You are on page 1of 24

Chem. Rev.

1995, 95, 735-758 735

Photocatalysis on TiOn Surfaces: Principles, Mechanisms, and


Selected Results
Amy L. Linsebigler, Guangquan Lu, and John T. Yates, Jr.*
Surface Science Center, Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260

Received July 6, 1994 (Revised Manuscript Received November 1, 1994)

Contents 3.5.2. The Photoactivity of Ti02: Effects of 752


Adsorbed H20 and 02
1. Introduction 735 3.5.3. Trichloroethylene (TCE) 752
2. Electronic Processes in Photocatalysis 737 3.5.4. 4-Chlorophenol (4-CP) 753
2.1, Molecular Electronic Excitation 737 3.6. Photooxidation at the Liquid-Solid Interface 753
2.1 -1. Molecular Spectroscopy and 737 on TiOz Catalysts
Photochemistry 3.6.1. Introduction 753
2.1 -2. Molecular Excitation and Deexcitation 738 3.6.2. The Primary Events of Photooxidation at 753
Events the Liquid-Solid Interface
2.2. Semiconductor Electronic Excitation 739 3.6.3. The Dynamics of Charge Carrier 753
2.2.1. Band-Gap Photoexcitation 739 Trapping, Recombination, and Interfacial
2.2.2. Band-Edge Positions 740 Electron Transfer
2.2.3. Charge Carrier Trapping 740 3.6.4. Overview of Photomineralization 754
2.2.4. Quantum Size Effects 741 Reactions in Aqueous Semiconductor
2.2.5. Band Bending and Formation of Schottky 742 Dispersions
Barrier 4. Surface Modification 754
2.3. Photoinduced Electron Transfer Processes on 743 4.1. Introduction 754
the Surface of Catalysts 4.2. Metal Semiconductor Modification 754
3. Photocatalysis on TiO2 743 4.3. Composite Semiconductors 755
3.1. The Lattice and Electronic Structure of Ti02 743 4.4. Surface Sensitization 756
3.1.1. The Lattice Structure of Rutile and 743 4.5. Transition Metal Doping 756
Anatase 5. Summary 756
3.1.2. Geometric and Electronic Structure of 743 6. Acknowledgments 757
TiOz Single-Crystal Surfaces 7. References 757
3.2. Chemisorption Studies on Ti02 Surfaces 745
3.2.1. Water Adsorption 745
3.2.2. H2 Adsorption 746 7. lnfroducfion
3.2.3. Oxygen Adsorption 746
3.2.4. CO and COz Adsorption 746 In 1972, Fujishima and Honda discovered the
3.2.5. NO and SOn Adsorption 747 photocatalytic splitting of water on Ti02 e1ectrodes.l
3.2.6. NH3 and H2S Adsorption 747 This event marked the beginning of a new era in
3.2.7. Deoxygenation Reactions of Organic 747 heterogeneous photocatalysis. Since then, research
Molecules on TiO2 efforts in understanding the fundamental processes
3.3. Photochemistry of Small Inorganic Molecules 748 and in enhancing the photocatalytic efficiency of Ti02
on TiO2 have come from extensive research performed by
3.3.1, Photodecomposition of Water on Ti02 748 chemists, physicists, and chemical engineers. Such
3.3.2. Photoadsorption and Photodesorption of 749 studies are often related to energy renewal and
Oxygen on Ti02 energy storage.2-6 In recent years, applications to
3.3.3. Photooxidation and Photoreduction of 749 environmental cleanup have been one of the most
Molecular Nitrogen active areas in heterogeneous photocatalysis. This
3.3.4. Photoreduction of COP 750 is inspired by the potential application of TiOz-based
3.3.5. Photooxidation of Halides on Ti02 750 photocatalysts for the total destruction of organic
3.3.6. Photoinduced Surface Corrosion 750 compounds in polluted air and wastewater^.^-^
3.4 Photooxidation on Ti02 Single Crystals 750 In a heterogeneous photocatalysis system, photo-
3.4.1. Photoelectrochemistry on Single-Crystal 750 induced molecular transformations or reactions take
Electrodes place at the surface of a catalyst. Depending on
3.4.2. Photochemical Studies on Single-Crystal 75 1 where the initial excitation occurs, photocatalysis can
TiO2 be generally divided into two classes of processes.
3.5. Photooxidation at the Gas-Solid Interface on 752 When the initial photoexcitation occurs in an adsor-
TiOz Catalysts bate molecule which then interacts with the ground
3.5.1 Introduction 752 ' state catalyst substrate, the process is referred to as
a catalyzed photoreaction. When the initial photo-
0009-2665/95/0795-0735$15.50/0 0 1995 American Chemical Society
736 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

“1 ...~ .

:,’ i
* ,
t; i -7\-Y
:
, .I

Amy Linsebigler received her B.S. degree in Chemistry from Seton Hill Professor John T. Yates. Jr. began his research in surface chemistry as
College in 1989. She is currently completing her Ph.D. in Chemistry at a graduate student at MIT. He continued this work from 1963 to 1982 at
the Univenity 01 Pittsburgh under the direction of Professor John T. Yates, the National Bureau of Standards. In 1982 he founded the Surface
Jr. During her doctoral studies she has examined several technologically Science Center at the University of Pittsburgh where he was appointed
important surface science systems. Her research includes the chemical R.K. Mellon Professor. He now holds a joint appointment in the
reactivity of environmentally important adsorbates on metal surfaces. Departments of Chemistry and Physics. Work on metallic, semiconducting,
electronic modification of metal surfaces with thin metal films, and currently, and insulator surfaces is now underway using modern surface measure-
the molecular level photochemistry and thermal chemistry of small probe ment techniques. His work with students and postdoctorals is focused
molecules on metal oxide single-crystal surfaces. on the use of electronic excitation to probe surface phenomena as well
as the use 01 a range of surface vibrational spectroscopies and other
methods for understanding surface processes.

Electron
Transfer D’ A-

---+ -I-

..
Guangquan Lu was born on Juiy 24. 1965. in Shandong, the People’s
Republic of China. He received his B.S. in Chemistry from Shandong
University in 1985, and his Ph.D. in Chemistry from the University of
Exchange -
California at San Diego in 1992. His primary research interests are the
kinetics and dynamics 01 thermal and photochemical processes on
semiconductor surfaces. He has been involved in a broad range of
research projects including the surface characterizations of SiiGe chemical
I A- -7 -+I
vapor depositions, the surface chemistry of photocatalytic reactions on
TiOZ. and the surface and interface characterizations of advanced electronic
materials processing. He is the recipient of the CGP scholarship from
the Chinese Education Commission (1985), the American Vacuum Society Figure 1.1. Electron transfer and energy transfer pro-
Student Prize (1990). and the Russell and Sigurd Varian Fellow Award cesses.
(1990).
An electron transfer process is a one-electron
excitation takes place in the catalyst substrate and reaction in which an electron jumps from an occupied
the photoexcited catalyst then transfers an electron orbital of the donor reactant to the empty orbital of
or energy into a ground state molecule, the process
is referred to as a sensitized photoreaction.
The initial excitation of the system is followed by -
place in either the donor molecule (D D*)or the
acceptor molecule (A A*). The electron transfer
-
the acceptor reactant. The initial excitation may take

subsequent electron transfer and/or energy transfer. process requires the overlap between the occupied
It is the subsequent deexcitation processes (via donor orbital and the acceptor orbital which may be
electron transfer or energy transfer) that leads to empty or half-filled. The electron transfer results in
chemical reactions in the heterogeneous photocataly- an ion pair of the donor cation (D+)and the acceptor
sis process. By using the electronic population anion (A-).
changes in the molecular orbitals, Figure 1.1 sche- An energy transfer process takes place by electron
matically illustrates the different interactions be- exchange or dipole-dipole resonant coupling. These
tween one reactive center in the excited state and two processes operate through two fundamentally
another reactive center in the ground state. A different mechanisms. Electron exchange occurs by
reactive center can be a molecule or a surface reactive two independent one-electron transfer steps-one in
site. each direction. Both electron transfer and electron
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 737

exchange require orbital overlap between the inter- expected to have no absorption intensity +if = 0), and
acting centers. When both processes are thermody- it will therefore be unlikely to cause photochemical
namically allowed, electron transfer predominates conversions which involve the excitation of such a
since the electron exchange process requires simul- transition.
taneous overlap of two orbital pairs, whereas only one The probability of an electronic transition can be
such overlap is necessary for electron t r a n ~ f e r . ~ calculated, using quantum mechanics purturbation
Dipole-dipole coupling occurs by a Coulombic reso- theory, as being proportional to the square of the
nance interaction in which the oscillating dipole of amplitude of the radiation field, EO,and the square
an excited state molecule is coupled with the induced of the transition dipole moment, IPiflz20s21
dipole in a ground state quencher molecule. This
coupling process does not require effective orbital
overlap between the two interacting centers and can
operate over a distance range from less than 10 A to Here pif = (YfIplYi)is the transition dipole moment
as large as 100 A.10 for an electronic excitation process from the initial
There exists a vast body of literature dealing with state Yi to the final state Yf. While the radiation
the electron transfer and energy transfer processes field can be controlled by varying the light intensity,
in photocatalytic reactions. A detailed description of the transition dipole moment is an intrinsic property
these processes is beyond the scope of this review. of the molecular structure.
Several excellent review articles and books already According to the Born-Oppenheimer approxima-
exist.11-19 Here, we tend to focus on interfacial tion, the molecular wave function Y can be expressed
processes and to summarize some of the operating as the products of the electronic spatial wave function
principles of heterogeneous photocatalysis. In section p,the electronic spin wave function 5, and the nuclear
2, we will first look at the electronic excitation wave function b?:20,21
processes in a molecule and in a semiconductor
substrate. The electronic interaction between the Y=q'G'K (2)
adsorbate molecule and the catalyst substrate will Then,
be discussed in terms of the catalyzed or sensitized
photoreactions. In section 3, thermal and photocata- Pif = P'fIPIYJ = (qfI,4qJ (SflSi) (KfIHi) (3)
lytic studies on Ti02 are summarized with emphasis
on the common characteristics and fundamental
principles of the TiOs-based photocatalysis systems. Now the transition dipole moment may be regarded
In section 4,we will address the research effort in as the product of the electronic transition moment,
the electronic modification of the semiconductor the electron spin wave function overlap, and the
catalysts and its effect on the photocatalytic ef- nuclear wave function overlap. The transition dipole
ficiency. Several representative examples will be moment, pif, will be zero if any of these three
presented including the Schottky barrier formation contributions become zero. This gives the selection
and modification at metal-semiconductor interfaces. rules for an electronic excitation process.
Some concluding remarks and future research direc- The electronic transition moment term (VfIPlqi)
tions will be given in the final section. depends on the nature of the electron distributions
in the initial and final electronic spatial wave func-
2. Electronic Processes in Photocatalysis tions. By examining the overall symmetry property
of the spatial wave function^,^^*^^ one can easily
2.1, Molecular Electronic Excitation determine if this integral is zero. When this term is
zero, the transition dipole moment pif is zero. Then
2.1.1. Molecular Spectroscopy and Photochemistry the transition is a symmetry-forbidden transition.
Photocatalysis processes involve the initial absorp- The overlap integral of the spin wave functions
tion of photons by a molecule or the substrate to ( d a ) can be evaluated using the orthornormal prop-
produce highly reactive electronically excited states. erty of the electron spin wave functions,20that is,
The efficiency of the photoinduced chemistry is
controlled by the system's light absorption charac-
teristics. In this section, we want to examine the Here a and p correspond to the only two spin
factors that control the light absorption intensity by configurations, spin-up ( a )and spin-down CP). The
the molecule or by the substrate. We will first electron spin functions maintain their orthogonality
discuss the electronic excitation of a molecule upon and normalization properties even when the electrons
photon absorption. The band-gap excitation of the under consideration are described by different spatial
semiconductor substrate will then be discussed and wave functions. Using these properties, we can
interfacial electron transfer will be reviewed. easily derive that the original spin orientation si must
Molecular electronic spectroscopy is a useful tool be preserved in the final excited state in order to keep
to determine where photochemistry may potentially the term (sfla) nonzero. Therefore, singlet-singlet
occur.11J2 Most importantly, we can determine what and triplet- triplet transitions are spin-allowed,while
photon energy will most likely induce an electronic a singlet- triplet transition is spin-forbidden. Excep-
transition in a molecule based on whether the transi- tions to this rule are often found among complex
tion dipole moment pif will be zero for a transition organic molecules containing heavy atoms (such as
from the initial state "i" to the final state "f". A Br or I). Spin-orbit coupling induces weakly allowed
transition that is forbidden by the selection rules is singlet-triplet transitions in these systems.
738 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

Although the selection rules are often broken in the


real world due to the simplicity of the molecular
quantum mechanics formulations used to develop
these selection rules, it is certainly true that a
transition predicted to be forbidden will be very weak.
These principles provide for us a set of generalities
that we can use to understand patterns in experi-
mental photochemistry. The excitation of a weak
transition will not effectively induce a photochemical
h
reaction in the sense that few of the delivered
C photons will actually be absorbed (low cross section).
w However, we must keep in mind that the reaction
A2
m
itself will be very efficient if each absorbed photon
can lead to the the formation of a product molecule
(high quantum yield). Thus, molecules with low
no absorption intensities are not necessarily poor pho-
tochemical reagents. The photochemical efficiency of
an excitation will also be determined by which

Internuclear Distance -
Figure 2.1. Vibronic transitions in a diatomic molecule.
deexcitation channel is dominant, as discussed below.
2.1.2. Molecular Excitation and Deexcitafion Events
The allowable excitation and deexcitation processes
The nuclear overlap integral (KflKi) has to do with for a molecule are given in the energy level diagram
the nuclear motion (vibrational wave fuctions) during in Figure 2.2. The ground state singlet energy level
the electronic transition. Generally, the electronic of the molecule is represented by SOand illustrates
transition induced by the absorption of a photon the energy of the molecule at room temperature in
occurs much more rapidly than the nuclear motion. solution. The ground vibrational states for the three
The nuclei remain essentially frozen at the equilib- excited electronic states shown in Figure 2.2 for the
rium configuration of the ground state molecule molecule are represented as SZand SI for the singlet
during the transition. This is the Franck-Condon states and TI for the triplet state. The triplet excited
principle and is schematically illustrated in Figure state for the molecule is less energetic than the
2.laZ1Depending on the shape and spatial distribu- singlet excited state of the molecule. The respective
tion of the nuclear wave functions of the initial and energy levels of the excited states of the molecule are
final states, the excited state can be produced with important when dealing with the photosensitization
different vibrational and rotational levels. Then the of semiconductors via dye molecule excitation. Nu-
nuclear overlap integral (HflKi) can be used to deter- merous vibrational energy levels associated with the
mine which of the possible vibrational levels in the electronic energy levels exist but are not shown to
electronically excited state will be most likely popu- simplify the figure. Absorption of radiation results
lated during the transition. For a molecule with in the excitation of the molecule from the ground
similar nuclear geometries in the ground and excited state to one of the excited singlet states. The excita-
states, the largest overlap occurs when the vibra- tion to the second singlet state Sa (requiring a shorter
tional quantum number (no)in the ground state and wavelength than excitation to SI) is illustrated in
in the excited state remain the same (An = 0). For Figure 2.2. The selection rules for an electronic
a molecule that possesses a very different equilibrium excitation process imply that direct photoexcitation
nuclear geometry in the excited state, the largest from the singlet ground state to the triplet excited
overlap will occur at a different vibrational level. state is spin forbidden [(&) = 01. The absorption
Singlet Excited State Triplet Excited State
lnternol
r Conversion
Intersystem
Crossing

Absorption Internol
W Fluorescence ond
Phosphorescence
(to-'- t65S) Rodiotionless (to-', 10%
Conversion

C hemicol
SO V \ Reoc tion
Ground
State (16'O- to- 5s)
Figure 2.2. Excitation and deexcitation processes in a molecule.
Photocatalysis on Ti02 Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 739

of a photon of radiation occurs very rapidly, on the become unpaired. Intersystem crossing is illustrated
order of s.24a Deexcitation events are much in Figure 2.2 between the S1 and TI excited states.
slower. This process is the result of vibrational states over-
The deexcitation of the excited molecule favors the lapping. The time required for such a process is in
route which will minimize the lifetime of the excited the range of lop6 s.24a Once intersystem crossing
state. Whether it occurs via emission of radiation occurs from a singlet to a triplet excited state, the
such as fluorescence or phosphorescence, or a radia- molecule undergoes deactivation by phosphorescence.
tionless decay, indicated in Figure 2.2 as curvy lines, The time scale for the radiative phosphorescence
depends upon the competition between different process is on the order of to s.24a
decay channels. The lifetime of the excited state for Relaxation of the excited singlet and triplet states
fluorescence emission is to s.24a can also occur by decomposition of the excited species
After the excitation of a molecule from the ground to form new chemical species. Such reactions include
state to a higher nondissociative excited state occurs, photoinduced fragmentation, intramolecular trans-
radiationless internal conversion transitions to the formation, and intermolecular and interfacial elec-
lower excited states usually take place before any tron or energy transfer. The photochemical reactions
radiative emission processes.25 The conversion is occur on a time scale of to s.24b
observed when the upper electronic energy levels are
close together and the vibrational energy levels 2.2. Semiconductor Electronic Excitation
overlap. The transition process from SZ to S1 is 2.2.1. Band-Gap Photoexcitation
isoenergetic through overlay between vibrational
levels. Once the transition occurs, the molecule Unlike metals which have a continuum of elec-
undergoes vibrational relaxations to the ground tronic states, semiconductors possess a void energy
vibrational state of the SI electronic excited state at region where no energy levels are available to pro-
a significant rate. Therefore, the SZto SI transition mote recombination of an electron and hole produced
in Figure 2.2 represents a loss of energy for the by photoactivation in the solid. The void region
internal conversion process. The time scale for which extends from the top of the filled valence band
internal conversion is to s . Internal
~ ~ ~as to the bottom of the vacant conduction band is called
well as external conversions can also occur from the the band gap. Once excitation occurs across the band
lowest excited states SI and TI t o the ground state gap there is a sufficient lifetime, in the nanosecond
SO. External conversions are the result of energy regime,26for the created electron-hole pair to un-
transfer to solvent or solute molecules and are dergo charge transfer to adsorbed species on the
usually only from the lowest excited states. If semiconductor surface from solution or gas phase
overlapping vibrational energy levels exist, deactiva- contact. If the semiconductor remains intact and the
tion via internal conversion to the ground state can charge transfer to the adsorbed species is continuous
occur faster than that involved in fluorescence emis- and exothermic the process is termed heterogeneous
sion. photocatalysis.
Figure 2.2 represents excitation to bound upper The initial process for heterogeneous photocatalysis
electronic states for the purpose of illustrating the of organic and inorganic compounds by semiconduc-
various classes of electronic transitions which are tors is the generation of electron-hole pairs in the
possible. Other upper states may involve chemical semiconductor particles. The enlarged section of
changes such as dissociation and are not shown here. Figure 2.3 shows the excitation of an electron from
Intersystem crossing is a process in which the spin the valence band to the conduction band initiated by
of the excited electron is reversed and the electrons light absorption with energy equal to or greater than

0
e--.
.
Sur face
I

- .-...-
I
~

Recombination /

Figure 2.3. Schematic photoexcitation in a solid followed by deexcitation events.


740 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

the band gap of the semiconductor. Upon excitation, 0 r Vacuum -I E(NHE)


.L

r,
the fate of the separated electron and hole can follow
several pathways. Figure 2.3 illustrates some of the
deexcitation pathways for the electrons and holes.
The photoinduced electron transfer to adsorbed
organic or inorganic species or to the solvent results Go P
from migration of electrons and holes to the semi- c Sic
conductor surface. The electron transfer process is
more efficient if the species are preadsorbed on the ;aCJ- 4 I F -
surface.27While at the surface the semiconductor can
donate electrons to reduce an electron acceptor (usu- W
ally oxygen in an aerated solution) (pathway C); in
turn, a hole can migrate to the surface where an -6 t
electron from a donor species can combine with the
surface hole oxidizing the donor species (pathway D).
The probability and rate of the charge transfer
processes for electrons and holes depends upon the
respective positions of the band edges for the conduc-
tion and valence bands and the redox potential levels
-8 I
of the adsorbate species. Figure 2.4. Energies for various semiconductorsin aque-
In competition with charge transfer to adsorbed ous electrolytes at pH = 1.
species is electron and hole recombination. Recom-
bination of the separated electron and hole can occur carrier traps are used to promote the trapping of
in the volume of the semiconductor particle (pathway electrons and holes at the surface leading to a more
B) or on the surface (pathway A) with the release of efficient charge transfer process. For photooxidation
heat. The process of back-donation after charge processes on TiOz, n, > ps, because the electron
transfer from the adsorbed species t o the semicon- transfer process to molecular oxygen trapped at
ductor surface can occur but is not illustrated in defect sites is relatively slow.28
Figure 2.3. Obviously electron and hole recombination is det-
The efficiency of the photocatalytic process is rimental to the efficiency of a semiconductor photo-
measured as a quantum yield which is defined as the catalyst. Modifications to semiconductor surfaces
number of events occurring per photon absorbed. The such as addition of metals, dopants, or combinations
ability to measure the actual absorbed light is very with other semiconductors are beneficial in decreas-
difficult in heterogeneous systems due to scattering ing the electron and hole recombination rate and
of light by the semiconductor surface. It is usually thereby increasing the quantum yield of the photo-
assumed that all the light is absorbed and the catalytic process. Such semiconductor modifications
efficiency is quoted as an apparent quantum yield. will be discussed in detail in section 4 later in the
If several products are formed from the photocatalytic review.
reaction then the efficiency is sometimes measured
as the yield of a particular product. 2.2.2.Band-Edge Positions
To determine the efficiency or quantum yield, a The ability of a semiconductor to undergo photo-
combination of all the pathway probabilities for the induced electron transfer to adsorbed species on its
electron and hole must be considered. The quantum surface is governed by the band energy positions of
yield for an ideal system, 4, given by the simple the semiconductor and the redox potentials of the
relationship: adsorbate. The relevant potential level of the accep-
tor species is thermodynamically required to be below

' OC
kCT
+
kc, k ,
(more positive than) the conduction band potential
of the semiconductor. The potential level of the donor
needs to be above (more negative than) the valence
band position of the semiconductor in order to donate
is proportional to the rate of the charge transfer an electron to the vacant hole.
processes ( ~ c T and
) inversely proportional to the sum
of the charge transfer rate ( ~ c T )and the electron- The band edge positions of several semiconductors
hole recombination rate ( k ~(bulk
) and surface). It are presented in Figure 2.4. The internal energy
is assumed that diffusion of the products into the scale is given on the left for comparison to the
solution occurs quickly without the reverse reaction vacuum level and on the right for comparison to
of electrons recombining with donors and holes normal hydrogen electrode (NHE). The positions are
recombining with acceptors. Without recombination derived from the flat band potentials in a contact
the quantum yield would take on the ideal value of solution of aqueous electrolyte at pH = 1. The pH of
1for the photocatalytic process. In this case the rate the electrolyte solution influences the band edge
of charge transfer would be dependent on the diffu- positions of the various semiconductors compared to
sion of charge carriers to the surface in the absence the redox potentials for the adsorbate.
of excess surface charge. However, this is an ideali- 2.2.3. Charge Carrier Trapping
zation. In a real system recombination does occur
and the concentration of electrons (n,) and holes (p,) Recombination of the photoexcited electron-hole
at the surface is not For example, charge pair needs to be retarded for an efficient charge
Photocatalysis on Ti02 Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 741

range.30 The trapping of valence band holes required


I an average time of 250 ns. Electron paramagnetic
resonance (EPR) spectroscopy experiments of il-
luminated colloidal Ti02 at 4.2 K have shown the
x existence of trapped photogenerated electrons (to
P
aJ form Ti3+defect sites) within the bulk of the semi-
C
w conductor.31 Adsorbed oxygen on the Ti02 surface
scavenges the trapped electrons and inhibits the
formation of Ti3+ sites. Trapped holes are also
observed. The exact species associated with the
trapped hole is undetermined, although 0-, 0 3 - , and
*OHspecies are postulated to exist in various cases.
Figure 2.5. Surface and bulk electron carrier trapping.
Further illustrations of the nature and role of
defect sites are given in sections 3.1 and 3.2.
transfer process to occur on the photocatalyst surface.
Charge carrier trapping would suppress recombina- 2.2.4. Quantum Size Effects
tion and increase the lifetime of the separated
electron and hole to above a fraction ofa nanosecond. Size quantization effects for metals and semicon-
In the preparation of colloidal and polycrystalline ductors have recently been a subject of great interest,
photocatalysts, ideal crystal lattices of the semicon- and several reviews are a ~ a i l a b l e . ~Quantum
~ - ~ ~ size
ductors are not produced. Instead, surface and bulk effects (QSE) occur for semiconductor particles (Q-
irregularities naturally occur during the preparation particles) on the order of 10-100 A in size. The
process. The irregularities are associated with sur- anomalies arise when the size of the semiconductor
face electron states which differ in their energy from particles become comparable to the de Broglie wave-
the bands present in the bulk semiconductor. The length of the charge carriers in the semiconductor.
electron states serve as charge carrier traps and help The range of size for particles experiencing QSE is
suppress the recombination of electrons and holes. therefore dependent on the effective mass for the
The nature of surface defect sites depends on the Q-particle semiconductor. The electron and hole
method of chemical preparation. As a specific ex- produced in Q-particles are confined in a potential
ample of the role of surface traps, CdS colloids well of small geometrical dimensions. The electron
produced by adding H2S to a cadmium salt solution and hole do not experience the electronic delocaliza-
possess surface defect sites which promote radiation- tion present in a bulk semiconductor possessing a
less recombination of charge carriers. The radiation- conduction band and a valence band. Instead, the
less recombination process dominates in this semi- confinement produces a quantization of discrete
conductor system. The fluorescence spectrum of this electronic states and increases the effective band gap
colloidal suspension exhibits only a very weak red of the semiconductor. Such effects can change the
fluorescence peak at a photon energy 0.4 eV below color of the material (due to the altered optical
the absorption threshold. The decrease in energy is absorption maxima) and the photocatalytic proper-
due to the trapping of charge carriers on the surface ties.
at energy levels below the conduction band edge. Recent advances in the ability to synthesize cluster
After modifymg the surface by addition of excess Cd2+ particles allows the study of size-dependent anoma-
ions and an adjustment in pH toward a basic solu- lies compared to the bulk proper tie^.^^^^^^^^,^^ CdS,29j39!40
tion, the maximum of fluorescence occurs at the Zn0,41and PbS42are the Q-particles studied in the
absorption threshold (2.48 eV). The surface modifi- most detail both experimentally and theoretically.
cation blocks defect trap sites which also promote Figure 2.6 illustrates the increase in effective band
radiationless recombination of charge carriers. The gap for CdS when the size of the particles is de-
high quantum yield (50%) for fluorescence on the
modified CdS is a result of electron-hole pair recom-
bination across the bulk band gap.29
creased from d > 100 A,
-
signifying the dimensions
A
of a bulk semiconductor, to d 26 where signifi-
cant quantum size effects occur for CdS.39140This
A simplified illustration of available bulk and
surface trapping states for a photogenerated electron Cluster Bulk Semiconductor
in a semiconductor is shown in Figure 2.5. In this
illustration, the energy levels of the bulk and surface
state traps fall within the band gap of the semicon-
ductor. These surface and bulk states are localized.
The charge carriers trapped in such states are
localized to a particular site on the surface or in the
bulk. The population of bulk and surface traps is
dependent on the energy difference between the trap
and the bottom of the conduction band and the I I
decrease in entropy when the electron undergoes I I
I I
trapping. Experimentally, trapping of conduction >
band electrons generated by picosecond laser pho- 3 0 50 100 200 (D

tolysis of colloidal Ti02 has been observed. Time- Diameter ( A 1


resolved transient absorption of trapped electrons Figure 2.6. Quantum size effect on semiconductor band
have demonstrated a lifetime in the nanosecond time gap.
742 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et at.

quantization and increase in effective band gap is Flat Accumulation Depletion Inversion
observed experimentally as a blue shift in the ab- -
Band Layer -
Layer Layer
sorption and emission spectra for CdS. The energy
shift in the band gap, AE, as a function of particle
size can be predicted by the three dimensional
confinement model based on the effective mass
approximati~n:~~,~~,~~-~~

m=-,+,
h22 1
2R2[m, di 1.786e2
0.248ERY (6)

where R is the particle radius, mz and m; are the


a b C d
effective masses for the electrons and holes, E is the
dielectric constant, and ERYis the effective Rydberg n-Type Semiconductor- Solution Interface
+
energy given as e4/2c2h2(l/m: l/m;). The equation Figure 2.7. Space charge layer formation and band
is characterized by the first term which represents bending.
the energy of localization, the second term which
represents the Coulombic a t t r a c t i ~ n and
, ~ ~the
,~~third
term which represents the correlation effect.46 A E
gives the blue shift in the band gap of the particle:

E,, = AE +EY (7)


and determines the transition energy (effective band
gap), ETE,for the particle.
The increase in effective band gap and conse-
VB
quently the blue shift in the absorption threshold,
can become quite dramatic for bulk semiconductors
with very small band gaps. The band gap for PbS Metal Semiconductor (n-type 1
(E, (bulk) = 0.4 eV) can actually be increased by a Figure 2.8. Schematic of Schottky barrier.
factor of 6 when the particle size is decreased from
150 to 13 A. When the Q-particle sizes are less than layer. The semiconductor contains a uniform distri-
13 A,discrete absorption bands are observed in the bution of charge. The existence of a positive charge
absorption spectrum for PbS. A theoretical treat- on the interface (part b) increases the majority carrier
ment for PbS has shown that the simple confinement concentration of electrons near the surface within the
model using the effective mass approximations can- region of the space charge layer. The space charge
not reproduce the experimental results.42 Other layer formed is called an accumulation layer. The
theoretical treatments have also been developed t o bands of the semiconductor will bend down as one
fit the experimental data for the very small diameter moves toward the surface as a result of the decrease
particles < 15 A. While photocatalyst particles have of electron potential energy as one moves toward the
not reached Q-particle sizes yet, it can be expected positively charged outerlayer. When negative charges
that this may happen in the future as new materials accumulate at the interface the majority electron
are produced. carrier concentration is less than in the interior of
the semiconductor (part c). The space charge layer
2.2.5.Band Bending and Formation of Schottky Barrier formed is a depletion layer and the bands bend
Contact between a semiconductor and another upward toward the surface. When the depletion of
phase (i.e. liquid, gas, or metal) generally involves a the majority charge carriers extends far into the
redistribution of electric charges and the formation semiconductor, the Fermi level can decrease below
of a double layer. The transfer of mobile charge the intrinsic level, which is half way between the
carriers between the semiconductor and the contact bottom of the conduction band and the top of the
phase, or the trapping of charge carriers at surface valence band. The surface region of the semiconduc-
states at the interface, produces a space charge layer. tor appears to be p-type while the bulk still exhibits
For semiconductor-gas phase interactions, an n-type n-type behavior. This space charge layer is called
semiconductor such as Ti02 can have surface states an inversion layer (part d).
available for electron trapping. The surface region The semiconductor-metal system represents a
will become negatively charged. To preserve electri- good example illustrating space charge layers, band
cal neutrality a positive space charge layer develops bending, and the formation of a Schottky barrier as
just within the semiconductor causing a shift in shown in Figure 2.8. Electrically neutral and iso-
electrostatic potential and a bending of bands upward lated from each other, the metal and the n-type
toward the surface. semiconductor have different Fermi level position^.^^
Figure 2.7 illustrates the space charge layers In the case to be discussed here, the metal has a
produced from the mobility of charge across a semi- higher work function (&) than the semiconductor
conductor-solution interface for an n-type semicon- (&I. When the two materials are connected electri-
ductor.15 Part a of Figure 2.7 shows the flat band cally, electron migration from the semiconductor to
potential diagram in the absence of a space charge the metal occurs until the two Fermi levels are
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 743

aligned as shown in Figure 2.8. The electrical contact processes on wide band-gap oxide semiconductor
has formed a space charge layer. The surface of the surfaces, and is the focus of the rest of this review.
metal acquires an excess negative charge while the Figure 2.91, part D shows a common excitation
semiconductor exhibits an excess positive charge as scheme observed for adsorbates on metals. When the
a result of electron migration away from the barrier metal is irradiated, a hot electron is generated at a
region. The bands of the semiconductor bend upward level above the Fermi edge and this electron then
toward the surface, and the layer is said to be tunnels into an empty level in the adsorbate mol-
depleted. The barrier formed at the metal-semicon- ecule. Processes occurring by this type of electron
ductor interface is called the Schottky barrier. The transfer process have been reviewed recently.50
height of the barrier, b,is given by The interfacial electron transfer process has been
extensively investigated14J5and the dynamics of such
A = 4 m - E, processes continue to attract intensive research
- ~ ~rate constant for an interfacial
e f f ~ r t . ~ lThe
where E, is the electron affinity, measured from the electron transfer is found to be greater than 5 x 1O1O
conduction band edge to the vacuum level of the s-1,55,56 The driving force for the heterogeneous
semiconductor. The diagram in Figure 2.8 illustrates electron transfer is the energy difference between the
an ideal metal-semiconductor contact, i.e. no surface conduction band of the semiconductor and the reduc-
states exist on the semiconductor, etc. The Schottky tion potential of the acceptor redox couple, MA-, (hE
barrier produced at the metal-semiconductor inter- = E,b - EN*-). An excellent review of this subject
face can serve as an efficient electron trap preventing has been written by and applications of these
electron-hole recombination in photocatalysis as ideas are given in section 3.6 dealing with photooxi-
discussed in section 4.2. dation processes at the liquid-solid interface of TiOz.

2.3. Photoinduced Electron Transfer Processes 3. Photocatalysis on Ti02


on the Surface of Catalysts
In an electronically excited state, a molecule or
3.1. The Lattice and Electronic Structure of Ti02
semiconductor particle becomes highly reactive. Elec- 3.1.1. The Lattice Structure of Rutile and Anatase
tron transfer occurs between molecules at the surface
or between a surface site and an adsorbate molecule. Two different crystal structures of TiO2, rutile and
Similar to the classification of photocatalysis, electron anatase, are commonly used in photocatalysis, with
transfer processes can also be broadly divided into anatase showing a higher photocatalytic activity.58
two general categories as shown in Figure 2.9, parts The structure of rutile and anatase can be described
I and 11. The categories involve either excitation of in terms of chains of Ti06 octahedra. The two crystal
the adsorbate directly by the photon or excitation of structures differ by the distortion of each octahedron
the solid by the photon followed by excitation of the and by the assembly pattern of the octahedra chains.
adsorbate. Figure 3.1 shows the unit cell structures of the rutile
For a catalyst substrate with no accessible energy and anatase crystal^.^^-^^ Each Ti4+ion is surrounded
levels for the adsorbate, such as Si02 and 4 2 0 3 , only by an octahedron of six 02-ions. The octahedron in
a 2D environment is provided for the reactant rutile is not regular, showing a slight orthorhombic
molecules, and the solid does not participate in the distortion. The octahedron in anatase is significantly
photoinduced electronic process.48 Electron transfer distorted so that its symmetry is lower than ortho-
occurs directly from the adsorbed donor molecule to rhombic. The Ti-Ti distances in anatase are greater
the acceptor molecule as shown in Figure 2.91, part (3.79 and 3.04 A vs 3.57 and 2.96 A in rutile) whereas
A. When there are accessible energy levels in the the Ti-0 distances are shorter than in rutile (1.934
substrate and there is strong electronic interaction and 1.980 A in anatase vs 1.949 and 1.980 A in
between the substrate and the adsorbate, the electron rutile).60 In the rutile structure each octahedron is
transfer may be mediated by the substrate. An in contact with 10 neighbor octahedrons (two sharing
electron is transferred from the donor into a substrate edge oxygen pairs and eight sharing corner oxygen
level and then into the acceptor orbital, as shown in atoms) while in the anatase structure each octahe-
Figure 2.91, part B. This scheme operates in the dron is in contact with eight neighbors (four sharing
photosensitization of semiconductor particles by dye an edge and four sharing a corner). These differences
molecules, as will be discussed in section 4.4. An in lattice structures cause different mass densities
electron is injected from the excited state dye mol- and electronic band structures between the two forms
ecule into the semiconductor particle which then of TiO2, as indicated in Figure 3.1.
reduces another adsorbate molecule.49
In Figure 2.911, part C, the initial excitation takes 3.1.2. Geometric and Electronic Structure of Ti02
place in the substrate. For a semiconductor, an Single-Crystal Surfaces
electron is excited into the conduction band of the The surface structure of rutile single crystals have
semiconductor, leaving a positively charged hole at been studied with the rutile (110) surface being most
the band edge of the valence band. An electron is extensively investigated. Figure 3.2 shows the model
transferred into the empty acceptor orbital from the structures for the TiOZ(110)surface. This surface is
catalyst conduction band. Simultaneously, an elec- thermodynamically most stable. Other faces will
tron is donated from the filled donor orbital to reconstruct upon heating to high temperatures to
recombine with the hole at the valence band edge. produce (110) facets.62 The structure of three types
This case is generally seen in most photocatalysis of oxygen vacancy sites are also shown in the figure.
744 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

1. PHOTOREACTION -
INITIAL EXCITATION OF ADSORBATE
A. Insulator

CB

VB

B. Semiconductor *

11. PHOTOREACTION -
I N I T I A L EXCITATION OF SOLID
C. Semiconductor or Insulator

A 1- A-

I .h I D+
D. Metal

Figure 2.9. (I) Catalyzed photoreaction, initial excitation of adsorbate, and (11)Sensitized photoreaction,initial excitation
of solid.
The electronic structure of the nearly perfect TiO,
surfaces is essentially identical to that of the bulk
-
The filled valence band at 6 eV is composed of 0
2p orbitals (as shown in the UPS spectrum) and the
rutile TiOz. Figure 3.3 shows the photoemission empty conduction band is composed of Ti 3d, 4s, and
spectra from vacuum-fractured (1101, (loo), and (001) 4p orbitals. The Ti 3d orbitals dominate the lower
faces of rutile Ti02.63 All three faces give spectra
similar to that of the bulk. The intense peak at 6
eV is due t o electron emission from the 0 2p obitals.
- portion of the conduction band. The weak emission
at -0.8 eV below the Fermi level is associated with
the defect induced-Ti 3d-derived levels. This state
The small emission peak near the Fermi level is due can be eliminated by surface oxidation.
to point defect oxygen vacancies. This feature is Few studies have been conducted on the structure
more clearly shown in Figure 3.4. Figure 3.4 shows of the anatase single crystal surface^.^^,^^@ A recent
the electronic band structure constructed from pho- photoemission study by Sanjines et al.65has shown
toemission (UPS) and inverse photoemission (IPS) that anatase TiOZ(101) and polycrystalline anatase
spectra for a slightly defective TiOB(110) surface.64 thin films exhibit similar electronic photoemission
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 745

0 = 4.593% 0=3.784a
=2.959 a c=9.515 A

Eg = 3.f eV Eg = 3.3 e V
p = 4 . 2 5 0 g/cm3 p = 3.894 g/cm3
AGdf =-212.6kcol/mole AGj =-211.4 kcol /mole

Figure 3.1. Structure of rutile and anatase TiOz.


SINGLE DOUBLE Filled States -!-Emply E F Slate
BRIDGING BRIDGING
LATTICE VACANCY VACANCY
VACANCY I /

Figure 3.2. Defect sites of TiOz(110). Binding Energy ( e V )


Figure 3.4. Photoemission and inverse photoemission
spectra on a slightly defective Ti02(110)surface.

briefly summarize the results of recent chemisorption


studies and try to illustrate some of the common
characteristics of the Ti02 surfaces.
3.2.1. Wafer Adsorption
Much of the interest in studying the interaction of
water with Ti02 surfaces was stimulated by the
discovery of the photocatalytic splitting of water on
Ti02 electrodes.' Efforts have been focused on what
forms of water (molecular or dissociated) exist on the
,, . , , , , , , , ,
,
'4,1 surface and what are the important parameters in
controlling the adsorption behavior. Henrich et al.
(5 to 5 0
Binding Energy ( e V )
detected surface hydroxyl groups present after H20
adsorption at 300 K on a slightly defective Ti02(110)
Figure 3.3. Photoemission spectra for vacuum-fractured surface with photoemission (UPS).67This result was
TiOz(110),(loo), (001) surfaces.
confirmed in a synchrotron photoemission study by
behavior to that of rutile. A similar 0.8 eV emission the Madey g r ~ ~ pThe ~ , ~of~water dissocia-
. ~amount
feature was observed upon the introduction of Ti3+ tively adsorbed at 300 K was well below one mono-
defect sites by sputtering o r Hz reduction. layer and the coverage of OH(a) was found to be
independent of the coverage of surface oxygen va-
cancy defect sites. In fact, surface defect coverage
3.2. Chemisorption Studies on Ti02 Surfaces was found to slightly increase during H2O adsorp-
The chemisorption properties on Ti02 surfaces tion.68 On the basis of these results, it was proposed
have been extensively studied. Particular interest that an adsorbed H2O molecule reacts with a bridg-
has been given to the influence of defect sites on the ing-oxygen atom to form two OH groups. It was also
chemisorptive behavior of the surface. Since these found that molecular water adsorption occurs below
defect sites are also found as the active sites for 160 K and hydroxyl groups were produced by water
photocatalytic processes,66 we will in this section dissociation upon heating the physisorbed layer to
746 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

above 200 K.68 However, most of the adsorbed water activation energy to dissociate the H2 molecule is too
desorbs molecularly between 170-180 K. The hy- high, and no adsorption was observed.
droxyls were not completely removed from the sur- A recent study by Pan et al.69also reported a very
face until 350-400 K. low sticking probability for H2 adsorption on TiO2-
A recent XPS and TPD study by Hugenschmidt et (110). Low-energy H2+ ion bombardment was em-
al.70reported four different adsorption states for H2O ployed to enhance the hydrogen adsorption. Surface
on TiO2(110), a 500 K TPD peak due t o surface hydroxyl groups were generated upon hydrogen ion
hydroxyls bound to oxygen vacancies, a 375 K peak exposures. In addition, the surface Ti3+coverage was
due to dissociated H20, a 250-300 K feature due to found to increase with increasing hydrogen expo-
molecular H2O adsorbed at Ti4+ sites, a 170 K sures.
desorption feature due to molecular H2O bound to On powdered Ti02 surfaces, Beck et al.76reported
bridging-oxygen anion sites, and a 160 K mutilayer TPD spectra typical of weakly adsorbed molecular
state. The assignments of the 250-300 K and the hydrogen. I ~ a k observed
i ~ ~ different adsorption
170 K peaks are inconsistent with the results by the behavior for hydrogen on anatase and on rutile TiO2.
Madey group which attributed these two states to the On both types of Ti02 powders, chemisorption of
dissociated and first monolayer water adsorption, hydrogen took place only when hydrogen was intro-
respectively. A recent study by Lu et al.71demos- duced above 623 K.
trated that, in addition to the molecular and dis-
sociative adsorption, water molecules can be reduced 3.2.3.Oxygen Adsorption
at the Ti3+sites on the TiOa(110) surface to produce Partial charge transfer from the surface adsorption
hydrogen gas. The oxygen atom in the water mol- site to the oxygen molecule was found to play an
ecule is preferentially extracted by the substrate to important role for oxygen adsorption on Ti02(110).
fill the surface oxygen vacancies. This selective On the basis of conductivity (Ao) and surface poten-
reduction process (as well as others) can be used to tial ( A q ) measurements, Gopel et al.75proposed the
infer the relative coverage of oxygen vacancy defect formation of 0 2 - upon chemisorption of oxygen. This
sites.71 step requires the presence of surface defect sites, and
The interaction of water with other single-crystal is the precursor for further dissociative reactions
Ti02 surfaces as well as powdered Ti02 has also been between the adsorbed 0 2 and the surface or bulk
investigated. Bustillo et al.72and Lo et al.73studied
the thermal desorption of water from the Ti02(100)
surface and reported dissociative adsorption of water.
-
oxygen vacancies. The initial sticking coefficient is
8x
-
at 300 K. The maximum desorption rate
for oxygen thermal desorption occurs at 348 K.
On powdered T i 0 2 , three TPD peaks can be observed. Low-energy ion scattering study by Pan et
A poorly resolved doublet at -211 K was attributed indicated that oxygen adsorption on TiOz(110)occurs
to multilayer and monolayer adsorption. A 311 K at the surface oxygen vacancy sites. With the use of
desorption peak was assigned to a different form of isotope 1 8 0 2 adsorption, it was found that no oxygen
molecularly adsorbed H20, and a 568 K desorption adsorption would occur on a stoichiometric surface.
was thought to arise from dissociatively adsorbed Kurtz et a1.68reported that oxygen was dissociated
H20. The production of hydrogen gas was also on the surface at 400 K and that the surface Ti3+sites
detected for H2O adsorption on reduced Ti02 pow- can be eliminated upon oxygen exposure. Lu et al.78
der,74indicating that the reduction property is char- found that oxygen molecularly adsorbs on TiOd 110)
acteristic of the Ti3+defect sites. at 105 K, and all 0 2 molecules are dissociated above
400 K.
3.2.2. H2 Adsorption Beck et al. studied the adsorption of oxygen on
Gopel et al.75studied the adsorption of hydrogen powdered rutile Ti02 using thermal desorption mea-
on the TiOz(110) surface using temperature pro- ~ ~ different desorption states at 164
s u r e m e n t ~ .Three
grammed desorption (TPD), electron paramagnetic K, 416 and 445 K were identified. Isotope labeling
resonance (ESR), and measurements of surface con- experiments showed no involvement of lattice oxygen
ductivity (Ao) and work function (Acp). The surface in the 164 and 416 K desorption states, and only 7%
defect sites (oxygen vacancies) were found to act as lattice oxygen was detected in the high temperature
electron donors and are the specific sites for H2 peak. For oxygen adsorption on anatase Ti02 pow-
adsorption. Chemisorption of hydrogen at 300 K der, only the low temperature state was observed. A
forms ionic titanium hydride bonds Ti4+-H- after Hz recent thermal desorption study by Yanagisawa et
dissociative adsorption at the defect sites. This a1.80reported a similar thermal desorption profile for
0 2 on rutile TiO2. Two desorption features at 180
process involves the transfer of two electrons which
before adsorption were attributed to one oxygen and 470 K involved only the oxygen from gas adsorp-
vacancy site (with two Ti3+ present). These two tion while another desorption state at 520 K included
hydrogen atoms can easily recombine during subse- oxygen from both the gas and the lattice.
quent thermal desorption measurements, exhibiting 3.2.4. CO and CO2 Adsorption
first-order desorption kinetics. The adsorbed hydro-
gen atoms also diffise into the bulk at 300 K, causing Ab initio molecular orbital calculations by Koba-
a nearly linear increase in conductivity (Ao) when yashi et a1.81showed that CO weakly interacts with
the Ti02(110) crystal is exposed to a continuous flow a defect-free TiO2(110) surface. The presence of
of molecular hydrogen. An initial sticking coefficient oxygen vacancy defects strongly enhances such in-
of 1 x was reported for H2 adsorption on TiO2- teractions due to electron back-donation from surface
(110) at 300 K. In the absence of surface defects, the Ti3+into the JC*orbitals of molecular CO. CO does
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 747
not adsorb onto the surface oxygen atoms. Carbonate surface. Onishi et a1.86investigated the adsorption
ion type or colinear carbon dioxide precursor type of SO2 on TiOz(110) and (441) surfaces using X-ray
surface complexes do not exist on the Ti02 surface and ultraviolet photoemission spectroscopies (XPS
containing adsorbed CO. At 300 K, Gopel et al.75 and UPS). On the (441) surface, SO2 oxidized Ti3+
found that CO adsorbs only at the defect sites. A to Ti4+accompanied with the formation of S2- species.
small amount of CO2 can be formed due to the Only SOs2- was detected upon SO2 adsorption on the
reaction of adsorbed CO with an adjacent bridging- (110) surface at 300 K.
oxygen atom, resulting in an additional oxygen
vacancy. On a single-crystal Ti02(110) surface, Lu 3.2.6. NH3 and H2S Adsorption
et al.78reported a weakly bound CO state desorbing Diebold et al.87studied the NH3 adsorption on T i 0 2 -
at -150 K. No thermal dissociation or oxidation was
observed.
On a powdered rutile Ti02 surface, Beck et al.79
-
(110) using XPS and low-energy ion scattering (LEIS).
A saturation coverage of 0.16 ML [l ML = 1 NH3
per surface atom] was measured on the stoichiomet-
observed two CO desorption states at 175 and 437 ric surface. A slightly higher coverage (0.19 ML) was
K. These states were attributed to CO molecules observed on the highly defective surface. Ammonia
interacting with the surface oxygen anions through adsorbs on TiOz(110) in molecular form. Roman et
the C-end of CO and CO molecules interacting with a1.88investigated the same adsorption system using
the surface defect sites through the O-end of CO, synchrotron radiation UPS. It was found that am-
respectively. Infrared spectroscopic studies by Tana- monia weakly adsorbs at 300 K. The uptake was
ka and White82 observed two different molecularly reported to be slightly higher on the perfect surface
adsorbed CO species with vibrational frequencies at than on the defective surface. The surface species
2185 and 2115 cm-l. The lower frequency species are predominately molecular ammonia. A small
was more strongly bound to the surface. fraction possibly dissociates at the defect sites upon
Gopel et al.75also reported that C02 weakly ad- heating the surface t o higher temperatures. The
sorbed on the TiOz(110) surface and its adsorption saturation coverage is 0.1 ML at 300 K.
was not influenced by the density of surface defect Roman and de Segoviasg also investigated the
sites. In the presence of surface hydroxyl groups, adsorption of ammonia on the Ti02(001) surface
Tanaka and White82found that CO2 readily reacted using UPS and TPD. Similar to that found on the
to form bicarbonate species on a powdered anatase (110) surface, NH3 molecularly adsorbed on Ti02
Ti02 surface. (001) at 300 K. Molecular NH3 desorbed at -338 K
with first-order kinetics. Some ammonia was dis-
3.2.5.NO and SO2 Adsorption sociated to produce NH2 and OH species. Further
decomposition of these products yields desorption of
Lu et aL71 studied the adsorption of NO on the N2 and H2 at 343 and 364 K, respectively.
TiOa(110) surface and reported a weakly bound Smith et al.90studied the interaction of H2S with
molecular adsorption state desorbing at 120 K. In a highly defective TiO2(110) surface and identified
addition, the reduction product, N20, was observed two distinct adsorption states. At low coverages, H2S
to desorb at 169 and 250 K. The 169 K desorption dissociated to produce H and S atoms bound to
feature was observed only on defective surfaces and surface Ti cation sites. The presence of the adsorbed
its intensity was proportional to the surface defect sulfur atoms dramatically inhibited the oxidation of
coverage. This low-temperature N2O state was then Ti3+sites by oxygen adsorption. At high H2S expo-
+ -
associated with the NO reductive reaction at surface
oxygen vacancy sites, e.g., NO(,, vacancy N(a,
+
+
Olattlce; N(a) NO(,, -.+ NzO. These defect sites were
sures, molecular adsorption was observed. This
adsorption state can be thermally desorbed before
423 K. Beck et al.79studied the adsorption of H2S
completely removed upon oxidation by adsorbed NO on both anatase and rutile powders. Two molecularly
(to produce N2O). adsorbed states (multilayer and monolayer) were
Similar results were reported by Boccuzzi et al.83 observed in thermal desorption spectra on both
for NO adsorption on powdered Ti02 using FT-IR anatase and rutile. A third irreversible adsorption
measurements. NO weakly adsorbs on hlly oxidized state was observed only on rutile Ti02 and was
Ti02 at 300 K. On the reduced sample, several attributed to dissociative adsorption at bridge-bond-
molecular and dissociative adsorption states were ing defect sites.
identified. NO adsorption reoxidized the reduced
sample. Thermal desorption measurements by Pan- 3.2.7. Deoxygenation Reactions of Organic Molecules on
de et al.84observed both NO and N20 desorption from Ti02
NO-exposed T i 0 2 samples reduced at 523 K. Increas- On Ti02 surfaces, various coordinatively unsatur-
ing the reduction temperature (and therefore the ated Ti cations (Ti3+,Ti2+,and Ti1+)can be generated
defect density) resulted in a higher yield of reduction by vacuum annealing, Ar+ sputtering, or chemical
products (N20 and N2). Only N20 and N2 were It is the relative
reductions (using H2 or C0).68,s9,75,91
desorbed from an NO-exposed sample that was ease in producing such defect sites that makes the
reduced at 1073 K. Ti02 surface exhibit not only the acid-base proper-
Smith et al.85have shown that SO2 also reacts with ties of most metal oxides, but also oxidation-reduc-
and oxidizes the oxygen vacancy sites (Ti3+)on TiO2- tion reactivities. This is particularly true for the
(110) and Ti203(1012) surfaces. This reaction con- adsorption of oxygen-containing organic molecules
tinued until all such defect sites were removed by which commonly undergo dehydration, dehydroge-
SO2 dissociation. Very weak interaction was ob- nation, deoxygenation, and self-disproportionation
served for SO2 on the nearly perfect TiO2(110) reactions.
748 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

r+l ,hu

A-
p - 4.2V---- H2/H20

02/H20

I "2'
hu
Pt-Ti02
,
Figure 3.6. Photosplitting of water in a photoelectro-
chemical cell.
Figure 3.5. Potential energy diagram for the H a 2 0 and
OZ/H20 redox couples relative to the band-edge positions
for TiOz.

The deoxygenation of a l c o h ~ l s carboxylic


, ~ ~ ~ ~ ~ac-
i d ~ketones,95
, ~ ~ and aldehydesg6have been observed
on reduced Ti02(100) and Ti02 powder surfaces.
Olefins (RCH=CHR) are produced by the reductive
coupling of aldehyde (RCH=O) molecules at the
oxygen vacancy defect sites. Ethylene formation was
observed upon formaldehyde adsorption on a defec-
tive Ti02(110) surface.71 The yield of ethylene pro-
duction was directly correlated to the coverage of
surface defect sites. On a reduced Ti02(100) surface,
formaldehyde decomposes to adsorbed C, H, and 0,
which further react upon heating to higher temper-
atures to produce methoxide species, CO, and C O Z . ~ ~ I
1 hu
H2° R u 0 2 - T i 0 2 - P t' I

On the fully oxidized (100) surface, formaldehyde Figure 3.7. Photosplitting of water on composite catalyst.
undergoes a Cannizzaro-type reaction to simulta-
neously produce adsorbed methoxide and formate been achieved under each of the following experi-
species.g1 The yield of each product is strongly mental conditions. Here, each experimental config-
dependent on the preparation procedure of the sur- uration is designed to effectively separate the pho-
face. The formation of dioxymethylene (-OCH20-) togenerated electrons and holes for maximum photo-
has been observed during formaldehyde adsorption reaction yield.
on Ti02.97,98Among all the above-mentioned adsorp- (1)A closed circuit photoelectrochemical cell em-
tion processes, the deposition or removal of surface ploying a Ti02 anode and a metal (Pt in most cases)
oxygen atoms play an essential role. cathode, as shown in Figure 3.6. Here, hydrogen
evolves from Pt and oxygen from TiO2. A small
3.3. Photochemistry of Small Inorganic Molecules externally applied electrical potential (> 0.25 V)lol
on Ti02 may be necessary but this is much smaller than that
required in an electrochemical cell for H2O electroly-
3.3.1. Photodecomposition of Water on Ti02 sis ( > 1.23 V). Such photoelectrochemical configura-
Even though Ti02 can be effectively photoexcited tions were extensively studied in the 1970s and early
under band-gap irradiation, H20 cannot be photode- - ~ system was designed to resemble an
1 9 8 0 ~ . ~The
composed on clean Ti02 surfaces. Figure 3.5 il- electrochemical reaction and to effectively separate
lustrates the band-edge positions of Ti02 relative to the photogenerated electrons and holes. The photo-
the electrochemical potentials of the Hfi20 redox excitation of T i 0 2 injects electrons from its valence
couple and the O a 2 0 redox couple.99 According to band into its conduction band. The electrons flow
this electron energy diagram, water photolysis is through the external circuit to the Pt cathode where
energetically favorable. However, due to the pres- water molecules are reduced to hydrogen gas and the
ence of a large overpotential for the evolution of H2 holes remain in the Ti02 anode where water mol-
and 0 2 on the Ti02 surface, Ti02 alone becomes ecules are oxidized to oxygen.
inactive. Although earlier studies by Schrauzer et (2)Ti02 powders with deposited metal particles
a1.lo0reported the photosplitting of water using Ti02, (such as Pt)for H2 evolution and metal oxide particles
Sat0 and White74 demonstrated that the hydrogen (such as RuO2) for 0 2 evolution,lo2as shown in Figure
evolution from wet Ti02 is not due to the photocata- 3.7. Here, this system behaves as a short-circuited
lytic splitting of water, but rather the photoassisted micro photoelectrochemical cell in which Pt is the
oxidation of the oxygen vacancy sites on reduced cathode and RuO2 is the anode. Band-gap excitation
TiO2. Sustained photodecomposition of water has in the Ti02 substrate injects negatively charged
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 749

stand the electron charge transfer from the substrate


to oxygen during adsorption and to understand the
electron scavenging process by oxygen during pho-
tooxidation of organics. Early investigations of pho-
toadsorption were in fact dealing with the photoox-
idation of organic contaminants on the Ti02 surface
by the photoactivated oxygen.lo6 Carbon dioxide was
formed in most of these adsorption studies. It was
believed that the photooxidation occurs through the
formation of 0 2 - radical ions. Courbon et alS1O7
+
suggested the formation of 0- and 0 3 - ( 0 2 0-1 as
the intermediates for photooxidation and photoiso-

I H2° hv
TiO, ' H,+ f0,
I
I tope exchange reactions. Bickley et a1.1°8 and Mu-
nuera et al.104J09studied the photoadsorption of
oxygen on rutile Ti02 surfaces and found that the
presence of adsorbed water enhances the photoad-
sorption of oxygen by trapping the photogenerated
Figure 3.8. Photosplitting of water: sacrificial donor
effect.
+ +
by electron trapping (H+ 0 2 2e- -
holes at OH- sites. The formation of surface HO2-
HO2-1 and
0 3 - by hole trapping reactions (02-(lattice) + 0 2 +
electrons into the Pt particles and positively charged
- h+
0 3 - ) is the primary route for 0 2 photoadsorption.
Oxygen adsorption is an important step for the
holes into the RuO2 particles. Trapped electrons in
Pt reduce water to hydrogen and trapped holes in photocatalytic oxidation of organics on TiO2. Anpo
et al.l1° showed that 0 3 - was formed by the reaction
RuO2 oxidize water t o oxygen. The presence of Pt
and RuO2 significantly reduces the overpotential for
+ -
of 0- (hole trap, 02-(lattice) hf 0-)with adsorbed
oxygen molecules, as discussed above. These authors
H2 and 0 2 production, respectively. also demonstrated the exclusive incorporation of gas
(3) The use of sacrificial species to remove one of
the photodecomposition products so that the reaction
equilibrium is shifted toward further decomposition,
-
phase oxygen into the CO2 product upon CO photo-
+
oxidation on TiO2, that is, I s 0 2 Cl60 2C160180.
No lattice oxygen was involved. Their calculations
as shown in Figure 3.8. Here, the sacrificial species implied that the photoactivation of oxygen occurred
may be oxidized by the hole-reaction product (pre- by the formation of a 03-(180-180-160-) species in
sumably 0 2 ) or reduced by the electron-reaction which the 0-0 bond in the original 0 2 molecule is
product (presumably H2). For example, when alco- significantly weakened.
hols such as CH30H are added to a Ti02 aqueous
suspension, sustained H2 production is observed upon Oxygen photodesorption from powdered Ti02 was
W irradiation and the alcohol molecules are oxidized recently studied by Yanagisawa and OtaeaOIt was
to C02.103 Additional examples about the photooxi- found that the photodesorption occurs only when
dation and reduction processes in aqueous Ti02 photon energy above the Ti02 band gap was deliv-
systems will be given later in this section. ered. Oxygen desorbed molecularly, and no isotopic
The detailed mechanism for the photodecomposi- exchange with the lattice was observed. The photo-
tion of water on Ti02 and the photooxidation or desorption signal followed t-l" decay kinetics, similar
reduction reactions involving the water-Ti02 system to that observed for COSphotodesorption from ZnO.lll
remains a controversial issue today. A number of These rate kinetics were attributed to the recombina-
researchers have reported the observation of several tion of adsorbed 0 2 - (or C02- on ZnO) with the
radical species using EPR measurements. Gonzalez- photogenerated holes.
Elipe et al.lo4reported the formation of HO2' and '0- Lu et al.78studied the adsorption of oxygen on a
or *023- species generated by W irradiation of TiOz(l10) surface and similar desorption behavior
hydrated anatase Ti02 in oxygen. Anpo and co- was observed. No isotopic mixing was detected
worker~ ~ ~ ~ 'OH radicals at 77 K on hydrated
observed during the photodesorption experiments even when
anatase under band-gap irradiation. Jaeger and a mixture of 1 8 0 2 and 1 6 0 2 was adsorbed on the
Bard reported the formation of HO2' and 'OH radicals surface.
in aqueous suspensions of Ti02,99 Howe and Grat-
ze131observed that surface hydration of anatase has 3.3.3.Photooxidation and Photoreduction of Molecular
a significant influence on the reactivity of holes and
Nitrogen
electrons generated upon band-gap irradiation. The photocatalytic activity of Ti02 for N2 oxidation
Trapped electrons are readily scavenged by adsorbed and reduction have been observed by several re-
oxygen. Trapped holes are much less reactive, and searchers. Schrauzer et al.loOfirst reported the
they react with surface hydroxyl groups above 77 K photoreduction of N2 by an iron-doped Ti02 catalyst.
to produce ' 0 2 - . Hydroxyl radicals are not the Adsorbed water was photodecomposed to yield oxy-
primary products and their existence is transient. gen, and at the same time nitrogen was reduced t o
produce NH3 and N2H4. The hydrogenation of un-
3.3.2. Photoadsorption and Photodesorption of Oxygen on saturated hydrocarbons was also achieved photocata-
Ti02 lytically in the same study.
The photoadsorption and photodesorption of 0 2 on Bickley and co-workers112studied the photooxida-
Ti02 have been investigated in an effort to under- tion of Nz on Ti02 at the gas-solid interface. Ther-
750 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

trapped at surface or subsurface sites. A trapped


/ hole reacts with an adsorbed I- ion to form an I atom
which further reacts with I- to produce 12-:

CH,C ;06H, etc.


I- + hf - I I + I- - 1,- 21,- - 1,- + 1-
(9)
In the presence of oxygen, electrons are effectively
removed by transfering to adsorbed oxygen. The 12-
will then disproportionate to form 13- and I-. When
there is no oxygen or other efficient electron scaven-
ger present, trapped electrons will eventually recom-
bine with the holes trapped in 12- to give back I- ions:
CH4 I + e- - 21-
hv ,C H 2 0 I,- (10)
“2 + H2° M-Ti02 CH,COOH
The photoinduced oxidation of halide on Ti02
etc. electrodes was also reported.llg
Figure 3.9. Photosplitting of water: sacrificial acceptor 3.3.6. Photoinduced Surface Corrosion
effect.
Photogenerated electrons and holes diffuse to the
mal desorption of NO was detected at -640 K after surface region and are trapped at surface or subsur-
irradiating a mixture of N2 and 0 2 in the presence of face sites where interfacial electron transfer takes
hydroxylated Ti02 at 300 K. A N2022- species was place to induce oxidation and reduction reactions.
suggested as the photooxidation product on the However, if these trapped charge carriers are not
surface based on comparative thermal desorption and quickly removed through such reactions, irreversible
X-ray photoemission studies. Further oxidation of chemical changes will occur to the semiconductor
this species to nitrite and nitrate ions is possible. surface layer itself. Studies have shown that both
surface and bulk defects in Ti02 and ZnO can be
3.3.4. Photoreduction of CO2 produced upon photoirradiation.lll Changes in color
or electrical conductivity are generally good param-
The photoreduction of C02 is an important process eters for evaluating the extent of photocorrosion. For
since it is a naturally occurring photobiological example, Ti02 electrodes in contact with solution
process and can be achieved electrochemically. Inoue became dark after repeated exposure to W irradia-
et al.l13 first reported that a suspension of Ti02
tion.120 Ti02 dissolution occurred under these condi-
photocatalyzes the reduction of C02 with water to tions. However, no such change was observed in the
produce formic acid, formaldehyde, methanol, and a
absence of irradiation. Metal sulfides are especially
trace amount of methane. Studies by Hirano et al.l14 easy to corrode upon prolonged photoexposure.121J22
observed methanol as the main photoreduction prod-
uct from CO2 when a Cu-containing Ti02 suspension
was irradiated. Several researchers have designed 3.4 Photooxidation on Ti02 Single Crystals
experiments to enhance the efficiency and selectivity The photochemical reaction on a Ti02 catalyst is
for C02 photoreduction. The presence of Hg or Pt generally believed to involve radical species. The
seemed to accelerate the formation of formaldehyde extensive research on photodecomposition of water
or carbon.l15 Ishitani and co-workers systematically and photooxidation of organics has provided some
investigated the effect of different metals on the evidence for such intermediates. However, some
photoreduction selectivity, and reported that meth- important issues regarding the reactive sites, the
ane and acetic acid are the major products when Pd, roles of each individual reactant species, and the
Rh, Pt, Au, Cu, or Ru were deposited onto Ti02 detailed mechanisms remain unsettled. Single-
cata1ysts.ll6 The Pd-Ti02 system exhibited very crystal surfaces provide the opportunity to study a
high selectivity for the production of methane from well-ordered structure with known surface area and
COa photoreduction. The process can be schemati- controlled surface coverages of the reactant molecules
cally illustrated in Figure 3.9. and the surface reactive sites.
3.3.5. Photooxidation of Halides on Ti02 3.4.1. Photoelectrochemistry on Single-Crystal Electrodes
Flash photolytic oxidation of halides on Ti02 were Photoelectrochemistry using Ti02 electrodes was
first conducted on colloidal Ti02 particles. In the one of the most active area of research in the 1970s
time-resolved study by Draper and iodide and early 1980~.~1~ Most of the research interests
oxidation was monitored on Ti02 powders and a emphasized the photoelectrolysis of water to produce
direct hole-adsorbate electron transfer process was hydrogen and oxygen. The close connection between
suggested. The one-electron oxidation intermediate electrochemistry and photocatalysis lies in the fact
12- (or BrZ-, Cia-) was detected by several research that both processes involve interfacial electron trans-
groups. The formation of 12- was studied by Fitz- fer (driven by electrical potentials or by photons,
maurice et al.lls by photoirradiation of aqueous I- respectively). Most of the fundamental concepts in
solution on Ti02 colloidal particles. It was found that photoinduced heterogeneous electron transfer were
the photogenerated electrons and holes each get either derived from some existing principles of elec-
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 751

Apertured QMS co
10 /

hv - Intermediate
H O CH2O

\ 0 Uactle.)

CH2O
Figure 3.11. Summary of CH$1 photooxidation on TiOz-
(110).

sorbed water were characterized using surface sci-


ence techniques. It was found that surface Ti3+sites
(oxygen vacancies) are the active sites for the pho-
Figure 3.10. Design of crystal holder for photochemistry tocatalytic oxidation of methyl chloride. Molecular
on Ti02(110) single crystal. oxygen adsorbed at such sites was activated by
charge transfer of electrons that were produced due
trochemistry or based on photoelectrochemical mea- to band-gap excitation of T i 0 2 . The activated oxygen
surements. Single-crystal semiconductor electrode species were the primary oxidizing agents and react
materials are most likely to represent the ideal with methyl chloride to produce CO, HC1, formalde-
situation of interfacial electron transfer processes. hyde, and water. Adsorbed water and hydroxyl
Studies in this field have been presented in several groups participated in the reaction only after the
excellent reviews and textbooks,2-6and shall not be photooxidation was initiated by the activated oxygen.
repeated here. However, we do wish to point out Isotopic labeling of molecular oxygen indicated that
some recent photoelectrochemical studies on the adsorbed oxygen was exclusively incorporated into
electron transfer process directly related to the CO (100%)and extensively into formaldehyde (70%).
photooxidation of toxic waste on T i 0 2 . Using a The oxygen in the water or the Ti02 lattice was only
single-crystal Ti02(001) electrode for photoelectro-
chemical measurements, Kesselman et al.123were partially incorporated into formaldehyde (30%). The
able to independently evaluate the interfacial charge photooxidation reaction exhibited a threshold energy
transfer reactions for the electrons and for the holes. of -3.1 eV, the band gap of rutile TiO2. This study
The electron transfer rate constant c d s ) ob- clearly demostrated that under U W conditions
tained in this study suggested that, when the pho- substrate-mediated photoactivation of adsorbed oxy-
tooxidation of CHCls by oxygen is conducted in gen is the key step in the photocatalytic oxidation of
aqueous solution using 30 nm T i 0 2 particles (typical methyl chloride on TiOz(110). Figure 3.11 schemati-
size for catalyst particles used in real applications), cally shows the mechanism proposed for this oxida-
the interfacial charge transfer (and not the electron- tion process, where 02* is a generalized symbol for
hole generation) is the rate-limiting step for the an activated species whose identity is currently
overall photodegradation process. unknown.
3.4.2. Photochemical Studies on Single-Crystal Ti02 In comparison to the study of photooxidation on
single crystal Ti02(110), Wong et al.124conducted a
The only UHV surface science study for the pho- parallel FT-IR study of methyl chloride photooxida-
todegradation of organic pollutants concerns the tion on powdered TiO2. Consistent results were
photooxidation of CH3C1 on the rutile TiOz(110) obtained which support the conclusions made in the
surface.66 The method for mounting the Ti02 single single-crystal study. Gas phase oxygen must be
crystal, reproducibly heating it, and studying photo- present for the reaction to occur, and it was this
desorption and photooxidation processes using a line- oxygen that was incorporated into the oxidation
of-sight mass spectrometer is indicated by Figure products. However, the final product from powdered
3.10. Here an oriented and polished single crystal
Ti02 catalysts was C02, not CH20. Carbon monox-
of Ti02 is mechanically clipped to a Ta supporting
plate. The plate may be heated by ohmic heating of ide, which contained exclusively the oxygen from the
the W-heating leads which are mounted inside the gas phase oxygen, was also detected as a reaction
plate. Feedback control from the thermocouple, intermediate and was further oxidized into C02. The
embedded in a corner slot, permits linear tempera- difference in the photooxidation products on pow-
ture programming of the crystal. The apertured dered Ti02 compared t o Ti02(110) was attributed t o
mass spectrometer (QMS) may be used to monitor the presence of more or different reactive sites on the
photodesorption directly or to monitor the adsorbed powdered Ti02 which contains both anatase and
photoproducts liberated during temperature pro- rutile (as compared to the single-crystal rut,ile sur-
grammed desorption. The aperture selectively col- face), which allow the oxidation to occur to a larger
lects desorbing species from the center of the crystal. extent. It is also possible that the powdered Ti02
The roles of surface defect sites produced in a studies involved a greater surface concentration of
controlled and reproducible manner by carefully O2(a) due t o the higher pressure used compared to
timed annealing cycles, adsorbed oxygen, and ad- the TiOs(110) studies in UHV.
752 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et at.

10.03 C'aOcI,
C,CI,H"O

e,
0
c
0
90
v)

Figure 3.12. Schematic description of the surface band-


bending changes: effects of H2O and 0 2 adsorption.
9
3.5. Photooxidation at the Gas-Solid Interface on
Ti02 Catalysts
3.5.1 lntroduction
In recent years, one of the most active areas of 2400 2200 2000 1800 1600
research in photocatalysis concerns environmental Wavenumber (cm-')
decontamination, namely the photomineralization of
organic p01lutants.l~~T i 0 2 is used in such studies Figure 3.13. Isotopic shifts in the infrared spectra of TCE
as the photocatalyst for both gas phase and aqueous photooxidation gas products on Ti02 at 300 K.
suspension systems. The research efforts have aimed
at two major photooxidation issues: (1)the identifi- photooxidation products for TCE on Ti02 are COZ,
cation of reaction intermediates, detailed reaction CO, HC1, and Cl2. For gas phase photooxidation,
mechanisms, and reaction kinetics; and (2) the phosgene (COClZ), dichloroacetyl chloride (DCAC,
optimization of reaction conditions to enhance the CHCLCOCl), and sometimes dichloroacetyl acid
photoreaction rate and yield. The photooxidation in (CHC12COOH)in the presence of excess water, have
aqueous suspensions will be summarized in section been identified as the oxidation intermediates by
3.6. Here, a few representative reactions will be several independent research groups.
discussed for gas phase photooxidation on Ti02 Phillips and R a ~ p pstudied
l ~ ~ the reaction kinetics
catalysts. Among all the gas-solid photooxidation and found that in the absence of water vapor, the
reactions, trichloroethylene (TCE) and chlorophenols Ti02 catalyst exhibited a high initial photoactivity
(CP) have been most extensively investigated.8 The which then declined rapidly with time. At low water
oxidation intermediates and the influence of water vapor pressure, the photooxidation rate is indepen-
and oxygen on the overall reaction kinetics have been dent of the water partial pressure, whereas at higher
determined. partial pressure the reaction rate is strongly inhibited
by the water vapor. Oxygen showed second-order
3.5.2. The Photoactivity of Ti02: Effects of Adsorbed H20 kinetics which shifted to zeroth order with increasing
and O2 oxygen pressure. On the basis of the kinetics data,
Anpo et a1.lZ6recently studied the influence of the authors suggested that the photoproduction of
water and oxygen on the photocatalytic activity of hydroxyl radical (*OH)and hydroperoxide radicals
TiO2. It was found that the adsorption of water on (Hoe', * 0 2 - ) was the rate-determining step. However,
the Ti02 surface caused a decrease in the upward it was not determined which radical species attacked
band bending (as shown in Figure 3.121, and there- the TCE molecule and induced the photooxidation.
fore an increase in the efficiency for the recombina- Fan et a1.lZ8studied this reaction using isotopically
tion of photogenerated electrons and holes. This is labeled oxygen and water. Similar reaction inter-
because in this case the barrier height and width is mediates and products were identified (that is,
smaller for the return of a surface trapped electron DCAC, phosgene, CO, COZand surface carboxylate
into the bulk conduction band region. On the other groups). Figure 3.13 shows the isotope induced
hand, addition of 0 2 led to an increase in the upward vibrational frequency shifts in these compounds in
band bending, and therefore suppressed the electron- the gas phase when TCE is oxidized by oxygen ( l 8 0 2
hole recombination processes leading to more efficient or l 6 0 2 ) on hydroxylated TiOz. It is quite obvious that
photoactivity. The above conclusions were based on only oxygen atoms from the gas phase oxygen are
the observed photoluminescense enhancement by incorporated into the intermediates (DCAC, phos-
H20 adsorption and photoluminescence quenching by gene, CO), while isotope mixing occurs in COZ. This
0 2 adsorption. From a chemical point of view, the
is probably due to the formation of carboxylates on
adsorbed water then can be regarded as an effective the surface (which involve lattice l60as an interme-
electron-hole recombination center while the ad- diate for the release of final product, COz). Therefore,
sorbed oxygen can be considered as an effective the initial oxidation of TCE involved exclusively the
electron trap to prevent such a recombination pro- gas phase 02-derived active radical species (HOz',
cess. These results have important implications for 'Of, etc.) and not the hydroxyl radicals from direct
gas phase photooxidation processes on TiO2. Some hole trapping by surface hydroxyl groups.
of the observed kinetics can be explained using these Larson and FalconerlZ9analyzed the surface com-
concepts. position of the Ti02 catalysts during and after TCE
3.5.3. Trichloroethylene (TCE) photooxidation reactions. Their results implied that
TCE is a common pollutant in air and water due the accumulation of C1 ions and other reaction
to its wide use as a solvent in industry. The final intermediates may poison the Ti02 catalyst for
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 753

further TCE photooxidation; the presence of water ing power of the conduction band energy and the
(either vapor or liquid) helped to remove these holes have the oxidizing power of the valence band
surface species. energy. From the band-edge positions of the valence
band and conduction band, as discussed in section
3.5.4. 4-Chlorophenol (4-CP) 2.2.2, the redox capability of a photoexcited semicon-
Photodegradation of 4-chlorophenol has been in- ductor particle in the aqueous solution can be esti-
vestigated in gas in aqueous suspen- mated. The bulk photoelectrons and photoholes can
si011,l~l-l~~and on e1e~trodes.l~~ The molecule is of recombine to produce thermal energy, or rapidly
interest due to its benzene ring structure which migrate to the surface and react with adsorbed
allows the capture of radical intermediates (such as species at the surface. In a steady state photocata-
'OH) or the direct interaction with an electron. A lytic reaction, the rate of oxidation by the holes has
recent FT-IR study of the gas phase reaction by to be balanced by the rate of reduction by the
Stafford et al.130 found that in the absence of water electrons. Either of these reactions can be rate
vapor, 4-CP was photooxidized possibly by reacting determining.
with the photogenerated ' 0 2 - radical species. Addi- Although the above physical events are generally
tion of water vapor to the system dramatically accepted as the initial step for the photooxidation
enhanced the rate and extent of photooxidation. process, the subsequent chemical events at the
However, the exact cause for this change was not liquid-solid interface remain an ambiguous and
determined. Direct reaction of 4-CP with photoge- controversial issue. The trapped holes have been
nerated electrons was also observed. 4-CP accepts proposed to directly oxidize adsorbate molecules,117
one electron and releases one C1- ion, resulting in or t o react with surface hydroxyl groups to produce
hydroquinone formation. Futher photooxidation re- hydroxyl radicals which are strong oxidizing agents.137
quired the presence of oxygen. From these results, The chemical identification of hydroxylated oxidation
the authors pointed out that hydroxyl radicals ('OH) intermediates and the ESR detection of hydroxyl
may not be exclusively responsible for the photooxi- radicals appear to support the hydroxyl radical
dation of 4-CP and the role of oxygen is more than mechanism. However, these data do not permit the
that of merely an electron scavenger. unambiguous delineation of the 'OH-driven mecha-
nism versus the direct hole oxidation mechanism
3.6. Photooxidation at the Liquid-Solid Interface since similar reaction intermediates are expected
on Ti02 Catalysts from these two schemes in an aqueous system. A
recent diffuse reflectance flash photolysis experiment
3.6.1. Introduction in nonaqueous solution presented evidence in favor
By using Ti02 as a catalyst, the photooxidation of of the direct hole oxidation route.l17 The trapped
organics may be used for decontamination treatment electrons are believed to react with preadsorbed
in polluted waters. Such applications have inspired molecular oxygen to produce 0 2 - and 0 z 2 - anions.
a vast amount of research. The solid photocatalysts However, the ultimate fate of these activated oxygen
studied include colloidal particles, high surface area species was not determined. They may directly
powders, and single-crystal surfaces. The complexity oxidize organic species, protonate to generate hydro-
of the liquid-solid interface presents many more peroxide radicals and hydroxyl radicals, or further
variables (in comparison t o the gas-solid system) to react with more trapped electrons to eventually form
be dealt with in kinetics studies. Such parameters water. Recent studies of 4-chlorophenol (4-CP) deg-
include the surface composition, surface area, prepa- radation in a T i 0 2 slurry suggested that oxygen plays
ration procedures, and concentration of the photo- a specific role during photooxidation in addition to
catalyst; the pH of the solution and its effect on the scavenging the trapped e l e c t r o n ~ . ~ ~It~ was
J~~J~~
surface structure; the concentration of the reactants; found that 4-CP degradation only occurs to a small
the solvent environment; the partial presure of extent (20%)in the presence of an alternative elec-
oxygen; the diffusion rate in solution and near the tron acceptor capable of sweeping up trapped elec-
surface, etc. Care must be taken with the control- trons as readily as oxygen, while complete photo-
lable parameters, or discrepencies will occur in the mineralization is achieved in a similar time frame
experimental results. For instance, chlorobenzene when oxygen is present.
was first reported not to undergo complete mineral-
ization over Ti02.135 However, experiments with a 3.6.3. The Dynamics of Charge Carrier Trapping,
differently prepared Ti02 catalyst and with a higher Recombination, and Interfacial Electron Transfer
oxygen pressure demonstrated that total photooxi- In an aqueous solution, picosecond and nanosecond
dation of chlorobenzene may be achieved.136 The laser photolysis was employed to investigate the
various kinetic parameters in the liquid-solid pho-
tooxidation systems have been discussed in several
recent reviews.14-19
tion in -
dynamics of charge carrier trapping and recombina-
60 8, colloidal particles of Ti02.30 The
trapping of the conduction band electrons is a very
rapid process and occurs within 30 ps. By contrast,
3.6.2. The Primary Events of Photooxidation at the the trapping of the valence band holes is a much
LiquicCSolid Interface slower process requiring an average time of 250 ns.
Continuous band-gap irradiation of an aqueous The recombination of trapped electrons with free or
semiconductor dispersion excites an electron from the trapped holes takes place in the to s time
valence band to the conduction band, creating an domain. At low charge carrier concentration, the
electron-hole pair. The electrons possess the reduc- mean lifetime of a single electron-hole pair is -30
754 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et at.

ns in a semiconductor particle, and the hole trapping


can compete with the recombination process. In the
- Wavelength (nm)

trapped state, holes are relatively unreactive toward


h 5000
N' to3
1000
1
500 400 300
1 . 1 3
electrons.30 At a high concentration of electron-hole E
\
Photochemical
opportunity region for
pairs, the charge carriers recombine within a fraction u)
c 4r TiO,: h v t E g ? 3 2 e V
of one nanosecond. Therefore, the interfacial carrier 0
3
trapping must be very rapid in order to achieve
effective photochemical conversion. This requires the
:
2
IO2
electron or hole trapping species to be preadsorbed c
0
Q,
on the catalyst surface. 0. I
m
Gerischer and c o - w ~ r k e r srecently
l~~ analyzed the & IO
photooxidation kinetics of organic molecules on T i 0 2 3 I 1 I I
0
particles in aqueous environment. It was found that a 0 1 2 3 4 5
the rate of photooxidation is equal to and limited by Photon Energy ( e V )
the reduction rate of dissolved oxygen ( 0 2 ) in the
solution. It was theoretically predicted140 and ex- Figure 4.1. Solar spectrum at sea level with the sun at
perimentally confirmed141that when 0 2 is not re- zenith.
duced at a sufficiently high rate, electrons accumu-
late on the photocatalyst particles, and the rate of with time.121 On the other hand, Ti02 is a quite
radiationless recombination is enhanced until the stable photocatalyst, but since the band gap is large
sum of the electron-hole recombination and the (E, = 3.2 eV) it is only active in the ultraviolet region
electron transfer to 0 2 is equal to the rate of the hole which is < 10%of the overall solar intensity as shown
photogeneration. The deposition of Pd metal par- in Figure 4.1.145
ticles on Ti02 enhances the electron transfer t o 0 2 The limitations of a particular semiconductor as a
and eliminates the electron accumulation on the Ti02 photocatalyst for a particular use can be surmounted
particles. by modifying the surface of the semiconductor. To
date, three benefits of modifications to photocatalytic
3.6.4. Overview of Photomineralization Reactions in semiconductor systems have been studied: (1)inhib-
Aqueous Semiconductor Dispersions iting recombination by increasing the charge separa-
tion and therefore the efficiency of the photocatalytic
In an aqueous T i 0 2 suspension, the holes in the process; (2)increasing the wavelength response range
Ti02 valence band have enough oxidizing power to (i.e. excitation of wide band gap semiconductors by
convert any organic species to C 0 2 , water, and visible light); and (3) changing the selectivity or yield
mineral acids (such as HC1). The photogenerated of a particular product. A few examples will be given
holes in the semiconductor particles, the hole-trap- in the following sections illustrating the large body
ping radical species, and the activated oxygen species of work conducted in the area of photocatalyst surface
(by electron trapping) are all strong oxidation agents modification.
for organic compounds. The nonselective and total
photooxidation property of the system has been 4.2. Metal Semiconductor Modification
applied for water purification by the photomineral-
ization of organic pollutants. Almost every major In photocatalysis the addition of noble metals to a
class of organic contaminant has been examined for semiconductor can change the photocatalytic process
possible degradation using this technique. Detailed by changing the semiconductor surface properties.
mechanistic analysis of these reactions have ap- The metal can enhance the yield of a particular
peared in several recent and shall not product or the rate of the photocatalytic reaction. The
be repeated here. enhancement in reactivity was first observed for the
photoconversion of H2O t o H2 and 0 2 using the PtJ
Ti02 system.146 The addition of a metal to a semi-
4. Surface Modifications conductor surface can also change the reaction prod-
ucts.
4.1, Introduction
Figure 4.2 is an illustration of the electron capture
As was stated earlier in this review, one of the most properties at the Schottky barrier of the metal in
active fields of research in heterogeneous photoca- contact with a semiconductor surface. The picture
talysis using semiconductor particles is the develop- schematically illustrates the small area of the semi-
ment of a system capable of using natural sunlight conductor surface that the metal actually covers.
to degrade a large number of organic and inorganic Transmission electron microscopy measurements
contaminants in w a s t e ~ a t e r . ~ JThe ~ ~ -overall
~~ have found that when the added metal is Pt, the Pt
photocatalytic activity of a particular semiconductor particles form clusters on the surface.14' With a Pt
system for the stated purpose is measured by several dose of 10 wt %, only 6% of the semiconductor surface
factors including the stability of the semiconductor area is covered. Therefore a large surface area of the
under illumination, the efficiency of the photocata- semiconductor is still exposed.
lytic process, the selectivity of the products, and the After excitation the electron migrates to the metal
wavelength range response. For example, small where it becomes trapped and electron-hole recom-
band-gap semiconductors such as CdS are capable bination is suppressed. The migration of electrons
of receiving excitation in the visible region of the solar to the metal particles was confirmed by studies
spectrum, but are usually unstable and photodegrade showing the reduction in the photoconductance of the
Photocatalysis on TiOn Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 755

Trap Barrier
Semiconductor

\
Figure 4.3. Photoexcitation in composite semiconductor-
semiconductor photocatalyst.

content affects the distribution of electrons in the


Figure 4.2. Metal-modified semiconductor photocatalyst
particle. system. Above the optimum metal content the ef-
ficiency of the photocatalytic process actually de-
semiconductor for the Pt deposited Ti02 compared creases. Care must be taken when studies are
to Ti02 alone.148aThe hole is then free t o diffuse to conducted on a metal-modified semiconductor to work
the semiconductor surface where oxidation of organic with the quantity of metal which gives the optimum
species can occur. photocatalytic efficiency.
The PtpTi02 system is the metal-semiconductor
system most commonly studied. As was previously 4.3. Composite Semiconductors
stated, the photostability of Ti02 and the capability Coupled semiconductor photocatalysts provide an
of band-gap excitation in the solar region make it the interesting way to increase the efficiency of a pho-
semiconductor of choice. The addition of Pt to the tocatalytic process by increasing the charge separa-
T i 0 2 surface is beneficial for photocatalytic reactions tion, and extending the energy range of photoexci-
evolving gas, especially hydrogen. The metal is tation for the system. Figure 4.3 illustrates geomet-
important also because of its own catalytic activity. rically and energetically the photoexcitation process
The metal actually modifies the photocatalytic prop- for the composite (coupled) semiconductor-semicon-
erties of the semiconductor by changing the distribu- ductor photocatalyst CdS-TiO2. Transmission elec-
tion of electrons. The effect of added metal t o the tron micrographs of the coupled semiconductors
semiconductor's electronic properties was explained shows the direct geometrical interaction of multiple
in section 2.2.5. When the two species come in CdS particles with the Ti02 particle surface.149The
contact the Fermi levels of the metal and semicon- relative positions of the conduction and valence band
ductor align causing electrons to flow t o the metal energy levels for the two semiconductors are refer-
from the semiconductor. The decrease in electron enced to the vacuum level (see Figure 2.4). The
density within the semiconductor leads to an increase energy of the excitation light is too small to directly
in the hydroxyl group This in turn affects excite the Ti02 portion of the photocatalyst, but it is
the photocatalytic process on the semiconductor large enough to excite an electron from the valence
surface. band across the band gap of CdS (Eg= 2.5eV) to the
The electronic modification of the semiconductor conduction band. According to this energetic model
surface via metal deposition can also be observed in Figure 4.3, the hole produced in the CdS valence
with other noble metals. The addition of silver to the band from the excitation process remains in the CdS
Ti02 surface does increase the production of H2 from particle while the electron transfers to the conduction
alcohol. The increase in H2 production is attributed band of the T i 0 2 particle. The electron transfer from
to the trapping of electrons at the metal sites. The CdS t o Ti02 increases the charge separation and
increase in H2 production for the Ag/Ti02 photocata- efficiency of the photocatalytic process. The sepa-
lyst is not as great as the increase in H2 production rated electron and hole are then free to undergo
for Pt/Ti02.149 electron transfer with adsorbates on the surface. The
TEM has determined that the size ,of Pt particles quantum yield for the reduction of methylviologen
remained the same over the 0.5-10% Pt range of drastically increased and approached an optimum
content on the Ti02 surface. The Pt particles have a value of 1 when the concentration of Ti02 was
mean diameter of 2 nm.14' There is an optimum increased in a CdS-Ti02 system.150
loading of Pt (1.0 wt %) to achieve a maximum Transient absorption spectra of the composite
photocatalytic rate of hydrogen production from CdS-Ti02 photocatalyst indicate trapping of the
alcohols. This shows that the morphology or geo- electron at Ti4+sites on the Ti02 surface. The CdS-
metrical factor does not affect the photocatalytic Ti02 system exhibits a broad absorption band in the
properties of the mixed system but an optimum Pt 550-750 nm region after receiving a 355 nm (3.5 eV)
756 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

Sensitizer e-Transfer Regenerative


Excitation to Acceptor Sensitizer
+ System
e -Transfer
Figure 4.4. Excitation steps using dye molecule sensitizer.
picosecond laser pulse. This band is characteristic become another interesting area of semiconductor
of chemical changes associated with the trapping of modification. The benefit of transition metal doping
electrons on the T i 0 2 surface. The lack of absorption species is the improved trapping of electrons to
activity in the 550-750 nm region was tested by inhibit electron-hole recombination during illumina-
using the same laser pulse with the Ti02 particles tion. With Fe3+ doping of TiO2, an increase in Ti3+
alone. Only the CdS portion of the composite pho- intensity was observed by ESR upon photoirradiation
tocatalyst exhibited an absorption band in the visible due to trapped e1ectr0ns.l~~ Only certain transition
region. The transient absorption spectrum showed metals such as Fe3+lm and Cu2+158~159actually inhibit
no absorption on clean TiO2. The experimental electron-hole recombination. The concentration of
results show that the coupling of semiconductors with the beneficial transition metal dopants is very small
the appropriate energy levels can produce a more and large concentrations are detrimental. Other
efficient photocatalyst via better charge separation. transition metal dopants such as C$+ 160 create sites
which increase electron-hole recombination. It is
4.4. Surface Sensitization believed that these transition metals create acceptor
Surface sensitization of a wide band-gap semicon- and donor centers where direct recombination occurs.
ductor photocatalyst (TiOz) via chemisorbed or phy- Compared to the other areas of surface modification,
sisorbed dyes can increase the efficiency of the the amount of work conducted on the photoreaction
excitation process. The photosensitization process of different organic species with transition metal
can also expand the wavelength range of excitation doped Ti02 systems is very small.
for the photocatalyst through excitation of the sen-
sitizer followed by charge transfer to the semiconduc- 5. Summary
Some common dyes which are used as sensi- In a heterogeneous photocatalysis system, the
tizers include erythrosin B,152t h i ~ n i n e ,and
l ~ ~analogs efficiency for chemical transformation depends on the
of R u ( ~ ~ Y ) ~ ~ + . ~ ~ ~ J ~ ~ photoactivity of the adsorbate molecules and the
Figure 4.4 illustrates the excitation and charge catalyst substrates. In the case of an inert oxide
injection steps involved for the regenerative dye substrate, electron transfer or energy transfer events
sensitizer surface process. Excitation of an electron occur between the adsorbate molecules. The catalyst
in the dye molecule occurs to either the singlet or only provides an ordered environment for a more
triplet excited state of the molecule (see Figure 2.2). efficient molecular interaction and does not partici-
If the oxidative energy level of the excited state of pate in the photoexcitation or chemical reaction
the dye molecule with respect to the conduction band process. The chemical reactions induced by photon
energy level of the semiconductor is favorable (i.e. absorption and the subsequent relaxation is deter-
more negative), then the dye molecule can transfer mined by the nature of the adsorbate molecular
the electron to the conduction band of the semicon- structure.
ductor. The surface acts as a quencher accepting an
electron from the excited dye molecule. The electron In the case of a reactive semiconductor substrate,
in turn can be transferred t o reduce an organic the catalyst can either provide energy levels to
acceptor molecule adsorbed on the surface. A study mediate electron transfer between adsorbate mol-
has been conducted which demonstrates the reduc- ecules (by temporarily accommodating an electron)
tion of NJVJV 'JV '-tetraethyloxonine by a sensitized or behave as both an electron donor (the photoge-
Ti02 system. The sensitizer was anthracene-g-car- nerated electron in the conduction band) and an
boxylic acid which extended the response of Ti02 into electron acceptor (the photogenerated hole in the
the visible region, A = 450 nm.156 In this system a valence band). Here, the band structure of the
redox couple was employed to regenerate the dye substrate plays a significant role. A change in the
sensitizer. Without the presence of a redox couple, surface and bulk electronic structure can dramati-
the dye sensitizer semiconductor system can also be cally alter the chemical events following photoexci-
used in oxidative degradation of the dye sensitizer tation of the adsorbate molecules or the catalyst
molecule itself after charge transfer. This is impor- substrate.
tant due t o the large quantity of dye substances in Applications of heterogeneous photocatalysis t o
wastewater from the textile industries. environmental cleanup involve the use of photocata-
lysts for the non-selective total oxidation of organic
4.5. Transition Metal Doping pollutants. Ti02 is photoactive in the W region
The influence of dissolved transition metal impu- (<400 nm) and is currently considered the most
rity ions on the photocatalytic properties of Ti02 has promising catalyst for air and water photocatalytic
Photocatalysis on Ti02 Surfaces Chemical Reviews, 1995, Vol. 95, No. 3 757

decontamination. Water and oxygen molecules are (20) Struve, W. S. Fundamentals of Molecular Spectroscopy; Wiley:
New York, 1989.
considered necessary for the photooxidation process, (21) Atkins, P. W. Molecular Quantum Mechanics. 2nd ed.: Oxford
however, very different kinetics effects by these two University Press: Oxford,- 1983,
surface species have been reported by different (22) Cotton, F. A. Chemical Applications of Group Theory, 2nd ed.;
Wiley: Chichester, 1971.
authors and for different compounds. For gas-solid (23) Douglas, B. E.; Hollingsworth, C. A. Symmetry in Bonding and
systems, it has been shown that molecular oxygen is Spectra: A n Introduction; Academic Press: San Diego, 1985.
necessary for the photooxidation to occur while water (24) (a) Skoog, D. A. Principles of Instrumental Analysis; Saunders
College Pub.: New York, 1971, p 228. (b) Peters, K. Annu. Rev.
is necessary to remove from the catalyst surface some Phys. Chem. 1987,38,253.
of the reaction intermediates or products, the ac- (25) Kasha, M. Discuss. Faraday SOC.1950,9,14.
(26) Nosaka, Y.; Fox, M. A. J . Phys. Chem. 1988,92,1893.
cumulation of which may poison the catalyst. For (27) Matthews, R. W. J. Catal. 1988,113,549.
aqueous Ti02 suspension systems, it is believed that (28) Gerischer, H. In Photocatalytic Treatment of Water and Air:
the 'OH radicals from hole-trapping by surface hy- Ollis, D. F., Al-Ekabi, H., Eds., Elsevier: Amsterdam, 1993.
(29) Spanhel, L.; Haase, M.; Weller, H.; Henglein, A. J.A m . Chem.
droxyl groups are the primary oxidizing agents and SOC.1987,109,5649.
oxygen is a scavenger for photogenerated electrons. (30) Rothenberger, G.; Moser, J.; Gratzel, M.; Serpone, N.; Sharma,
However, for aqueous Ti02 suspensions, there is D. K. J . Am. Chem. SOC.1985,107,8054.
(31) Howe, R. F.; Gratzel, M. J . Phys. Chem. 1987,91,3906.
currently no isotope labeling experiment to defini- (32) Henglein, A. Chem. Reu. 1989,89,1861.
tively show which species (H20 or 0 2 ) is more (33) Henglein, A. Top. Curr. Chem. 1988,143,113.
extensively incorporated into the photooxidation (34) Kubo, R.; Kawabata, A,; Kobayashi, S. Annu. Reu. Mater. Sci.
1984,14,49.
intermediates or products. Further studies are nec- (35) Wang, Y. In Photochemical Conversion and Storage of Solar
essary to elucidate the mechanistic details of the Energy; Pelizzetti, E., Schiavello.. M... Eds., Kluwar Acad. Pub.:
DordGicht, 1991; p 295.
photocatalytic process in the aqueous suspension (36) Nozik. A. In Photocatalvtic Purification and Treatment of Water
system. and Air; Ollis, D. F., Ai-Ekabi, H . , Eds.; Elsevier Scienc'e Pub.:
Electronic modification of the catalyst by deposition New York, 1993; p 39.
(37) Wang, Y.; Herron, N.; Mahler, W.; Suna, A. J . Opt. SOC.A m . B
of metal particles, sensitizer molecules, or other 1989,6 , 808.
semiconductor particles has a strong effect on the (38) Steigenvald, M. L.; Brus, L. E. Annu. Reu. Mater. Sci. 1989,19,
1 m.
photoactivity of the system. The wavelength tuning 411.
(39) Brus, L. E. J . Chem. Phys. 1983,79,5566.
of photoresponse, the efficiency of electron-hole (40) Brus, L. E. J. Chem. Phys. 1984,80, 4403.
separation, and the dynamics of interfacial electron (41) Koch, U.;Foitik, A.; Weller, H.; Henglein, A. Chem. Phys. Lett.
1985,122,507.
transfer can be dramatically influenced. The ap- (42) Wang, Y.; Suna, A.; Mahler, W.; Kasawski, R. J . Chem. Phys.
plication of these fundamental principles for design- 1987.87.7315.
ing photochemical transformation methods is a rich (43) Foitik, A:; Weller, H.; Koch, U.; Henglein, A. Ber. Bunsen-Ges.
Phys. Chem. 1984,88,969.
area for both basic scientific research and technolog- (44) Weller, H.; Schmidt, H. M.; Koch, U.; Foitik, A.; Baral, S.;
ical development. Henglein, A.; Kunath, W.; Weiss, K.; Diekmann, E. Chem. Phys.
Lett-1986, 124,557.
(45) Schmidt, J. M.; Weller, H. Chem. Phys. Lett. 1986,129,615.
6. Acknowledgments (46) Kayanuma, Y. Phys. Rev. B 1988,38,9797.
(47) Rhoderick, E. H.; Williams, R. H. Metal-SemiconductorContacts,
We acknowledge with thanks the support of the 2nd ed.; Oxford University Press: New York, 1988; p 11.
(48) Ramamurthy, V. Photochemistry in Organized and Constrained
Army Research Office. Media; VCH New York, 1991.
(49) Gust, D.; Moore, T. A. Science 1989,244,35.
(50)Zhou, X.-L.; Zhu, X.-Y.; White, J . M. Surf. Sci. Rep. 1991,13,
7. References 73.
(1) Fujishima, A,; Honda, K. Nature 1972,37,238. (51) Rosenwaks, Y.; Thacker, B. R.; Nozik, A. J.; Ellingson, R. J.;
Burr, K. C.; Tang, C. L. J.Phys. Chem. 1994,98,2739.
(2) Bard, A. J. J. Phys. Chem. 1982,86, 172; J. Photochem. 1979, (52) Ford, W. E.; Rodgers, A. J . J. Phys. Chem. 1994,98,3822.
10, 59; Science 1980,207,139. (53) Zhang, J. Z.; O'Neil, R. H.; Roberti, T. W. J. Phys. Chem. 1994,
(3) Gratzel, M., Ed. Energy Resources Through Photochemistry and 98,3859.
Catalysis; Academic Press: New York, 1983. (54) Bedja, I.; Hotchandani, S.; Kamat, P. V. J . Phys. Chem. 1994,
(4) Kalyanasundaram, K.; Gratzel, M.; Pelizzetti, E. Coord. Chem. 98,4133.
Reu. 1986,69,57. ( 5 5 ) Kamat, P. V.; Dimitrijevic, N. M.; Fessenden, R. W. J. Phys.
(5) Parmon, V. N.; Zamareav, K. I. In Photocatalysis -Fundamentals Chem. 1988,92,2324.
and Applications; Serpone, N., Pelizzetti, E., Eds.; Wiley Inter- (56) Rossetti, R.; Beck, S. M.; Brus, L. E. J . Am. Chem. SOC.1984,
science: New York, 1989; p 565. 106,980. Rossetti, R.; Brus, L.E. J . Phys. Chem. 1986,90,558.
(6) Pelizzetti, E., Schiavello, M., Eds. Photochemical Conversion and (57) Lewis, N. S. Annu. Reu. Phys. Chem. 1991,42,543.
Storage of Solar Energy; Kluwer Academic Publishers: Dor- (58) Augustynski, J. Electrochim. Acta 1993,38,43.
drecht, 1991. (59) Burdett, J. K. Inorg. Chem. 1985,24,2244.
(7) Schiavello, M., Ed. Photocatalysis and Enuironment; Kluwer (60) Burdett, J . K.; Hughbands, T.; Gordon, J. M.; Richardson, J. W.,
Academic Publishers: Dordrecht, 1988. Jr.; Smith, J . V. J . Am. Chem. SOC.1987,109,3639.
(8) Ollis, D. F., Al-Ekabi, H., Eds. Photocatalytic Purification and (61) Fahmi, A.; Minot; C.; Silvi, B.; Causa, M. Phys. Reu. B 1993,
Treatment of Water and Air; Elsevier: Amsterdam, 1993. 47,11717.
(9) Mauzerall, D.; Ballard, S. G. Annu. Rev. Phys. Chem. 1982,33, (62) (a) Zschack. In The Structure of Surfaces III; Tong, S. Y., Van
377. Hove, M. A., Takayanagi, K., Xie, X. D., Eds.; Springer Series
(10)Forster, T. Faraday Discuss. Chem. SOC.1959,27,7. In Surface Science, Vol. 24; Springer-Verlag Berlin: Heidelberg,
(11) Okabe, H. Photochemistry of Small Molecules: Wiley-Inter- 1991; p 646 and references therein. (b) Murray, P. W.; Leibsle,
science: New York, 1978. F. M.; Fisher, H. J.; Flipse, C. F. J.; Muryn, C. A.; Thornton, G .
(12) Gilbert, A.; Baggott, J. Essentials of Molecular Photochemistry; Phys. Reu. B 1992, 46, 12877. (c) Carroll, D. L.; Liang, Y.;
CRC Press: Boca Raton, 1991. Bonnell, D. A. J . Vac. Sci. Technol. A 1994,12 (41, 2298. (d)
(13) Fox, M. A., Chanon, M., Eds. Photoinduced Electron Transfer, Poirier, G. E.; Hance, B. K.; White, J. M. J. Phys. Chem. 1993,
Part A: Conceptual Basis; Elsevier: Amsterdam, 1988. 97,5965; J . Vac. Sci. Technol. B 1992, 10, 6;J. Phys. Chem.
(14) Serpone, N., Pelizzetti, E., Eds. Photocatalysis .Fundamentals 1993,97,6500.
and Applications; Wiley-Interscience: New York, 1989. (63) Henrich, V. E.; Kurtz, R. L. Phys. Rev. B 1981,23,6280. Henrich,
(15) Gratzel, M. Heterogeneous Photochemical Electron Transfer;CRC V. E. Rep. Prog. Phys. 1985,48,1481.
Press: Boca Raton, 1989. (64) See, A. K.; Bartynski, R. A. J. Vac. Sci. Technol. A 1992,10,
(16) Julliard, M.; Chanon, M. Chem. Reu. 1983,83,425. 2591.
(17) Kavarnos, G. J.; Turro, N. J. Chem. Rev. 1986,86, 401. (65) Sanjines, R.; Tang, H.; Berger, H.; Gozzo, F.; Margaritondo, G.;
(18) Fox, M. A.; Dulay, M. T. Chem. Reu. 1993,93,341. Levy, F. J . Appl. Phys. 1994,75,2945.
(19) Kamat, P. V. Chem. Reu. 1993,93,267. (66) Lu, G.; Linsebigler, A,; Yates, J . T., Jr. J . Phys. Chem., in press.
758 Chemical Reviews, 1995, Vol. 95, No. 3 Linsebigler et al.

(67)Henrich, V. E.; Dresselhaus, G.; Zeiger, H. J. Solid State (118)Fitzmaurice, D. J.;Eschle, M.; Frei, H.; Moser, J . J . Phys. Chem.
Commun. 1977,24,623. 1993,97,3806.
(68)Kurtz, R. L.; Stockbauer, R.; Madey, T. E.; Roman, E.; de (119)ORegan, B.; Gratzel, M. Nature 1991,353,737 and references
Segovia, J. L. Surf. Sci. 1989,218,178. therein.
(69)Pan, J. M.; Maschhoff, B. L.; Diebold, U.; Madey, T. E. J . Vac. (120)Kajeshwar, K.; Singh, P.; DuBow, J. Electrochim. Acta 1978,23,
Sci. Technol. A 1992,10, 2470. 1117.
(70)Hugenschmidt, M. B.; Gamble, L.; Campbell, C. T. Surf. Sci. (121)Henglein, A. J . Phys. Chem. 1982,86,2291.
1994,302,329.
(71)Lu, G.; Linsebigler, A.; Yates, J . T., Jr. J . Phys. Chem. 1994, (122)Mills, G.; Zongguan, L.; Meisel, D. J . Phys. Chem. 1988,92,822.
98,11733. (123)Kesselman, J. M.; Kumar, A.; Lewis, N. S. in Photocatalytic
(72)Bustillo, F. J.; Roman, E.; de Segovia, J. L. Vacuum 1989,39, Purification and Treatment of Water and Air; Ollis, D. F., Al-
659;1990,41,19. Ekabi, H. Eds.; Elsevier: Amsterdam, 1993;p 19.
(73)Lo, W. J.; Chung, Y. W.; Somorjai, G. A. Surf. Sci. 1978,71, (124)Wong, J . C. S.; Linsebigler, A. L.; Lu, G.; Fan, J . F.; Yates, J.
199. T., Jr. J . Phys. Chem. 1996,99,335.
(74)Sato, S.;White, J. M. J . Am. Chem. SOC. 1980,102,7206;J . (125)Blake, D. M. Eiblwgraphy of Work on the Photocatalytic Removal
Phys. Chem. 1981,85,592. of Hazardous Compounds from Water and Air; US.Government
(75)Gopel, W.; Rocker, G.; Feierabend, R. Phys. Reu. E 1983,28, Report, National Renewable Energy Laboratory, 1993.
3427. (126)Anpo, M.; Chiba, K.; Tomonari, M.; Coluccia, S.; Che, M.; Fox,
(76)Beck, D. D.; White, J. M. J. Phys. Chem. 1984,88,174. M. A. Bull. Chem. SOC.Jpn. 1991,64,543.
(77)Iwaki, T. J. Chem. Soc., Faraday Trans. 1 1983,79,137. (127)Phillips, L. A.; Raupp, G. B. J . Mol. Catal. 1992,77,297.Dibble,
(78)Lu, G.; Linsebigler, A.; Yates, J. T., Jr. J . Chem. Phys. 1996, L. A.; Raupp, G. B. Catal. Lett. 1990,4, 345;Enuiron. Sci.
102,3005. Technol. 1992,26,492.
(79)Beck, D. D., White, J. M.; Ratcliffe, C. T. J . Phys. Chem. 1986, (128)Fan, J. F.; Wong, J. C. S.; Yates, J . T., Jr. To be published.
90,3132.
(80) Yanagisawa, Y.; Ota, Y. Surf. Sci. Lett. 1991,254,L433. (129)Larson, S.A.; Falconer, J. L. In Photocatalytic Purification and
(81)Kobayashi, H.; Yamaguchi, M. Surf. Sci. 1989,214,466. Treatment of Water and Air; Ollis, D. F., Al-Ekabi, H., Eds.;
(82)Tanaka, K.; White, J. M. J . Phys. Chem. 1982,86,4708. Elsevier: Amsterdam, 1993;p 473.
(83)Boccuzzi, F.; Guglielminotti, E.; Spoto, G. Su$. Sci. 1991,251/ (130)Stafford, U.;Gray, K. A.; Kamat, P. V.; Varma, A. Chem. Phys.
252, 1069. Lett. 1993,205,55. Gray, K. A,; Stafford, U.; Dieckmann, M. S.;
(84)Pande, N. K.; Bell, A. T. J. Catal. 1986,97,137. Kamat, P. V. In Photocatalytic Purification and Treatment of
(85) Smith, K. E.; Henrich, V. E. Phys. Rev. B 1986,32,5384. Smith, Water and Air; Ollis, D. F., Al-Ekabi, H., Eds.; Elsevier:
K. E.; Mackay, J. L.; Henrich, V. E. Phys. Rev. E 1987,35,5822. Amsterdam, 1993;p 455.
(86)Onishi, H.; Aruga, T.; Egawa, C.; Iwasawa, Y. Surf. Sci. 1988, (131)Al-Ekabi, H.; Serpone, N. J . Phys. Chem. 1988,92, 5726.Al-
193,33. Ekabi, H.; Serpone, N.; Pelizzetti, E.; Minero, C.; Fox, M. A,;
(87)Diebold, U.;Madey, T. E. J . Vac. Sci. Technol.A 1992,10,2327. Draper, R. B. Langmuir 1989,5,250.
( 8 8 ) Roman, E. L.; de Segovia, J. L.; Kurtz, R. L.; Stockbauer, R.; (132)Al-Sayyed, G.; D’Oliveira, J . C.; Pichat, P. J . Photochem.
Madey, T. E. Surf. Sci. 1992,273,40. Photobiol. A: Chem. 1991,58,99.
(89)Roman, E.; de Segovia, J . L. Surf. Sci. 1991,251/252,742. (133)Cunnigham, J.; Sedlak, P. J . Photochem. Photobiol. A: Chem.
(90)Smith, K. E.; Henrich, V. E. Surf. Sci. 1989,217,445. 1994,77,255 and references therein.
(91)Idriss, H.; Kim, K. S.; Barteau, M. A. Surf. Sci. 1992,262,113. (134)Vinodgopal, K.; Hotchandani, S.; Kamat, P. V. J . Phys. Chem.
(92)Kim, K. S.;Barteau, M. A.; Farneth, W. E. Langmuir 1988,4, 1993,97,9040.
533. (135)Ollis, D. F.; Hsiao, C. Y.; Budiman, L.; Lee, C.-L. J. Catal. 1984,
(93)Kim, K. S.;Barteau, M. A. Surf. Sci. 1989,233,13. 88,89.
(94)Vohs, J . M.; Barteau, M. A. Su$. Sci. 1990,201,481. (136)Matthews, R. W. J . Catal. 1986,97,565.
(95)Kiennemann, A.; Idriss, H.; Kieffer, R.; Chaumette, P.; Durand,
D. Ind. Eng. Chem. Res. 1991,30,1130. (137)Turchi, C. S.;Ollis, D. F. J . Catal. 1989,119,483;1990,122,
(96)Idriss, H.; Pierce, K; Barteau, M. A. J . Am. Chem. SOC.1991, 178.
113,715. Idriss, H.; Kim, K. S.; Barteau, M. A. J . Catal. 1993, (138)Matthews, R. W. J . Catal. 1988,111, 264.
139,119. (139)Gerischer, H.; Heller, A. J . Phys. Chem. 1991,95,5261.
(97)Lavalley, J.-C.; Lamotte, J.; Busca, G.; Lorenzeli, V. J . Chem. (140)Gerischer, H. Electrochim. Acta 1993,38,3. Gerischer, H.; Heller,
Soc., Chem. Commun. 1986,1006.Idriss, H.; Hindermann, J. A. J . Electrochem. SOC.1992,139,113.
P.; Kieffer, R.; Kiennemann, A.; Vallet, A.; Chauvin, C.; Lavalley, Wang, C. M.; Heller, A,; Gerischer, H. J . Am. Chem. SOC.1992,
J. C.; Chaumette, P. J. Mol. Catal. 1987,42,205. Busca, G.; 114,5230.
Lamotte, J.; Lavalley, J.-C.; Lorenzelli, V. J . Am. Chem. SOC. Ollis, D. F. Enuiron. Sci. Technol. 1986,19,480.
1987,109,5197.
(98)Li, C.; Domen, K.; Maruya, K.-I.; Onishi, T. J . Catal. 1990,125, Ollis, D. F.; Pelizzetti, E.; Serpone, N. Enuiron. Sci. Technol.
445. 1991,25,1523.
(99)Jaeger, C. D.; Bard, A. J. J . Phys. Chem. 1979,83,3146. Matthews, R. W. J . Phys. Chem. 1987,91,3328.
(100)Schrauzer, G. N.; Guth, T. D. J . Am. Chem. Soc. 1977,99,7189. Jackson, J . D. Classical Electrodynamics; Wiley & Sons: New
(101)Wrighton, M. S.;Ginley, D. S.; Wolczanski, P. T.; Ellis, A. B.; York, 1975;p 424.
Morse, D. L.; Linz, A. Proc. Nut. Acad. Sci.U S A . 1976,72 (4), Sato, S.; White, J. M. Chem. Phys. Lett. 1980,72,83.
1518. Pichat, P.; Mozzanega, M.-N.; Disdier, J.; Herrmann, J.-M. Nouu.
(102)Duonghong, D.; Borgarello, E.; Gratzel, M. J . A m . Chem. SOC. J . Chim. 1982,11,559.
1981,103,4685. (a) Disdier, J.; Herrmann, J.-M.; Pichat, P. J . Chem. SOC.
(103)Kawai, T.; Sakata, T. J . Chem. Soc., Chem. Commun. 1980,694. Faraday Tran. 1 1983,79,651.(b) Jafiezic-Renault,N.; Pichat,
(104)Gonzalez-Elipe, A,; Munuera, G.; Soria, J. J . Chem. Soc., P.; Foissy, A,; Mercier, R. J . Phys. Chem. 1986,90,2733.
Faraday Trans. 1 1979,75,749. Sclafani, A.;Mozzanega, M.-N.; Pichat, P. J. Photochem. Pho-
(105)Anpo, M.; Shima, T.; Kubokawa, Y. Chem. Lett. 1986,1799. tobiol. A: Chem. 1991,59,181.
(106)Hieu, V. N.; Lichtman, D. Surf. Sci. 1981,103,535;J . Catal.
1982,73,329 and references therein. (a) Gopidas, K. R.; Bohorquez, M.; Kamat, P. V. J . Phys. Chem.
(107)Courbon, H.; Formenti, M. Pichat, P. J . Phys. Chem. 1977,81, 1990,94,6435.(b) Spanhel, L.; Weller, H.; Henglein, A. J . Am.
550. Chem. SOC.1987,109,6632.
(108)Bickley, R.I.; Stone, F. S. J . Catal. 1973,31,389.Bickley, R.I.; Gerischer, H.; Willig, F. Top. Curr. Chem. 1976,61,31.
Munuera, G.; Stone, F. S. J . Catal. 1973,31,398. Kamat, P. V.; Fox, M. A. Chem. Phys. Lett. 1983,102,379.
(109)Munuera, G.; Rives-Amau, V.; Saucedo, A. J . Chem. Soc., Patrick, B.; Kamat, P. V. J . Phys. Chem. 1992,96,1423.
Faraday Trans. 1 1979,75,736. Vlachopoulos, N.; Liska, P. Augustynski, J.; Gratzel, M. J . Am.
(110)Anpo, M; Kubokawa, Y.; Fujii, T.; Suzuki, S. J . Phys. Chem. Chem. SOC.1988,110,1216.
1984,88,2572. Desilvestro, J.;Gratzel, M.; Kavan, L.; Moser, J.; Augustynski,
(111) Shapira, Y.; Cox. S. M.; Lichtman, D. Surf. Sci. 1976,54,43. J. J . Am. Chem. Soc. 1986,107,2988.
(112)Bickley, R. I.; Jayanty, R. K. M.; Navio, J. A,; Real, C.; Macias, Kamat, P. V. J . Phys. Chem. 1989,93,859.
M. Surf. Sci. 1991,251/252,1052 and references therein.
(113)Inoue, I.; Fujishima, A.; Konishi, S.; Honda, K. Nature 1979, Gratzel, M.; Howe, R. F. J . Phys. Chem. 1990,94,2566.
277,637. Butler, E. C.; Davis, A. P. J . Photochem. Photobiol., A: Chem.
(114)Hirano, K.; Inoue, K.; Yatsu, T. J . Photochem. Photobiol. A: 1993,70,273.
Chem. 1992,64,255. Fujihira, M.; Satoh, Y.; Osa, T. Bull. Chem. SOC.Jpn. 1982,55,
(115)Tennakone, K Sol. Energy. Mater. 1984,10, 235.Rophael, W. 666.
M.; Malati, M. A. J . Chem. Soc., Chem. Commun. 1987,1418. Herrmann, J.-M.; Disdier, J.;Pichat, P. Chem. Phys. Lett. 1984,
(116)Ishitani, 0.; Inoue, C.; Suzuki, Y.; Ibusuki, T. J . Photochem. 108,618.
Photobiol. A: Chem. 1993,72,269.
(117)Draper, R. B.; Fox, M. A.Langmuir 1990,6,1396. CR940025E

You might also like