Conventional ClaySmart
HF acid generation All HF acid is generated at
surface.
Risks of damaging Risk is only partially covered
precipitates out of out of additional
Secondary and tertiary sequestering additives in the
reactions of HF acid. treatment acid.
Reaction kinetics of clay No control on reaction rates
minerals with highly reactive clay
minerals thus spending most
of live acid on the sand face
and attaining very shallow
penetration of live acid into
the formation matrix.
Reduced chemical volumes Regular strength
conventional Mud acid is
12% HCl acid +3% HF acid
blend.
Reduced inhibitor loading Requires high loading of acid
corrosion inhibitors and ACI
intensifier additives
depending on the operating
conditions.
Formation wettability High loading of cationic
additives like corrosion
inhibitors may alter the
Delayed generation of HF in-situ. Multip
with proprietary H5 acid molecule are r
stoichiometric conditions in-situ thus al
penetration of live acid into the format
Risk is greatly minimized. The core ingr
organophosphate chemistry will comple
ions and greatly reduce the damaging p
enhancing the success of the treatment
H5Acid/HF/Clay reaction forms a micr
Aluminium Silicon Phosphonate (ASP) o
clay minerals thus controlling the reac
making more live acid available to react
minerals like quartz, feldspars etc. This
acid to penetrate deeper.
Equivalent ClaySmart acid requires only
gpt of H5 acid, thus drastically reducing
acid and other additives to be mobilize
ClaySmart acid system is a high pH syste
allowing for the drastic cut in the loadin
inhibitors. It helps to eliminate the ACI
well as substantial benifit on the cost o
Core ingredient of ClaySmart acid syste
strong water wetting agent. It allows In
between Formation and Treating Fluids
water wet state of the formation in the ideal water wet state
formation thus inducing Production
wettability damages.