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Course Objectives: This course builds for knowledge of about the fabrication of BJT and MOSFET transistors. Fabrication steps to understand VLSI design
Process & Technology. This course builds a foundation for courses on VLSI design and analog CMOS IC Design to expose students to the complexities and
design methodologies of current and advanced IC design technologies for Post-graduation courses.
Prerequisites: NIL
Course Contents / Syllabus:
Module I 30% Weightage
Introduction to Monolithic Integrated circuit technology
Bipolar & MOS IC
CMOS fabrication, the p-well process, n-well process.
Silicon wafer preparation & characteristics
Thermal oxidation, Oxidation system
Photolithography
Module II 40% Weightage
Diffusion of dopants, Dopant profiles
Ion implantation
Epitaxy, Epitaxial growth of Si
Etching, Properties of etch processing.
Dielectric and Polysilicon Film Deposition, Deposition process
Future Trends
Module III 30% Weightage
MOS Structure, MOS system under external bias
Structure & operation of MOSFET, Enhancement mode & Depletion mode devices
I-V characteristics
MOSFET scaling
CMOS technology, BICMOS technology.
Pedagogy for Course Delivery:
The class will be taught using theory only. There is no lab related to this course as it is a open elective course. The instructor will cover all the steps of how an
IC is fabricated.
Student Learning Outcomes:
Describe the importance of integrated circuits and apply their applications in modern society
Describe the wafer fabrication process
Describe the structure and operation of MOSFETs
100% NA 100%
Text:
Basic VLSI Design ,D.A Pucknell & Eshraghain , PHI, ISBN: 9780130909961
Introduction to VLSI Design and technology by J. N. Roy & D. N. Bose ( New Age International ( P) Limited, ISBN: 9788122430646
VLSI technology, S. M. Sze ( E d.) ,M. Hill.1988, ISBN: 0070582912
VLSI Design techniques for Analog and Digital Circuits, Randall L. Geiger, Phillip E. Allen, Noel R Strader, McGraw-Hill Publishing
company, ISBN 0-07-023253-1