Unit: Equipment in number


Related Controls: See ECCN 0A982 for other
CC applies to entire entry CC Column 1 types of restraint devices
Related Definitions: N/A
License Exceptions Items:

LVS: N/A The list of items controlled is contained in the


GBS: N/A ECCN heading.
CIV: N/A
Note to ECCN 3A981. In this ECCN, electronic
List of Items Controlled monitoring restraint devices are devices used to
record or report the location of confined
Unit: Equipment in number persons for law enforcement or penal reasons.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 24

The term does not include devices that confine a.1. An average output power equal to or
memory impaired patents to appropriate greater than 48 W (46.8 dBm);
medical facilities.
a.2. A pulsed output power equal to or greater
than 240 W (53.8 dBm) and a duty cycle of 20
3A982 Microwave or millimeter wave percent or more.
components that operate at frequencies below
those controlled by 3A001 as follows (See List b. Packaged microwave monolithic
of Items Controlled). integrated circuits (MMIC) power amplifiers
with physical dimensions less than 43mm per
License Requirements side, rated for operation at frequencies from 2.7
GHz up to and including 3.2 GHz and having
Reasons for Control: RS, AT either of the following:

Control(s) Country chart b.1 An average output power equal to or greater


RS applies to entire entry. RS Column 1 than 15W (41.7 dBm); or
AT applies to entire entry. AT Column 1
b.2 A pulsed output power equal to or greater
License Exceptions than 75 W (48.75 dBm) and a duty cycle of 20
percent or more.
LVS: N/A
GBS: N/A
CIV: N/A 3A991 Electronic devices and components
not controlled by 3A001.
List of Items Controlled
License Requirements
Unit: $ value
Reason for Control: AT
Related Controls: 1.) See ECCN 3A001.b.2 for
certain microwave monolithic integrated Control(s) Country Chart
circuits (MMIC) power amplifiers other than
those controlled by this entry. 2.) See ECCN AT applies to entire entry AT Column 1
3A001.b.3 for discrete microwave transistors
other than those controlled by this entry. 3.) See License Requirements Notes:
ECCN 3A001.h for high electron mobility
transistors that are solid state semiconductor See 744.17 of the EAR for additional license
switches, diodes or modules rather than discrete requirements for commodities classified as
microwave transistors. 3A991.a.1.

Related Definitions: N/A License Exceptions


Items:
LVS: N/A
a. Packaged high electron mobility transistors GBS: N/A
(HEMTs) with physical dimensions less than 43 CIV: N/A
mm per side, rated for operation at frequencies
from 2.7 GHz up to and including 3.2 GHz and List of Items Controlled
having any of the following:
Unit: Equipment in number

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 25

Related Controls: N/A following:


Related Definitions: N/A
Items: c.1. A resolution of 8 bit or more, but less than
12 bit, with an output rate greater than 200
a. Microprocessor microcircuits, million words per second;
microcomputer microcircuits, and
microcontroller microcircuits having any of the c.2. A resolution of 12 bit with an output rate
following: greater than 105 million words per second;

a.1. A performance speed of 5 GFLOPS or c.3. A resolution of more than 12 bit but equal
more and an arithmetic logic unit with an access to or less than 14 bit with an output rate greater
width of 32 bit or more; than 10 million words per second; or

a.2. A clock frequency rate exceeding 25 MHz; c.4. A resolution of more than 14 bit with an
or output rate greater than 2.5 million words per
second.
a.3. More than one data or instruction bus or
serial communication port that provides a direct d. Field programmable logic devices having
external interconnection between parallel either of the following:
microprocessor microcircuits with a transfer
rate of 2.5 Mbyte/s. d.1. An equivalent gate count of more than
5000 (2 input gates); or
b. Storage integrated circuits, as follows:
d.2. A toggle frequency exceeding 100 MHz;
b.1. Electrical erasable programmable read-
only memories (EEPROMs) with a storage e. Fast Fourier Transform (FFT) processors
capacity; having a rated execution time for a 1,024 point
complex FFT of less than 1 ms.
b.1.a. Exceeding 16 Mbits per package for
flash memory types; or f. Custom integrated circuits for which either the
function is unknown, or the control status of the
b.1.b. Exceeding either of the following equipment in which the integrated circuits will
limits for all other EEPROM types: be used is unknown to the manufacturer, having
any of the following:
b.1.b.1. Exceeding 1 Mbit per package; or
f.1. More than 144 terminals; or
b.1.b.2. Exceeding 256 kbit per package
and a maximum access time of less than 80 ns; f.2. A typical basic propagation delay time
of less than 0.4 ns.
b.2. Static random access memories (SRAMs)
with a storage capacity: g. Traveling wave tubes, pulsed or continuous
wave, as follows:
b.2.a. Exceeding 1 Mbit per package; or g.1. Coupled cavity tubes, or derivatives
thereof;
b.2.b. Exceeding 256 kbit per package and a
maximum access time of less than 25 ns; g.2. Helix tubes, or derivatives thereof, with
any of the following:
c. Analog-to-digital converters having any of the

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 26

g.2.a. An instantaneous bandwidth of half including single cell batteries.


an octave or more; and
Technical Notes:
g.2.b. The product of the rated average output
power (expressed in kW) and the maximum 1. For the purpose of 3A991.j energy density
operating frequency (expressed in GHz) of more (Wh/kg) is calculated from the nominal voltage
than 0.2; multiplied by the nominal capacity in ampere-
hours divided by the mass in kilograms. If the
g.2.c. An instantaneous bandwidth of less nominal capacity is not stated, energy density is
than half an octave; and calculated from the nominal voltage squared
then multiplied by the discharge duration in
g.2.d. The product of the rated average output hours divided by the discharge load in Ohms
power (expressed in kW) and the maximum and the mass in kilograms.
operating frequency (expressed in GHz) of more
than 0.4; 2. For the purpose of 3A991.j, a cell is
defined as an electrochemical device, which has
h. Flexible waveguides designed for use at positive and negative electrodes, and electrolyte,
frequencies exceeding 40 GHz; and is a source of electrical energy. It is the
basic building block of a battery.
i. Surface acoustic wave and surface skimming
(shallow bulk) acoustic wave devices (i.e., 3. For the purpose of 3A991.j.1, a primary
signal processing devices employing elastic cell is a cell that is not designed to be charged
waves in materials), having either of the by any other source.
following:
4. For the purpose of 3A991.j.2., a secondary
i.1. A carrier frequency exceeding 1 GHz; or cell is a cell that is designed to be charged by
an external electrical source.
i.2. A carrier frequency of 1 GHz or less; and
k. Superconductive electromagnets or
i.2.a. A frequency side-lobe rejection solenoids specially designed to be fully charged
exceeding 55 Db; or discharged in less than one minute, having all
of the following:
i.2.b. A product of the maximum delay time
and bandwidth (time in microseconds and Note: 3A991.k does not control
bandwidth in MHz) of more than 100; or superconductive electromagnets or solenoids
designed for Magnetic Resonance Imaging
i.2.c. A dispersive delay of more than 10 (MRI) medical equipment.
microseconds.
k.1. Maximum energy delivered during
j. Cells as follows: thedischarge divided by the duration of the
discharge of more than 500 kJ per minute;
j.1. Primary cells having an energy density of
550 Wh/kg or less at 293 K (20C); k.2. Inner diameter of the current carrying
windings of more than 250 mm; and
j.2. Secondary cells having an energy density
of 300 Wh/kg or less at 293 K (20C). k.3. Rated for a magnetic induction of more
than 8T or overall current density in the
Note: 3A991.j. does not control batteries, winding of more than 300 A/mm2.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 27

List of Items Controlled


l. Circuits or systems for electromagnetic energy
storage, containing components manufactured Unit: Equipment in number
from superconductive materials specially Related Controls: N/A
designed for operation at temperatures below the Related Definitions: N/A
critical temperature of at least one of their Items:
superconductive constituents, having all of the
following: a. Electronic test equipment, n.e.s.

l.1. Resonant operating frequencies exceeding b. Digital instrumentation magnetic tape data
1 MHz; recorders having any of the following
characteristics;
l.2. A stored energy density of 1 MJ/M3 or
more; and b.1. A maximum digital interface transfer rate
exceeding 60 Mbit/s and employing helical scan
l.3. A discharge time of less than 1 ms; techniques;

m. Hydrogen/hydrogen-isotope thyratrons of b.2. A maximum digital interface transfer rate


ceramic-metal construction and rate for a peak exceeding 120 Mbit/s and employing fixed head
current of 500 A or more; techniques; or

n. Digital integrated circuits based on any b.3. Space qualified;


compound semiconductor having an equivalent
gate count of more than 300 (2 input gates). c. Equipment, with a maximum digital interface
transfer rate exceeding 60 Mbit/s, designed to
o. Solar cells, cell-interconnect-coverglass convert digital video magnetic tape recorders for
(CIC) assemblies, solar panels, and solar arrays, use as digital instrumentation data recorders;
which are space qualified and not controlled
by 3A001.e.4.
3A999 Specific processing equipment, n.e.s.,
as follows (see List of Items Controlled).
3A992 General purpose electronic equipment
not controlled by 3A002. License Requirements

License Requirements Reason for Control: AT

Reason for Control: AT Control(s) Country Chart

Control(s) Country Chart AT applies to entire entry. A license is required


for items controlled by this entry to North Korea
AT applies to entire entry AT Column 1 for anti-terrorism reasons. The Commerce
Country Chart is not designed to determine AT
License Exceptions licensing requirements for this entry. See
742.19 of the EAR for additional information.
LVS: N/A
GBS: N/A License Exceptions
CIV: N/A
LVS: N/A

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 28

GBS: N/A semiconductor devices or materials, as


CIV: N/A follows (see List of Items Controlled) and
specially designed components and
List of Items Controlled accessories therefor.

Unit: $ value License Requirements


Related Controls: See also 0B002, 3A225 (for
frequency changes capable of operating in the Reason for Control: NS, AT
frequency range of 600 Hz and above), 3A233
Related Definitions: N/A Control(s) Country Chart
Items:
NS applies to entire entry NS Column 2
a. Frequency changers capable of operating in
the frequency range from 300 up to 600 Hz, AT applies to entire entry AT Column 1
n.e.s;
License Requirement Notes: See 743.1 of
b. Mass spectrometers n.e.s; the EAR for reporting requirements for exports
under License Exceptions.
c. All flash x-ray machines, and components of
pulsed power systems designed thereof, License Exceptions
including Marx generators, high power pulse
shaping networks, high voltage capacitors, and LVS: $500
triggers; GBS: Yes, except a.3 (molecular beam
epitaxial growth equipment using gas
d. Pulse amplifiers, n.e.s.; sources), .e (automatic loading multi-
chamber central wafer handling systems
e. Electronic equipment for time delay only if connected to equipment
generation or time interval measurement, as controlled by 3B001. a.3, or .f), and .f
follows: (lithography equipment).
CIV: Yes for equipment controlled by
e.1. Digital time delay generators with a 3B001.a.1 and a.2.
resolution of 50 nanoseconds or less over time
intervals of 1 microsecond or greater; or List of Items Controlled

e.2. Multi-channel (three or more) or modular Unit: Number


time interval meter and chronometry equipment Related Controls: See also 3B991
with resolution of 50 nanoseconds or less over Related Definitions: N/A
time intervals of 1 microsecond or greater; Items:

f. Chromatography and spectrometry analytical a. Equipment designed for epitaxial growth as


instruments. follows:

a.1. Equipment capable of producing a layer


B. TEST, INSPECTION AND of any material other than silicon with a
PRODUCTION EQUIPMENT thickness uniform to less than 2.5% across a
distance of 75 mm or more;

3B001 Equipment for the manufacturing of Note: 3B001.a.1 includes atomic layer epitaxy

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 29

(ALE) equipment. be connected; and

a.2. Metal Organic Chemical Vapor Deposition e.2. Designed to form an integrated system in a
(MOCVD) reactors specially designed for vacuum environment for sequential multiple
compound semiconductor crystal growth by the wafer processing;
chemical reaction between materials controlled
by 3C003 or 3C004; Note: 3B001.e does not control automatic
robotic wafer handling systems specially
a.3. Molecular beam epitaxial growth designed for parallel wafer processing.
equipment using gas or solid sources;
Technical Notes:
b. Equipment designed for ion implantation and
having any of the following: 1. For the purpose of 3B001.e,
semiconductor process tools refers to modular
b.1. A beam energy (accelerating voltage) tools that provide physical processes for
exceeding 1MeV; semiconductor production that are functionally
different, such as deposition, etch, implant or
b.2. Being specially designed and optimized to thermal processing.
operate at a beam energy (accelerating voltage
of less than 2 keV; 2. For the purpose of 3B001.e, sequential
multiple wafer processing means the capability
b.3. Direct write capability; or to process each wafer in different
semiconductor process tools, such as by
b.4. A beam energy of 65 keV or more and a transferring each wafer from one tool to a
beam current of 45 mA or more for high energy second tool and on to a third tool with the
oxygen implant into a heated semiconductor automatic loading multi-chamber central wafer
material substrate; handling systems.

c. Anisotropic plasma dry etching equipment f. Lithography equipment as follows:


having all of the following:
f.1. Align and expose step and repeat (direct
c.1. Designed or optimized to produce critical step on wafer) or step and scan (scanner)
dimensions of 65 nm or less; and equipment for wafer processing using photo-
optical or X-ray methods and having any of the
c.2. Within wafer non-uniformity equal to or following:
less than 10% 3 measured with an edge
exclusion of 2 mm or less; f.1.a. A light source wavelength shorter than
245 nm; or
d. [RESERVED]
f.1.b. Capable of producing a pattern with a
e. Automatic loading multi-chamber central Minimum Resolvable Feature size (MRF) of
wafer handling systems having all of the 95 nm or less;
following:
Technical Note: The Minimum Resolvable
e.1. Interfaces for wafer input and output, to Feature size (MRF) is calculated by the
which more than two functionally different following formula:
semiconductor process tools controlled by
3B001.a, 3B001.b, or 3B001.c are designed to MRF =

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 30

(an exposure light source wavelength in nm) x i. Imprint lithography templates designed for
(K factor) integrated circuits by 3A001.
-------------------------------------------------------
numerical aperture
3B002 Test equipment specially designed for
where the K factor = 0.35 testing finished or unfinished semiconductor
devices as follows (see List of Items
f.2 Imprint lithography equipment capable of Controlled) and specially designed
production features of 95 nm or less; components and accessories therefor.

Note: 3B001.f.2 includes: License Requirements

- Micro contact printing tools Reason for Control: NS, AT

- Hot embossing tools Control(s) Country Chart

- Nano-imprint lithography tools NS applies to entire entry NS Column 2

- Step and flash imprint lithography (S-FIL) AT applies to entire entry AT Column 1
tools
License Exceptions
f.3. Equipment specially designed for mask
making or semiconductor device processing LVS: $500
using direct writing methods, having all of the GBS: Yes
following: CIV: N/A

f.3.a. Using deflected focused electron beam, List of Items Controlled


ion beam or laser beam; and
Unit: Number
f.3.b. Having any of the following: Related Controls: See also 3A999.a and
3B992
f.3.b.1. A spot size smaller than 0.2 m; Related Definitions: N/A
f.3.b.2. Being capable of producing a Items:
pattern with a feature size of less than 1 m; or
a. For testing S-parameters of transistor devices
f.3.b.3. An overlay accuracy of better at frequencies exceeding 31.8 GHz;
than 0.20 m (3 sigma);
b. [RESERVED]
g. Masks and reticles, designed for integrated
circuits controlled by 3A001; c. For testing microwave integrated circuits
controlled by 3A001.b.2.
h. Multi-layer masks with a phase shift layer;

Note: 3B001.h. does not control multi-layer 3B991 Equipment not controlled by 3B001
masks with a phase shift layer designed for the for the manufacture of electronic components
fabrication of memory devices not controlled by and materials, and specially designed
3A001. components and accessories therefor.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 31

b.1. Equipment for the processing of materials


License Requirements for the manufacture of devices and components
Reason for Control: AT as specified in the heading of 3B991.b, as
follows:
Control(s) Country Chart
Note: 3B991 does not control quartz furnace
AT applies to entire entry AT Column 1 tubes, furnace liners, paddles, boats (except
specially designed caged boats), bubblers,
License Exceptions cassettes or crucibles specially designed for the
processing equipment controlled by 3B991.b.1.
LVS: N/A
GBS: N/A b.1.a. Equipment for producing
CIV: N/A polycrystalline silicon and materials controlled
by 3C001;
List of Items Controlled
b.1.b. Equipment specially designed for
Unit: Equipment in number, and purifying or processing III/V and II/VI
components and accessories in $ value semiconductor materials controlled by 3C001,
Related Controls: N/A 3C002, 3C003, 3C004, or 3C005 except crystal
Related Definitions: Sputtering is an pullers, for which see 3B991.b.1.c below;
overlay coating process wherein positively
charged ions are accelerated by an electric b.1.c. Crystal pullers and furnaces, as
field towards the surface of a target (coating follows:
material). The kinetic energy of the
impacting ions is sufficient to cause target Note: 3B991.b.1.c does not control diffusion
surface atoms to be released and deposited and oxidation furnaces.
on the substrate. (Note: Triode, magnetron
or radio frequency sputtering to increase b.1.c.1. Annealing or recrystallizing
adhesion of coating and rate of deposition equipment other than constant temperature
are ordinary modifications of the process.) furnaces employing high rates of energy transfer
Items: capable of processing wafers at a rate exceeding
0.005 m2 per minute;
a. Equipment specially designed for the
manufacture of electron tubes, optical elements b.1.c.2. Stored program controlled
and specially designed components therefor crystal pullers having any of the following
controlled by 3A001 or 3A991; characteristics:

b. Equipment specially designed for the b.1.c.2.a. Rechargeable without replacing


manufacture of semiconductor devices, the crucible container;
integrated circuits and electronic assemblies,
as follows, and systems incorporating or having b.1.c.2.b. Capable of operation at
the characteristics of such equipment: pressures above 2.5 x 105 Pa; or

Note: 3B991.b also controls equipment used b.1.c.2.c. Capable of pulling crystals of a
or modified for use in the manufacture of other diameter exceeding 100 mm;
devices, such as imaging devices, electro-optical
devices, acoustic-wave devices. b.1.d. Stored program controlled
equipment for epitaxial growth having any of the

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 32

following characteristics: optical emission spectroscopy types; or

b.1.d.1. Capable of producing silicon layer b.1.h.1.b. Reactor operational (etching)


with a thickness uniform to less than 2.5% pressure of 26.66 Pa or less;
across a distance of 200 mm or more;
b.1.h.2. Single wafer types having any of
b.1.d.2. Capable of producing a layer of any the following:
material other than silicon with a thickness
uniformity across the wafer of equal to or better b.1.h.2.a. End-point detection, other than
than 3.5%; or optical emission spectroscopy types;

b.1.d.3. Rotation of individual wafers b.1.h.2.b. Reactor operational (etching)


during processing; pressure of 26.66 Pa or less; or

b.1.e. Molecular beam epitaxial growth b.1.h.2.c. Cassette-to-cassette and load


equipment; locks wafer handling;

b.1.f. Magnetically enhanced sputtering Notes: 1. Batch types refers to machines


equipment with specially designed integral load not specially designed for production processing
locks capable of transferring wafers in an of single wafers. Such machines can process
isolated vacuum environment; two or more wafers simultaneously with
common process parameters, e.g., RF power,
b.1.g. Equipment specially designed for ion temperature, etch gas species, flow rates.
implantation, ion-enhanced or photo-enhanced
diffusion, having any of the following 2. Single wafer types refers to machines
characteristics: specially designed for production processing of
single wafers. These machines may use
b.1.g.1. Patterning capability; automatic wafer handling techniques to load a
single wafer into the equipment for processing.
b.1.g.2. Beam energy (accelerating The definition includes equipment that can load
voltage) exceeding 200 keV; and process several wafers but where the
etching parameters, e.g., RF power or end point,
b.1.g.3 Optimized to operate at a beam can be independently determined for each
energy (accelerating voltage) of less than 10 individual wafer.
keV; or
b.1.i. Chemical vapor deposition (CVD)
b.1.g.4. Capable of high energy oxygen equipment, e.g., plasma-enhanced CVD
implant into a heated substrate; (PECVD) or photo-enhanced CVD, for
semiconductor device manufacturing, having
b.1.h. Stored program controlled either of the following capabilities, for
equipment for the selective removal (etching) by deposition of oxides, nitrides, metals or
means of anisotropic dry methods (e.g., plasma), polysilicon:
as follows:
b.1.i.1. Chemical vapor deposition
b.1.h.1. Batch types having either of the equipment operating below 105 Pa; or
following:
b.1.i.2. PECVD equipment operating either
b.1.h.1.a. End-point detection, other than below 60 Pa (450 millitorr) or having automatic

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 33

cassette-to-cassette and load lock wafer b.1.l. Interconnection equipment which


handling; includes common single or multiple vacuum
chambers specially designed to permit the
Note: 3B991.b.1.i does not control low integration of any equipment controlled by
pressure chemical vapor deposition (LPCVD) 3B991 into a complete system;
systems or reactive sputtering equipment.
b.1.m. Stored program controlled
b.1.j. Electron beam systems specially equipment using lasers for the repair or
designed or modified for mask making or trimming of monolithic integrated circuits
semiconductor device processing having any of with either of the following characteristics:
the following characteristics:
b.1.m.1. Positioning accuracy less than 1
b.1.j.1. Electrostatic beam deflection; micrometer; or

b.1.j.2. Shaped, non-Gaussian beam b.1.m.2. Spot size (kerf width) less than 3
profile; micrometer.

b.1.j.3. Digital-to-analog conversion rate b.2. Masks, mask substrates, mask-making


exceeding 3 MHz; equipment and image transfer equipment for the
manufacture of devices and components as
b.1.j.4. Digital-to-analog conversion specified in the heading of 3B991, as follows:
accuracy exceeding 12 bit; or
Note: The term masks refers to those used
b.1.j.5. Target-to-beam position feedback in electron beam lithography, X-ray lithography,
control precision of 1 micrometer or finer; and ultraviolet lithography, as well as the usual
ultraviolet and visible photo-lithography.
Note: 3B991.b.1.j does not control electron
beam deposition systems or general purpose b.2.a. Finished masks, reticles and designs
scanning electron microscopes. therefor, except:

b.1.k. Surface finishing equipment for the b.2.a.1. Finished masks or reticles for the
processing of semiconductor wafers as follows: production of unembargoed integrated circuits;
or
b.1.k.1. Specially designed equipment for
backside processing of wafers thinner than 100 b.2.a.2. Masks or reticles, having both of
micrometer and the subsequent separation the following characteristics:
thereof; or
b.2.a.2.a. Their design is based on
b.1.k.2. Specially designed equipment for geometries of 2.5 micrometer or more; and
achieving a surface roughness of the active b.2.a.2.b. The design does not include
surface of a processed wafer with a two-sigma special features to alter the intended use by
value of 2 micrometer or less, total indicator means of production equipment or software;
reading (TIR);
b.2.b. Mask substrates as follows:
Note: 3B991.b.1.k does not control single-
side lapping and polishing equipment for wafer b.2.b.1. Hard surface (e.g., chromium,
surface finishing. silicon, molybdenum) coated substrates (e.g.,
glass, quartz, sapphire) for the preparation of

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 34

masks having dimensions exceeding 125 mm x purpose scanning electron microscopes except
125 mm; or when specially designed and instrumented for
automatic pattern inspection.
b.2.b.2. Substrates specially designed for
X-ray masks; b.2.f. Align and expose equipment for wafer
production using photo-optical or X-ray
b.2.c. Equipment, other than general purpose methods, e.g., lithography equipment, including
computers, specially designed for computer both projection image transfer equipment and
aided design (CAD) of semiconductor devices or step and repeat (direct step on wafer) or step and
integrated circuits; scan (scanner) equipment, capable of performing
any of the following functions:
b.2.d. Equipment or machines, as follows,
for mask or reticle fabrication: Note: 3B991.b.2.f does not control photo-
optical contact and proximity mask align and
b.2.d.1. Photo-optical step and repeat expose equipment or contact image transfer
cameras capable of producing arrays larger than equipment.
100 mm x 100 mm, or capable of producing a
single exposure larger than 6 mm x 6 mm in the b.2.f.1. Production of a pattern size of less
image (i.e., focal) plane, or capable of producing than 2.5 micrometer;
line widths of less than 2.5 micrometer in the
photoresist on the substrate; b.2.f.2. Alignment with a precision finer
than 0.25 micrometer (3 sigma);
b.2.d.2. Mask or reticle fabrication
equipment using ion or laser beam lithography b.2.f.3. Machine-to-machine overlay no
capable of producing line widths of less than 2.5 better than 0.3 micrometer; or
micrometer; or
b.2.f.4. A light source wavelength shorter
b.2.d.3. Equipment or holders for altering than 400 nm;
masks or reticles or adding pellicles to remove
defects; b.2.g. Electron beam, ion beam or X-ray
equipment for projection image transfer capable
Note: 3B991.b.2.d.1 and b.2.d.2 do not of producing patterns less than 2.5 micrometer;
control mask fabrication equipment using photo-
optical methods which was either commercially Note: For focused, deflected-beam
available before the 1st January, 1980, or has a systems(direct write systems), see 3B991.b.1.j or
performance no better than such equipment. b.10.
b.2.e. Stored program controlled
equipment for the inspection of masks, reticles b.2.h. Equipment using lasers for direct
or pellicles with: write on wafers capable of producing patterns
less than 2.5 micrometer.
b.2.e.1. A resolution of 0.25 micrometer or
finer; and b.3. Equipment for the assembly of integrated
circuits, as follows:
b.2.e.2. A precision of 0.75 micrometer or
finer over a distance in one or two coordinates of b.3.a. Stored program controlled die
63.5 mm or more; bonders having all of the following
characteristics:
Note: 3B991.b.2.e does not control general

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 35

b.3.a.1. Specially designed for hybrid GBS: N/A


integrated circuits; CIV: N/A

b.3.a.2. X-Y stage positioning travel List of Items Controlled


exceeding 37.5 x 37.5 mm; and
Unit: Equipment in number
b.3.a.3. Placement accuracy in the X-Y Related Controls: See also 3A992.a.
plane of finer than 10 micrometer; Related Definitions: N/A
Items:
b.3.b. Stored program controlled
equipment for producing multiple bonds in a a. Equipment specially designed for the
single operation (e.g., beam lead bonders, chip inspection or testing of electron tubes, optical
carrier bonders, tape bonders); elements and specially designed components
therefor controlled by 3A001 or 3A991;
b.3.c. Semi-automatic or automatic hot cap
sealers, in which the cap is heated locally to a b. Equipment specially designed for the
higher temperature than the body of the package, inspection or testing of semiconductor devices,
specially designed for ceramic microcircuit integrated circuits and electronic assemblies,
packages controlled by 3A001 and that have a as follows, and systems incorporating or having
throughput equal to or more than one package the characteristics of such equipment:
per minute.
Note: 3B992.b also controls equipment used or
Note: 3B991.b.3 does not control general modified for use in the inspection or testing of
purpose resistance type spot welders. other devices, such as imaging devices, electro-
optical devices, acoustic-wave devices.
b.4. Filters for clean rooms capable of
providing an air environment of 10 or less b.1. Stored program controlled inspection
particles of 0.3 micrometer or smaller per equipment for the automatic detection of defects,
0.02832 m3 and filter materials therefor. errors or contaminants of 0.6 micrometer or less
in or on processed wafers, substrates, other
than printed circuit boards or chips, using optical
3B992 Equipment not controlled by 3B002 image acquisition techniques for pattern
for the inspection or testing of electronic comparison;
components and materials, and specially
designed components and accessories Note: 3B992.b.1 does not control general
therefor. purpose scanning electron microscopes, except
when specially designed and instrumented for
License Requirements automatic pattern inspection.

Reason for Control: AT b.2. Specially designed stored program


controlled measuring and analysis equipment,
Control(s) Country Chart as follows:

AT applies to entire entry AT Column 1 b.2.a. Specially designed for the


measurement of oxygen or carbon content in
License Exceptions semiconductor materials;

LVS: N/A b.2.b. Equipment for line width measurement

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 36

with a resolution of 1 micrometer or finer; 2. Assemblies or a class of electronic


assemblies for home and entertainment
b.2.c. Specially designed flatness applications; and
measurement instruments capable of measuring
deviations from flatness of 10 micrometer or less 3. Electronic components, assemblies and
with a resolution of 1 micrometer or finer. integrated circuits not controlled by 3A001 or
3A991 provided such test equipment does not
b.3. Stored program controlled wafer incorporate computing facilities with user
probing equipment having any of the following accessible programmability.
characteristics:
Technical Note: For purposes of 3B992.b.4.b,
b.3.a. Positioning accuracy finer than 3.5 pattern rate is defined as the maximum
micrometer; frequency of digital operation of a tester. It is
therefore equivalent to the highest data rate that
b.3.b. Capable of testing devices having a tester can provide in non-multiplexed mode. It
more than 68 terminals; or is also referred to as test speed, maximum
digital frequency or maximum digital speed.
b.3.c. Capable of testing at a frequency
exceeding 1 GHz; b.4.c. Equipment specially designed for
determining the performance of focal-plane
b.4. Test equipment as follows: arrays at wavelengths of more than 1,200 nm,
using stored program controlled
b.4.a. Stored program controlled measurements or computer aided evaluation and
equipment specially designed for testing discrete having any of the following characteristics:
semiconductor devices and unencapsulated dice,
capable of testing at frequencies exceeding 18 b.4.c.1. Using scanning light spot diameters
GHz; of less than 0.12 mm;

Technical Note: Discrete semiconductor b.4.c.2. Designed for measuring


devices include photocells and solar cells. photosensitive performance parameters and for
evaluating frequency response, modulation
b.4.b. Stored program controlled transfer function, uniformity of responsivity or
equipment specially designed for testing noise; or
integrated circuits and electronic assemblies
thereof, capable of functional testing: b.4.c.3. Designed for evaluating arrays
capable of creating images with more than 32 x
b.4.b.1. At a pattern rate exceeding 20 32 line elements;
MHz; or
b.5. Electron beam test systems designed for
b.4.b.2. At a pattern rate exceeding 10 operation at 3 keV or below, or laser beam
MHz but not exceeding 20 MHz and capable of systems, for non-contactive probing of powered-
testing packages of more than 68 terminals. up semiconductor devices having any of the
following:
Notes: 3B992.b.4.b does not control test
equipment specially designed for testing: b.5.a. Stroboscopic capability with either
beam blanking or detector strobing;
1. Memories;
b.5.b. An electron spectrometer for voltage

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 37

measurements with a resolution of less than 0.5


V; or Control(s) Country Chart

b.5.c. Electrical tests fixtures for NS applies to entire entry NS Column 2


performance analysis of integrated circuits;
AT applies to entire entry AT Column 1
Note: 3B992.b.5 does not control scanning
electron microscopes, except when specially License Exceptions
designed and instrumented for non-contactive
probing of a powered-up semiconductor device. LVS: $3000
GBS: N/A
b.6. Stored program controlled CIV: N/A
multifunctional focused ion beam systems
specially designed for manufacturing, repairing, List of Items Controlled
physical layout analysis and testing of masks or
semiconductor devices and having either of the Unit: $ value
following characteristics: Related Controls: This entry does not control
equipment or material whose functionality has
b.6.a. Target-to-beam position feedback been unalterably disabled are not controlled.
control precision of 1 micrometer or finer; or Related Definitions: N/A
Items:
b.6.b. Digital-to-analog conversion accuracy
exceeding 12 bit; a. Silicon (Si);

b.7. Particle measuring systems employing b. Germanium (Ge);


lasers designed for measuring particle size and
concentration in air having both of the following c. Silicon Carbide (SiC); or
characteristics:
d. III/V compounds of gallium or indium.
b.7.a. Capable of measuring particle sizes of
0.2 micrometer or less at a flow rate of 0.02832 Note: 3C001.d does not apply to a substrate
m3 per minute or more; and having one or more P-type epitaxial layers of
GaN, InGaN, AlGaN, InAlN, InAlGaN, GaP,
b.7.b. Capable of characterizing Class 10 InGaP, AlInP or InGaAlP, independent of the
clean air or better. sequence of the elements, except if the P-type
epitaxial layer is between N-type layers.

C. MATERIALS
3C002 Resist materials as follows (see List of
Items Controlled) and substrates coated
3C001 Hetero-epitaxial materials consisting with the following resists.
of a substrate having stacked epitaxially
grown multiple layers of any of the following License Requirements
(see List of Items Controlled).
Reason for Control: NS, AT
License Requirements
Control(s) Country Chart
Reason for Control: NS, AT

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 38

NS applies to entire entry NS Column 2 License Requirements

AT applies to entire entry AT Column 1 Reason for Control: NS, AT

License Exceptions Control(s) Country Chart

LVS: $3000 NS applies to entire entry NS Column 2


GBS: Yes for positive resists not optimized for
photolithography at a wavelength of less AT applies to entire entry AT Column 1
than 365 nm, provided that they are not
controlled by 3C002.b through .e. License Exceptions
CIV: Yes for positive resists not optimized for
photolithography at a wavelength of less LVS: $3000
than 365 nm, provided that they are not GBS: N/A
controlled by 3C002.b through .e. CIV: N/A

List of Items Controlled List of Items Controlled


Unit: $ value
Related Controls: N/A Unit: $ value
Related Definitions: Silylation techniques are Related Controls: This entry controls only
defined as processes incorporating oxidation compounds whose metallic, partly metallic or
of the resist surface to enhance performance non-metallic element is directly linked to
for both wet and dry developing. carbon in the organic part of the molecule.
Items: Related Definition: N/A
Items:
a. Positive resists designed for semiconductor
lithography specially adjusted (optimized) for a. Organo-metallic compounds of aluminum,
use at wavelengths below 245 nm; gallium or indium, having a purity (metal basis)
better than 99.999%;
b. All resists designed for use with electron
beams or ion beams, with a sensitivity of 0.01 b. Organo-arsenic, organo-antimony and organo-
coulomb/mm2 or better; phosphorus compounds, having a purity
(inorganic element basis) better than 99.999%.
c. All resists designed for use with X-rays, with
a sensitivity of 2.5 mJ/mm2 or better;
3C004 Hydrides of phosphorus, arsenic or
d. All resists optimized for surface imaging antimony, having a purity better than
technologies, including silylated resists; 99.999%, even diluted in inert gases or
hydrogen.
e. All resists designed or optimized for use with
imprint lithography equipment specified by License Requirements
3B001.f.2. that use either a thermal or photo-
curable process. Reason for Control: NS, AT

Control(s) Country Chart


3C003 Organo-inorganic compounds as
follows (see List of Items Controlled). NS applies to entire entry NS Column 2

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 39

AT applies to entire entry AT Column 1 Unit: $ value


Related Controls: See ECCN 3E001 for
License Exceptions related development and production
technology, and ECCN 3B991.b.1.b for
LVS: $3000 related production equipment.
GBS: N/A Related Definition: N/A
CIV: N/A Items:

List of Items Controlled The list of items controlled is contained in the


ECCN heading.
Unit: $ value
Related Controls: N/A
Related Definition: N/A 3C006 Substrates specified in 3C005 with
Items: at least one epitaxial layer of silicon carbide,
gallium nitride, aluminum nitride or
The list of items controlled is contained in the aluminum gallium nitride.
ECCN heading.
License Requirements
Note: This entry does not control hydrides
containing 20% molar or more of inert gases or Reason for Control: NS, AT
hydrogen.
Control(s) Country Chart

3C005 Silicon carbide (SiC), gallium nitride NS applies to entire entry NS Column 2
(GaN), aluminum nitride (AlN) or aluminum
gallium nitride (AlGaN) substrates, or AT applies to entire entry AT Column 1
ingots, boules, or other preforms of those
materials, having resistivities greater than License Exceptions
10,000 ohm-cm at 20C.
LVS: $3000
License Requirements GBS: Yes
CIV: Yes
Reason for Control: NS, AT
List of Items Controlled
Control(s) Country Chart
Unit: $ value
NS applies to entire entry NS Column 2 Related Controls: See ECCN 3D001 for
related development or production
AT applies to entire entry AT Column 1 software, ECCN 3E001 for related
development and production
License Exceptions technology, and ECCN 3B991.b.1.b for
related production equipment.
LVS: $3000 Related Definition: N/A
GBS: Yes Items:
CIV: Yes
The list of items controlled is contained in the
List of Items Controlled ECCN heading.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 40

3A002, and 3B
3C992 Positive resists designed for
semiconductor lithography specially adjusted AT applies to entire entry AT Column 1
(optimized) for use at wavelengths between
370 and 245 nm. License Requirement Notes: See 743.1 of
the EAR for reporting requirements for exports
License Requirements under License Exceptions.

Reason for Control: AT License Exceptions

Control(s) Country Chart CIV: N/A


TSR: Yes, except for software specially
AT applies to entire entry AT Column 1 designed for the development or
production of Traveling Wave Tube
License Exceptions Amplifiers described in 3A001.b.8 having
operating frequencies exceeding 18 GHz.
LVS: N/A STA: License Exception STA may not be used
GBS: N/A to ship or transmit software specially
CIV: N/A designed for the development or
production of equipment specified by
List of Items Controlled 3A002.g.1 or 3B001.a.2 to any of the eight
destinations listed in 740.20(c)(2) of the
Unit: $ value EAR.
Related Controls: N/A
Related Definitions: N/A List of Items Controlled
Items:
Unit: $ value
The list of items controlled is contained in the Related Controls: Software specially
ECCN heading. designed for the development or
production of the following equipment is
under the export licensing authority of the
D. SOFTWARE Department of State, Directorate of Defense
Trade Controls (22 CFR part 121): 1.) When
operating at frequencies higher than 31.8 GHz
3D001 Software specially designed for the and space qualified: Helix tubes (traveling
development or production of equipment wave tubes (TWT)) defined in
controlled by 3A001.b to 3A002.g or 3B 3A001.b.1.a.4.c; microwave solid state
(except 3B991 and 3B992). amplifiers defined in 3A001.b.4.b; and
traveling wave tube amplifiers (TWTA)
License Requirements defined in 3A001.b.8; 2.) Space qualified
solar cells, coverglass-interconnect-cells or
Reason for Control: NS, AT covered-interconnect-cells (CIC) assemblies,
solar arrays, and/or solar panels, with a
Control(s) Country Chart minimum average efficiency of 31% or greater
at an operating temperature of 301K (28C)
NS applies to software NS Column 1 under simulated AM0 illumination with an
for equipment controlled irradiance of 1,367 Watts per square meter
by 3A001.b to 3A001.f, (W/m2), and associated solar concentrators,

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 41

power conditioners, and/or controllers, bearing


and power transfer assemblies, and License Requirements
deployment hardware/systems. 3.) Space
qualified atomic frequency standards defined Reason for Control: NS, AT
in 3A002.g.2. See also 3D101.
Related Definitions: N/A Control(s) Country Chart
Items:
NS applies to entire entry NS Column 1
The list of items controlled is contained in the
ECCN heading. AT applies to entire entry AT Column 1

License Exceptions
3D002 Software specially designed for the
use of equipment controlled by 3B001.a CIV: N/A
to .f, or 3B002. TSR: Yes

License Requirements List of Items Controlled

Reason for Control: NS, AT Unit: $ value


Related Controls: N/A
Control(s) Country Chart Related Definitions: 1.) Libraries, design
attributes or associated data for the design of
NS applies to entire entry NS Column 1 semiconductor devices or integrated circuits
are considered as technology. 2.) Physics-
AT applies to entire entry AT Column 1 based in 3D003 means using computations to
determine a sequence of physical cause and
License Exceptions effect events based on physical properties
(e.g., temperature, pressure, diffusion
CIV: N/A constants and semiconductor materials
TSR: Yes properties).
Items:
List of Items Controlled
The list of items controlled is contained in the
Unit: $ value ECCN heading.
Related Controls: Also see 3D991.
Related Definitions: N/A
Items: 3D004 Software specially designed for the
development of equipment controlled by
The list of items controlled is contained in the 3A003.
ECCN heading.
License Requirements

3D003 Physics-based simulation software Reason for Control: NS, AT


specially designed for the development of
lithographic, etching or deposition processes Control(s) Country Chart
for translating masking patterns into specific
topographical patterns in conductors, NS applies to entire entry NS Column 1
dielectrics or semiconductor materials.

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 42

AT applies to entire entry AT Column 1 development, production, or use of


items controlled by 3A980 and 3A981.
License Exceptions
License Requirements
CIV: N/A
TSR: Yes Reason for Control: CC, AT
List of Items Controlled
Control(s) Country Chart
Unit: $ value
Related Controls: N/A CC applies to entire entry CC Column 1
Related Definitions: N/A
Items: AT applies to entire entry AT Column 1

The list of items controlled is contained in the License Exceptions


ECCN heading.
CIV: N/A
TSR: N/A
3D101 Software specially designed or
modified for the use of equipment List of Items Controlled
controlled by 3A101.b.
Unit: $ value
License Requirements Related Controls: N/A
Related Definitions: N/A
Reason for Control: MT, AT Items:

Control(s) Country Chart The list of items controlled is contained in the


ECCN heading.
MT applies to entire entry MT Column 1

AT applies to entire entry AT Column 1 3D982 Software specially designed for the
development or production of microwave
License Exceptions or millimeter wave components classified
under ECCN 3A982.
CIV: N/A
TSR: N/A License Requirements

List of Items Controlled Reasons for Control: RS, AT

Unit: $ value Control(s) Country Chart


Related Controls: N/A
Related Definitions: N/A RS applies to entire entry RS Column 1
Items:
AT applies to entire entry AT Column 1
The list of items controlled is contained in the
ECCN heading. License Exceptions

CIV: N/A
3D980 Software specially designed for the TSR: N/A

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 43

General Technology Note for the


List of Items Controlled development or production of equipment
or materials controlled by 3A (except 3A292,
Unit: $ value 3A980, 3A981, 3A991 3A992, or 3A999), 3B
Related Controls: N/A (except 3B991 or 3B992) or 3C (except
Related Definitions: N/A 3C992).
Items: The list of items controlled is in the
ECCN heading. License Requirements

Reason for Control: NS, MT, NP, AT


3D991 Software specially designed for the
development, production, or use of Control(s) Country Chart
electronic devices or components controlled
by 3A991, general purpose electronic NS applies to technology NS Column 1
equipment controlled by 3A992, or for items controlled by
manufacturing and test equipment controlled 3A001, 3A002, 3A003,
by 3B991 and 3B992; or software specially 3B001, 3B002, or 3C001
designed for the use of equipment to 3C006.
controlled by 3B001.g and .h.
MT applies to technology MT Column 1
License Requirements for equipment controlled by
3A001 or 3A101 for MT
Reason for Control: AT reasons

Control(s) Country Chart NP applies to technology NP Column 1


for equipment controlled by
AT applies to entire entry AT Column 1 3A001, 3A201, or 3A225 to
3A233 for NP reasons
License Exceptions
AT applies to entire entry AT Column 1
CIV: N/A
TSR: N/A License Requirement Note: See 743.1 of the
EAR for reporting requirements for exports
List of Items Controlled under License Exceptions.

Unit: $ value License Exceptions


Related Controls: N/A
Related Definitions: N/A CIV: N/A
Items: TSR: Yes, except N/A for MT, and
technology specially designed for the
The list of items controlled is contained in the development or production of: (a)
ECCN heading. Traveling Wave Tube Amplifiers described in
3A001.b.8, having operating frequencies
exceeding 19 GHz; and (b) solar cells,
E. TECHNOLOGY coverglass-interconnect-cells or covered-
interconnect-cells (CIC) assemblies, solar
arrays and/or solar panels, which are space
3E001 Technology according to the qualified, having a minimum average

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 44

efficiency exceeding 20% but less than 31% for the production of equipment or
described in 3A001.e.4. components controlled by 3A003.
STA: License Exception STA may not be used
to ship or transmit technology according to Note 2: 3E001 does not control technology
the General Technology Note for the for the development or production of
development or production of equipment integrated circuits controlled by 3A001.a.3 to
specified by ECCNs 3A002.g.1 or 3B001.a.2 a.12, having all of the following:
to any of the eight destinations listed in
740.20(c)(2) of the EAR. a) Using technology at or above 0.130 m;
and
List of Items Controlled
b) Incorporating multi-layer structures with
Unit: N/A three or fewer metal layers.
Related Controls: 1.) See also 3E101 and
3E201. 2.)Technology according to the
General Technology Note for the 3E002 Technology according to the
development or production of the General Technology Note other than that
following commodities is under the export controlled in 3E001 for the development or
licensing authority of the Department of State, production of a microprocessor
Directorate of Defense Trade Controls microcircuit, micro-computer
(22CFR part 121): (a) When operating at microcircuit and microcontroller
frequencies higher than 31.8 GHz and space microcircuit core, having an arithmetic logic
qualified: helix tubes (traveling wave tubes unit with an access width of 32 bits or more
(TWT)) defined in 3A001.b.1.a.4.c; and any of the following features or
microwave solid state amplifiers defined in characteristics (see List of Items Controlled).
3A001.b.4.b; or traveling wave tube amplifiers
(TWTA) defined in 3A001.b.8; (b) Space License Requirements
qualified solar cells, coverglass-
interconnect-cells or covered-interconnect- Reason for Control: NS, AT
cells (CIC) assemblies, solar arrays, and/or
solar panels, with a minimum average Control(s)
efficiency of 31% or greater at an operating
temperature of 301K (28C) under simulated NS applies to entire entry NS Column 1
AM0 illumination with an irradiance of
1,367 Watts per square meter (W/m2), and AT applies to entire entry AT Column 1
associated solar concentrators, power
conditioners, and/or controllers, bearing and License Exceptions
power transfer assemblies, and deployment
hardware/systems; and (c) Space qualified CIV: Yes, for deemed exports, as described in
atomic frequency standards defined in 734.2(b)(2)(ii) of the EAR, of
3A002.g.2. technology for the development or
Related Definition: N/A production of general purpose
Items: microprocessor cores with a vector
processor unit with operand length of
The list of items controlled is contained in the 64-bit or less, 64-bit floating operations
ECCN heading. not exceeding 50 GFLOPS, or 16-bit or
more floating-point operations not
Note 1: 3E001 does not control technology exceeding 50 GMACS (billions of 16-

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 45

bit fixed-point multiply-accumulate Notes:


operations per second). Deemed exports
under License Exception CIV are 1. 3E002 does not control technology for
subject to a Foreign National Review the development or production of
(FNR) requirement, see 740.5 of the microprocessor cores, having all of the
EAR for more information about the following:
FNR. License Exception CIV does not a. Using technology at or above 0.130
apply to ECCN 3E002 technology also m; and
required for the development or
production of items controlled under b. Incorporating multi-layer structures with
ECCNs beginning with 3A, 3B, or 3C, five or fewer metal layers.
or to ECCN 3E002 technology also
controlled under ECCN 3E003. 2. 3E002 includes technology for digital
TSR: Yes signal processors and digital array processors.

List of Items Controlled


3E003 Other technology for the
Unit: N/A development or production of the
Related Controls: N/A following (see List of Items Controlled).
Related Definitions: N/A
Items: License Requirements

a. A vector processor unit designed to Reason for Control: NS, AT


perform more than two calculations on floating-
point vectors (one dimensional arrays of 32-bit Control(s)
or larger numbers) simultaneously;
NS applies to entire entry NS Column 1
Technical Note: A vector processor unit is a
processor element with built-in instructions that AT applies to entire entry AT Column 1
perform multiple calculations on floating-point
vectors (one-dimensional arrays of 32-bit or License Exceptions
larger numbers) simultaneously, having at least
one vector arithmetic logic unit. CIV: N/A
TSR: Yes, except .f and .g
b. Designed to perform more than two 64-bit or
larger floating-point operation results per cycle; List of Items Controlled
or
Unit: N/A
c. Designed to perform more than four 16-bit Related Controls: 1) Technology for the
fixed-point multiply-accumulate results per development or production of space
cycle (e.g., digital manipulation of analog qualified electronic vacuum tubes operating
information that has been previously converted at frequencies of 31.8 GHz or higher,
into digital form, also known as digital signal described in 3E003.g, is under the export
processing). license authority of the Department of State,
Directorate of Defense Trade Controls (22
Note: 3E002.c does not control technology CFR part 121); 2) See 3E001 for silicon-on-
for multimedia extensions. insulation (SOI) technology for the
development or production related to

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 46

radiation hardening of integrated circuits. License Exceptions


Related Definitions: N/A
Items: CIV: N/A
TSR: N/A
a. Vacuum microelectronic devices;
List of Items Controlled
b. Hetero-structure semiconductor electronic
devices such as high electron mobility Unit: N/A
transistors (HEMT), hetero-bipolar transistors Related Controls: N/A
(HBT), quantum well and super lattice devices; Related Definitions: N/A
Items:
Note: 3E003.b does not control technology
for high electron mobility transistors (HEMT) The list of items controlled is contained in the
operating at frequencies lower than 31.8 GHz ECCN heading.
and hetero-junction bipolar transistors (HBT)
operating at frequencies lower than 31.8 GHz.
3E102 Technology according to the
c. Superconductive electronic devices; General Technology Note for the
development of software controlled by
d. Substrates of films of diamond for electronic 3D101.
components;
License Requirements
e. Substrates of silicon-on-insulator (SOI) for
integrated circuits in which the insulator is Reason for Control: MT, AT
silicon dioxide;
Control(s) Country Chart
f. Substrates of silicon carbide for electronic
components; MT applies to entire entry MT Column 1

g. Electronic vacuum tubes operating at AT applies to entire entry AT Column 1


frequencies of 31.8 GHz or higher.
License Exceptions

3E101 Technology according to the CIV: N/A


General Technology Note for the use of TSR: N/A
equipment or software controlled by
3A001.a.1 or .2, 3A101, or 3D101. List of Items Controlled

License Requirements Unit: N/A

Reason for Control: MT, AT Related Controls: N/A


Related Definitions: N/A
Control(s) Country Chart Items:

MT applies to entire entry MT Column 1 The list of items controlled is contained in the
ECCN heading.
AT applies to entire entry AT Column 1

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 47

3E201 Technology according to the AT applies to entire entry AT Column 1


General Technology Note for the use of
equipment controlled by 3A001.e.2 or .e.3, License Exceptions
3A201 or 3A225 to 3A233.
CIV: N/A
License Requirements TSR: N/A

Reason for Control: NP, AT List of Items Controlled

Control(s) Country Chart Unit: N/A


Related Controls: N/A
NP applies to technology NP Column 1 Related Definitions: N/A
for equipment controlled by Items:
3A001.e.2, or .e.3, 3A201 or
3A225 to 3A233 for NP The list of items controlled is contained in the
reasons ECCN heading.

AT applies to entire entry AT Column 1


3E980 Technology specially designed for
License Exceptions development, production, or use of
items controlled by 3A980 and 3A981.
CIV: N/A
TSR: N/A License Requirements

List of Items Controlled Reason for Control: CC, AT

Unit: N/A Control(s) Country Chart


Related Controls: N/A
Related Definitions: N/A CC applies to entire entry CC Column 1
Items:
AT applies to entire entry AT Column 1
The list of items controlled is contained in the
ECCN heading. License Exceptions

CIV: N/A
3E292 Technology according to the TSR: N/A
General Technology Note for the
development, production, or use of List of Items Controlled
equipment controlled by 3A292.
Unit: N/A
License Requirements Related Controls: N/A
Related Definitions: N/A
Reason for Control: NP, AT Items:

Control(s) Country Chart The list of items controlled is contained in the


ECCN heading.
NP applies to entire entry NP Column 2

Export Administration Regulations Bureau of Industry and Security December 7, 2012


Commerce Control List Supplement No. 1 to Part 774 Category 3page 48

3E982 Technology require for the 3A992, or manufacturing and test equipment
development or production of microwave controlled by 3B991 or 3B992, or materials
or millimeter wave components classified controlled by 3C992.
under ECCN 3A982.
License Requirements
License Requirements
Reason for Control: AT
Reasons for Control: RS, AT
Control(s) Country Chart
Control(s) Country Chart
AT applies to entire entry AT Column 1
RS applies to entire entry RS Column 1
License Exceptions
AT applies to entire entry AT Column 1
CIV: N/A
License Exceptions TSR: N/A

CIV: N/A List of Items Controlled


TSR: N/A
Unit: N/A
List of Items Controlled Related Controls: N/A
Related Definitions: N/A
Unit: $ Value Items:
Related Controls: N/A
Related Definitions: N/A The list of items controlled is contained in the
Items: The list of items controlled is in the ECCN heading.
ECCN heading.

EAR99 Items subject to the EAR that are not


3E991 Technology for the development, elsewhere specified in this CCL Category or
production, or use of electronic devices in any other category in the CCL are
or components controlled by 3A991, general designated by the number EAR99.
purpose electronic equipment controlled by

Export Administration Regulations Bureau of Industry and Security December 7, 2012

You might also like