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Diss. ETHNo.

13526

Simulation of

single-electron

devices

A dissertation submitted to the

SWISS FEDERAL INSTITUTE OF TECHNOLOGY


ZURICH

for the

degree

ol

Ph. D.

presented by
ANDREAS SCHOLZE

Dipl. Phys., University


citizen of

of Jena

born June 14, 1969

Germany

accepted on the recommendation of Prof. Wolfgang Fichtner, examiner


Prof. Klaus Ensslin, co-examiner

2000

c
i.*
1

*u

U
\
\

11e

\
\
i

'v

Acknowledgements
T wish to thank Prof.

Wolfgang

Fichtner for his

guidance
and

and assistance

during

my years at TIS, and Prof. Klaus Ensslin for

reading

co-examining
the

this thesis.

Special

thanks goes to PD Andreas Schenk for

supervising

scientific aspects of this work.


Thanks to all members of the simulation group: Andreas Wettstein, Bern-

hard Schmithiisen. Bernd

Witzigman.

Andreas

Witzig,

Thomas Krner, Gtz


to

Leonhard, Christian Schuster, Fabian Butler and Frank Geelhaar. I wish


express my with

gratitude for the benefits that I have gained from conversations Michael Stopa (TU Munich), Massimo Macucci (University of Pisa) and
(WIAS Berlin). Furthermore,
for his
I wish to thank Thomas Heinzcl data and Diederick Fokkema

Klaus Grtner

(ETH Zrich) (1SE Inc.) for

help

with the

experimental

his support with numerical software.


to thank the technical staff of

Also, 1 would like

TIS for

providing excellent

working
to

conditions and all other

the excellent

atmosphere

that

people at the I enjoyed very


to

institute for their contribution

much.

I would like to express my


the

appreciation
at the

Prof. Karl Hess who gave

me

opportunity

to

spend

total of five months at the Beckman Institute of

Advanced Science and

Technology

University

of Illinois in Urbana-

Champaign.
This work has been Nano

supported by the Swiss Priority Program in System Technology (MINAST project 7.05 STMNAD).

Micro and

is

11:

in,:

IK

it a i

Contents

Preface

Preface

(German)

Introduction
1.1

Evolution of

single-electron

devices

1.2

Modern semiconductor device simulation

1.3
1.4 1.5

Single-electron Objectives
Eayout

device simulation

of this work and

general

remarks

Introduction to
2.1 2.2

single-electron tunneling

and Coulomb blockade

Introduction Orthodox
2.2.1
2.2.2

theory

of Coulomb blockade

The rules of the game

Single-electron box

2.2.3
2.3 2.4

Single-electron

transistor

Constant interaction model

Example

structures;

vertical quantum dots

vi

Contents

Theory
3.1
3.2
3.3

of

single-electron tunneling

in semiconductors

29

Introduction
Model definition
Master

29
30
32

equation approach
Master

3.3.1

equation
distributions and transition rates

32 33
35

3.3.2
3.3.3

Probability

Detailed-balance

equations

3.3.4
3.4

Stationary

current

36
37

linear-response regime
3.4.1 3.4.2 3.4.3

Linear-response
Limiting
cases

conductance

37 42

Amplitude

and

lineshape

44

Transport
4.1

coefficients

47

Introduction

47

4.2

Equilibrium
4.2.1 4.2.2 4.2.3
4.2.4

carrier densities bandstructure and

48

Energy

applied forces

48
51 54 55

Quasi-equilibrium approximation
Boundary
conditions and Fermi level

Low dimensional electron gases

4.3

Total free 4.3.1


4.3.2

energies

60
60
61

Equilibrium thermodynamics
Flelmholtz free energy and external forces

4.3.3

Helmholtz free energy and

charge quantization

....

63

Contents

vu

4.3.4 4.4

Free energy minimization


rates

65

Tunneling
4.4.1

66 66 69

Bardeen's transfer Haniiltonian method

4.4.2

Adiabatic

theory

for quantum dot systems

.......

Numerics 5.1
5.2 Introduction

73

73
74 74

Space
5.2.1

discretization
Finite differences

5.2.2 5.3
Linear 5.3.1

Discretization of

V-(-7 V)
eigenvalue problems

76
77
77

equation solving
Linear Poisson S chrdinger

and

equation

5.3.2 5.4

equation

79
80

Nonlinear 5.4.1
5.4.2 5.4.3

equation solving

Introduction

80
method

Newton-Raphson BroydeiTs

81 82

method

5.4.4

Globally converging
algorithms

Newton schemes

85

5.5

Self-consistent
5.5.1

87

Predictor-corrector

approach
SIMNAD

87

5.5.2
5.5.3

Algorithm implementation in
Examples

89
92

Simulation

examples

95

6.1

GaAs/AlGaAs heterostructure

95

Vlll

Contents

6.2

Device simulation 6.2.1 6.2.2 6.2.3

98
and

Geometry modeling
Surface and donors Simulation results

grid

98 100 102
115

6.3

Comparison

with measurements

Achievements, failures and prospects

119

Thermodynamic properties

of localized systems

123

Transition rates
B.l

129
129
132

Time-dependent perturbation theory


Effective transition rates

B.2

Density-functional theory
C.l
C.2

135

ilohenberg-Kohn
Kohn-Sham

theorem

136
137

equation

C.3

Local-density approximation

139

Bibliography

141

Curriculum Vitae

149

Preface
repulsion of additional electrons from tiny metallic semiconducting islands (Coulomb blockade) in conjunction with correlated
of
Devices

utilizing

the

or

single electrons from externally controlled reservoirs are called single-electron devices. In contrast to conventional field-effect transistors where switching is accomplished by electrostatically opening a channel and allowing for a macroscopic current to flow, the switching in single-electron transistors (SETs) is based on adding or removing a single electron from a
tunneling
quantum dot, which is the analogue
devices represent the ultimate
to the channel.

As

such, single-electron

physical

limit of miniaturization in electronics

which is

thought

to

be reached within the next decades.

This work is concerned with the numerical devices. The main focus is
on

modeling

of

single-electron
such
as

the simulation of the local

quantities

the

carrier densities and the electrostatic of

potential

and the terminal characteristics

single-electron
After

transistors. introduction into the

giving
of
a

an

by

means

of the so-called orthodox

physics of single-electron devices theory, the physical models used for the
are

description

SET driven in linear response


a

derived.

The distribution

functions and the transition rates for


drain and the
ter
source

quantum dot in equilibrium with the

reservoir and the linearization of the

corresponding

mas

equation

is discussed in detail. The evaluation of the

resulting equation

for

the

linear-response conductance requires the calculation of the self-consistent many-body groundstate of a system of quantized electrons within the frame
work of

density-functional theory
evaluated
on

as

well

as

the calculation of the

tunneling
of
a

rates which are

the basis of Bardeen's transfer-Hamiltonian for

malism.

Finally,
are

the numerical methods used for the

implementation

simulation software,

especially

devised for the simulation of


are

single-electron
for the

transistors,

discussed.

Nonlinear solvers

of

key importance

proposed simulation approach, and therefore, much space is devoted to the quasi-Newton methods employed to solve the nonlinear Schrdinger/Poisson equation
which results from carrier confinement in semiconductor quantum

IX

Preface

dots, -wires, and -wells.

An introduction into methods for


at

solving

and

eigenvalue problems

finite-difference

grids

is

linear-equation given. singleus

Besides the focus of this work

on

basic models and methods for


was

electron device simulation, the simulator

employed

in

comprehensive
modeled

study

of

GaAs/AlGaAs heterostructure SET. The device

was

ing

the realistic

layer

structure and

the exact lateral gate geometry

assuming
which
are

various levels of
tum dot.

quantization
some

in the leads, the

tunneling

barriers and the quan

Despite

assumed to be due to

an

discrepancies with the experimental data oversimplified model for narrow split-gate

structures,

the main features in the Coulomb-blockade characteristics could be


on

explained

the basis of the self-consistent calculations. In addition to the conductance


a

results,

discussion of the

capacitances

of

preprocessed data from the simulation meaningful definition of a quantum dot self-capacitance

given on the basis output. Especially, the problem of a


was

of the system is

studied in

more

detail.

provides a physically sound and numerically stable framework for further investigations of single-electron transistors. The software implementation, for which the preliminary name SIMNAD (Simulation and Modeling of Nanodevices) is used, allows for the simulation of a variety of structures including GaAs/AlGaAs heterostructures and silicon SETs. However, for increased predictive capabilities more inves tigations into various problems including the treatment of narrow split-gate proposed
structures on

This work shows that the

method

active surfaces

or

the role of discrete

doping centers,

for instance,

is

certainly mandatory.

Einleitung
Bauelemente, die auf der Abstossung
lischen oder halbierenden Inseln
reliertem Tunneln einzelner Elektronen

winzigen metal (Coulomb-Blockade) in Verbindung mit kor


von

Elektronen

von

von extern

kontrollierten Reservoiren

basieren, werden F^inzelelektronen-Bauelemente genannt. In herkmmlichen


Feldeffekt-Transistorcn fliesst ein

makroskopischer
von
nur

Strom durch das

ffnen

eines Kanals. Im Unterschied dazu wird in Einzelelektronen-Bauelementen

ein Strom durch die

Bewegung

einem Elektron zwischen einem

Quanten-Punkt,
in der nach wie

dem

Analogon
rasant

zum

Kanal, und der

Umgebung erzeugt.

Daher

stellen Einzelelektronen-Bauelemente einen


vor

physikalisch bedingten Endpunkt

fortschreitenden

Miniaturisierung

der Elektronik
er

dar. Dieser Punkt wird wahrscheinlich innerhalb der nchsten Jahrzehnte


reicht werden.

Diese Arbeit

beschftigt

sich mit der numerischen

Modellierung

von

Einzelelektronen-Bauelementen. Dabei

liegt der Schwerpunkt auf der Simula tion sowohl lokaler Grssen wie der Ladungsdichten und des elektrostatischen Potentials, als auch der Berechnung der Kennlinien von EinzelelektronenTransistoren.

Nach

einer kurzen auf der

Einfhrung
Basis der Modelle

in

die

Physik
die

von

Einzelelektronenwer

Bauelementen
den

sogenannten orthodoxen Theorie

Besehreibung von Einzelelektronen-Transistoren verwendet werden. Die Verteilungsfunktionen und die bergangsraten fr einen Quanten-Punkt im Gleichgewicht mit dem Drain- und dem Source-Reservoir und die Linearisierung der entspre
zur

die

physikalischen

abgeleitet,

chenden Mastcr-Gleichime werden ausfhrlich diskutiert. Die

Linearisierung

der

Master-Gleichung

fhrt auf die

Leitfhigkeit
der

im Rahmen der Linearen-

Antwort-Theorie. Fr die

der selbstkonsistente
ter

entsprechenden Gleichung werden Mehrteilchen-Grundzustand fr ein System quantisierder Transfer-Hamiltonian-Methode nach Bardeen be

Auswertung

Elektronen auf der Basis der Dichtefunktional-Theorie und die Tunnelra

ten unter

Verwendung

rechnet. Schliesslich werden die numerischen Methoden diskutiert, die bei

xi

Xll

Einleitung

der

Implementierung

eines

Programms

zur

Simulation

von

Einzelelektronenvon

Transistoren verwendet wurden. Da die nichtlinearen

Gleichungslser

herausragender Bedeutung fr den gewhlten Simulationsansatz sind, wer den Quasi-Newton-Methoden sehr ausfhrlich behandelt, die bei der Lsung
der nichtlinearen

Schrdinger/Poisson-Gleichung

fr

Ladungstrger

in ein
zur
nu

sperrenden Potentialen verwendet werden. Eine Einfhrung in Methoden Diskretisierung von linearen Operatoren mit Finiten-Differenzen und der
merischen

Behandlung linearer Gleichungssysteme beziehungsweise genwertproblemen ist gegeben.


Der und

von

Ei

Schwerpunkt
fr

dieser Arbeit
die

liegt

auf der

Entwicklung
auf
einen

von

Modellen

Methoden
daraus

Simulation

von

Einzelelektronen-Bauelementen. GaAs/AlGaAs wird auf der

Der

resultierende

Simulator

wird Das

Eiuzelelektronen-Transistor

angewendet.
von

Bauelement

Basis

der realistischen Schichtstruktur und der

exakten

Ga/<?-Geometrie

modelliert, wobei verschiedene Arten

einsperrenden Potentialen sowohl fr Quanten-Punkte, -Drhte und -Trge bercksichtigt werden. Trotz einiger Abweichungen zu den experimentellen Daten, die vermutlich mit den stark vereinfachten Annahmen zusammenhngen, die bei der Behandlung der eng beieinander liegenden split-gates gemacht wurden, knnen die wichtigsten Besonderheiten in der Coulomb-Blockade-Kennlinie auf der
Basis der selbstkonsistenten

Rechnungen

erklrt werden. Zustzlich

zu

den

Leitfhigkeits-Kennlinien werden
eine

die verschiedenen

Kapazitten

an

Hand der

simulierten Daten diskutiert. Insbesondere wird das Problem untersucht, wie

Quanten-Punkt-Selbstkapazitt sinnvoll
zeigt,
dass die

definiert werden kann.


Methode einen

Diese Arbeit

vorgeschlagene

physikalisch

zuknftige Untersuchungen an Einzelelektronen-Transistoren bietet. Die Implementierung, fr die der vorlufige Name SIMNAD (Simulation and Modeling of Nanodevices) ver
wendet

korrekten und numerisch stabilen Rahmen fr

wird, erlaubt die Simulation einer Vielzahl


von

von

Strukturen, einsch
Daten

liesslich

GaAs/AlGaAs Heterostrukturen und Silizium Einzelelektronen-

Transistoren. Um eine bessere


zu

berein Stimmung

nt

experimentellen
zu

erreichen, mssen allerdings weitere Untersuchungen


zum

verschiedenen

Problemen, wie

Beispiel

der

Behandlung

eng beieinander

liegender

Kon

takte auf aktiven Oberflchen oder der Rolle diskreter Dotierzentren, vorge
nommen

werden.

Chapter
Estupor

1
cose non conte.

in'ercm le
was

My

mind

stunned

by

what it did

not

know.

Dantia.

^Purgatorio,

XVvx

Introduction
1.1 Evolution of

single-electron
by

devices

Since the invention of the transistor

John Bardeen and William


to

Shockley

in

1948 constant miniaturization has lead


the LOO
tint

devices with dimensions well below

limit.
soon

Originally designed

to

simply
more

emulate the

vacuum

tube,

the transistor

potential for speed, power consumption and reliability. In its most widespread configuration as metaloxide-semiconductor field-effect transistor (MOSFET) these potentials were proved
to

provide

lot

fully exploited

and initialized what

we now

call the

information something

age.

The relentless quest for device miniaturization is with semiconductor


This search is

that has been

technology since its early evolution starting in the 1950s. driven by a few facts which became obvious at the latest when

the first steps towards

integrated
a

circuits where made in the late 1950s.

First,

the reduced volume of

miniaturized transistor allows for lower power dis lower

sipation. Second,
nects

the

consequently

capacitances

and shorter intercon

lead to faster systems.

ever-increasing chip sizes. taining 100 million transistors


three years.

Finally, relative costs drop with more devices on According to the latest "Toad-map" [1 ], chips con
will start to reach the markets within the next

The end of the millennium

sees

the silicon-based semiconductor

industry

Chapter

1.

Introduction

well at the

height

of its evolution with

even

further transistor miniaturization

ahead. But nevertheless, the


are

scaling
to be

limits for the classical MOSFET structure

already beginning

to

show. Transistors with channel

lengths

of

few tens
car

of

nanometers are

predicted

governed by

the

quantized nature
new

of the

riers. Besides the efforts to

overcome

the limitations intrinsic to the classical

MOSFET structure, there is


not

an

intense search for

device

principles

that

only

allow for the

scaling

limits to be

pushed

even

further but make

use

of

the

quantized

nature of the

charge

carriers evident in small structures.

Since the 1980s,


ory have lead to
a

developments
new

in both semiconductor
field of research

technology

and the

completely

operation

is based

potential
of the

barriers.

focusing on devices whose on the discrete nature of electrons tunneling through thin These devices which exhibit charging effects including
are

Coulomb blockade

referred to

as

single-electron
breathtaking.

devices.

The

potential

single-electron concept
to

is rather
one

In

principle,

it should be

possible

operate in the limit of


Semiconductor

transferred carrier per bit, the ultimate


enormous

limit of semiconductor based


overcome.

logic. However,
for

obstacles have to be

technology
of very

repioducible manufacturing
rate

single-electron devices requires the small conducting islands and their accu

positioning with respect to external electrodes. Tt was not before the mid 1980s that especially lithography technology reached the deep sub-micron range making structuring in the 100 nm range possible. In the mean time,

single-electronics
tures is

has matured and

variety

of concepts and device architec

available. A

typical

device structure is shown in


on

Fig.

1.1. As

are

most

structures in the

field, this device is based

the

TII/V-compomid

material

GaAs

AlGaAs

1 m

Figure

1.1: GaAs/AlGaAs heterostructure quantum dot. The metal gates

are

structured

using electron beam lithography (Stanford University).

1.1. Evolution of

single-electron devices

system GaAs/AlGaAs which has the advantage of providing


a

very clean in

terface, therefore being especially suitable for heterostructure devices. For

long

time, semiconductor heterostructures have been used to achieve two-

dimensional electron gases

(2DEGs)

in HEMTs

(high-electron-mobility
are

tran

sistor). Heterostructure single-electron


ever,

transistors

related to HEMTs, how

with the difference that the 2DEG is


at

patterned by

electrostatic contacts
a

(Schottky contacts)
island, the
regions
so

the top of the device in order to create

small

charged

called quantum dot which is

separated from the

source

and drain

by

tunnel barriers. The electron gas in the quantum dot is

essentially

zero-dimensional
the term

(ODEG) exhibiting properties


atoms

similar to atoms. This led to

artificial

for this kind of structure


were

[2]. GaAs/AlGaAs single-

electron transistor

(SET) prototypes
Therefore,

build

as

early
across

as

1987.

These de

vices had islands several hundreds of nanometers

because of techno

logical

limitations.

they
can

had to be cooled to temperatures below

I K to make observation of

single-electron charging only


be

effects
at

possible.

Devices,

however, whose functionality


atures are somewhat

guaianteed

cryostatic temper

impractical for real-world applications. Consequently, one of the major driving forces behind the development of single-electron de vices was the quest for room temperature operation which requires the island
sizes to be in the sub-100
nm

range.
transistors were realized in silicon.

Just

recently,

the first

single-electron

Silicon is the basic material of modern semiconductor

technology,
20

and there-

nm-/ A*-

Figure

1.2:

Single-electron Right:

transistor m

the device

structure.

SEM

technology. Left: Schematic of micro-graph of the channel after oxidation


SOI

(Princeton Universit\).

Chapter

1.

Introduction

application of the single-electron concept for memory- and switching devices. Figure 1.2 shows one of the most prominent structures processed in silicon-on-insulator
fore, provides
one

of the most

promising paths

towards industrial

(SOI) technology.
is

The central island is formed

by

10

nm

silicon

grain

which

reduced to its final size

by

oxidation. The

size

of the island allows the ob

servation

of the Coulomb blockade of conductance at in


as

general higher

tem

peratures

in GaAs/AlGaAs structures

L3).
a

single-electron transistor memory device f4J with a self-aligned quantum-dot floating gate (Fig. 1.3 left). Due to the self-alignment, the floating gate is accurately posi tioned above the channel wire. If additional charges tunnel from the channel
A similar

technology

was

used for the fabrication of

Si

onto

the floating sate, the threshold voltase shifts and

memory effect simiwas

lar to classical
even

floating gate
room

transistors

is

observed. This device concept


a

able to exhibit

temperature operation which is

prerequisite

for

application [4],[5]. Figure 1.3 (right) shows a side view of a similar structure [6]. Other concepts pursued comprise multiple nano-crystals coupled to the channel of a conventional MOSFET [7] which is especially interesting, since it could minimize offset charge effects.
further industrial

single-electron concept is by no means clear. Several problems are not solved yet. The major flaws of single-electron technology are
The future of the

300

nm

Oxide

Figure 1.3: SEM micro-graphs of quantum dot flash memory devices. Left: Self-aligned floating gate on a narrow channel FET (Fujitsu). Right: View of a quantum dot flash memory device along the channel (IBM).

1.2.

Modem semiconductor device simulation

the

sensitivity

to

random

capacitance
parameters.
How

to raise

background charges, the necessity for lower junction operation temperatures, and the sensitivity to fabrication

exactly

SET devices

can

be used

as

building

blocks for further


several

logic

circuits is yet another unsolved


have been

problem.

Even

though

logic

schemes

proposed, none is presently threatening to oust the semiconduc tor standard CMOS (complementary metal-oxide-semiconductor) technology. Some of the schemes, however, are similar to CMOS technology where bits are represented by voltage levels. Nevertheless, it remains unclear whether these devices have significant gain. Other concepts are based on a bit rep resentation by charges. An intriguing, but as-yet-unrealized proposal in this direction is the quantum-cellular automata (QCA) concept [8]. Mesoscopic cells of quantum dots can be polarized, and since the polarization of a cell can effect that of a nearby cell, a polarization signal can be propagated along a chain of cells. Together with principle problems regarding the read-in or read-out of polarization states and the stability of the states it is not clear that there will be any speed or density advantage and low temperatures seem to be mandatory.
It is clear that silicon MOSFETs have their limits. When these limits will

be reached is not

so

obvious.

The demise of silicon

technology

has been

predicted (and postponed)


semiconductor

many times in the last decades. At the

same

time,

companies have grown increasingly reluctant to work on new technologies whose potential might be exploitable in a far future. In any case, miniaturization will remain an important aspect of VLSI circuits and singleelectron related effects will almost certainly plague, and perhaps, eventually
revolutionize the semiconductor

industry

in the next decades.

1.2

Modern semiconductor device simulation

From the

very

JO

besinnins of semiconductor technolosy it O


OJ

was

thought that
O

im-

merical,

physics-based analysis of devices could help a great deal in their un derstanding. Nowadays, simulation and modeling of semiconductor devices
one

both at the process and the de\ice level has become

important development methodologies industry eventually has developed into an ever-growing industry itself. Complete TCAD (tcchnology-computer-aideddesign) suites, that include process-simulation- and device-simulation tools
in and

of the most

connected to advanced

meshing-

and

optimization

software

are

readily

avail-

Chapter

1.

Introduction

able from many different vendors.

today are essentially partialdifferential equation (PDE) solvers, that are specialized to solve a particular system of PDEs relevant to semiconductor modeling. These so-called semi conductor (device-) equations describe the static and dynamic behavior of car
All of the device simulation tools available

riers in semiconductors under the influence of external fields that


ations from the thermal

cause

devi
as

equilibrium [91.

The system of

equations

known

drift-diffusion equations

consist of the Poisson

equation
+

V-(eV</>)
the

-</Q>-/i
and holes

C),

(1.1)

continuity equations for electrons


_,

on

-qRn
=

V7T

VJP

i +

9P

(Ifff

qBp

and the

current-density equations for


J
=

electrons and holes

qp,nnV

ql)nVn

Jp
where

qfippV

qDpVp.

<f is the electrostatic potential, n and p are the electron- and hole den sities, respectively, G is the total density of ionized donors, J and Jp are the current densities and Rn and Rp can be understood as functions describing generation and recombination of carriers. The material dependent parameters are the permitivity (. the mobilities // and up, and the cam er diffusion con stants Dn and Dp. Numerical solutions of this system of equations, maybe extended by the energy balance equations with the electron and hole temper ature as variables (hydrodynamic model), is the main goal of classical device
simulation.
The drift-diffusion

the flow of

equations are macroscopic equations which describe charged particles using appropriate models for their macroscopic important physical
are

physical

behavior. The most

models
on a

are

for the densities

of states of electrons and holes which

based

bandstructurc model,
rates

the carrier mobilities // and //p, and the and

generation/recombination
are

7?n

Rp.

The semi-classical models for the densities of states of electrons and


based
on

holes

are

the

assumption
an

that the carriers


mass

freely moving particles


Fermi-Dirac statistics.

in

parabolic

bands with

effective

//?*

obeying

1.2. Modem semiconductor device simulation

This

simple assumption, however,

is not sufficient for carriers in


are

narrow

MOS
lower

FET channels for instance. The local carrier densities than the

significantly

riers, i.

classically predicted ones. Needed is a quantum treatment of the car e. the solution of a (usually one-dimensional) Schrdinger equation
quantum effects is still
a

conceptually and numerically dif ficult problem due to the nonlocal relationship between the potential and the quantum mechanically calculated charge density [llj.
[10].
Inclusion of

generation/recombination rates Rn and Rp should be calculated on the basis of physical models. In most cases this is a difficult issue and the agreement of the microscopic model with the experimental data is sometimes rather poor. Common is the application of simple analytical functions containing various adjustable parameters which guarantee the required fit and cause no numerical problems. However, the drawback is obvious. Since a multitude of parameters with no apparent physi cal meaning is available for tuning the functions, almost everything can be cal culated and almost no certainty about the validity of the results can be given. Therefore, the development of advanced physical models for the parameters in the device equations is a mayor quest for nowadays device simulation [12].
A last

The carrier mobilities // and pp and the

point

should be made.

Much of the

success

of device simulation

is due to the

underlying

process simulation.

Process simulation is the first


a

step in modern device modeling. The particular steps in the fabrication of


semiconductor device

deposition, etch ing and implantation of dopands are simulated. The result is a representation of the geometry and a doping (-density) profile which is subsequently used to automatically generate a simulation mesh by means of a mesh-generation software. Process simulation is in particularly demanding since problems as
as

(the semiconductor process) such

moving

boundaries

are

difficult to handle, and instabilities of the simulation


are

due to the mesh

quality

still

rather

common a

mesh has to be

generated manually using


is that
a

problem. Alternatively, the mesh-editor. The disadvantage of


are

this

procedure by

complicated
over

three-dimensional meshes

hard to gen

erate

hand and

control

the mesh

quality

is difficult to achieve.

Also,

manual mesh

generation

makes

within the scope of TCAD

complex optimization geometries experiments (DoE, design-of-experiments) almost

of device

impossible.

Chapter

1.

Introduction

1.3

Single-electron device
equations

simulation

The drift-diffusion

described in the

propriate

mathematical model for

previous section provide no ap single-electron devices. Flere, the transport


tunneling
electrons. If the trans

is dominated

by

the

quantized
an

nature of the

port description for


mechanical

electronic device

requires

the inclusion of quantum-

properties of the carriers, the choice is between two models (Fig. 1.4). Dynamic models on one hand are based on equations of motion for Green's functions or for quantum-phase-space distributions such as Wigner functions. Kinetic models on the other hand use time-independent representa tions of the quantum-mechanical states solving kinetic- or rate-equations.
Transport
stochastic in

arbitrary single-electron
sources

circuits

consisting by
a

of tunnel

junc

tions, capacitors, and voltage

is described

rate

equation for the

probability

distribution

P(AI)
-

^P(K)
at

V [P(M)W(M. K) /-/
My-K

P(K)W(K, M)],

(1.2)

where

YIk P{K)

=:

1 md

W(AL K)

is the rate for the transition from state


a

M to state K

[20]. The

state

variable is the electron number. For


to

given
to

state

of the system the transition rates have

be calculated solution of

according
Eq. (1.2)

system

parameters.

An iterative method based


a

on

for circuits

containing
cially

up to

few tens of islands is based


on a

was

introduced

by

Fonseca et. al.

[14].

An alternative

approach

Monte-Carlo method

[13]. A

commer

available program that combines the master

equation approach
[15].

with the

Monte-Carlo

approach

is SIMON from TU Vienna

All these methods


which treats islands

use

the results of the

phenomenological orthodox theory purely capacitively coupled


given
in

single-electron
or

transitions between

(metallic grains)
(an

its extension towards confined levels, the constant-

interaction model

account

of these models is

Chapter 2).

The

possibility to evaluate complex circuits con taining a multitude of islands and tunneling junctions. Even cotunneling can be included in the calculations. The method is only slowed by the effort that is invested in calculating the transition rates and the probability distributions. Most of the time, analytical capacitance results are used which retain the sim plicity needed for the numerical evaluation. The accuracy strongly depends on the physical models which are used to calculate the capacitances and the tunneling rates.

advantage

of these methods is the

1.3.

Single-electron

device simulation

Device

Modelling

Quantum

Transport

Formalism

?
?
Dynamic
Models

'"1
Kinetic Models

(Coherent Models) Density Matrix Wigner Function


Green's Function
E nvelope Function

Geometry
Structural Parameters "\

\
-*.

/
^
,.

Device

Operating

Numerical
Device

Conditions

A
Material Parameters
,-

jit

Models

Band Structure

Auxiliary Equations

T
Device Terminal

Properties

Figure

1.4:

Classification of methods for

numerical simulations

of quantum

transport in electronic devices.

For semiconductor structures the above mentioned methods


curate

are

not
a

ac

enough, especially

if

discrete energy spectrum is present at

small

island

(then often referred


are

to as

quantum dot).

A self-consistent
on

tion of the confinement

potential

is needed and methods based

descrip densityby

functional theory (DFT)

used. The

screening

of the carriers is treated

solving

an

nonlinear

(Schrdinger-)
a

Poisson

try. This method allows for


the calculation of the exact

detailed

equation for a analysis of single-electron charging


peak heights

realistic geome and

shapes

and

of the Coulomb-blockade

peaks [41].
A drawback of the self-consistent models is the numerical effort.

Such

calculations
As such

extremely costly, especially if employed for they arc mostly limited to a single solid state device,
are
an

3D i.

geometries.

e. to a

single-

analytical solution of the transport equation, Eq. (1.2), in the linear-response regime with respect to the junction voltage exists [26]. However, the hope is that device simulations can help to extract parameters such as the capacitances for the analysis of more complex circuits using
stochastic methods. This is the classical

electron transistor for which

path

in modern semiconductor

10

Chapter

1.

Introduction

device simulation. The first step is the actual device simulation

using

self-

consistent solid-state simulator. Then, in

second step,
a

parameterized model
a

(SPICE-model
more

for instance) is extracted and used in

circuit simulation for

complex

circuit environment.

1.4

Objectives
outlay
and the numerical

This work is concerned with the theoretical

imple mentation of a simulation software, designed to simulate single-electron tran sistors. The developed physical models and numerical algorithms, however, are in principle applicable in the much wider context of nanodevice modeling
and simulation. Two main

objectives

had to be reached.

First, concepts from


that describe the
a

conven
so

tional TCAD had to be advanced towards the nano-scale range,


lutions for the full quantum mechanical of electron transport in

including

equations

of electrons in quantum dots and quantum wires. Second,


nano

sound

properties description particles

structures,

including

the

tunneling

of

through arbitrarily shaped potential barriers, separating the macroscopic regions of the device had to be developed.
The

the quantum dot from

approach

chosen is based

on a

self-consistent

densities and the

potential landscape
conjunction

in

analysis of the charge (almost) arbitrarily shaped semicon


one-

ductor structures. Zero-dimensional confinement in semiconductor quantum


dots
can

be simulated in

with

and two-dimensional confine

ment in

quantum wells and quantum wires.


transistors

This framework is

applied

to

single-electron
els for the

by simulating

the quantum dot

using

various mod

charge density

of zero-dimensional electron gases. The


are

charge
the

den

sity

models for quantum wires- and quantum wells

applied

to

source

Using the results from the self-consistent structure cal culation, the tunneling rates through electrostatically formed barriers are com puted. With the Helmholtz free energy which is calculated from the potential and the charge distribution in the device, the linear-response conductance is computed.
All these concepts had to be

and the drain reservoir.

implemented
even

in

both advanced and

nu

merically
chanical

stable simulation software. State-of-the-art


had
to

algorithms

for nonlinear
me

equation solving

be

pushed

further to include the quantum


a

equations

necessary to describe

single-electron

device. The valid-

1.5.

Layout

of this work and

general

remarks

11

ity

of the simulation

approach

is

proved by simulating example performed.

devices.

GaAs/AlGaAs SET has been modeled and first calculations of the electronic
structure
are

and the conductance characteristic have been


with

The results

compared
Finally,

experimental findings.
was

the software
use

embedded in the TCAD suite of ISE AG Zrich.

This enclosed the

of the ISE data structures in order to utilize the

meshing

and visualization tools part of the ISE TCAD suite.

1.5

Layout

of this work and

general

remarks

This work has been duction to

organized in the following manner: In Chapter 2 an intro single-electron tunneling based on the orthodox theory for metallic
given.
on

grains

with extensions towards finite temperatures and confined states in semi

conductor structures is

single-electron tunneling in semi conductors. Based on a linearized master equation approach, a formula for the linear-response conductance of single-electron transistors is derived and limiting cases are discussed. Chapter
3 concentrates
the

theory

of

Chapter

4 is devoted to the discussion of the two main transport coeffi

cients that enter the transport

equation

derived in the antecedent

chapter.

The

first coefficient is the Helmholtz free energy which is used to evaluate the Gibbs distribution for the quantum dot

occupations.

The second is the tun

neling

rate

for

single-barrier tunneling,
formalism.
account

which is calculated

using Bardeen's

trans fer-Hamiltonian

Chapter

gives

an

of the numerical methods used. Both lineara

and nonlinear solvers

are

needed for the solution of

nonlinear

Schrdinger-

Poisson-type equation in a discretized form. The main focus lies on globally converging Ncwton-Raphson methods that are used to solve the nonlinear sys
tems

of

equations

involved.

Chapter 6 discusses the functioning of the self-consistent simulation proach at a particular example, a GaAs/AlGaAs heterostructure SET.
In

ap

Appendix A,
an

the Gibbs distribution for localized systems under the in


The

fluence of
rates in

equations for the transition single-electron tunneling employing time-dependent perturbation theexternal reservoir is derived.

12

Chapter

1.

Introduction

ory

are

derived in

dations of

Appendix B. Appendix C gives an overview over the foun density-functional theory and the local-density approximation.
some

Finally,
is used

remarks have to be made: The SI


the work. However,
one

(MKSA) system

of units
are

throughout
cm-3
nm

exception

is made. Densities

given

in

in order not to deviate too much from well established

common

usage and

is the distance unit. For all constants such


or

as

the Boltzmann

con

stant, Planck constant

any other constant all units

are

converted to MKS A

units, i.

e.

cm,

nm > m.

Chapter
Qui

2
ogni sospetlo;
morta.

si convien lasciure

ogni villa convien che qui si a


let all your cowardice die

Now here you must leave all distrust behind


on

this spot.

Dante,

> Inferno.

111^.

Introduction to

single-electron tunneling and


C oulomb blockade
2.1 Introduction

The evolution of
to the

consistent

theory for sinsle-electron tunneling

goes

back

early 1950s. An unusual dependence of the resistance of thin metal films was explained by Goiter as due to the charging of small metallic grains [16]. Transferring electrons through the barriers between the grains would

result in

charging

of the

the electrostatic energy

neighboring grains, by

and therefore, in

an

increase of

i?c-^where C is the effective

(2.1) EG
became later known

capacitance

of the island.

as

the Coulomb

charging

energy. This energy suppresses electron transfer unless

13

14

Chapter

2. Introduction to

single-electron tunneling

...

it is

overcome

by

either thermal excitations at

temperature T, i.

e.

T0

-r^-

Be

(2.2)

or

by

an

externally applied voltage

V. i.

e.

Er

suppression of electron transport a new term was coined: Coulomb blockade (CB) of tunneling. Independently from Goiter, this effect was ob Yet another effect, served and explained by Neugebauer and Webb [17]. Coulomb exclusion became known in the late 1960s through the work of GiIf the voltage V is less aever and Zeller [18] and Lambe and Jaklevic [19]. then the threshold voltage Vt. the system is in the Coulomb blockade state. With the voltage V exceeding V\, Eq. (2.3), an electron tunnels through the barrier into the grain. However, because of the Coulomb repulsion it can not be followed by another electron unless the externally applied voltage V is in creased even further by AC e/'C. This can readily be seen by looking at the electrostatic energy of such a grain

For this

with the discrete


T <

charge Q

Ne and the

externally applied voltage V.


known
as

At
and

To
is

the electron number is


a

given

at the minimum electrostatic energy

N(V)

staircase-like function

commonly

the Coulomb staircase.

At temperatures of order of
corners

Tq

the staircase which otherwise exhibits


above

sharp

is washed out,

totally vanishing

Tq.
was

The first and

quantitative theory Shekhter in 1975 [20]. They


as a

for two barrier systems


used
an

equation

similar to

given by Kulik Eq. (2.4), treating

equilibrium Haniiltonian. A master equation for the time evolution of probabilities P(X) which contains all relevant infor mation of the system behavior was derived. This approach is the basis of the so called orthodox theory of single-electron tunneling. The theory of correlated tunneling as is used now was eventually developed by Averin and Likharev [21] in the mid-1980s and almost immediately supported by experiments on single-electron transistors [22]. In the early 1990s the orthodox theory was generalized towards the inclusion of effects of both charge and energy conser vation in semiconductor structures. Based on the pioneering papers of Meir et al. [23], Averin et al. [24] and Beenakker [26] a consistent theory that ex plains the principle features in the characteristics of single-electron tunneling
tunneling perturbation

to the

2.2.

Orthodox

theory of Coulomb

blockade

15

amplitude and lineshape is now well established. Throughout the 1990s this theory was used in many papers on Coulomb blockade devices (see for instance [27]). It proved to be extremely successful in combination with a self-consistent evaluation of the single-particle levels and the total ground state energy of the electrons based on density-functional theory (DPT) (see for instance [45]). Experimen tal findings related to the single-particle level structure such as shell filling effects have been evaluated and at least qualitatively been explained on a selfas

devices such

the width of the conductance

peaks,

their

consistent basis

[28].

2.2

Orthodox

theory of Coulomb

blockade

2.2.1

The rules of the game

theory

island

single-electron tunneling has as its subject the charging of a small (grain, quantum dot etc.). The orthodox theory focuses on the charging
of

of metallic islands with diameters d > 100


island is

given by

the

equation
limit

for

capacitance of 2ixeQtd conducting sphere C


nm.

The

such and

an

can

be estimated to be > 5 aF. The resistance of the

tunneling

barrier

Rt has

to be

above the

quasi-classical
Rf

>

i?Q

/,7r/2f2

6.4 kO,

(2.5)

where
the

i?q

is the resistance quantum.


rate V
=

This bias
is

can

be understood

considering
time The term
not the

tunneling

rfcR\

at some

voltage
r
=

V.
l
--

The

tunneling

between two

subsequent tunneling tunneling

events

eRt/V.
rt

tunneling
10"15
s.

time refers to the characteristic time of


event

junction relaxation,
=

duration of the actual


The
to

itself, which is of order of

F"1

according single
an

uncertainty principle states the duration of the tunneling event r^eV > h. Hence. Eq. (2.5) means that rt < r, e. i. tunneling

events are well

separated

in time and

one

speaks

of

sequential tunneling

of

electrons.

Essentially,

this condition

ensures

that the wavefunction of

island electron is well localized there.

resistance

Rt is small compared
occurs

to

single-electron charging

and

tunneling the scale provided by Rq suppression of delocalized states are available for charge
In systems where the

transport1.
'Eq. (2.5)
parency
ensures

localization of electrons

at

the

effectively

suppress the localization and make

conducting island. Barriers with high trans single-electron manipulation possible.

16

Chapter
-15

2.

Introduction to

single-electron tunneling

0.08
SET

operation
6.4

(R>

k)
0)

jT
<0
o

10

16

i\
i

101

0.80
D

\
10
17

1 TH/

cd

\10THz

\100I ll/ \
10
18

Room temperature (300 K)

102

8.00
S-H

\
L0C
101
Resistance

\
HY

LO3

80.0

102

(kO)

Figure

of the parameters for single-electron tunneling parameter r_1 ized by the tunneling frequencies f (i?t-C)~L. Room tempera ture operation is only possible in the lower right-hand side field between the
2.1: Plot

dashed lines.

As

already stated,
be
seen

the

temperature

must

be small

energy exceeds the energy of thermal excitations. it


can

enough that the charging From Eq. (2.1) and Eq. (2.2)
is present for

readily

that the Coulomb blockade

regime

kuT <C

2(7
the temperature
or

(2.6)

litis condition

can

be fulfilled either

by lowering
a

by

de
ex

creasing

the

capacitance

which
at

means

to reduce the island size.

Usually,

periments

are

performed
a

temperatures of

few mK and for structures with

island sizes of

Figure 2.1 shows a plot of the criti cal parameters for single-electron tunneling. For room temperature operation capacitances in the aF-range and island sizes in the sub 100 nm range (sil
few hundred nanometers.
icon:

d < 5 nm)

are

required.

These limitations hindered

experiments
at

and

detailed evaluation of the orthodox


a

theory especially

in semiconductors for

long

time.

Nowadays,
to structure

with advanced nanofabiication

techniques
are

hand

it is
This

possible
is m

islands of known geometry which

separated by

"quantum-electionic devices" which opeiate above the limit given by the tesistance quantum Ot com se, single-election tiansistois use quantum piopeities ot mattet, but so do conventional bipolai oi held-cftcct tiansistois (Likhaiev L25J)
contiast to the held ot

2.2.

Orthodox

theory of Coulomb blockade

17

well defined barriers and

can

be acted upon

by

leads

connecting

the island to

voltage

controlled reservoirs.

single-electron transistors make them candidatedevices for further ultra-dense logic. However, care has to be taken with re spect to power consumption/dissipation. The power p of switching in singleelectron devices is given by the charging energy, Eq. (2.1), divided by the
The small diameters of

switching

time

R{C
IP

ryP

2 C

"=-r=W*Assuming
that silicon-based

(2'7)

technology will still be the technology of future electronic devices, one can take the "road-map" 11] estimate for the year 2012 of 10l2 transistors/chip realized with the same number of single-electron tran sistors. According to Eq. (2.7) a room temperature operating SET would have
a

power

consumption
mean a

of p

10

~8

(I?t

25i?Q

160 kO and (7

aF).

This would
are

total of

104 W/chip

has to be

dissipated

if all transistors

switched at the

same

time. With lower tunnel resistances

R\,

and therefore

higher operational frequencies (Fig. 2.1) the power consumption is increasing linearly. A decrease of the capacitance even leads to a quadratic increase of the power consumption as can be seen from Eq. (2.7).
A last very

important point
at the island

is to be made. At temperatures close to

zero

integer multiple of e. In such systems, tunneling events which occur via two tunneling junctions are not independent the island anymore. The tunneling events are correlated by the need to keep
Kelvin the

charge

is

an

charge

an

integer multiple

of

e.

However, each of the charges

at

the two

junctions can be external gating.

fractional which makes it

possible

to tune

the

junction by

2.2.2

Single-electron
and

box

Charging
energy of

de-charging

of

single

island is related to

changes
an

in the

Hclmholtz free energy F of the system. Within the orthodox model the free
a

single-electron
in terms of

box

(Fig. 2.2)

under the influence of

external

gate is written

macroscopic charges

F(X)-=

dQ(Q),

(2.8)

Chapter

2.

Introduction to

single-electron tunneling

where

potential at the single-electron node and Q the discrete charge. A system of capacitors is described by a capacitance matrix, which relates potentials and charges at the circuit. For the single-electron box as in

4>{Q)

is the

Fi". 2.2 this is

width

Cv
I
\

-C
(Jy

(Jo

Rewriting

of

Eq. (2.9)

in terms of the unknown

quantities (Qg,

Cx-CCoC^1

-CCr
C

CC

which determines the


itance is
sum

potential
sate
=

Co-, and Va is the

single-electron node </>. The gate capac voltase. The total capacitance CV] which is the
at the

of all

capacitances C-%

C +

(7g

is assumed to be

independent

of N.

With

Eq. (2.8)

the free energy takes the form

F(X)
The first term
on

Acr
=

-Nc-

C
CJ]

-V

2(

(2.11)
or

v;

the

right-hand

side represents the electrostatic

charg

ing

energy

U(N)

of A^ electrons

corresponding

to

Eq. (2.1).

The second

term

gives

the work

(potential energy)

voltage source. It is as sumed that only one gate has significant capacitive coupling to the island. An external charge QcyLi C&Vg is intro
done

by

the

duced which

can

be understood

as

an

externally
be varied

induced

polarization charge
can means

which is bound to the gate field and

continuously by
contrast to

of

gate voltage in
restricted to
terms

which is
In
be

of
as

integer multiples of <?. (7ext the free energy can


Xe
=

Figure 2.2: Equivalence a single-electron box.


<-/exext

circuit for

written

F(X)
The last term in

ext, Qcy

2C V!

2C\
A
.

(2.12)

Eq. (2.12)

is

free energy variations with


N electrons at the island is

again independent of changing gate voltage.


Z"-] exp(-J[F(AT)

Figure

The

displays the probability of finding

2.3

given by
--

X)

EFX\).

(2.13)

2.2.

Orthodox

theory of Coulomb blockade

19

where Z is the the reservoir


a net

AMndependent partition function, Ep is the Fermi energy of which can be related to the ground contact of the circuit. Having
allowed numbers of electrons
and N
means

at

of

flowing through the device, the the island must be fluctuating between Ar electrons is then AT 1/2 (Fig. 2.3). This
current
-

1.

The net number


are non-zero

that there

1). 1\X probabilities for two different numbers of electrons, i. e. P(N) an electron Midway between these degeneracy points adding (or removing) This is equivalent to the moves the free energy away from the minimum.
=

condition

F(N)

F(N

1)

p{X)

FJj? (energy-conservation law) for


into this condition

the entire system. Substitution of

Eq. (2.12)

gives
(2.14)
If

eQ ext
Cv

where

EF

is defined

as

the renormalized Fermi energy of the island. energy, the constant


=

one

neglects changes in the Fermi


increments
Fiee

spacing

of the island

charge

by

one

is

simply AVg

e/CR.
Ew
-

en eis y

F
Q
=

-(N

l)t
Q
'=
-

_(\

)e
Q
=

~(N

-JVe

})e

(TV

l)e

Ae

-(TV

l)e
\c
-(

De

Chai ge

Q
Nt

(N

\)e

(N)

Ep

--

Gate

olta.se F

Figure 2.3: Free energies (top): as the gate voltage is increased the charge Q l)e to (N 1/ l)e. for which the energy is minimized changes from (X' the gap in the Fenni Fermi energies (bottom): when Q l/2)e (X

energies vanishes and

current can

flow (after [2f),

20

Chapter

2.

Introduction to

single-electron tunneling

...

2.2.3

Single-electron transistor simple


tunnel

Now consider

junction

The island is located between two It


can

(Fig. 2.4). tunnel junctions with capacities C\ and C2.


one

circuit

containing

island

electrostatically

be controlled

by

the gate

The total

is called
but with

capacitance of the central island is a single-electron transistor. The device


a

capacitance (7g (Fig. 2.4(b)). (A C\ + Co X Cg. Such a setup


=

is reminiscent of
two

MOSFET,

small

conducting

island embedded between

tunnel

junctions,

instead of the usual inversion channel.

First,
circuit

reduced circuit that contains

only

the basic parts of the SET, the

island and the two tunnel junctions in series

analysis

reveals that the

(Fig. 2.4(a)) is considered. Simple voltage drops across the junctions are
,

Vi

C2V

+ Ne

Q(

C\

and

T~
I

CxV-Nc
^
C\]

Qo

(2.15)

Ne-\-Qo. Q2 -Q1 + Q0 the two capacitors Qi and Q2 are given as Q\ The charges at C\Vi and C2V2, and Qo is some background charge which is due to polarization Q2 of the island related to charged defects in the vicinity (not contained in the circuit Fig. 2.4). The electrostatic energy is given as
where V

F1

V2 and the island charge is Q

U(N)

-2 G Co I
=

A>

-Q(

2C\
is

(2.16)

and the work done

by

the

voltage

source

(a)

Ci./

C2.R2

(b)

Ct,Z?i

Ch.Ri

cg

gy

Figure

2.4:

Equivalence
tunnel

circuit

for

SEP structure:

(a) basic

circuit consist

ing of two

junctions, (b) capacitively coupled

SEP. The dashed lines

mark the island.

2.2.

Orthodox

theory

of Coulomb blockade

21

W{NuNz
where

(N1C2XN2C1)eV
Cy.
=

(2.17)
Xi
N2.
ca

N{ and X2

are

the electron numbers at the junctions with N

Additional control of the island

charge
-->

is obtained

by introducing
using
1
on
-^

gate

pacitance Cg (Fig. 2.4(b)).


tions with the substitutions

The free energy is calculated

above equa

C\
=

Ci
a a

oCg,
factor
1.

Co

C2

(1

^)Cg

an(f

Qo
the

~~~>

Qo

+ (

g(^g

f/)

Qey.\

is
=

depending

the circuit. For

the circuit in

question

the choice is

Consequently,
is

the free energy of

capacitively gated single-electron

transistor

FIN1,N2)

(Ci
=

C\)C2V2

(Xc-Qcxi):
[XiC2
+

2CV

N2{Ci
ex

Cg)]cV

(2.18)
with

The condition for the transition from

state with

higher

energy to

state

lower energy

can

be evaluated.

The

change

in free energy for

an

electron

tunneling through

either junction is
e
=

AF(Ni

1, /V2)

-{Ne-Cf,Vg~QQ

C2V)
+

AF(N,, Aro 1)

e
=

ex L2

(~^

C&V&

^0

(C\

Cg)V)

At

zero

temperature only transitions with AF


V
Slope
=

are

allowed. Evaluation of

Cs,
es \

Slope

Ci J-C-.

-Ic

-V

C\

Figure
tion is

Stability diagram for the single-electron transistor. Stable opera only possible in the shaded regions. The system is assumed to be free
i.
e.

2.5:

of background charges,

Qo

0.

22

Chapter

2.

Introduction to

single-electron tunneling

...

this condition leads to the

stability diagram given

in

Fig.

2.5. Stable

operation

is

only possible

for values of V and

Vg

within the shaded

regions.
cir

Figure 2.6(a) displays


cuit

the iV-characteristies for

symmetric junction
R2.
For

(Fig. 2.4(a)),

i.

e.

with

C2

and

h\

\V\

<

e/Cz
as

suppression of tunneling Coulomb blockade. Due to the charging energy, available chemical potentials. Only if the junction voltage V is above the threshold given by the charging
the current is
zero.

The

for low biases known


a

gap has

opened

in the

(a'

energy, the blockade


come

can

be

over

and

current

flows. Then the


an

junction

behaves like resistor. If

electron enters via

junction

one an

other leaves via

is known

as

junction (spatially-)

two.

This

correlated

(b)

tunneling

of electrons.

Figure 2.6(b)
characteristics for

shows
a

the

IVwith

circuit

highly asymmetric junction resis tances, for example R\ <C R2- Car
riers that enter
are

through

one

junction

____

3e

(A

c Zj

kept from escaping though the second junction by the high resis tance. Eventually, the electron will
leave
ever,

Figure 2.6: IV-characteristics of single-electron transistor.


charged
with carrier.

the

through junction
for
most

two,

how
an excess

of the time the island is


more

With

increasing

populate the island. The IV-curve exhibits a staircase-like characteristics, commonly referred to as Coulomb staircase. If the as>mmetry is reversed, i. e. Ri > R2, the island is
bias electrons have the chance to
more

and

more

depleted

and

descending

instead of

an

ascending

Coulomb

staircase appears.

Figure 2.7 (Fig. 2.4(b)) at


the r-axis

shows the
a

1Vg-characteristics
of I
'

bias

voltage

0. This

capacitively coupled SET plot is equivalent to a cut along


a

of

through

the

period c/Cg. In the current peaks to the value Vy2(i?i + Ro). 0 (and T peaks are sharp peaks at V

stability plot (Fig. 2.5). The current oscillates with instable regions, where correlated tunneling occurs,
These
=

the

the

so

called Coulomb blockade

0 K of
as

course), however, with


At finite tempera-

increasing

bias

voltage

the line width increases

well.

2.3.

Constant interaction model

23

2(lh+B2)

14

3e

Cg

Figure

2.7: J V -characteristics
->

of a single-electron

transistor for

vanishing

junction bias, V

0, and finite temperature.

tures some

electrons

can overcome

the Coulomb
a

charging

energy for values

of

Vg

between the

peaks.

The result is

non-vanishing

conductance in the

blockade

regions. Then, the conductance peaks aquire a finite width. In fact, Fig. 2.7 already shows the characteristics of an SET at finite temperature, since some level broadening is visible. The Coulomb blockade is almost completely
washed out at

sufficiently high temperatures, knT

e2/(7

2.3

Constant interaction model

The orthodox electron

theory

of Coulomb blockade

was

developed

to

explain single-

charging phenomena observed in small metallic grains. In these grains the level discreteness gains importance only for structures with diam eters below 1 nm. Above this limit, the level separation is in general much smaller than the Coulomb charging energy e2/C's and the free energy is equal
to
a

capacitive

energy. These basic

for the free energy used in the


In
a

assumptions are previous section.

made in the

simple picture

semiconductor structure the island is called quantum dot. It exhibits

discrete level spectrum for much


and the level

larger

island sizes then in metallic systems,

separation

increases
a

dot diameter d.

Assuming by

indirectly proportional to the square of the symmetric square box of a given semiconductor
mass

material characterized

an

effective

nC with

potential

walls of infinite

24

Chapter

2.

Introduction to

single-electron tunneling

..

height,

the level spectrum is calculated

according

to

op

(2.19)

where the lower effective

mass

in semiconductors

(GaAs:

in*
=

0.067) in

1) is the reason comparison to the mass of free electrons used in metals (m* for the significance of the level separation. If the level spacing Ae p\~i sp is of the order of the Coulomb charging energy. At" the Coulomb e2/(7s, blockade is affected by it. A quick estimate can be obtained for a GaAs (tr

13) quantum

dot with

2DEG of d

400

nm.

The
a

charging
is Ac
=

energy

can

be
=

estimated to be 1 meV

(using

the

equation

for

metallic

sphere
=

e2/Cs

e2/27ToTd,). According to Eq.


a

2.19 the level

spacing

0.03 meV. For


2 meV and

diameter of d

50

nm

the level

spacing

would be around Ae

the

charging

energy is estimated to be 8 meV. Island sizes of 50

nm are

well

within the reach of modern

lithography
theory
a

tools.

Even

though

the orthodox

can

still

serve

as

useful model for

complete picture including the interplay of the discrete level spectrum and the capacitive charging, especially of small semiconductor quantum dots is only possible if the electron gas is treated quantum-mechanically. The electrons in a QD comprise a many-body sys tem of strongly interacting Fermions in a complex potential. The quantum
mechanical states of such
a

single-electron charging effects,

system

are

the solutions of

complex system

of

equations taking

all

possible

interactions of the system and of the system with


The issue of

its environment into account.

finding
a

for the quantum states is omitted here and

discrete

meaningful expression set of eigenlevels with


an

energies ep (energies
manner.

relative

to

the Fermi

level) is introduced in
the
sum

"ad-hoc"
energy

The free energy F of the

QD is

of the of all

capacitive

according
particle
be

to the orthodox model and of the


one assumes

energies

occupied singlelevel, which


can

levels. If

that

one

electron

occupies

one

spin-degenerate

of

course,

the

following
o

form of the free energy is obtained

F(N)

i^t AepM; sp.


-

(2.20)

The actual values of ep need to be calculated numerically. Within the ortho dox theory the spacing of conductance peaks is calculated using Eq. 2.20 and

F{N

L)

F(N)

E-y\ yielding the following relation for the spacing of

2.4.

Example

structures: vertical

quantum dots

25

the conductance

peaks
'

e2
CS

:,+i-s,)

O'even)
;2.2i)

C e-y^AV:

Cv
e

Cs
where Al/'

(?' odd),

Vff

C? and V?

marks the center

position

of the ?'th

peak.

The

dependence spacing on whether i is even or odd reflects the spin-degenerated nature of the levels. The separation of the change of the free energies of a QD into a capacitive part which is constant and a fluctuating part related to the discrete spacing of the single-particle levels according to Eq. (2.20) is known as constant interaction (Ci) model.

of the level

2.4

Example
an

structures: vertical

quantum dots

In this section

illustration of the main effects related to

neling

in semiconductor nanostructures is
structures in
a

single-electron tun given by shortly discussing vertical


a

quantum dot
which allow

GaAs.

Vertical quantum dots have thin barriers

fore, these

precise control structures are especially


very

of

just

few electrons

(Ar

<

20). There

suitable for

studying

effects related to the

discrete energy spectrum of quantum dots.

Figure 2.8(a)
ture

shows

schematic

diagram

of

vertical two terminal struc


two AlGaAs barriers.

[32j. The InGaAs quantum dot is located between

The two barriers have different widths. The inclusion of Indium reduces the

(b)

UGa V
fnGj V-,

\lGaA>

10

n-GaA>

J.
-1 0

UliUJl
(V)

GATE VOLTAGE

Figure

2.8:

(a):

Schematic

diagram of
for
a

vertical quantum dot.

(b):

The

Coulomb blockade oscillations

500

nm

dot

[32 f.

26

Chapter

2.

Introduction to

single-electron tunneling

bandgap
electrons

so

that the conduction band is below the Fermi level. This accumulated
even

means

that

are

is surrounded
to

by

circular

junction voltage V is zero. The dot Schottky gate placed at the side of the mesa close
gate voltage

when the

the quantum dot. With

Vg applied,

the

quantum dot

can

be

squeezed electrostatically.
Figure
Coulomb measured
the
at

2.8(b)
blockade small

shows

the

1 t)

1?

^"*

oscillations V.
of
Due
to
s

small
=

number

electrons
b

(N
is

...

20) the peak spectrum


influenced

significantly

by

the and

strong

Coulomb

interaction

quantum-mechanical
few-electron

effects in the
Since
the

regime.

electron gas in the dot has the

shape

of

circular disc and the


is harmonic,

confining
\'-0

potential
exhibits
a

the system of symmetry


: i
,

high degree

with
states.

degenerate

single-particle

Somee-Diain

Voltage (mV)
the quam

With the arguments of the


stant

con-

Figure
turn

2.9:

Stability plot for


in

interaction

model,

different

dot

structure

Fig. 2.8 [32],

spacings should lead to dif ferent spacings in the conductance peaks (Eq. (2.21)). Moreover, the
level

shell

structure

of the levels is also


<
c

reflected in the

height of the indi vidual peaks. Strong modulations of both the peak height and the spacing of the conductance peaks, especially for the electron num
bers N
=

-50

...

12

can

be

seen

in the

V(mV)

Fig. 2.8(b). Figure stability plot, i. e.


conductance

2.9

displays

the differential

Figure

2.10:

Coulomb staircase

for

vertical dot

OP/dV

of the structure

[33].

in

Fig.

2.8.

The electron number A' is fixed in each of the white diamondwhere Coulomb blockade is present
areas

shaped
ular

areas,

(Ol/OV

0). The irreg


and the

shape

of these

is also

an

effect related to the level

spacing

2.4.

Example

structures: vertical

quantum dots

27

shell-filling. pronounced.

One

can

clearly

see

that the numbers 2, 6 and 12 the

are

especially
an

These numbers

are

magic numbers of

the two-dimensional

harmonic oscillator

potential,

i.

e.

those electron numbers A^ at which

ad

ditional shell in the level spectrum is

occupied.
a

A measurement of the Coulomb staircase for shown in

similar structure
are

[331 is

Fig.
a

2.10.

At

negative voltages C
whenever
an

electrons

accumulated in

the dot and

step

occurs

electron is

trapped.

The few-electron

regime

is

again reflected by

the low number of electrons which leads to modu

lations in the width of the

plateaus

of the staircase due to the strong Coulomb

interaction. The width of the staircase steps is which hints


more on a

shift in the total

larger for low electron numbers capacitance Cyj towards higher values for

electrons.

Is*
iL

"

H
>
|

w
,

(,

' ^

Chapter
And
now

3
note.

Ora incomincian le dolenti

the notes of

anguish

start to

play.

Dante. >lnierno, V<

Theory of single-electron

tunneling
3.1 Introduction

in semiconductors

In the last

chapter

an

introduction to

single

electron

tunneling

was

basis for the theoretical

predictions

was

the so-called orthodox

given. The theory and the


are

constant interaction model. The

shortcomings

of the orthodox

theory

evi

dent.

Equation (2.21)

is sufficient to describe the

spacing

of the conductance

peaks. However, no information about their amplitude and lineshape can be obtained. This requires the solution of a kinetic equation. Furthermore, the assumption that the capacitance of the island is constant and especially that C>j is independent of the electron number is not valid in small semiconductor
quantum dots.
In this

chapter

linear response

theory is discussed, which leads

to an

equation for the conductance of a SET in the limit of vanishingly small sourcedrain voltages. The effects of finite temperatures and discrete level spacings This are taken into account as well as the shape of the tunneling barriers. analysis was first performed by Kulik and Shekhter 120] for metallic islands within the orthodox theory and extended by Averin et al. [24] and Beenakker
[26]
to

semiconductor quantum dots.

29

30

Chapter

3.

Theory

of

single-electron tunneling

3.2

Model definition

The model for

single-electron
a

transistor consists of

confinement

region
Each

(island, quantum dot) with


level carries
one or zero
an

discrete level spectrum eh

{i

0.1,...).

electrons. The
n,
=

occupation of the

?th level is therefore

described
tem, i.

by

integer number,

0,1, and the

occupation of the
is

level sys

e. a

specific occupation
to two
are

number

configuration
and X
=

given by
barriers

the set

{n7}

where the number of electrons is


is

integer
source

]C?

n,. The confined

weakly coupled

electron reservoirs via


named

tunneling
are

region (junctions).

The reservoirs which

and drain

taken to be in thermal

(a)
Gate

capacitor

Tunnel

junctions

(b)

A
^

t>(X)

F<f

m
i

rjeV

co

eV

Figure

3.1:

(a) Schematic drawing of


on

SET.

(b) Potential

cut

through

the

(long dashed lines). The chemical potentials p(N) according to discrete numbers of electrons are indicated by straight lines. Electron s in the reservoirs continuously occupv all energies up to the Fermi levels.
structure.

Electrons

the island occupy discrete levels

3.2. Model definition

31

equilibrium at temperature T and Fermi energy Ep, is applied between the reservoirs is small.
The device is considered to be driven in
tance

i.

e.

the

voltage

V which

linear-response,
)

i.

e.

the conduc

G is defined

as

I/V

in the limit V

0. In the absence of

charging
Ep
in
a more

effects

a net current

flows
with

through

the quantum dot if the Fermi energy

the leads is

aligned
one

one

of the discrete

single-particle

levels. In

general
aligns
set

case, at T

0 K current flows if the Fermi energy in the reservoirs

with

of chemical

potentials ft(N) of the quantum dot. The potentials {//(.A)} is given as the change in the free energies
of the chemical

of the quantum dot when

adding

or

removing

an

electron, and therefore, the

condition for the lift of the Coulomb blockade is

EF^f,{N)
The

F(N)-F{N-i).
by
sets

(3.1)

tunneling through

the two barriers is described


to

for all states k in the quantum dot

the left

(drain-) and

tunneling rates the right (source-)

of

reservoir,

by

the

{F^}. The characteristic energies of the system are given charging energy e2/Cv. the single-particle level separation Ae, the
and

{F^1}

thermal energy

k^T,
X>

and

nFt.
==

The last term denotes the intrinsic width of the

transmission
in the dot

resonance

/zFt
can

^(Fs

4-

Td).

It is assumed that for all levels


resonance

kuT
an

M~\, i.

e.

the finite width of the transmission

through the quantum dot


dot state

be disregarded. This allows to characterize each

by
<C

occupation
are
=

number. Furthermore, it is assumed that the

tion resistances

i.

e.

7-?q

smaller than

quasi-classical (Eq. (2.5) Rt RiR2/(Ri + R2) and the tunneling time rt the junction relaxation time r~ 1. This ensures that the
limit
=

above the

in Section

junc 2.2), F71 is

tunnel

ing

events are well

separated

in time and the current flow does not disturb the


to use a master

equilibrium.

It is therefore

possible

equation

to

describe the

following section it is assumed that inelastic scattering takes place exclusively in the reservoirs and not in the dot. The effect of inelasic
transport. In the

scattering

in the quantum dot is discussed in


an

|26j.
a

The transition of
in either the drain
The initial
or

electron from the kth state in the dot to


source

final state

the

reservoir, cf \

requires

energy conservation.

configuration

of electrons in the quantum dot is charcterized

by

the

Helmholtz free energy

F({ih}.nk
and the final

UX)

F{ni

'^i.l.^tr- :N),

configuration by
m
=

F({h,},

0, N

i)

F(m,...

x.

o. m

*1-...

AT

l).

32

Chapter

3.

Theory of single-electron tunneling

...

For
the

given drain-source voltage V


banier is
n
=

the fraction rj of the

voltage that drops

over

source

dot chemical

Rd/(Rd X Rs). According to Eq. (3.1) potential fi(N) is given as


=

the quantum

/x(Ar)

F({n,}.nk

hX)- F{{n,},nk
a

0, N

1).

(3.2)

The energy conservation condition for

transition into

final energy state in

the

source

reservoir is

tl(X)
Similarly,

n(X)

neV.
a

(3.3)
transition from
an

the energy conservation condition for


source,

initial

reservoir state in the

ef (N),
=

to

the Ath dot state reads


+

S1(N)
N is the number of electrons

ii(N

l)

qeV.
event takes

(3.4)

before

the

tunneling

transitions between the dot and the drain reservoir the

place. For the following condition

applies

for the final state

|(N)
(3.5)

ef(N) =ij(X)- {l-ri)cV


and the initial state

e^(Ar)

ef(N)
The parameter //

p(N

i)

(1

ii)eV.

(3.6)

drops

out

of the final

ductance. The derivation of the

equation for the linear-response con conductance expression follows the linc-of-

arguments given by Beenakker [26].

3.3

Master

equation approach

3.3.1

Master

equation
probability
distribution

In

general,

the

P(A7 t)

is

time-dependent property
j\f of the system
in the
to

that describes the

probability
described

for the stochastic variable


a

have the value Ar. Transitions from able Ar to


a

state of the

system described by the vari

state

by
and

M will

produce changes

corresponding

occupation

factors

P(N. t)

P(M. f),

dP(NJ) =-dP{Mj) =P{Xj)W{X>M)dt.

3.3. Master

equation approach

33

For discrete stochastic variables the summation


processes results in the

over

all

possible

transition

following

master

equation

ot

P(N,t)

V [P(XPt)W(M.N) ^^
Myx

P(N,t)W{N,M)\,

(3.7)

probability distribution or transition rate (usually assumed to be time independent) for the transition of the system from state A' to state AT. The probability distribution is normalized according to

where

W(N,M)

is the transition

^P(AA)
x

1.

In

quantum dot the stochastic variable A'' is the electron number. Singleoccur

electron transitions between quantum dot states


trons in the

if the number of elec

dot is increased
can

or

decreased

by
as

one.

the master

equation

therefore be

given

the

stationary solution to solution to the following rate


The

equation
0=

Y,
A'={iU!}

[P{M)W(M.N)- P(N)W(N,M)],

(3.8)

where

W(N,M)

is the total transition

rate

from the iV-electron to the Mdistributions

electron system. The set of discrete

{P(N)}

is the solution of the

non-equilibrium probability master equation.

3.3.2

Probability

distributions and transition rates

stationary equilibrium probability-distribution function Peq({n7}) for particular occupation configurations {/?;} is given by the Gibbs distribution
The
of the

grand

canonical ensemble

theory

Peq({'h})
where

Z-1

exp

| -^-L[* v{h,},7V)

EFN}\

(3.9)
is the free

{n,}

is

energy of this

specific set of occupation numbers, F({nq},N) configuration and Z is the grand partition function
a

z=Y,
X<}

cxp

{-^r^{"'}'x) EfN^}
~

(3-10)

34

Chapter

3.

Theory of single-electron tunneling

...

The

equilibrium probability

Peq(N)
=

for the dot

to

contain N electrons is

PeqW
The

Y, Peq({^})VEnt.

(3.11)

single-particle occupation factor for the dot levels is given by the conditional-probability distribution function g{ek\N), i. e. the probability that the th single-particle level in the quantum dot is occupied if the dot contains
N electrons

9{sk\N)
(from
now on

-j^r E ''.({ JW.L A,


reqCv
r X:}
-,

(3.12)

the

symbol gx(?k)

is used

instead). The

sum over

the

occu

pation configurations {r/,} on the right hand side of Fiq. (3.12) is the jointprobability distribution to have AT electrons in the dot and the AAh singleparticle level occupied. The Gibbs distribution for localized systems under
the influence of external reservoirs is discussed in

Appendix

A.

many-particle ground states of the iso lated quantum dot can be derived by treating the tunneling Hamiltonian as a perturbation to the time-dependent Schrdinger equation. An account of this approach is given in Appendix B, The total transition rate W is the sum over the partial transition rates of the reservoirs, i. e. the summation is over the
The transition rates between the
reservoirs
r

{s.r}
W{N. M)
=

]>^ JT71(AT,il/),
rates to or

(3.13)
from

which

are

given

as

sums

over

all

partial tunneling
are

specific

energy levels ek. Transitions to dot states

characterized

by

W1

(AT,

N + 1)

Y rA fttW
* k

fM1
1)
-

9N(k)]
(3.14)
-gN

W>(N-1,N)
This leads to
an

=-

r)/(^Y-

)[!

^(ek)}.
equations decreasing

increase of the electron number in the dot. The next

refer to transitions

from

filled dot states to empty reservoir states

the electron number in the clot

Wl(N,N

1)

rHl
Y V [Jk
-

f(f\(X)
/W(*V

E{;)}gx(sk)
1)
-

W*(N

F 1.

A)

^F)]gN+l(sk),

3.3. Master

equation approach

35

where

c^{

are

the initial and final states in the reservoirs,

is the Fermi-Dirac

distribution for continuous states

f(e
and g is the
tum

EF)

c
=

i + exp

E-p

-t

(3.16)

occupation probability
to

for the discrete energy levels in the quan

dot which is taken

be the Gibbs distribution for discrete

single-particle
[31].

levels

(Eq. (3.12))

in the most

general

case.

For
can

large

electron numbers the

Fermi-Dirac distribution for continuous states

be used instead

3.3.3

Detailed-balance

equations
for

With
the

Eq. (3.14) and Eq. (3.15) the stationary master equation, Eq. (3.8), stationary non-equilibrium distribution function P(N) is
o

=p(n

-1)[i-9y i(ek)]J2nf(t(x

-1;
-

r-ir

-P(N+

l)]T\gx+iXk Y1!^
-

f(A(NX 1)
-

EF]
(3.17)

-P(N)
-P(N)
This

X>
'

">

gN(ek)]Y,Tim(N)
*"\ Mil

EF)
EF)

>(*)] E1"-!1
be recast

/WW

equation can Eq. (3.12) which

using
a

the

leads

to

set

of

conditional-probability distribution equations for the non-equilibrium

probability-distribution
0
=

functions

/?({??,})
.)SnkA

Y P{ni,
k

..

A-1.

0. nk+u

X)rfr/(e(Ar
v
-

1)

Y P(/li
k

>n

J-

L rn^-

'

)(^.o/LrlP
i
^

f(^(N

1)

--

EF

Yp({^})snk^Yrif^x)
k
i

ef)

(3.18)

36

Chapter

3.

Theory

of

single-electron tunneling

...

The first two terms refer to the system


tion

evolving

into the state with the occupa


or

{nt}

either

by adding
out

one

electron to the dot

by removing

one

electron

from the dot to the drain

or source

reservoir. The last two terms refer to the

system evolving

of the state with the

filling an unoccupied level tion (3.18) is equivalent to


dot level k

in the dot
a

occupation {n?} due to and an electron leaving the


equations,

an

electron

dot.

Equa

set

of detailed-balance

one

for each

p(m,...,iik. i,l,nkfl....)
=

Yv\[i
t..

KA(X

i)

i%)\
-

P{nu

<nk

,.

0, nH

..)

VrA/(eI(iV)
1

EF),

(3.19)

using

the notation N

Y2,^k
=

n>-^-

c-

X XI if the Mi state is
is

definitely

occupied, Skti,

and N

N if the A'th

state

unoccupied, Snk)o-

3.3.4

Stationary
to

current

According
rier

Kichhoff 's law the

steady-state
=

current

through
It is

the

source

bar

equals
I

that

through

the drain banier. I

Id.

given by
(3.20)

^]Tp(A)[IFs(Ar. A +
/v

l)

WS{N,N- I)].
equation

Applying

the results of the

previous

section this

can

be written

as

/=^E/KiM-[i-*)]
X k
-

VI [1

f(cl(N)

E$)]gN(ek)}.

(3.21)

Again, the first term in the sum refers to an electron moving into the previ ously empty state k in the quantum dot. The second term refers to an electron

moving

from

state

k in the dot

to

the final

state

e^

in the

source

reservoir.

3.4.

Linear-response regime

37

3.4

Linear-response regime
Linear-response
conductance

3.4.1

equations in a general form, a restriction to the case of small source-drain voltages V is made. The conductance in the linear-response regime can be given analytically. As mentioned before, the linear-response conductance is defined as
G
=

Since it is

impossible

to solve

above

lim
v -m

I \
source

(3.22)
and the drain

Equilibrium
i.
e.

conditions
=

are

assumed for the

reservoir,

Pp. In this limit the non-equilibrium probability distri EF EF bution P({n7}) differs very little from the Gibbs distribution at equilibrium Peq({n?}). Therefore, the stationary non-equilibrium probability distribution
is

linearly expanded

in terms of V

p({nj)
Substitution of this

peq(W)(i ^^(K})).
+

(3.23)

expression
1,
A+l,
X

into the balance

equations, Eq. (3.19), yields


}nk

Peq(/*1.
x

1,

1+

cV

A'bT
-

T'(//L)...
-

!,l,/A-rl- )

{ri[l

f(c

qeV)}

r?[l

f(t
e

(I

q)eV)]}
..

Peq(ni,..

.nk.

i.O,

A-ti.
^1

l + -j-ty{7iu.

kB I

,nk_i,0,nk+1,. ..)

x{T*kf(t-\ ,,er)

+ r?/(e-

(X^q)eV)}.
(3.24)

witlK

F{{ih}ynk

l.N X

1)

F({/*,}./7A

0,

X)

PF.

Since

the balance

equations are linearized with respect to the junction voltage V, a Taylor expansion of the Fermi-Dirac factor including only the first-order term can be used in Eq. (3.24), i. e.

/(e

reVWlO-Mer/'tO
=f(t)
1
-

/(<
I X cxp

(3.25)
kXT
XT

38

Chapter

3.

Theory

of

single-electron tunneling

...

and

/(-(I- n)eV)=f(e)-(l-V)eVf(() :/(<


1 +

(L--,)
1
'

CXP

y-^
l
kBT
;

eV

(3.26)

\
1

kBT

The following identities

are

substituted

l-/(e)
^r/'(e
and

/(t)exp( yy )
=

'

(3.27)

1 + exp

kBT

-/(*),

(3.28)

Pcq(ni,.

AU-1- I- A-

)
/U-1.0.
A
,

Pcq('M

!..

.)exp

/CrT
means

(3.29)
that if

Latter describes the so-called detailed-balance symmetry which


the level system is in

occupation

distribution

{/?,},

the

probability
zero

for the kth

level to be

occupied compared
are

to the

probability

that the level is empty differs

by

Boltzmann factor.

Another consequence is that at which would lead to the

temperature
are

no

transitions

possible

previously empty,

whereas at

occupation of the high temperatures both probabilities


leads to
a new

kth level if

equal.

Application
tions,
now

of these

equations

form of the balance equa

for the first-oder

non-equilibrium

correction

^({r^})

to the

equi

librium

probability
...

distribution

Peq({?i,})
l

#(t?i,

cnk

i.l.

n k

x{(Tl+Tt)-r
+

-[r|/,-lt(l-//)]
7?A rl>'

exp exp

kjiT

A-rT

[r^-r?(i-/7)i
>U-

-=^(1
X
ps

-1-0.

)
1 I + oxp

"pd\ i 1 j j T

knP

[Vln-Tdk(l -/;)]

ArT

3.4.

Linear-response regime

39

All factors

Peq

and

cancel.

Further, all
are

terms

all second order contributions

ignored

and

proportional to eV/k^T, i. a final equation for \I/({r^})

e.

is

obtained

^("i

?H

lX.n k

\ t'
"nd
1

*(m

A-i.o.ui-..)

A,
-

ArrVd
n+q

'?>

(3-3)

for which the solution is

*({.})

cou.t

J2 A
?

\1,

VA -I)t1,
'

pd

(331)

The first-order
77
=

non-equilibrium

correction

T'dn,})
if
/?
=

to

Peq({n^})
and F*
=~

is

zero

if

Tf/(r,

Tf)

for all
are

?.

This is the

case

1/2

Ff,

i.

e.

if

the

tunneling

barriers

identical.

linear-response current through the quantum dot in first order in V can be calculated. Linearization of the current equation, Eq. (3.21), after substitution of Eq. (3.23) and the subsequent use of the laylor expansion
With this result the

of the Fermi-Dirac factor,

Eq. (3.25), yields

~CH E rl^,({,})
I
1111 llll

1 +
\

II

'

lV?*(KK
I
t

{>%,}
x

{Sk o/U

rieV)

Snk^

/(<

>1<>V)]}

and

expanding

the Fermi-Dirac factor

(~=^YYrlP^{{n'])
k

{,}

{<5A
X

o/(0 -6nk i[l

f(c))Xdnk on<.Vf(c)
-

nktlrieVf'(e)
^

^n{>h})nk
*bJ-

o/(0

^({x})S>n
k!
X

i[l

/(e)]

^U({n,}Ku
k'B

orteVffe)

~*({>})^ineVf'{t)).
A'BZ

40

Chapter

3.

Theory

of

single-electron tunneling

...

Neglecting

terms

of the order

V2 (the

last two

terms)

one

arrives at

J=-

eV

kn

{J

r ht
x

cy-6>n
+

o/(e)

Ff^6>n if1
+

kXF

,,

"

.f(e)1

^uo^BT//(t)
-+

(5?u.1//A-BT,/,/(f)
-

*(K})<Wo/W

*({"J)<WU

/(*)]}.
bal into

The first two terms cancel because of


ance

symmetry). If

the
one

Eq. (3.27) and Eq. (3.29) (detailed identities Eqs. (3.27)-(3.29) are now substituted
obtains

the

current

equation

e~

Y E rA^q({^}){(^u
A

6nk ,U>/"

/(<
1 + exp

{,}

( j^
(3.32)

^({" JM/u of (e)

^(KIKu ,i,/'(()

exp

k~

and

finally
( v
^ "

/vBi

;TrE
A

Er^oq({J)^0/(e)
^ *

{n,}

[;/

^(l,

"A-l,

ClU^i... .)

*(/?i

/iA-i.0,r7A4i.. )).
(3.33)

where the first two terms in

Eq. (3.32)

combine to

give

Pcq({J)((5A+Au l)/(0
1
-+-

Pcq({?j)^u,0//.f(0:
exp
kB l

and the last two terms

give

Peq({n,}W{J)/(0 6nk
X

Lexp

A'B

hit
/'A

Peq(K})^o.f(c
0. /?A
L,

[^(1,..-

.A

i.L/?A-t--.-) -"^(/?]

i.

-*)]

3.4.

Linear-response regime

41

It is

now

nkto

the
c
=

possible to write replacement N

the current
N
can

equation again always be made, i.


-

in terms of N since for


e.

F({m,},

rtk

1. A-f

1)

F{{nt},nk
V leads
to

0, N)

PF.

(3.34)
for the

Substituting Eq. (3.30) and dividing by linear-response conductance

the final

expression

=^EE r7CAP-({"'})'"<"/(t)The

(3-35)

particular product

between the Gibbs distribution for the quantum dot

P({n,})
fact that

and the Fermi-Dirac distribution

f(t)

for the reservoirs reflects the


an

tunneling requires
[26J.
an

an

occupied

initial state in the reservoir and

empty

state in the

quantum dot. Eq. (3.35) is the central result of the paper


The
same

of Beenakker

equation

has also been obtained

by

Meir et. al.

[231 by solving

Anderson model in the limit

knT

>>

hTt.

Within the constant-interaction model for semiconductor quantum dots al

ready

introduced in the is

previous chapter,

the difference in the free

energies

using Eq. (2.20)

F(nk
where
tem

LN+l)-F{ntl =0,iV)=fA +r(/y+l)- U{N),


denotes the

(3.36)

U(N)

with N electrons.

capacitive contributions to the free energy of a sys Inserting the Gibbs distribution P(N), Eq. (3.11), and
the

the

the

single-particle occupation numbers gy{sk), Eq. (3.12), linear-response conductance, Eq. (3.35), reduces to
2
oc

equation

for

pS ^

T^Y,i:rx^^um^gx(x)]
K'B
L

x=o

X^X

f(ek

U(N

1)

U(N)

EF)

(3.37)

or

the

equivalent equation
O

OL

-fiq

Tirl

vKf X
A

iV1

E XXyfUX)gxle'']
k K

[1

f(sk XV(X)
applicability

U(N

I)

EF)].
has

(3.38) already

A first

assumption

that limits the

of these

equations

been made in the model definition:

one assumes

that the quantum mechan

broadening of the quantum dot levels is smaller than the thermal en ergy, hVt <C kifP. In the following section limiting cases for Eq. (3.37) and Eq. (3.38) related to the other significant energy scales are discussed.

ical

42

Chapter

3.

Theory

of

single-electron tunneling

...

3.4.2

Limiting
fcBP

cases

In the limit

X>

Ae, the discrete energy spectrum may be treated


The Gibbs distribution is

as

continuum of states.
Dirac distribution, gjy

(ek)

f{ek

approximated by the Fermip(N)). with a given chemical potential

p>(N)

determined

by

The Gibbs distribution

Peq(A~)

is

taking

its classical form

PclAsdX)

cxp{-[i7(Ar)-f A>- EF)]/kBT}


-

Y exp {-[U(X) X N(fi


x

EF)]/kBT}

equilibrium. The summation over A' in Eq. (3.38) is replaced by an integration over e, multiplied by the density of states p(e). If A-BT <. //, Pp, the density of states and the tunneling rates are evaluated at using that ft(N) const for all N
potential

where //, is the chemical

of the quantum dot in

which contribute to the classical Gibbs distribution. The conductance becomes

Jf^jNXEY E ^iass(N)g(r(N)
if

U(N

1)

-f M

PF).
(3.39)

A^ft, PF,

with

dyf(y)[L-f{y
If furthermore

x)]

l'^["
charging
energy
can

9X)be

A'BP

^>

r2/CA,
e.

the

ignored,

and

Eq. (3.39)
two

with g

k*T

states that the conductance is

simply

that of the

tunnel barriers in series, i.

7^-^.

if

e2/rS.

As < kBT

<<y

, Pp.
are

(3.40)

The conductances of the

source

and drain barrier, (P and

Gd,

given by

the

thermally averaged

Landauer formula
i'
r

X j
_

'^s

GbU-

/
~T~
h

rr^ d/

.'
.

d-rcl(f)Tde

(3.41)

J0

3.4.

Linear-response regime

43

where the transmission

T(e)

divided

by

the

probability of a barrier T(s) equals \/hp{e), attempt frequency v{e)


=

the

tunneling

rate

rs-d()
If the

/?rs'd(c-)/)(f).
are

(3.42)

tunneling

rates at

high

barriers

assumed to be

ergy the conductance of the barriers for each side

independent of en becomes Gs,d e2Fs,dp,


=

evaluated at

Pp this leads

to the conductance of the

quantum dot

(j-_e
_

FTd

c2
_ -

PqPd
=

/>rs

+ pd

y f^sTjXfX
if

Clx-

eV^VAe<^BT<p,

Pf-

(3.43)

The conductance

Goo depends solely on the banier height and width which determine the transmission probabilities rPs,d, however, it is independent of the size of the dot. The assumption that the quantum mechanical broadening of the levels should be small, hTi <C kBF. i. e. the levels should be sharply defined together with p if As in Eq. (3.42) requires that 7ls,d <C 1. Hence,
~

the

general

criterion for the

tunneling

rates

of the barriers

implies

that the

conductance of the quantum dot is G <C

e2/h.
In with A"

Coulomb blockade oscillations become visible at low temperatures.


the

regime

where

kBT
to

<C

At. the

term

JVmm in Eq. (3.37)


are

gives

the dominant contribution to the conductance. All

Peq(N)
e.

negligible

small for Ar not

equal
-

Amm
-

or

A"mm

1,
=

so

that

Ninm
-

minimizes the value

A(iV)

0(A)

Q(N

1)

with

0(A)

FIX)
-

NEF. i.
-

A(iA)
and the

eN X

U(N)

U(N

1)

PF,

probability Peq(Ar)
("mm)
'

is

-*

eqcqv"mm'

exp[^0(Amm)/A-B7'] oxp[-n(A*mm)/A-n7,j + exPhO(Aw

l)/kBT]

J V^nnil/

Using

the

equivalence

/(.r)[l-/(.r)]

-A-B77'W.
given
as

(3-44)

the conductance in the low temperature limit is therefore

G^-e2l^-j^f{&mm),

if

A-BPAc.

(3.45)

44

Chapter

3.

Theory of single-electron tunneling

...

This formula is
onant
as

equivalent

to

the

one

that describes
includes the

tunneling. However, Eq. (3.45)

thermally broadened res effects of charging as well

the discrete level spectrum.

3.4.3

Amplitude

and

lineshape

With the results from the


imations for the

previous section it is possible to give simple approx amplitude and the lineshape of the conductance oscillations.
regime. As
X

The classical

kBT,

was

first studied

by

Kulik and Shekhter

[20] within

the orthodox

theory.
to
-

A continuum of states is assumed to par

ticipate

in the conductance.

If As <C
the
sum

kBT

<C

e2/(7s, only

one

electron

number, Armm, contributes

in

A(AP)

U(N)

U(N

1)

+ p

Eq. (3.39) minimizing PF. If defining AmiI

the difference
=

A(iVmin),

Eq. (3.39)

reduces to

e2p
xp

FTd
nspd

rsrrt

Amu

(3.46)
*

kBP Vs

X Fd

exp(Amin/A-Br)
and the

exp(-Amin/A;BP)
peak

The final result for the

shape

height

of the

is therefore

Amin/A'B/

Amin

Gmax

sinli(Amm/A'Br)

cosh

\2XkBT J

(3.47)

In the classical
and half the

regime

the maximum conductance is temperature


value of

independent

Eq. (3.43) with negligible charging energy. The reason is the correlation of subsequent tunneling events by the charging energy. One electron can only tunnel onto the quantum dot if another one is tunneling off. Therefore, the probability for one tunnel event decreases to one half. The width of the peaks is linear in temperature.
The situation is

high-temperature

distinctly
<

different in the quantum-

regime. kBT
beled

-C

As

e2/Cv>
The

by Nmm

in

Eq. (3.45).

resonant-tunneling Tunneling occurs through a single level la conductance oscillations and the peak height
or

3.4.

Linear-response regime

45

G,

are

given by

G
=

G max

-4A-Br/,(Amin)
1

cosli

-2

pd
A,

(3.48)
if
A

<7,

4kBT F
-.

F
V n

The

lineshape in the quantum regime is almost the same as in sical regime, except for the different effective temperatures T*,
2.5 P in the classical and 2 71 in the quantum

the clas which is


maximum

regime.
in

The

peak

Gmax
same

G00(Af/4A,BP)
regime
while

decreases

linearly

with

the quantum

remaining

constant

increasing temperature in the classical regime. At the peaks

time, the peaks broaden and the total

area

under the conductance

remains constant.
It should be noted that above the natural linewidth

theory

is not suitable for the

case,

where
As
a

/if t exceeds

the thermal energy,


can

A?Ft

>

A;BP.

compromise

the

Breit-Wigner
G

formula FTC

be used

9l h

F^ + Fd

(A/2)2+ O72;
energetic

(3.49)

where g is the

degeneracy of

the resonant level and A is the

separa

tion of the resonant level from the Fermi level

[34],

Neglecting
the energy
the the
or

the influence of
on

the temperature
rates and

tunneling
same

assuming
energy
con
C5

rates
as

Ty,

for all levels

as

well

equidistant
const,

levels Ae
ductance

the

can

be evaluated

using
Flo:10J

Eq. (3.37)
strate the
tire

in order to demon

distinct regimes.

3.2 shows the temperature


the conductance Also shown
are

dependence of peak maxima.


the maxima
as

the minima which merge with

Figure

3.2:

Pemperature dependence of of the^


0.01

kBP approaches
In

the maxima and minima blockade

Coulomb
and

e2/CX

(classical regime).

peaks for As

e2/C\2

the resonant tunneling

regime

l\

YL\. (From

Beenakker

f26f.)

46

Chapter

3.

Theory

of

single-electron tunneling

...

peak height increases with reduced temperatures vanishing thermal broadening of the resonance.

kBT

<C Ae the

clue to the

Figure 3.3(a) displays the temperature dependence of the peaks in the clas sical regime. The width increases with P. For low temperatures the peak heights are independent of temperature. The crossover the resonant-tunneling regime is shown in Fig. 3.3(b).
1
,

from the classical to

0 75

AEF/(X/CX
Figure
3.3:

AEF/(X/tX)
Coulomb blockade

Pemperature dependence of the


=

peaks for pa
=

rameters

As
In

O.Olf/Cs
(b)

/// the classical

regime (b).
[a]
to

(a) the temperature


In

increases

regime (a) and in the quantum 0.075 in from kBT / {e2 f Gjf) from kBT/As
=-

2 in

[ff.

the temperature increases

0.5 in

faf

to

15 in

[dj. (From Beenakker [26f.)

Chapter

Transport coefficients

4.1

Introduction

previous chapter a formalism for the calculation of the linear-response transport through a single-electron transistor was derived. The main results are
condensed in
a

In the

equation for the linear-response conductance, Eq. (3.35), for system composed of a quantum dot weakly connected to a drain and a source
an

reservoir via

tunneling

barriers. The

function of the Helmholtz free

linear-response conductance is given as a energies of the system, P({/??}, N), and sets of

tunneling rates tunneling rates


the the

for the two barriers,


are

{Tsk}

and

{Fd}.

The free

energies

and the

termed transport

relevant information about

coefficients since they contain all physical the many-particle ground state of the system and
which
are

tunneling barriers transport equation (Eq. (3.35)).


In

shape

of the

necessary for the evaluation of

Chapter

2 the free energy

was

obtained within the orthodox

theory

and

the constant interaction model at (

zero

temperature, i. C

e.

Ve)2

^A.
A-=l

However, while this simplified model

was

sufficient

to

provide

basic under

standing
tor

of the

key effects

associated with Coulomb blockade in semiconduc

quantum

structures, it will fail to

give precise

results for small structures

47

48

Chapter

4.

Transport coefficients

strongly influenced by the screened electrostatic potential. Especially, the parameterization of the free energy in a circuit-like approach using capacitances and voltage sources is not a sufficiently accurate model for structures with small quantum dots. More appropriate is the calcu lation of the free energies using a solid state model for the earner densities and the electrostatic potential. Furthermore, the resulting self-consistent potential can also be used to calculate the tunneling rates for realistic electrostatic bar
where the level spectrum is rier

shapes.
In the

the free

following chapter the self-consistent theory for the calculation of energies on one side and the transfer Hamiltonian formalism for the
on

calculation of the tunneling rates

the other side is discussed.

4.2

Equilibrium

carrier densities

4.2.1

Energy bandstructure

and

applied forces
by its bandcrystal potential in
of the crys bands in the
bands which

The electronic structure of


structure.

bulk semiconductor is best described

The bandstructure reflects the


are more or

properties
move.

of the

which the electrons


tal

less free to

The

periodicity

potential in real space allows the calculation of the energy reciprocal space of wavevectors (k-space). This assumes energy are spatially invariant.
An

externally applied force field modifies the bandstructure and leads to spatially varying energy bands. Consider an undisturbed bulk bandstructure P,?o(k), associated with a particular semiconducting material. Force fields ap plied to the bandstructure can act in two ways. Either, they can affect the crys tal potential of the unit cell, and therefore change the bandstructure Pno(k)
such that

E (k. r)
where

EnQ(k)

6En (r).
index,
or

(4.1)
they
can

6En (r) is the perturbation and n the band potential energy T^r) which is superimposed on

produce

the bandstructure such that

,(k.r)
En (k, r)

,2(k.r)+*(r).
an

(4.2)
external

is the total energy of the nth band under the influence of

4.2.

Equilibrium

carrier densities

49

potential.

The exact

Schrdinger equation

for the

crystal

in

force field is

ft4>(k)=$(k),
with
a

(4.3)

Hamilton

operator of the form


r?
U
=
-

2???

V2 +

U(r)

#(r),

(4.4)

where U is the

crystal potential operator. If the externally applied forces are slowly varying over the dimension of the crystal unit cell, Eq. (4.3) transforms equivalent Schrdinger equation

into the

Ui,A(r)=nA(r),
where

(4.5)
a

A(r)

are

Wannier functions, and


e.

PLn is the effective Haniiltonian for

band with the index n, i.

#n=

n2
2

_^V

\m*x{v)

+*(r).
X

(4.6)
of the

Equation (4.6)

has the form

Hn

correspondence principle (-7V

>

En( /V.r) k) yields


+
no

^(r). Application

*Hn(k,r)
The Haniiltonian in

P(k.r)
contains

/(r)

Sn(k,r).

(4.7)

explicit potential term for the peri odic crystal background potential. Electrons (or holes) are described as par ticles with a spatially varying effective mass ???* which is different from the mass m of the free electron. The effective mass depends on the material and Eq. (4.7)
the

of

particular band En atk ko=

which is assumed to be

parabolic

around the minimum

Modifications of the bandstructure due to nonuniform lattice

according

to

SEn(r)
band
with the

locally varying AEn(r). Usually,


The

materials

is

described

the band offset is

by the given for the


can

spacing band offset


conduction

(conduction-band offset).

The valence-band offset energy of the

be determined forces in
e.

bandgap g.

potential

externally applied

semiconductor devices is the

potential

energy of the electrostatic

field, i.

\Ef(r)
where
nian

-qo{r).
potential. Now,

(4.8)
the effective Haniilto

f> is the electrostaticin Eq. (4.7) is written


n (k. r)

or

Hartree

P0(k)

AP (r)

<#(r).

(4.9)

50

Chapter

4.

Transport

coefficients

For

some as

fixed

point in k-space, usually

minimum

(valley), Eq. (4.9)

can

be

written

(r)
where and
v

P (k, r)
to

qf(r).

c.

v;

//=!,...,
the

(4.10)

refers

the lowest conduction band, index.

to

highest

valence band

is the

valley

Figure free
it is

4.1 shows the energy band level

diagram for two diagram


an

materials with different is the

bandstructure.
vacuum

The reference for the band

infinitethe

or

forceexter

Eq.

It is defined

as

the energy
is defined
an

electron would have if


or

completely

free from the influence of the material


vacuum

applied

nal forces.

The local

level

P\

as

the

vacuum

level in the

presence of forces, i.

e.

in the presence of

electrostatic field

ci(r)

Eq -qo{r).
=

(4.11) E\. The


energy needed to

Therefore, in the absence of forces Eq


excite
an

E\

electron from the conduction band to the local

vacuum

level is the

affinity \. It accounts for the work against image forces and sur face dipoles. The work function <f> of the semiconductor is defined as the change in free energy of the material if an electron is added or taken away
electron from the system. The work function
more

changes

with the

doping.

Therefore, it is

practicable

to

characterize the material

using

the electron

affinity.

The

conduction-band offset

APC

used in the band energy,

Eq. (4.9),

is calculated

F(x)

S(x)

Figure 4.1: Energy band diagram for nonuniform material before (left) and after (right) contact. Phe different chemical potentials pL and p2 align to
a

constant Fermi energy

potential if no

equilibrium. external potentials are applied.


m

Ep

Phe

potential cp

is the built-in

4.2.

Equilibrium

carrier densities

51

as

Ac(r)

xi(r)-X2(r),
yo
are

(4.12)
ma

(electron-affinity rule) where \ [ and terials building a heterojunction at r.

the electron affinities of two

Before contact, each of the materials is characterized


tential ft.
to

by

chemical po

The effect of the electrostatic

potential

on

the energy levels due

q<f(r) is described by a locally varying chemical potential, electrochemical potential ( which is defined as follows
=

T^r)

the

(r)=fi(r)-qo(r).
Before contact, the materials
are

(4.13)

by different chemical poten tials, /i, electron affinities, \, and energy gaps g 8Y (Fig. 4.1). After 8C contact, the difference in the chemical potentials leads to electron transfer from right-hand- to the left-hand side minimizing the free energy and estab lishing thermodynamic equilibrium characterized by an uniform electrochem ical potential at a Fermi energy Pp C const. In /i-doped materials the
characterized
=

electron transfer ionizes donors


trons
on

on

the

right-hand

side and creates

excess

elec

the left-hand side. An internal electrostatic

junction which is flat in regions far from the trality holds. The potential difference between the two materials can be under stood as a potential drop (voltage) which is built-in into the junction because of its internal composition (material composition, doping). It is especially not an externally applied voltage.

the

potential is induced across junction where charge neu

4.2.2

Quasi-equilibrium approximation

potential o(r) in a semiconductor structure depends on the charge p(r). In general, p also depends on the current flow. The self-consistent evaluation of potential, carrier densities and current densities is the fundamen tal problem of device theory. However, in many cases an adequate estimate
for the densities and the
This is called
can

The electrostatic

potential

can

be calculated

by neglecting

the current.

be
a

with

quasi-equilibrium approximation. It is assumed that the device subdivided into regions, each of which is locally in thermal equilibrium Fermi level set by the voltage of a contact to which the region is con
assumption
holds

nected. This

exactly

if

no

external

voltages

are

applied

to

the contacts and the structure is

naturally

in thermal

equilibrium.

If different

52

Chapter

4.

Transport

coefficients

applied to the contacts, the regions with different Fermi levels have to be separated by insulating regions where the carrier densities are zero and no current flow is possible.
are

voltages

In the

quasi-equilibrium approximation
one

the system of

equations

for the

potential,
reduces to

the carrier densities, and the current densities

given

in Section 1.2

equation

for the electrostatic

potential and

the carrier

densities,

the non-linear Poisson

equation

-X>.(tV<f>)
which is
a

p[],

(4.14)

subject

to

global equation, i. e. appropriate boundary

which is solved for the whole device domain conditions. The total

charge density

is

/#]
where p is the

q(p[d]

n[0]

X+[<f>]

A, M),

(4.15)

density of holes, ?? the density of the electrons, and AdH, Nff are the densities of the ionized impurities. The equilibrium carrier densities for electrons and holes in bulk regions are given by the following state equations for carriers in parabolic bands

n(r)
p(r)
where

A^i(,?c(r)),
NvTi (;,v(r)).

,,c(r)
ih(r)

(J^h^j (^Z^^)
previously
-

(4.16a) (4-16b)

>

Ec

is the conduction band

edge,
+

which

was

defined

as

c(v)
A

Ec0(K)

AEc(t)

#(r).

(4.17)

by the spa tially invariant term FJcq (k ). The val ence-band edge is given by Ev EgEc and Fi ri is a statistical distribution function which in this particular case is the generic Fermi-Dirac integral of order 1/2. The general form of the FermiDirac integral of order o is
v
=

particular

minimum

in the conduction band is characterized

r^
J

xdt
a
^

1 X

exp( /;)

rt

-l

(4.18)

4.2.

Equilibrium

carrier densities

53

The factor

AP is the effective conduction-band density of stales

Nr

Xirm:tkBry MC7

(4.19)

with

Mc the number of energetically degenerate conduction band valleys and AP is the effective valence-band density of states
'27071* A*BT

/Vc-2

k?

Mv,

(4.20)
It

where

Mv is the number of energetically degenerate valence band valleys.


an

is not useful to introduce

intrinsic

density
a

/^
a

or an

intrinsic Fermi level

Pi

since these the


mass

quantities

are

not constant

through

heterostructure. Furthermore, semiconductor.

action law pn

n2

is not valid in

degenerate

The total ionized

charge density, Eq. (4.15), also contains contributions from the impurity densities of donors Arcj~ and of acceptors Nr. The state
for these

equations

quantities

are

given

as

Nd

(4.21a)

AP
where g a and ga
are

(4.21b)
the

energies

of the
as

energy scale

degeneracy factors for donors and acceptors. The donor levels Ec\ and Ea are defined with respect to the same the conduction band edge Ec and the valence band edge Ev.
for the structure is obtained by

The

screening equation

combining

all equa
which is
as

tions in this section into the non-linear Poisson solved for the electrostatic
are

equation, Eq. (4.14),

potential f>(r).

Material parameters such

APC

determined

by the design of the

structure and the Fermi energy is fixed

by the external circuitry. The solution d(r) has local screening properties: increasing the potential decreases the charge density and vice versa.

54

Chapter

4.

Transport coefficients

4.2.3

Boundary

conditions and Fermi level

equation is solved within a bounded domain subject to the ap propriate boundary conditions. In principle, two different kinds of boundaries are distinguished. First, real physical boundaries to contacts and interfaces are represented by Diiichlet boundary conditions. Another boundary type is due
to the limited size of the simulation domain. This second

The Poisson

category of artificial
sense

boundaries

(<90a) represents
zero
e.

no

boundary

in the

physical

and is

only

introduced to enable the simulation. i.


e.

Usually,

Neumann

boundary conditions,
normal to the

the condition of
are

gradient

of the electrostatic

potential

boundary

used, i.

nVo(r)
where
n

0,

re

<9Qd,
it is

(4.22) guaranteed

is the unit normal vector of the

boundary. Therefore,

that

no currents are

flowing

in and out the device except contact currents.

physical boundary conditions are either for Of unie contacts (<90o) or for Schottky contacts (ds). For the ith voltage controlled Ohmic contact the boundary condition is

The

<f>^ (r)
where

^ (r)

(j?

0.

re

d0.

(4.23)

(/vjy

is the

externally applied bias,


a
"

and

oj^

is the built-in potential'which

is defined through

local

charge neutrality

condition

using Eq. (4.16)

and

Eq. (4.21).

i.e. 0

p{r)

n(r)

-t

AP/(r)

Xr(T),
act as

c900.

(4.24)

The

terminals, together with the circuit nodes


Fermi levels which
are
are

given
which
in

determined

by

the

charge reservoirs with applied voltages. Terminals


are

connected to the substrate via Ohmic contacts

assumed to be

equilibrium

with the substrate, i.e. the Fermi level in the substrate

region
such

connected to the Ohmic contact is

pinned through

the

applied voltage

that

EF
In

-qog.
can

(4.25)
have differ has been
Other

general,

different

regions

connected to different terminals


a

ent

Fermi levels. However, since

quasi-equilibrium approximation quasi-equilibrium assumption

made, these regions then ha\e wise,


a current

to be

separated by insulating regions.

would flow and the

would be

violated.

4.2.

Equilibrium

carrier densities

55

For

Schottky

barriers the
is used

following

Dirichlet

boundary

condition for the

electrostatic

potential

<!>il\r)
where
^>s

<^(r) + c/4

0$

=0.

re

dQs,
as

(4.26)
the difference of the material

X)

:
is

the

Schottky

barrier of the Mi contact

given

between the work function of the metal and the electron

affinity

the contact is connected to

(Schottky model),
o

(o
G

apo
-*" 1 1

(4.27)

The

height

of the

Schottky

barrier is

characteristic

quantity for

the semicon in

ductor/metal

contact.

Biased

Schottky

contacts are not

generally

rium with the substrate. The Fermi level in the terminal

node, which

equilib is given

applied voltage d)^ is in general different from the substrate Fermi level, which is given by some ground electrode (Ohmic contact) far away from the Schottky contact. Additionally to the Poisson equation, the current equa tions have to be solved to get the bending of the quasi-Fermi potential at the Schottky contact and the contact current right.
by
the
,

4.2.4

Low dimensional electron gases

Kohn-Sham system

The electron

charge
is

in bulk

regions

mensional semi-classical effective

given by Eq. (4.16a) with the three di conduction band density of states Nc. This
parabolic
energy band extrema,

is

approximation
i.
e.

only
a

valid for electrons in

in bands with

localized levels
dimensions has

quadratic dispersion relationship. The charge density for in the bandgap due to carrier confinement in one or more space to be calculated using a different representation of the density
are

of states. Electrons in systems with confinement

described

by

an

equation

of the form

lr

hrv-

\
J

\m*

Veff(r)

c
-

v,(r)

0.

in

O,

(4.28)

where the effective

potential Veff (r) for

electrons is

given

as

Vei(r)-APc(r)^PPH rxc(r).

(4.29)

56

Chapter

4.

Transport coefficients

Figure

4.2

schematically

shows

possible

subdivision of the simulation do

region and the confine ment region O proper boundary conditions for Eq. (4.28), which is only solved in region Q, have to be supplied. Homogeneous Diiichlet boundary conditions for the eigenfunctions </, are
main. For the interface between the semi-classical

suitable

for

confined the
at

carriers.

Consequently,
sities
of 0

carrier den

vanish
and
a

boundary depletion zone is


confined
the
re

the

Device

Semiclassical carrier densities

surrounding the gion. Naturally,

eigenfunc

QD-ODEG

tions should not feel the bound


ary conditions too much.

Envelope
functions

wave

Although Eq. (4.28) looks like a Schrdinger equation, it is what is called a single-band effective-mass equation (BenDaniel-Duke form

Figure 4.2: Domain partition for the Schrdinger equation. Phe depletion zone around the confined region (ODEG) is indi
cated bv
a

135]).

The

das/ied line.
not

crystal potential is periodic on the atomic scale and does itly. It is incorporated through the position dependent
the conduction band m* and the
set

appear

explic
for

effective

mass

position dependent
an
=

conduction band off

APC. Equation (4.28) is

an

effective

single-particle level characterized by responding envelope wavefuetion (/',


The electron

single-particle equation for the ?'th E7 (V0a) and the cor eigenvalue E,
=

'((Veil).
a

mean-field approximation, i.e. each electron moves in the effective potential produced by all other electrons. The form of the effective potential in Eq. (4.29), however, goes beyond the popular Hartree approximation by incorporating not only the classical interac tion due to the electrostatic potential energy, qcf but an additional term Vxc
which accounts for the quantum mechanical interactions due to

screening is treated within

exchange-

and

Schrdinger type Eq. (4.28) with an appropriate formulation for the exchange- and correlation potential is known within the framework of density-functional theory (DFT) as the Kohn-Sham equation [51]. A short account of DFT is given in Appendix C.
Density-functional theory states and Yxc[n](r) are unique functionals
that the two

correlation. The

potential

terms

qf[n](r)
The

of the electron

charge density (49).


wavefunctions

charge density

is

compiled from

the

single-particle

according

4.2.

Equilibrium

carrier densities

57

to

the quantum mechanical

expression
oo

?7(Veff)(r)
The numbers

Y ^(>eff)k/',(Vcft)(r)|2,
=0

G 0.

(4.30)

N,

are

the

occupation

factors

according

to

iV!(Veff)
where p, denotes the chemical
ferent forms the

/(fJ(Veff)-//),
and

(4.31)

potential,

is the

thermodynamic equilib
d,

rium distribution function for electrons.

The distribution function takes dif

depending

on

the reduced dimension of the electron gas. With

dimensionality

of the electron gas. this is


1

if
if

d d

3
2

/(s)

rjT0

(_-JL_),
kBT

tv=<J-
0

if

d= 1

where
s

is

some
as

positive constant,

T the temperature of the electron gas and

eigenvalue E7 corresponding to the wavefunction ijy used in Eq. (4.30) and the chemical potential, i. e. s Et (VCfr)A*The chemical potential for a given electron number, p(N), is defined by the

is defined

the difference of the

charge conservation law, i.

e.

dr

n(Veti)(r)

V/(,(Veff)
7=0

W).

(4.32)

Electron densities

Confinement is
in two

possible in one space dimension (quantum wells: 2DEG), dimensions (quantum wires: 1DEG) or in all three space dimensions

(quantum dots: ODEG). For zero-dimensional electron gases in quantum dots,


i.e. O C

jR3,

the distribution function is

given by

the Fermi-Dirac distribution

f(s)

2t,F

(pX)

-,

(4.33)

with

E,

s,,

the

single-particle

energy of the iih quantum dot level. For


e.

one-

dimensional electron gases in quantum wires, i.

O C

]i2,

the distribution

58

Chapter

4.

Transport

coefficients

function is

J\

2tt1P

J
a
~T

"3

\kBPj
i
'

(2ml A'bT)

/'^

Klf
-,

'/

Y,

(4.34)

H-expU+^rj
of the
/th
one-

with

E,

6;,

the

dimensional subband.

position dependent subband energy The Schrdinger equation. Eq. (4.28),


=

is solved in slices

alongside
mass

the ID-channel and //C

m\

is the conduction band effective

component

perpendicular
e.

to

. For

two-dimensional electron gas in

quantum wells, i.

O C

A1.

the distribution function is

given

as

/W

2^!ltr^ (^) ^^ln (1


^

+ CXP

())
is solved

'

(4.35)
with

E,

j,

the

position dependent
The
=

subband energy of the

?th twoone-

dimensional subband.

Schrdinger equation, Eq. (4.28),


n

is the component of fhe conduction band rn\ effective mass perpendicular to 0. The factor 2 arises from the spin degen eracy of the eigenstates. g is the valley degeneracy of the particular material.

dimensionally

and ?7?*

Two-dimensional systems with one-dimensional confinement


for instance

are

studied for 2DEGs in semiconductor inversion and accumulation

intensively layers (see

L30J).
dots
are

Quantum
In
some
a

regions

with confinement in all three space dimensions.


are

structures, the electrons


few hundred nanometers

confined in

tiny

areas

of
are

typical
~

sizes

below

(typical

for GaAs systems

100 nm).
be

The energy level spectrum is discrete and the


than there thermal

spacing

of the levels

can

larger
used

broadening.
as

The Fermi-Dirac distribution, which

was

in the

previous
not a

section

distribution function for electrons amongst the


any
more.

levels, is
dot
are

good approximation

The electrons in the quantum


a

isolated from the resenoirs, and therefore, the definition of

Fermi

energy for the dot electrons is somewhat

meaningless. The electron gas in a quantum dot is described by canonic ensemble theory. The electron number is fixed at an integer value N and the occupation factors N, for the electrons in an effective potential VAr are determined by the Gibbs distribution for localized

4.2.

Equilibrium

carrier densities

59

states

g(s, \N)
A,

as

already

introduced in

Chapter

(Eq. (3.12)),

i.

e.

X)
-

Z(X)

exp

XX

kBT

"/A

n>AN

v in

(4.36)

where

Z(N)

is the

A"-dependent partition

function in the canonic ensemble

theory

Z(N)

y
XX

exp

kBl

AT,

t?a

(4.37)

and

X(N)

kBTln{Z(N))

is defined

as

the free energy of the internal

degrees of freedom. Again, the factor 2 arises from the spin degenerate nature of the eigenstates e,, g is the valley degeneracy of the particular material and T the temperature of the electron gas. In practical calculations, the FermiDirac distribution, Eq. (4.33), can be used instead since for larger electron
numbers in

highly populated quantum dots the deviations of the Fermi-Dirac distribution from the more general Gibbs distribution is small [31], However, the difference can be significant for small numbers of X (see Appendix A).
In
one some

cases, the electron gas in

quantum dot is strongly confined in


nature

dimension, and therefore, its quasi-2D

allows

shortcut to the very

expensive solution of the 3D-Schrdinger equation. The wavefunction ip(r) is separable and an one-dimensional equation is solved in the direction of the strong confinement (which is taken to be the ^-direction for instance) at every point
in the

.ry-plane,
1

i.

e.

h2 d
2

0
4

Oz \ mt dz

Vet(x.y,z) C'y(^)^ A^y)i;fy(x

(4.38)

Assuming only a single subband en(x, y), the index n can be dropped and the charge distribution in the .n/-plane is calculated with the effective potential

c(x.y)

eo(.r,(/),

i.e.

r.y)

(pm

(x, y)

=-

sm 0m

{x, y).

(4.39)

The mth

single-particle wavefunction within the single-subband approxima tion is 0m (r) > 0mo(.r. y, z) om (x. y)Co'V {z) an(i m is the energy of the corresponding single-particle level.
=

60

Chapter

4.

Transport

coefficients

4.3

Total free

energies

4.3.1

Equilibrium thermodynamics

The first and second law of

thermodynamics
a

are

condensed in

an

equation

for

the total internal energy E of B

system (Eider's equation) such that

-i>V +

5>AV
on

(4.40)

where the intensive variables (not

depending

the

particle concentration)

temperature T, pressure P,
tensive variables

and chemical
on

(depending

the

potential p, are related to the ex particle concentration) entropy S, volume


p} and of

V, and particle number X,. The index of the chemical potential


the

particle number Xt refers to a particular species of particles With Eq. (4.40) the Helmholtz free energy can be defined as
F= E-TS.
and the Gibbs free energy

in the system.

(4.41)

as

G
both of which have minimal
constant.

E- TS X PC,
at thermal

(4.42)

properties

equilibrium if T

and

A)

are

P is at minimum for constant volume and 67 for constant pressure.

change of the Helmholtz free energy is completely transformed into work. Using Eq. (4.40) a system consisting of a single species of particles with particle number N and the total charge Q qX has the free energy
an

In

isothermal transformation the

F
The Fermi energy when
an

-?7 +
the

(/i-(/o)A
change
in free energy of the

(4.43)

EF is defined
or

as

crystal

electron is added

taken away

qo.

(4.44)

where 0 is the internal electrostatic

potential
in

energy

(built-in potential) of the


no excess

system. The built-in potential is

zero

equilibrium with

carriers

present. Only in this

case

the Fermi energy

equals

the chemical

potential.

The

4.3.

Total free

energies

61

equilibrium. In a non-equilibrium situ ation (externally applied forces) the (non-equilibrium) Fermi energy is often referred to as quasi-Fermi potential C, qf>, where qo is the sum of the p
=

Fermi energy is constant in thermal

internal- and the external

potential. The property Q

EFN is the grand

canonical

potential.

4.3.2

Helmholtz free energy and external forces

To calculate the total

(Helmholtz)

free energy of

of i

i... XI distinct elements with the total

charged system consisting equilibrium charges Q, and the


a

voltages V,

the

following

semi-classical

expression

is used

145]

F=YlQ>Vi-y, / affinait/),

Vi

,--~iJo

(4.45)

where the

provided by the external circuitry (voltage sources). The first term in Eq. (4.45) is the capacitive (potential-) energy U stored in the device. Voltages and charges are related by the elements of the symmetric capacitance matrix C7;, i. e. the charge at the ith clement is related
are

the currents

to the

voltages V3

at all

elements such that


M

The

diagonal

elements The

of the

capacitance

matrix

are

the

capacitances.
or

negative off-diagonal

elements

arc

mutual

positive selfcapacitances

coefficients of ith charge due to


constant.

induction which account for the amount of


the

change

in the

jth voltage
matrix with

if all other

change in the voltages are kept

{Gn}

is the

capacitance

M(M

l)/2 independent

elements.
The device is

separated

into elements which contain

continuous space

charge p (dot, leads, donor layer) and metal plates which are equipotential regions (gates, contacts). The electrostatic energy U is written as
U
-

\ j dvp(r)<f(r) Xlr}Y
V

Q>V>-

{4A1)

il

tutes

The

potential c/>

is the electrostatic

potential,

i.

e.

the solution of the Poisson

equation with

the

charge density

p.

subject to

Diiichlet

boundary

conditions at

62

Chapter

4.

Transport

coefficients

gates and
i.
e.

contacts. The electrostatic

of the Greens function of the Poisson

potential can also be expressed in equation, (7(r, r') l/(c(r') |r


=

terms
-

r'|),

0(r)
The

f dr'G(r.rf)p{r').

(4.48)

integral over the space charges replaces the summation over the M charged elements in Eq. (4.45). The energy contribution from the gates which are kept at constant voltages \ ] is calculated with the surface charges Q, which
are

obtained

using

Gauss law. i.

e.

Ql=

dfo-{r)

with

rr(r)

-<(r)^El,
OYlf

(4.49)

d,
where

<r(r)

is the surface

charge density

and rif is the unit surface normal

vector of the ?'th

gate

at

<9Q;. Eq. (4.45)


is the work IF which is needed to

The second term in

charge

all

elements which
source

are

connected to external

circuitry (such
are

as

the gates and the

and drain

region)
the

when Ar electrons

transferred to the quantum dot

region.

It is assumed that the


e.

ation times, i.
ideal with

charging is fast compared with the internal relax tunneling time rL. Voltage sources are considered to be

(low-impedance environment). Therefore, it is reasonable to assume that the voltages are kept at constant level before and after the charging Vj(t) \]{0). Using I dQ/dt the current integral in Eq. (4.45), i. e. the work W, for the charging of the ith element is written
zero

internal resistances

Wt
The

Vt

I
7o

df

I,(t')

VfCKt)
be

Q,(0)]

V,QL.

(4.50)

charge
as

at

the ith gate at /

can

arbitrarily

set to

Q7(0)

0. Com

bining
is

these results, the final form of the semi-classical Helmholtz free energy

given

-=

Y
f k HIS

/
O,

dr/)(r)<;)(r'

MUS

;L
'This again
time
is not

Y
.ifnilii.

..Blrf

/drp(r)o(r)/

l- V QX.
/

f,

(4.51)

|,||f

cads

; t

gates

between the

tunneling dilution rt, tunneling e\ents and rt C r

the

moteo\ei it is

the system lelaxation time,

the

(see

Chaptei 2)

4.3. Total free

energies

63

The work needed to

recharge

the ith element

during

single tunneling

event
can

in transition of the dot from the be calculated in


a

AAparticle
e.

to the

(iV + 1)-particle

system

similar manner, i.

AW,=
where

I
7o

dt'I,(t')V,{t')
Q,(N).
The

AQ,Vn
are

(4.52)
surface

AQ7

Q-,(N

-(-

1)

charges Cf,
a

charges

calculated

using Eq. (4.49)

if the ?th element is

metal gate.

4.3.3

Helmholtz free energy and

charge quantization

In the

case

of bound states in

zero-dimensional electron gas the free energy


on

has to be modified

including

the influence of the confined states

the to

tal energy of the quantum dot

[42], [43], [45].


e.

The Helmholtz free energy.

Eq. (4.45), is extended by

two terms, i.

F({r,k}iN)

Y^4
'

'IT

Exc+~Y/Q>V>-Yl / <lf'/,(f')V;(0/
,i(M...ii.i..Llrf

.,**m**KHl

(4.53)
The first
sum over

the bare

(non-interacting)

dot levels

with

particular oc

cupation configuration {/?/,} is the interaction-free kinetic energy of the quan tum dot Ts. The exchange-correlation energy F\c of the electrons in the localdensity approximation (EDA) corresponds to a (local) exchange-correlation

potential ipc according


EDA). The last
free energy is

to

two terms

Eq. (C.ll) (see Appendix C for a discussion of the are the same as in Eq. (4.45) in the previous section.

The total energy contribution of the quantum dot electrons to the Helmholtz

Etat {{'U}-Q dot X^lot)


From the Kohn-Sham

=YUk^
k

"h

o(AdotFdot

Pxo-

(4.54)

equation, Eq. (4.28),

with the Kohn-Sham effective po


are

tential,

Eq. (4.29),

the self-consistent energies

written

as

<V'A.|

^-V
=

Vj
-

-f

AP(r)

qo(r)

ipc(r)|^)-

(4.55)

With the definition of


X

sf

this results in

(!x(iy\

q<f>(r)\vk)

{Vk\Wc{r)\ik}.

(4.56)

64

Chapter

4.

Transport coefficients

Subsequent

summation

over

k after

weighting

with the

occupation

numbers

ni leads to the

following expression

for the interaction-free kinetic energy

I
xx
k

xY >u
k

/ dr|^|2(/Kr)^ /
h
a

dr

|(/^|2I/xc(r)

occupation configuration dependence of the last two terms is ignored and the discrete occupation numbers /?/, are replaced by the non-integer occupation numbers according to the Gibbs- or Fermi-Dirac distribution, one obtains
If the

Ts(W})
It is not

Ytnk
k

+7

/dr(r)u(r)
9.
a

[ dr n(r)VKC(r).

(4.57)

approximation. However, small thermal variations in the level occupancies have a negligible effect on the self-consistent results (t^, o, p, and Qt) which are implicit functions of the
electron number and the

straightforward to

find

vindication for this

applied voltages [41], [43]. This is especially true for low temperatures, where the level spacing is hardly affected by the tempera ture. The above result is now inserted into Eq. (4.54) where the electrostatic replaced according
to

energy of the quantum dot is

drn(r)c/>(r).
n

(4.58)

The final

expression

for

Ptot

becomes

Ptot(i>u}AP A)

YnXi

-f

zQ

I drn(r)(r)

7^c-

drn(r)rxc(r).

(4.59)

The is

integration

is

over

the quantum dot

area

positive.

The second term in

Eq. (4.59)

is

only and the electron density n the negative electrostatic energy


a mean

of the electrons. This is because the electrostatic energy is counted twice if


the
sum over

the self-consistent

particle

levels from

field

theory

as

the

Kohn-Sham

theory

is included in the total energy calculation.

The last

sum

provides

similar correction for the

exchange-

and correlation energy.


the

The total energy of the quantum dot,


terms in the Helmholtz free energy

EUA. replaces

corresponding

given by Eq. (4.53).

litis leads to the

4.3.

Total free

energies

65

final form of the Helmholtz free energy,


two-terminal

F({nk}, N),

which is used to

com

pute the Gibbs distribution, Eq. (3.9), for the quantum dot occupation and the

linear-response conductance, Eq. (3.37).

In the low temperature


e.

limit,

/?/,.

L for all k < X and nk

0 otherwise, i.

the electrons occupy be denoted

only

the lowest states in the dot and the free energy

can

Fq(X)

with AT

being

an

integer

number and

]P/,

'A

^V-

4.3.4

Free energy minimization

In the

following,

the method used to minimize the free energy to determine the


// of the quantum dot is

equilibrium
ground
state

number of electrons in the dot and the conductance is discussed.

The chemical

potential

and the free energy is

ramped and the self-consistent calculated using the equations from the pre

vious section for

maybe five

values of p above the reservoir Fermi level. The

number of electrons in the quantum dot is

peratures)

and the free energy values

generally non-integer (at finite tem give a parabola if plotted as a function


numbers of electrons,

of ft. Now, the free


determined

energies

at

integer

P({'A },X),

are

Gibbs
in the

by spline interpolation. These free energy values are used in the distribution Eq. (3.11) to calculate the equilibrium number of electrons dot and the conductance according to Eq. (3.35) (note that the Fermi

energy used in these

equations
1

is the reservoir Fermi

energy).

CO

\
\ \

63 0
CD

\
e

(a)

(b)

40

c
Z3

1
1
\

X2

3<D

c
!

E
Z5 C

\
.

30

^
p
CD C CD

f :\
!

CO
G
3

20

1
\
\

_CD

a
c

1
\

LU

L*

10

CD CD
LL

62 0
\
1

II

.1

-10

-0 78

-0 76

60

62

64

60

62

64

Gate

voltage (V)

Electre n tlumber

Figure

4.3:

Left: Coulomb blockade peak and discrete charging (dashed line)

of a GaAs quantum dot at 1 K. Right: free energy curves at the conductance peak (a) and between two peaks (b). Phe zero of the free energy is set arbi
trarily.

66

Chapter

4.

Transport

coefficients

Figure 4.3 shows

an

example of a conductance peak and the voltage.


Also

discrete

charg

ing

of

GaAs quantum dot. The electron number in the dot is increased from

62 to 63

by ramping

the gate

a point half-way to the parabola for the top of the conductance next peak (b). It can be seen that the free energies for electron number 62 and 63 are degenerate at the top of the peak and consequently the equilibrium number of electrons is 62.5. Between the peaks, at point (b), the electron number is an integer value and the minimum of the parabola is to be found at

displayed peak (a) and

are

the two free energy

63.

4.4

Tunneling

rates

4.4.1

Bardeen's transfer Haniiltonian method

The

transfer Haniiltonian including tunneling


able to

formalism

was

introduced

by
of

Bardeen
a

[36]

in 1961.

It has proven to be very successful in the


ena

description

between normal metals and

phenom superconductors and was

number of

Josephson effect [381. The transfer Hamiltonian for malism is based on the separation of the system into subsystems. Consider a two reservoir/barrier system described by the following model Haniiltonian
even

predict

the

={PA iXy
(
/in
ii

it "R-

(4.60)
Each

'Hl and 'Hn


tains
a

are

the Hamiltonians for the


to
an

subsystems.
a

subsystem

con

reservoir connected

electrode and

semi-infinite barrier

Fig.

(4.4). Ol and Ol denote the half-spaces for which the Hamiltonians 'Hi and

fi\\

adequate descriptions. The eigenstates and eigen functions of subsystems are given as the solutions to two Schrdinger equations
are

the two

PPa''o =Eovq,
PlAA =P/P
A

(4.61)

In other words, it is assumed that the electron tunnels from the left hand side to
set of
a

given

state
a

Eq

on

state

F\.

on

the

right

hand side which is part of

eigenstates

of

'HB.

Now, the solution of the

given time-dependent Schrdinger

equation

with the model Hamiltonian

/AyP(P)

-Hv{t)

(4.62)

4.4.

Tunneling

rates

67

(a)

Pn

/~-\

(b)

X^

nh

\J

Pfc 77r

(c)

^\
vy

aR

0,

of the tunnel junction. Phe electron tun nels from a given reservoir state Eq to a discrete quantum dot state P\ (b), (c): Left and right subsystem characterized by the Hamiltonians Hj, and'Hji, respectively. Figure
4.4:

(a): Schematic

view

is written

as a

linear combination of

iJjq

and the various i/'f, which

are

indepen

dent of time

iy(t)^a(t)r0c
At t
-=

fXt

+Y^bXt)iye

iEk1

(4.63)

expansion coefficients have 0. Furthermore, the expansion is restricted to first order to vanish, 6(0) in a which leads to a 1 and 0. Inserting the eigenfunction ip(t) into the time-dependent Schrdinger equation yields the following equation for the expansion coefficient
0
one assumes r
=

vq and therefore, the

ink =c'^{E^Eo)tMk,

(4.64)

68

Chapter

4.

Transport

coefficients

with the matrix element for the transition

Mo-*-

Mk (4.65)

Mk

fdriliCHh

Po)Po.

The transition rate

IV-u-

^k follows from
i.
e.

F,
The

lim
f^>^?

\bk(t)\2t

-K

F,

'?I\Mk\26(Ek
n

E0).

(4.66)

remaining task is to evaluate the matrix element, Eq. (4.65), which can be done if P0 and the fk are known. Bardeen suggested a more useful form of the matrix element which is derived now. Using the model Hamiltonian, Eq.
(4.60),
in

Eq. (4.65)
Mk*

j dri!>lCHK-Eo)i!>o,
the

(4.67)

where the

integration

is

over

vanishes

on

the left-hand side.

right half-space only since {n\ \% Since (tA \'H Ek [fo) vanishes on
-

Po|0o)
right-

the

hand side, the matrix element

Mk

can

be

approximated by
-

A4

dr

[Xk('H

E0)wo

)(P

Ek)i,Xk)

/ drfc/^Pvo

iXHif

clEoipo

ifoFkff}

All transitions

are

considered to be elastic

tunneling
a

events, i.

e.

if)oFJkifl

i)fPJoiX

and energy is

always
n=r-

conserved. If

model Hamiltonian of the form

^V2
=

Veff(r)

(4.68)

(i.
a

e.

Kohn-Sham
r

Hamiltonian2) PoPef?Xk

is assumed with the effective


i

potential Veff

as

function of

then

f^eii )
dr

and the matrix element becomes

Mk

--^r /
2m

[v*kV2vo

ioV2].
that the bandstructure

(4-69)

2Note
constant,

that the form of the Hamiltonian


i.

Eq. (4 68) implies

is

e.

the effective

mass

m"

is

not

spatially dependent.
is

Foi

an extension

ot the

spatially tlieory

towards tunnel junctions with wining bandstructure the eadei

referred to

[371.

4.4.

Tunneling

rates

69

Using

Green's theorem the

integral Eq. (4.69) following

can

be evaluated, and the final

form of the matrix element is the

surface

integral

Mk

kv
2m*

(1/

*"k

On

ipo

df;
~z

(4.70)

On

over

the surface of the

right-hand

side

half-space Or
X

with the vector

being

the unit normal vector of the

surface,

dQB.

4.4.2

Adiahatic

theory for quantum dot systems


[36] is applied in

straightforward man ner to a reservoir/quantum dot system. The quantum dot is separated from the reservoir by a narrow quasi-ID channel. By applying a voltage to an elec trostatic gate above the channel a narrow constriction, Fig. (4.5), is created. Since the constriction is formed electrostatically, its boundaries are smooth and electron scattering can be neglected. An ideal quantum point contact (QPC) between the reservoir region and the quantum dot is formed.
The transfer Hamiltonian formalism
a

The wavefunction inside the constriction is one-dimensional width of the constriction


can

140].

The

not be

considered constant, however. The sim the adiabatic

plest theory
sumes

for this
cross

case

is based

on

approximation

which

as

that the

section of the channel

ligible scattering
value of
x

between the subbands

changes so slowly that only neg occurs. Transport is possible only


occurs

in the .r-direction and confinement of carriers

along

the channel

two-dimensional

?/z-plane. Schrdinger equation


</,

in the

At each

with the

self-consistent effective Kohn-Sham

potential Vcs(x1 energies

z)

for the transverse


is

eigenfunctions f>n (,r;


'

y>

z)

and the subband

(x)

solved, i.

e.

Ir

d2

2/?p
where m*

dy2

ox

Vcij(x. y.z)

en(x) on{.v:y,z)-0,

(4.71)

is the electron effective


mass

mass

tion. The effective i.


e.

is assumed to

perpendicular to the transport direc be constant throughout the /p-plane,


wave

the channel cross-section. The full

function
as

f> satisfying the three-

dimensional

Schrdinger equation

factorizes

if
where the

>>

yk

(.r,

y.

z)

t>

(x:

ty,

z)$h (x),
i.

(4.72)
e.

a-(-*')

are

the solutions of the

coupled-mode equation,

the

70

Chapter

4.

Transport coefficients

Quantum dot

,r

Classical
E
i

turning point

,T

XL

Xb

Figure
the

4.5:

(a) Schematic

view

of the constriction, (b) Phe barrier potential,


a

energies of

the lowest subband and the quantum dot spectrum, in the reservoir.

is the

classical

turning point

one-dimensional
effective

Schrdinger equation

with the nth subband energy <r

(x)

as

potential
h2
l.ni 2m*

02
4(iv Ox

tn(x)

&(<")

-=-

Evkikix)-

(4.73)

The total energy is

Enk

tn(x)
from
a

h2k2
X
-

(4.74)
Enk

Zllh

Now, the

case

of

an

electron

mo\ing

reservoir state labeled

to

OD-quantum dot process requires


stant

state

sp is considered.

Energ>

conservation in the
to assume

that

Enk

slt. It is convenient

that
,r

tunneling V0f is con


< .rx,

outside

larger

range to the left hand side of the barrier

i.

e.

4.4.

Tunneling

rates

71

const for x < xj, < a, Fig. (4.5). Since the constriction is V0rf,L formed electrostatically, its boundaries are smooth and scattered components (cxp(ikx)) of the wavefunction can be neglected. The wave function com

(x)

ponents in the .f-direction in the

outer

regions
is

are

taken to be
root

plane

waves

k (x)

exp(ikx)

where k

/,'l and k(x)

the

positive

~k2{x)-^Enh
2nP

(.).
particular point
in

(4.75)

The classical

turning point a
e-

in the reservoir is that

where

Hnk

cp> i-

where the

energies

of the electron before and after the tunnel

classically forbidden region starts. Classi cally, the wave is reflected at this point. Quantum mechanically, it can tunnel through the barrier. The WKB approximation is used for the x-component of the wavefunction in xF < x < a, Fig. (4.5), i. e.
process
are

ing

matched and the

k(x)
as

exp[u;(.r)]

with

w(x)

dxf

k(x')
<^
a.

(4.76)

long as k(x) varies slowly enough (in particular, if \dk /dx | WKB approximation is also used in the forbidden region x >
function component in
x

'2).
The

The
wave

is

h(.r)^exp[u>(.r)]
and

with

w{x)

Ja

dx'

k(x')

(4.77)

k(x)

is the

positive

root

^yK2(x)^en(x)
2m*

~Enk

(4.78)

again
the
the

assumption of |dK /dx | X k2. The WKB wave functions in different regions would have to be joined correctly as x increases through classical turning point a.
with the
the matrix element for the transition from the nth trans
to

Using Eq. (4.70),


verse

state in

the constriction

the

pth localized quantum


narrow

dot state that

can

be
a

approximated.

The constriction is assumed to be

enough

only

single
states

transverse state is below the

Fermi level. As the electron


\\

moves

away

from the constriction, the channel becomes


the matrix element is calculated

ider and the number of transverse


a

grows. However, within the constriction

single

mode is present and

only

for the transition from the

ground

state

72

Chapter

4.

Transport coefficients

(n
at

0).

Both the channel

region
taken

and the quantum dot


over a

region overlap and

the

matrix element is calculated


some

by integrating
as

surface 0 in the
of the

point

x\>

(usually

the

mid-point

yz-pUme barrier, Fig. (4.5)).

This leads to

Mp

Tr

2m"

<4'rb,
ao((;,=N

dydzQ{)(x\yy.
0
-

K{xh)r<p(xh;y, z)
where

y^t/pUpp
cp.
^ ==

-)

(4.79)

K"(,rb)

is defined

by Eq. (4.78)

with

Eqk

element in

Eq. (4.66)

the

tunneling

rate

Yp

is obtained.

Inserting the matrix Equation (4.79) is the

central result of this section.

Chapter
Provando
e

riprovanclo.

By proof

and refutation.

DANTb, >Paradiso, IA

Numerics
5.1

Introduction

Subject of this chapter


tions for the transistors.

are

the numerical methods

employed

to solve the equa

linear-response model which is used to simulate single-electron The basic equation is the nonlinear Poisson equation

V-(tVrf
where the
p
=

+
as

/o[c)]
the

0,
of all

(5.1)

charge density

p is

given

sum

charges

in the device

n X q(p X~). A considerable portion of the charge is cal Xrff culated by solving Schrclinger-type equations for confined electrons whose interaction is not sufficiently described by the classical Coulomb repulsion alone but requires the inclusion of complex quantum-mechanical many-body interactions. In general, it is not possible to lind analytical solutions for this equations. Therefore, the development of efficient numerical methods is of paramount importance for single-electron device simulation.

The numerical solution of

Eq. (4.14) proceeds

in three steps: first the de

vice is subdivided into small elements with constant electrostatic

potential

and

carrier densities. Then the

equations

in these domains

are

approximated by

al

gebraic equations using a finite-difference discretization scheme. This leads to a fairly large system of nonlinear equations for the electrostatic potential f and the charge density p. In a third step this system of equations is solved.

73

74

Chapter

5.

Numerics

5.2

Space

discretization

5.2.1

Finite differences

A discretization

approach in which the differential operators are approximated by differences is known as the method of finite differences (FD). The device domain is partitioned in subclomains separated by grid lines which run paral
lel to the
sented

(Cartesian) coordinate

axes.

Such (/-dimensional

by products

of d one-dimensional

grids can be grids. Consequently, they are

repre

called

tensor-product grids.
The nomenclature for
a

two-dimensional nonuniform
=

grid grid

is shown in
is numbered

Fig. 5.1. In three space dimensions (d by a discrete triple p (?', j, k). The

3)

point

on

the

coordinates of this

rp

(xz,yvzk)

where the elements of this


to

triple

are

point are given by the positions of the

ith, jth and A*th grid line parallel

the

.r-,

y- and -axis,

separation

of the ?'th from the

(i

l)th grid
7

line in the

respectively. The .r-direction is given as


(5.2)
a

IPj
where nT is the
total of
n
j

.iv i

r?,

0,...

na,

highest grid
a

line number in the direction of the r-axis and

--(-1 lines is present in this direction. A scalar

the

grid

is

represented by
ui,).k

quantity ?/(,r, yy z) finite number of sampling points ul))tk with


?-/>/)

at

Hpap-a)

x,

+.r,-ri
zlJjXk

0,.

..

nT

.r,_

+ .r,

U7-

l2.).k
nr,
u

sVvzk

/=-0.... ,nr

--

(5.3)

and

0,

ny and k

ru

if not stated otherwise.

Assuming
can
x

that

is three times
an

be used to find

continuously differentiable, a Taylor expansion approximation for the first order derivative X (x) for
of

(r,_|

x,).

The

Taylor expansion

ii(x/}

is

given

as

4P)

"(*")

(p

A.r)
dx

^XfX^p> (.r) + c7((r?


2 dx-

xf).
(5.4)

Subtracting

an

equivalent equation

for

u(x^i)

from
j

definition of

(/

in the middle between .r, and xt

Eq. (5.4) and using the (Eq. (5.3)) the derivative at

5.2.

Space

discretization

75

y,

~i

":
P
1

wF j

"',-1

/7-1

'j-i V 7

X-i
1

*4
t

i;

Figure
node

5.1: Elements and vertices in

finite difference discretization.


elements

The

circles mark the nodes and the dashed

area

is the box volume associated with

i,j.

Phe shaded

areas are

the

different

surrounding

the node

.r,

is given as

Ox"
This leads to
an

'< +

-1.7.A
.

A,;

AM

0((h

x\lh

(5.5)

approximation for
e.

the first order derivative which has second


error

order accuracy, i.

the local truncation

O is of third order. The above


as

definition of the first order derivative is known


mation. It should be mentioned that without the tion the local truncation
error

central-difference approxi central difference approxima

would be of second order.

C7((/?7C)A.

Tensor-product grids have two major drawbacks. Hie first is the poor con trol one has over the point density of the grid. Refining the grid in regions where the gradients of the sampled properties are high always creates an abun dance of unneeded points in other regions. The number of grid points deter
mines both memory and CPU time

requirements

hich
the

can

seriously

limit the

utility

of finite differences. The second is related

to

rectangular properties

of the grid which makes it difficult to model non-rectangular device features.

76

Chapter

5.

Numerics

regularity of the sparse linear systems emerging from the discretization. The simple banded structure of the matrices allows for the use of very simple data structures and algorithms. Finite differ ences are therefore very appealing if a discretization scheme is needed which
can

The main

advantage, however,

is the

be handled with little effort.

5.2.2

Discretization of V

(y V)
such the non-linear Poisson

The

partial differential equations,


and the
are

as

equation,

Eq. (4.14),

eigenvalue problem
characterized

associated with the Kohn-Sham equa


the
same
=

tion, Eq. (4.28),

by

form of the linear operator

VfyV).
of the both

The material

tensor in the Poisson

dependent tensor 7 (")1/fJ)1,^,e{x,y,z} is the dielectric equation with the components yv^ eUfl and the tensor
=

reciprocal effective
the tensor is
a

mass

in the Kohn-Sham i.
e.

cases

symmetric,

y*"

equation, yvp l/m* In 7^. For symmetric tensors

there

always exists

coordinate system in which the tensor is

diagonal

J^(jlJSp,lX,,e{x,yX=
Furthermore, in isotropic media, yz
the
case

fy
0
0

0 \
0
.

7y

(5.6)

Of/

7^

7". This will be assumed to be

in the next steps.

approximation to the differential operator V (7V) can be derived using the box-integration method. An algebraic equation for an operator at a grid point (i. j, k) is derived by integration over the box p

The finite difference

volume

m7>

{.a

^ 'Ai

v>y3-\ ^

y a

yJ+xzk-x ^z ^

zk+\}"

(5.7)

Application

of Gauss law

yields

f
X
,k

drV-(y(r)Xi,(r))=

I
do/
,

d/7(r)Vw(r),
k

(5.8)

which leads to

surface the line

integral

over

the surface of the box defined

planes bisecting

connecting

a vertex to

its next

by the six neighbor (for vertices

5.3.

Linear

equation solving

and

eigenvalue problems

77

on

boundary, only the volume inside is included). symmetric matrix A which operates on the vector u as

the

The result is

real,

:u),
v=.{i y.s}

hf(h/

hX^X2.3,kvi,xk

where

(Au),^^
for

denotes the

row

(column) of the symmetric matrix associated


of the
=

with the box

equation

(?,j, k) multiplied by u, i.e. the left-hand side u in the box (?, j.k). The order of the matrix isn
a

algebraic
for for

nxxny xnz.

Because of the number of

^?,;,A 0M;a

R1, 1R3,

off-diagonal entries the matrix is tridiagonal five-point matrix for il, j k ES2, and a seven-point matrix
e.

i.

the summation in

Eq. (5.2.2)

is restricted for

problems

with

dimensions d Neumann
tions

or

2.

boundary conditions, especially homogeneous boundary equation


for the electrostatic

condi

(used

in the Poisson
are

potential
as

at

artificial

boundaries)

given

for vertices in the surface

region

nVw(r)
They
reduce to u,y],k-\
i

0.

0 B-

(5.9)
in the ^-direction for in

u,

; k

(n

(0, 0,1))

Implementation of Diiichlet boundary conditions in the surface region D is trivially performed by setting iy uq at (07, y, ,zk) G D where uq is , k a physically meaningful value for either Ohmic- or Schottky contacts.
stance.
=

5.3

Linear

equation solving
equation

and

eigenvalue problems

5.3.1

Linear Poisson

The operator of the linear Poisson

equation

is the
.

Laplace operator C

V
t

(\7)

which acts

on

the electrostatic Potential

The dielectric tensor

is

taken for

inhomogeneous

but

isotropic materials,

which makes all entries of

78

Chapter

5.

Numerics

the matrix

equal

to

e.

hand side of the linear the matrix L

Application of Eq. (5.2.2) and integration of the right equation results in a real symmetric matrix problem for

t(f>=. -ftp.
where <p and p
the total linear system in
are

(5.10)

vectors of the vertex

charge density,

and ft is the is

representations of the potential and diagonal matrix of the box volumes. The
to

Eq. (5.10)

equilibrated according
=

(D-l/2LD_1/2)(D1'20)
in order to restrict the
therefore

-D-1'2fipJ

with

diag(L).
0 <

(5.11)
2. and

improve

the

eigenvalue spectrum of the operator conditioning of the matrix [60].

to

A7

<

The solution of the linear Poisson

equilibrated
cretization

matrix L

TL

2LD

equation requires the inversion of the L 2. Due to the fact that the box dis

couples only between different grid points which are neighbors separated by the box faces, the linear system Eq. (5.10) is sparse, i. e. only a small portion of the matrix entries is nonzero. Furthermore, since the FD
method is used, the
nonzero

entries

trix. To limit time and memory


ces

always fill the same positions in the ma requirements for the inversion of linear matri

it is

mandatory
of the

sparsity
YSMP
l

employ data structures and algorithms that make use of problem. A common data structure for sparse matrices is the
to
nonzero

format: all
of the

entries of the matrix

are

stored in

dense vector.
are

In

vector
a

same

length
to

the

corresponding
n

column indices

listed,
are

and in

third vector
row start

pointers
as

the start of each

row

in the other vectors

stored. The

vector has

length

X L, the last entry


row

being
a,

sentinel.

This format is also known

condensed

format

or

( ia, j

a) -format

because of

an

often used

naming

of the three vectors.

The linear system

can

be solved

by

sparse direct methods, i.

e.

Gaus

sian elimination,

or

by

sparse iterative

methods, usually derivatives of the


The matrices
,

conjugate gradient
dimensional

method

(CG) 154].

resulting

from three-

grids

are

often rather
as

large

applied.
large

CG based methods

BiCG

only iterative methods can 1551. CGS [56] and CGSTAB [57],
are

and

be all

combined with ILU

preconditioning [58)

nowadays

methods of choice in

scale device simulations.

Aale Sparse Matrix Package

5.3.

Linear

equation solving

and

eigenvalue problems

79

5.3.2

Schrdinger equation
is called Kohn-Sham

The

Schrdinger equation (which


a

equation
a

in the

case

of the presence of

Kohn-Sham

potential)

constitutes

matrix

eigenvalue

problem for

the Hamilton operator matrix H

H'0
where the operator 'K

En ft'if)

n.

(5.12)

-t

V, the FTamilton operator with the kinetic part

1/2

(l/r/W),
effective

is discretized

using Eq. (5.2.2).

The

inhomogeThe

neous

reciprocal

mass tensor

1/nV

is assumed to be

diagonal.

potential operator V represents the effective (Kohn-Sham-) potential and is given as the product of the unity matrix times the vector of the vertex poten tial V(r) - (IV)l)k, therefore being a contribution to the diagonal of H. En and tpn are the eigenvectors and eigenvalues of the operator.
In order to transform this lem both sides arrives at
are

equation premultiplied by ft

into
x

standard matrix
=

2. Substituting

eigenvalue prob O1'2 one ft

(fr^Hfr12)(o17Vn)
or

En(n1/2if)n)
=

(5.13)
and

Hi/>7)

Enifn

with the still Hermitian matrix H


=

ft"1'"H. ft"1'"

ft1,/2ipn [60]. The matrix is real and symmetric with eigenvectors tfn out an applied magnetic field, which results in real eigenvalues and eigenvec tors. Boundary conditions are such that the eigenfunctions ipn vanish at the boundary of the Schrdinger grid (homogeneous Diiichlet boundary condi tion) which comprises only a small portion of the total grid.
the

problem as with linear equations arises with eigenvalue prob lems. The matrix representations of the operators are too large for direct meth ods. Alternatively, one uses iterative methods which calculate the eigenvalues
The
same

and vectors at the lower bound of the spectrum up to


is
a

desired number. This

reasonable

therefore

approach, since only the lowest eigenvalues are occupied, physically meaningful within a Kohn-Sham framework.

and

Especially, subspace (Krylow subspace)


be

iteration methods have proven to

extremely powerful for large eigenvalue problems arising not only from space discretizations of the Schrdinger equation. A rather new method in
style QR
near a

this context is the Jacobian-Davidson


is able to obtain
a

method

(JDQR) [59]

which
use

group of

eigenvalues

target At without the

of

80

Chapter

5.

Numerics

shift

and invert strategy.

JDQR is
A search

trying

to

find the smallest


is

eigenvalues
which the

of the matrix

(A

AtI).
is

subspace

generated

onto

projected. The much smaller projected eigenproblem is solved and this leads to approximations for the wanted eigenvectors and eigenvalues of the larger problem (Davidson part). Then, a correction equation for a selected eigenpair is considered. The solution of the correction equation defines an orthogonal correction for the current eigenvector approximation (Jacobi part). The correction is used in the expansion of the search subspace and the process is repeated again. JDQR aims to find &max Schur pairs (q, A)
near

given eigenproblem

At.

It consists of and
an

an outer

iteration, in which
a

an

approximate
an

Schur

pair

is

computed
matrix

inner iteration in which


a

linear system is solved. The linear

system is preconditioned by

matrix K which is

(A

AtI).

Deflation is

i.e. the linear system is

applied w henever a projected onto the subspace orthogonal

approximation of the Schur vector has converged,


to the

found

Schur vectors.

5.4

Nonlinear

equation solving

5.4.1

Introduction

Solving
can

nonlinear be

equations

like the nonlinear Poisson

equation
are

is

task that

only

performed numerically. Traditionally,


solves for

all terms

moved to the

left and

one

F(x)

and

R*v

->

RN,
F)

(5.14)
are

where F is the AT-dimensional vector function whose components

the

individual

equations

to

be satisfied

simultaneously.

The functions

17,

are

func

tions of real variables. Furthermore, it is assumed that

they

are

continuous and

diffrend able with respect to these variables. In many tions


are

cases

the vector func

extremely complicated and hence laborious to compute. This has the immediate consequence that during any iterative solution process the bulk of the computing time will be spent in evaluating the vector function. Thus, the most efficient method will be that which requires the smallest number of
function evaluations.

Other than for linear

equations,

root

finding
an

for nonlinear

equations

in

variably proceeds by

iteration.

Starting

from

initial guess vector for x, the

5.4. Nonlinear

equation solving

81

improved until some predetermined convergence criterion is satis fied. Even for smoothly varying functions, most of the convergence behavior of an algorithm depends on the quality of the initial guess. Providing good initial guesses requires at least some insight into the non-linear problem, i. e.
solution is
some

analysis concerning

the

properties

of the vector function F.


semiconductor device simulations method. However, in most
cases

Most of the methods


are

based

on

the

applied today in familiar Newton-Raphson


can

of

actual interest, Newton methods


are

not be

applied

in

pure way since

they
or

not in

general globally converging.


ensure are

The combination with


a

damping-

line-search schemes to

global
bad

convergence is

very

common

practice.

performers essentially in two cases. First, if the initial guess is only a poor approximation to the solution, and second, if the Jacobian matrix can not be given explicitly and a poor approximation to the algebraic expression for the derivatives or numerically calculated derivatives
Newton-Raphson
methods
have to be used.

single-electron and other quantum-median ics-based simulations, the problems arise mainly with the quantized charge densities which can not be given as functions locally dependent on the electrostatic potential. Therefore,
In

the Jacobian matrix has to be

approximated in some way. In most cases the semi-classical expressions for the charge densities are used to approximate the Jacobian entries which are due to quantized charges. However, quadratic con vergence can not be guaranteed with these approximations, and in many cases
the Newton iterations will fail to converge at all.

'fhe

following
schemes

section is
as

mainly dealing

with inexact and

damped Newton-

Raphson
and

arise from

low-temperature

calculations
are

complete
problems

confinement of carriers. The methods

including partial especially designed to

reduce the number of function evaluations the


due to the inexact Jacobians.

required,

and to work around the

5.4.2

Newton-Raphson

method

The most

equation solving in one dimen sion are bisection and bracketing. The only elementary method that works in multidimensional problems is the Newton-Raphson method. The nonlinear equation is linearized in the vicinity of the solution using a truncated laylor important
methods for nonlinear

82

Chapter

5.

Numerics

expansion

F(x

Sx)

F(x)

+ J Sx X

(Sx2),
are

(5.15)

where J is the Jacobian matrix whose elements

the first order derivatives

of the elements of the

vector

function

OF

J^-zr-1By neglecting
set

(5-16)

OXj
+

terms

of order

<5x2 and setting F(x

Sx)

0,

one

obtains

of linear

equations

for the corrections <)x.

-J"xF(x)
that
move

Sx<

(5.17)
to

the vector function closer to

zero

according
Sx.

xnow

x0id 4

(5.18)

In this sense, Newton's method


a

replaces

system of nonlinear equations with

equations, but since the solutions of the two systems are not identical in general, the process must be repeated until a certain accuracy is achieved. The Newton method converges quadratically if applied close to the
set of linear

solution.

5.4.3

Broyden's
updating

method

Secant

methods

The

high

cost per
to

iteration of the Newton method and/or the difficulties for


calculate the Jacobian matrix has lead to alternative meth
secant method. These methods
on

some

problems
an

ods, analogous the one-dimensional


build up

gradually

approximation

to

the Jacobian based

successive evaluations of

the function vector without effort is saved

explicitly calculating
a

derivatives.

Computational
Jacobian
ma

by updating

factorization of the

approximate

trix at each iteration

formula). Because

(employing techniques similar to the Sherman-Morrison of these two features they are often referred to as secant
these methods gen

updating methods. However, the price to be payed is that erally have super-linear and not quadratic convergence.

5.4. Nonlinear

equation solving

83

Broyden's original

method

One of the most effective schemes for secant

updating

is

Broyden

\s method

approximate Jacobian matrix which is updated at each iteration. If the negative inverse of the approximate Jacobian is denoted &-m^ (J^^pmox me /?7tn quasi-Newton step <5x(m) is the solution of
[61], which begins with
=

an

GX)FX) ^Sx{m) ^0,


where and

(5.19)

(he*)

xl'7H
can

l)

x^m) (cf. Eq. (5.18)).


a

In

general, F(x

Sx)

A 0

Eq. (5.15)

be recast into satisfies

quasi-Newton

secant condition which is

such that

F(x

Sx)

Sx(m) XG{m)SF{m)
where

0,

(5.20)
of the secant

SF^

F^r"4L)

F('").

This is the
one

generalization

approximation to the derivative F' in and numerically advantageous to scale

dimension.

It is both convenient
as

the vectors and redefine Sx and SF

S^X)

^^

__
_

,,p(TM+i)

F("7)|lo

and

SF{m)

"

||F0 + l)

F(n0jjo"
(5.21)

Note, that

now

SF(m)

SFX)

l.

Since

G^ generally

fails to

satisfy
is

Eq. (5.20)
used

an

updating

formula for

G^r") minimizing

HG^"1"1)

G("^||2

Q(m + l)
where

Q(m)

(fa(m)

q(w )SF(X)SFXX/

(5-22)

Eq. (5.20). Equation (5.22) is the Broyden updating formula which is often applied using the Sherman-Morrison formula for an analytical inversion of the approximate (quasi-) Jacobian.
is consistent with

G^m+1^

Modifications of

Broyden's

method

Vanderbilt and Louie


method in which

163] introduced

modified version of the

original

previous iteration steps during the updating procedure. Even though the overall performance of the method is improved over the original method, the storing and multiplications
they
retain the informations from all

84

Chapter

5.

Numerics

shortcoming especially in large-scale applica tions. A new updating formula was derived using least-squares minimization of an error function, which includes all previous vectors Sx and SF weighted
of Ar
x

Ar matrices remained

with

factor l for the nth out of??? steps and


error

factor cjq

assigned to

the

error

in the inverse Jacobian. With the

function defined

as

cjqIIG^1)
to
a

G(n||2

Y^n
n1

I S*{n)

G(m+1W' |2,

(5.23)

subject

variational ansatz

according
=

to

DE/dG
x

one

obtains

G^HJ)
with the

(7HL)(B(77"n)
according
and
to

(5.24)

auxiliary
A)
=

matrices A and B

("<

QO")

x^FXXr

B(m+i)
TA"^1

|
=

FX)fXX^
and

where, the

following

notation for the vectors is introduced

(ujn/ujo)F^^

Sx^71)

--

(uj1i/ujo)Sx(7^

x(n) p()
Still,
a

(Sx^l\

AAA)<7rA(,Vxn)
,F(n))
G

(F(1V

X{NX71)

performed to get (B^nH l^) 'is nec in terms of S~F in essary. Johnson [64] suggested an expansion to infinite order order to avoid explicit matrix inversions. By applying the Sherman-MorrisonWoodbury formula2, the following form of (EF'"^L))~~L was derived
matrix inversion which has
to

be

(B(m ID)

I
=

I +

f(m)(m)f(m)T
l

wjth

8(m)
where

-(AF^?,)F(m))a

dM/mxm\
Using
the result in

is

a m

matrix and not

large

A" matrix.
e.

Eq. (5.24).

a new

updating
_

formula is obtained, i.

q(>+A
2Shei
suppose

g<7)

(Qt')]Am)
toi muta e

4.

-yrX))/f>XFXXi\
and both

(5.26)

man-Mon ison-Woodbm

PVxA\

:-Yxl.V
1

^Vx

and

VTA

1TJ)

are

nonsingular,

than

VTr

A"

-"

L(

VT

1) 1VT.

(5.25)

5.4.

Nonlinear

equation solving

85

This method

can

be

improved

even

further if

G^m^

^ is written in terms of

G^L) [64],

i.e.

qO+i)
with the matrices

__

q(i)

2;("^F^n^T
as

(5.27)

\j(X

and

Z^

defined
i

follows

-ry(m)

A<(t)A(n))

VAA
"

2(m)
The
tion.

^fjOA^ j2(m
formula
can

| 0])/J(m).
be

proof of
The

this

new

updating
as

easily

new

method
as

requires

the storage of the and

accomplished by induc current matrix , and the previous


iterations

vectors x

and F

well

the vectors Sx and SF from the


a m x
m

(storage of
The

2(???

1) A-veetors

matrix).
formula
can

following approximation
Q(m + 1)

for the

updating

be made if

Uq <C Ld7)
=

q(D

fiirn)(m)f(m)T^
form of

(52g)

It

only

remains to find
as a

an

appropriate
the

G^.
-

It is

straightforward

to choose it

diagonal

constant matrix

G^

ai and
a

(0

<

cy

<

1).

According (5F(2) ()F(2)

to Powell

<

F(1)

[651, appropriate ()F(1). More elaborate

choice of

should be such that

choices for

G(1)
um.

be

envisaged.

Another

question

is the choice of the


"l

weights

certainly Johnson [64]


can norm

suggested

to use ujm

(dF^ <5F^7^)

2,

i.

e.

the inverse of the

of

the vector function.

5.4.4

Globally converging

Newton schemes

Newton's method may fail to converge when started far from the solution. Un

fortunately,
a

in AAdimensions there is

no

analogy

to bisection that

can

provide

fail-save

hybrid

method when combined with Newton iterations. Neverthe


to

safeguard the Newton's method and open it to a much broader range of applications. Two methods will be discussed her, one is the damped Newton method especially in the form of the Bank-Rose damped
less, it is

possible

Newton method. The other


on

on

is

an

Broyden's
In the

method

as

discussed

extrapolation method which in the previous section.

can

be based

damped

Newton method, the Newton step Sx is calculated


new

as

usual

at everv

calculation, but then the

iterate is taken to be

x0n+i)=x0)

nim)-x(n

with

o<o(m)<l.

(5.29)

86

Chapter

5.

Numerics

where

(m) is

scalar parameter. The motivation is that far from the solution

the Newton step is


tor

oOA

can

be

likely to adjusted in

be unreliable, in most of the such


a

cases

to

big.

The fac

way that

x^777+1)

is

better

to the

solution if the step is

damped. Sufficiently

close to

approximation the solution c\X)

should

approach unity
are

and the convergence properties of the classical Newton

method

retained.

One method to estimate the


Rose

damping

factor

was

introduced

by

Bank and

[66]. They

showed that under certain conditions


one uses

global

and

quadratic

convergence

is achieved if

with Kk such that

a^

satisfies
<

sufficient

decrease condition

cy(,n)S
where S
>

(1

HF^-^lla/'lF^Ua)
can

(5.31)
as

0 is

fixed, small number which


noted that

be taken

the machine fast


as

epsilon. iipAOlL

It is
_^

readily

a^ approaches unity sufficiently

||F("7+i)||<>.
a

The method after Bank and Rose is


conductor device

modeling. Other than


not

popular method in the field of semi the extrapolation methods discussed


e.

in the next section, it does

alter the direction of the Newton descent, i.

only
[66].
been

the

length

of the method,
Practical

adapted. Convergence properties therefore, remain predictable and are investigated thoroughly experience with this method which shows its capabilities has
of the correction vector is

reported by

Fichtner and Rose

[67] for instance.

An alternative method to the Bank-Rose

damping

method is based

on an
e.

extrapolation

scheme used to determine the


__

optimal

correction vector, i.

x(m+l)
with
n

x(?7) j-l)/x(m) x(,)

x(")

n)

^x(rnn)\

(5 32)

extrapolation depth. Laux [60] used the Anderson extrapo lation method [68J to extrapolate the correction vector in an Newton-Raphson iteration. This combination proved to be superior in convergence if applied
being
the
to

the nonlinear Poisson


an

equation describing

the

charge density of confined

electrons in

two dimensional channel.

Care should be taken in

damping

methods not

using extrapolation methods since in only the length of the correction vector but general
poorer convergence

contrast to

also its di
com

rection is altered. This leads to in

properties

pared

to

damped

Newton methods.

Especially, quadratic

convergence is not

5.5.

Self-consistent

algorithms

87

achieved in most of the

cases.

However, extrapolation methods

can

be advan

tageous if the
method

vector function is very

expensive

to

evaluate. The Bank-Rose

find
tion
a

requires at least two function evaluations, in many cases even more to an appropriate choice for a777. If, for instance, the evaluation of the func vector includes the solution of Schrdinger equations, this can consume

considerable amount of time.

5.5

Self-consistent

algorithms

equation solvers for the solution of the nonlinear Pois son equation are implemented in the SIMNAD software. Both algorithms are based on Newton-Raphson iterations and a predictor-corrector type approach for the evaluation of the vector function F. They are mainly distinguished by
Tow different nonlinear
the methods used to force and stabilize the convergence. The first
uses

algorithm

the Bank-Rose

damping

method and the second

Broyden extrapolation

steps.

5.5.1

Predictor-corrector

approach

Before the methods and there

implementations are explained in more detail, the main idea of the predictor-corrector method in the solution of the nonlinear Poisson equation involving the Schrdinger equation for confined states is

explained.
As

already

outlined in Section 4.2.4, the electrons in bound states of partial confinement


are

or

sub-

bands in the

by the Kohn-Sham equa tion, Eq. (4.28), for the envelope wavefunctions. The charge densities in re gions with zero-, one- or two-dimensional confinement are given by Eq. (4.30) with the (Fermi-Dirac-) distribution functions Eqs. (4.33), (4.34) and (4.35). Apparently, the exact dependence of the electron densities n on the electro static potential is not known. This results in an incorrect contribution to the Jacobian if a Newton-Raphson method is employed. Newton-Raphson meth ods can only be used without the Schrdinger equation coupled via the charge
case

described

densities, i.

e.

with semi-classical

charge

densities

as

in

Eq. (4.16).
to

In many calculate

approaches potential
is

the

dependence of the electron charge density on the approximated assuming a semi-classical form for n
for instance

electrostatic

On/0f> (see

[60]).

88

Chapter

5.

Numerics

approximate expression (predictor equation) for the quantum electron density n[] in O for which an explicit de pendence on the electrostatic potential can be given. Consequently, the Pois son equation
A
more

advanced solution is to

use an

V-(cV0)
can

/)[?7[o].oA^O

(5.33)

Newton-Raphson approach (for all charges other then the quantized charges, the semi-classical expressions are used). The predicted result for n is then corrected in an outer iteration, i. e. the Schrdinger equation
be linearized

using

expression for the charge density is evaluated. An expression for a predictor density which depends explicitly on </> was derived by Irellakis et al. [69]. They applied first order perturbation theory to the
is solved and the correct

Schrdinger equation in a quantum wire. The one-dimensional electron charge density is given according to Eq. (4.30) and Eq. (4.34), i. e.

kBT
with the

dimension-dependent factor
'???* knlX
^f*|=- I
2

AYd

2<? I

2?rr?2

(5.35)

A similar

expression (predictor)

is derived

XX^Xt

/A^+^-^x)

in which the subband energy


mented

t,/

from the last outer step (corrector) is aug

by

the

change

in the electrostatic

potential,

i.

e.

fn[o]-^}- q(6-{k)).
This form of the

(5.37)

density

is in

particular

suitable for

since

an

expression

for the contribution to the

Newton-Raphson methods Jacobian can be given


+

AM
0(0

^D,,nW)^
k'li
I
z'
2

|V-A y--^)
V

A'b

(53g)

5.5.

Self-consistent

algorithms

89

In

perturbation ansatz can be extended towards the electron densities in quantum wells (2DEG) and quantum dots (ODEG) re sulting in similar expressions. If the electrostatic potential is sufficiently con verged, it is used as <pA+i) m tjie Schrdinger equation and ??^,+i) is used to

principle,

this first order

calculate The
son

a new

exchange-correlation potential

V^l/h^^^}.

predictor-corrector
can

method for the solution of the nonlinear Pois

equation
=

be summarized

Fpicd

0 is solved

using

the

predictor type equation approximate density h[<p), Eq. (5.36), i. e.


as
a

follows. First,

Pprcd
Then
a

(fV^l+1))+pWl ui):0(k\Hk\t^}l<f>(k+1)].

(5.39)

corrector

step is performed which includes the solution of the

Schrdinger equation with the electrostatic potential solution of the predictor equation (/>^'+i) and the exchange-correlation potential calculated with n/k'^ A
Fr_
-^V

/ V

-VV
m

A?c

#(A'41}

V4c[^+1)]

(Ml)

L(11k+l)ij^+l).
With the exact

(5.40)
the correct
non

(corrector-)

electron

density n[<p\, Eq. (5.34),

linear function vector

Fcorr is evaluated
+

FcolI

(cV<fi{k+1))
are

/>[[^+1);{V>ifr fl),4frtl)}]^(A * l)]^|Fcou||2


<
e.

(5-41)

The iterations

repeated

until

5.5.2

Algorithm implementation

in siMNAD

Figure 5.2 shows a flow chart of a Newton-Raphson method with Bank-Rose damping for the above described nonlinear Poisson equation. The vector func tion F is composed of the \alues of the residual of the Poisson equation at
discrete

grid points so that the order of the nonlinear problem is given by the size of the grid, i. e. by the number of nodes. The argument vector x is the scalar electrostatic potential o at discrete grid points. For the predictor form

of the vector function

Fpiea

the electron

Eq. (5.36) or the plicit dependence on the electrostatic potential according


to

density ??[</>] for a 1DEG is corresponding expressions containing


d?

chosen
the
ex

for 2DEG and ODEG. For

the corrector form of the vector function the exact


to

expression n[</>] according


re-

Eq. (5.34)

is used. All other densities

(electrons outside the confinement

90

Chapter

5.

Numerics

Setup

XA

xmit

Concctot step

Yes

F^A

=Fcou(x(A;
tf(rn)
p(m
I t)

__

New

ton-Raphson step
=

(A(7

(_J i)(m)F(0

Bank-Rose step

x(m 1-1)

__

x(m)

aA'Ax(m)

Piedictoi step

F(m-+1)
(m)
Am)

Fpred(x("'fl)

Aa,iifA)a:

Figure 5.2: /-'low chart of a Bank-Rose damped Newton-Raphson algorithm for a predictor-corrector t\pe nonlinear problem. Phe i onvergence criterion for the corrector equation Fcoll is S{ and for the predictor equation Fpiej
the convergence criterion
is

s2
to a

Usually,

one

chooses t~2

=-

lei,

i-

<?

the

predictor equation

is

solved

higher accwac\

then the corrector equation.

5.5. Self-consistent

algorithms

91

gion, given

holes and ionized


in Section 4.2.2.

donors)

are

treated within the semi-classical

equations

The second

algorithm

is based

on a

Broyden extrapolation scheme. The new secant approach (BroydeiTs method) described in Section 5.4.3. update vector is extrapolated from the previous steps. This method has the advantage over the Bank-Rose method that the vector function has to be com puted only once during one Newton step, whereas the Bank-Rose method re determine the correct damping quires multiple, but at least two evaluations to factor c\(nt\ This can be extremely costly if the evaluations have to be per 100 000). On the other side 50 000 formed for vectors of high order (N
with
a
~
...

Newton-Raphson method combined Fig. 5.2. Using the multidimensional

Setup

x(0)

=-

xmit

Coiiectoi step

FO")

=Fcoll(xOA)
'

No
I
I

Piedtctoi step

F<'^Fpied(x(A)
'A"
^

^"""\

NO

V.

Newton-Raphson step

dX,n)

(-J

A(m)FA)

Bioxden

extiapolation step
.

X('U)

x(>-

t)

(Sx{ni\ 5F("'\

SXm "'0, $~pX

"))

Figure 5.3: Flow chart of a Newton-Raphson algorithm combined with a Broyden extrapolation scheme for a predictor-corrector type nonlinear prob
lem.

92

Chapter

5.

Numerics

the

use

of the

Broyden extrapolation
n

method

requires storage

of

at

least 2n

vectors

of order N. The number

is the number of

previous

iteration steps

used for the


The

extrapolation.
and the

success

speed
e.

of convergence

heavily depend

on

the choice

of the initial vector ximt, i.

the choice of the initial electrostatic

potential.

Usually, this is not a big issue in quasistationary calculations where a gate voltage is ramped with considerable smoothness and so the boundary condi tions of the Poisson equation change not very much from one run of the solver to the next. In this case the potential from the previous iteration is always a

good estimate. However, at the


7

very
J

beeinniim of the

calculation, when
"

no

in-

previous runs is available, the Eaplace equation, subject to the appropriate boundary conditions is solved and the (homogeneous) potential is
formation from
used
as

the initial choice.

5.5.3

Examples

In order to demonstrate the convergence behavior of the non-linear methods

presented,

performed. A GaAs/AlGaAs structure similar to the one discussed in the next chapter is used. The 2DEG in the GaAs/AlGaAs heterojunction is modeled assuming three independent
a

calculations for

test structure are

1er2 1CA4
=
=

10~6
108 KT10
10
12

_j_

500

1000

1500

2000

CPU time

(s)

Figure
imation
Rose

5.4:

Convergence of the
guess
a.

Bank-Rose

algorithm (o)
curve

with

poor approx

of the initial damping factor

potential.
and the

Phe other

(A) shows the Bank-

Phe dotted lines mark the convergence threshold for

the corrector

equation (c\)

predictor equation (S2), respectively.

5.5.

Self-consistent

algorithms

93

regions

with one-dimensional confinement in the ^-direction. Two


source

related to the drain and

region, respectively,

and the third

regions region is

are

the

quantum dot region.

Figure
son

5.4 shows the convergence for the residual of the non-linear Pois

damping factor a for the Bank-Rose algorithm. The solution of the homogeneous Poisson equation was used as initial estimate for the potential which is a rather poor approximation resulting in a slow con vergence during the first steps. The residual exhibits the typical seesaw-like behavior of predictor-corrector equations since the residual always increases if the corrector equation is solved. A good performance of the Newton-Raphson method is achieved for the predictor equation because of the exact Jacobian involved. The calculation was performed at a temperature of 4.2 K. equation
and the
The result of this calculation is used where the 2DEG model ODEG model
as

||F^'7^ ||2

initial guess for the next


00

run a

previously

used for the quantum dot is 50


...

replaced by

eigenvalues in the quantum dot. The performance of the Bank-Rose algorithm was compared to that of the Broyden-extrapolation algorithm in which the following parameters were 4 and GA1^ 0.5 I. The calculations were now performed 10" used: uq
solving
for

approximately

at

1 K. The
a

where

Broyden-extrapolation algorithm is usually faster in calculations good initial guess potential can be provided, i. e. it is mostly used in
calculations where
a

quasistationary

gate voltage is ramped in small steps and


can

the result from the

previous

calculation

be used

as

initial estimate.

The

10

10

10~8
10
10

AAA
\ /
<

1A

-12

500

1000

1500

2000

2500

CPU time

(s)

Figure 5.5: Comparison of extrapolation algorithm (o).

the Bank-Rose

algorithm (U)

with the

Broyden-

Phe dotted lines mark the convergence threshold and the

for

the corrector

equation (si)

predictor equation (S'i), respectively.

94

Chapter

5.

Numerics

Bank-Rose

algorithm generally proved

to be

more

stable and converges

even
a a

if the initial estimate is rather poor. It is therefore the method of choice if good guess for the potential is needed or no previously calculated results for
structure are available.

Chapter
And here Alice saying to

6
to

begun
in
a

get rallier sleepy, and


sort

went on
cats cat

herself,
cats eat

dreamy

of way,
either

'Do

bats? Do

bats?' and sometimes 'Do bats


answer

eat

cats'?'

for,

vou see, as

she couldn 't


wax

question,

it clidn 't

much

matter

which

she put it.

Liwis Carroll, Alice's Adventures in Wonderlands

Simulation
6.1

examples

GaAs/AlGaAs heterostructure

The most

commonly

used material system for quantum dot structures is

gal

lium arsenide,

GaAs, which combined with the ternary solution aluminum-

gallium arsenide, AlxGai_.,r As. serving as barrier material, allows for the cre ation of very thin epitaxial layers as a result of the almost equal lattice con
stants. The

strong electrostatic confinement

at

the interface between GaAs and


move

AlGaAs

can

be used to constrain electrons to

in

plane,

thus

forming

two-dimensional electron gas The 2DEG


The
can

(2DEG).
any desired

be

given

shape of the gas is defined either which electrostatically deplete the 2DEG underneath. The latter method the advantage that the depletion is not permanent and can be switched
Focal

shape using lithographic methods. by etching a pattern or by metallic gates


has

off.

depletion of the electron gas is associated with a local increase of the electrostatic potential relative to the undepleted region. The resulting potential step in the 2DEG is smooth because of the large depletion length of 100 nm. This is the basis for the so called split-gate technique used to define small
channels
or

dots with variable size and smooth boundaries

by

means

of several

95

96

Chapter

6.

Simulation

examples

r.-T

-,-'

^;A"A

4nm

Alo 32Ga0 esAs


=

^\
\
\

{Nd
16

g x

10i2
>Gao

cm

2)

nm

Alo

'-i

68

As

GaAs substi

ate

Figure

6.1:

Schematic

of the horizontal

structure

of

the GaAs/AlGaAs het

erostructure.

Phe dashed line marks the 2DFG.

gates deposited

on

the top semiconductor

isolated from each other because of the


the metal/semiconductor contact if

layer. Schottky
in

The gates

are

barriers which

automatically are formed by


e.

operated

reverse

bias, i.

by applying

negative voltages

with respect to the semiconductor

ground.

At low temperatures, the distances

conducting electrons are free to move over large (several /./.in) without being scattered and therefore maintain phase
For systems with size

quantization which is connected with a change in the density of states, the Fermi wavelength Ap is important. It de fines the length scale on which the wave nature of a particle becomes obvious. The electron motion is confined and only standing wave solutions, i. e. bound The quantum mechanical wavestates with discrete energies are allowed. function of a particle with the Fermi energy Ap has the typical wave length
Ap
=

coherence.

2tAf
10

and

kp

(2mFX/h2)1^2.

Particles at the Fermi

edge

are es

sential for

Ep

charge transport. In meV and Ap 50 nm.


6.1 shows
an

GaAs heterostructures the

typical

value for

Figure
with
a

example

for

GaAs/AlGaAs heterostructure 170]


nm

patterned top gate.

The 2DEG is situated around 45


a

below the

gate

at the

interface between the GaAs substrate and

AIq 32Gao egAs. The conduction band edge and the


calculated at 1 K
at
are

layer composed of electron charge density


of the conduction band
level

shown in
=

Fig.

the

exposed
zero.

surface (z

0) is

position determined by Fermi

6.2. The

pinning.

The

con

ductance band
to

edge

is

pinned

600 meV above the Fermi level which is taken atomic-force

be

Figure

6.3 shows

an

split-gate structure [71]. The gates consist (Ti) and gold (Au). A 5 nm layer of Ti is first evaporated directly at the GaAs cap-layer. Then a 50-150 nm thick layer of gold is deposited. The Schottky

microscopy (AFM) picture of a of a layered structure of titanium

6.1. GaAs/AlGaAs heterostructure

97

barrier is determined The gates


as

mainly by

the Ti/GaAs contact

(f>s

800

meV).

are

asterisked
the fin
to
06
>
17
~

follows:

is

1 5x10

ger

gate which forms


with
two

E
o

gether
and Q1

the

gates

Q1

quantum point

>,04
E?

1 0x10

w c Q>

contacts

(QPC) by deplet

<5

TJ

iS

02

C
-

ing

electron

charges

in the
00
-

-I

5 0x10

16

O
o

2DEG underneath the gate electrodes.

LU

Usually, negative
are

20

40
z

60

80

100

voltages
to

between 200 meV

(nm)

and 300 meV

sufficient

fully deplete the charges immediately underneath the


gates. A further increase of
the negative voltages leads to

Calculated conduction-band Figure 6.2: edge (solid line) and electron-charge density

(dashed line) of the GaAs/AlGaAs heterostruc


ture

in

Fig. 6.1

in

growth

direction.
or

additional lateral

depletion.

The gate asterisked C is the control-

plunger
a

gate which is used


which is

to vary the

potential

in the quantum dot


an

by applying
tunnel
can

control-gate voltage VA

The gate geometry defines


source

island in the 2DEG

separated

from the drain- and

reservoir

by

two

junc
con-

tions, i.

e. two

quantum point

contacts. The

shape

of the barriers

be

Figure

6.3: AFM

erostructure

picture of the split-gate structure of the GaAs/AlGaAs het SEP in Fig. 6.1. Phe framed region marks the simulated domain. [72f.)

(Courtesy

P. Heinzel

98

Chapter

6.

Simulation

examples

trolled with the gates


controlled

F, Q1

and

F, Q2, respectively.

The island

potential

is

by

the control gate C.


are

Measurements

performed
=

in

dilution

refrigerator
was

temperatures below T
a

1 K. The electron transport

liquid helium at studied by applying


in

small bias
source

voltage (4.3 //V AC)


to

between the drain reservoir to the left and

the

reservoir

the

right.

The current

was

measured

using

standard

lock-in

techniques ([71]

and references

therein).

6.2

Device simulation

6.2.1

Geometry modeling

and

grid

mapped onto a three dimensional non-uniform tensorproduct grid with 69 x 36 x 70 grid points along x x y x z, comprising a total of 173 880 vertex nodes. The total area simulated is a brick-like region of 1000 nmxOOO nmx290 nm. The substrate, which is extending 2.8pm in the
The device in

Fig.

6.1 is

negative 2-direction, boundary conditions


active device

is

effectively

cut-off at 290
as

nm

imposing

von

Neumann

at this surface

well

as

at the surfaces in the lateral .7;in

direct ions where the electric field vanishes at distances far

enough

from the
an

region.

The Fermi level in the substrate is set


e. a

assuming

elec
or a

trode

(ohmic contact) outside the simulated region, i.


connected to
an

metal

backgate

highly doped layer


at

ohmic contact. The

boundary

conditions

Schottky gates (Fig. 6.4(a)) are imposed by use conditions at the relevant nodes (Fig. 6.4(b)) according
the

of Diiichlet
to

boundary

Eq. (4.26).

decomposition of the 2DEG into regions where the cal culation of the electron charge is performed using different models for the electron confinement. Figure 6.4(c) shows the domain decomposition in the 2DEG layer. The quantum dot region (ODEG) is situated in the central region
Critical is the

comprising a total of 12 336 nodes. The wavefunctions and the electron density \anish at the boundaries of this domain. The negative voltages at the split-gates ensure that the area surrounding the ODEG region in the .rty-pane is depleted so that these boundary conditions are
of 585 nmx450 nmx39
nm

adequate. The two quantum wire regions (IDEGs) which are used to selfconsistently model the potential and the 2D-wavefunctions at the quantumpoint contacts (QPCs) are connected to the two quantum well regions (2DEGs)
which

give

the

charge

densities in the drain and

source

regions (leads).

In the

6.2.

Device simulation

99

500

nm

(a)

**i >^*$$$f

^#*^*#*?^4r***^**^**^^f>*^*^*%^^H^
-L
-

El

j^.i^HS.^*$^ | -^i*4i-*4^

|
|

-j

X
!-* ,
.

**$***

|...

-i*^^.^.

(b)

-AH'
1

' DEGs
T

Ar
17
,

^iiiAriA
TT

a'.X...__
-

XT

+.x:..-.it4l-t4,J
j
i

:;.
.-.+

~~-

ZZX'^A"' :::--Xi:-::^^TT;::: J^--: 4X1. A t T ^Xv-~i AtV A+*- \IL-.T pffif h"
"':
r
.

^T

A.XjXiiiL

l._. i A

l^ITLt

--

ti::pT:

L
.-j|i_r
_

fE:I^E|
^ :.;-;:

ODEG

X:z:

A
~

4-~i

X::|
^_

1=1
1^

'

'

Al^^-t^

ff|||4fA^1iA Ai|H]t4!ATlHl .:ir".'X:;:itf tt+t-FP":3^4-iic^


j.-..::.
i

(c)

7h
EGs

A^AA
t

tAAx i i

-*-

~"

Xtt "'Alt.
1

"t.i!+i;:XJr
C.U
-

|i

|l

Figure 6.4: (a)- Scheme of pwdiut gnd and Diiichlet

the

split-gate

su m tute
at

(b) Non-uniform
i>ate

tensor

boundai\ nodes

the

layer

(c)

Domain

decomposition of the 2DEG laser

100

Chapter

6. Simulation

examples

yz-plane and the electron charge is calcu lated according to Eq. (4.35). Usually these regions are completely depleted in order to guarantee a quantum-point contact with a sufficiently high barrier.
However, the calculation of the 2D-wavefunctions and of the lD-subband
en

IDEGs the confinement is in the

quantities are needed in the evaluation of the tunneling rates (see Section 4.4, especially Eq. (4.79)). In general, the differ ent regions can overlap. This is mandatory, especially between the ODEG re gion (quantum dot) and the 1DEG regions (lead channels, QPCs), since both
ergies

is necessary since these

Schrdinger equation are needed to evaluate the tunneling rates, i. e. to calculate the overlap integral in the matrix element Eq. (4.79) at some point in the barrier. However, no special boundary conditions for the charge densities are imposed since the QPC is always depleted at least in its central region. Alternatively, open-boundary conditions for the Schrdinger equation in the quantum dot would have to be formulated to account for the propagating components of the otherwise localized states.

solutions for the

6.2.2

Surface and donors

Part of the surface of the device is covered

by
are

metal gates for which Dirichlet

boundary

conditions for

Schottky
surface

contacts
covers a

employed.

The rest is

exposed

GaAs. Since the


the choice of the

exposed

substantial

portion

of the surface,

appropriate boundary potential


are

condition is crucial for the determi

nation of the electrostatic

in the whole device.

The

properties
near

of
the be

exposed

GaAs surfaces

dominated

by

band of surface states

middle of the assumed to


are

bandgap. be pinned to

While the states underneath the metal gate


the metal Fermi level, those at the

can

exposed

surface is
at

assumed to be

modeled
the

pinned at the substrate Fermi level. Fermi-level pinning using Diiichlet boundary conditions for the electrostatic potential
e.

surface, i.

(r)
The conduction band is set to

v>pm-

dftex.

(6.1)

characteristic value above the Fermi level


...

which is assumed at
of
an

Ec

Ep

0.6

0.8 eA for GaAs surfaces. The choice


is
a

appropriate

model for

exposed surfaces

somewhat controversial is

pinning model leads to unrealistic discontinuous steps of the potential at the edges of the Schottky gates. Also, at low temperatures it is difficult to believe that charges from the 2DEG can move to the surface states in response to shifts in the gate voltages in order to maintain the exposed surface at equipotential and in equilibrium with the substrate. An alternative
sue.

The Fermi level

6.2. Device simulation

101

frozen surface model. The surface is treated as a simple dielec tric boundary with a fixed (frozen) surface charge density Qs which does not move in response to the gate voltage. The corresponding Neumann boundary
choice is the

condition reads

On
where
n

is the unit normal vector of the

boundary.

The

the dielectric constant of the semiconductor


tion
can

means

relatively high value of that this boundary condi

0. The frozen surface model, however, approximated by do/On is only valid if the exposed surface is large and smooth [73], [74k If the sepa ration of the gates is small as in split-gate structures, the above approximations
be

are not

valid and the dielectric has to be modeled

as

well for

a more

realistic

description

of the surface
was

[75].

(i-doped at the GaAs/AlGaAs interface by evaporating silicon during the growth process and at the same time stopping the GaAs deposition. The dopands are assumed to be positioned in an atomic mono layer. However, the Coulomb repulsion between the dopands and the high growth temperatures of 600 K lead to a spreading of the layer. The doping3 nm depending on sheet acquires a finite width which is assumed to be 1 the doping density (see [76] and references therein). A typical value for the 2 two-dimensional charge density in the doping layer is 5 x 1012 cm [72].
The structure
...

If

doping

sheet with

constant

assumed, the three-dimensional

density and charge density

an

effective width of 2
x

nm

is

in the sheet is 3
and the

10l9 cm"3.

The discrete nature of the donors is


as

neglected

doping

sheet is treated

jellium.
The

doping density has to be reduced from that grown in the structure since deep levels are neglected. This is reasonable, since half of the electrons from the doping occupy deep levels. These levels are usually found well below the
Fermi level and the associated

charge

can

be assumed to be frozen out. This


..

results in

an

effective
is used to

doping density

of 1.

1.5

1019

cm

3.

The

remaining

adjust the number of electrons in the quantum dot to a particular value. Comparing the charge densities in the doping sheet and in the 2DEG (Fig. 6.2) one notices that the density of the ionized donors is much higher by two orders of magnitudes. Most of the electrons from the donors are obviously absorbed by the surface states.
uncertainty

102

Chapter

6.

Simulation

examples

6.2.3

Simulation results

The conductance characteristics of the heterostructure


a

was

calculated

small
e.

subspace

of the available parameter space. The control

only for gate voltage,

voltage Vg at gate C was ramped from a negative value of 800 mV to the point at which the depletion of the 2DEG underneath the gate is breaking down. Usually, this happens at around 200 mV. All other gates were kept
i. the

fixed at used to
dot.

value of 700 mV. The the

doping density
e.

in the

(Adoping

sheet

was

adjust

charge density,

i.

the number of electrons in the quantum

Figure 6.5 shows along the ^-direction.


Fermi energy is set to

the conduction-band

edge

and the electron densities

The conduction-band offset between GaAs and Al


no

GaAs is 360 meV. There is


zero.

substrate bias in this

example

and the substrate

Displayed are the densities for a parabolic-band model (Bulk), a two-dimensional electron-gas model (2DEG), and a zerodimensional electron-gas model (ODEG). Only the lowest subband is occupied

u.o

!
I

|
|

\
\
\

0 10

0 05

L
^
_

4.0x10

0.6

\
\

0 00

Bulk

-0 05

:
30

%
\
,

:
i

\
>

-0 10

3.0x1017 'E
u

50

70

S 0.4
E?
CD C 1

\
X
-

2DEG
-

ODEG

2.0x10

17

<U
-o c o o

LU

0.2

A*
\

\
,,

LU

0.0

"~~\\T
1
1
1 1

\\
I

1.0x10

--

..~~

III

t,

20

40
z

60

80

(nm)

Figure

6.5:

Conduction-band

edge

and electron

densities
curve

along

the

z-

direction at 1 K. Phe circles at the conduction-band

of the grid planes

in

first

two

subbands

xy-direction. Phe inset displays the (q, c>X corresponding to the 2DEG model.

position wavefunction s of the

show the

6.2.

Device simulation

103

in the 2DEG model. The subband above the conduction-band

energies <fi
at the

and

<f>2

are

31 meV and 55 meV

edge

GaAs/AlGaAs

heterojunction.
by

This

corresponds
Sarma

to

the values of 24 meV and 46 meV calculated


a

Stern and Das

[77] for

similar structure. The difference of the Fermi energy to the

lowest subband is 6 meV.


in the lateral

The conduction-band
v

edge and

the

electron-charge density

n-planc

is shown in

Fig.
a

6.6. The electron

was

calculated

using

ODEG model

density in the center (quantum dot) sohing a 3D-Schrodinger equation. The


was

number of electrons in the quantum dot


gas shows
a

found to be A"

50. The electron

structure which is related to the

shape of

the 3D-wavefunctions

>

Q1

Split-gate structure (top), conduction-band edge (bottom) in a lateral Figure


edge
6.6:
cuts
are

electron
x

density (middle)

and

y-plane.

Phe density and band-

taken 8

nm

below the GaAsXYlGaAs

heterojunction

in the

0DFG/2DEG.

104

Chapter

6.

Simulation

examples

of the electrons which

are

used to calculate the quantum dot

charge density.
is far from be

The form of the conduction band in the quantum dot

region

ing parabolic and the dot electron charge is distorted towards a non-circular shape. The shape of the confinement is determined by the gate geometry in the first place. This finding is in contrast to the calculations of Kumar et. al. [78] which showed a nearly parabolic shape of the confinement poten tial for a similar layer structure. However, they calculated the self-consistent grounclstate for only around 12 gate symmetric in the xj/-plane.
ing the density Fig.
eter

electrons in the quantum dot and for In order to compare with their
was

top

results, the

electron number in the quantum dot


donor

density

in the

adjusted to around 10 electrons us doping sheet as a tuning parameter. The charge


a

in this

case was

found to exhibit

similar

shape

to the one

shown in

6.6

(middle).

The diam
how

of the electron gas,


was

ever,
to

significantly
~

reduced
in the
0 001
-

around

LOO

nm

^-direction.

Measurements in would be

this

low-filling regime
geometry)

difficult (at least with this de


vice because of the increased barrier thickness. The
electron

charge density
more

is

con
>

centrated

in

the

center

of

the

quantum dot and the

3*
>, O)
>~

-0 001

coupling of the single-particle eigenstates to the leads is very


weak.

CD
C

LU

-0 002

single-particle level spectrum and a cut through wavefunctions the along the ,r-direction through the quantum-point contacts (QPC)
The
are

-0 003

shown in

Fig.
not

6.7. The level


-0 004

spectrum
oscillator with
The
a

is

harmonic
associated
x

500

1000

spectrum
two

(nm)

parabolic

confinement.
are
near

first

eigenstates
and
a

Figure

6.7: Cut

through

the

single-particle
the

non-degenerate

level spectrum

and the conduction-band

degeneracy

occurs

only

with the

edge

in the x-direction

along

QPCs.

6.2. Device simulation

105

Figure

0 .34; spin-degenerate). The Single-particle levels (\f'j\2, i cut has been taken in the xy-plane 8 nm below the GaAs/AlGaAs interface in the ODEG. The lead channels are situated to the left and the right of each

6.8:

..

individual plot.

plots of the individual wavefunctions labeled 2 and 3 in the xy-plane (Fig. 6.8). The distorted shape of the quantum dot potential is also reflected in the shape of the individual wavefunctions shown in Fig. 6.8. One observes a tendency to
third and the fourth level which
can

also been

seen

in the 2D

quasi-one-dimensional \va\efunction-.stY7r,v. These scars are related to the classical trajectories of particles entering the dot, then bouncing within, and finally exiting. Two pronounced families of scars are visible. The first (SI) is related to the wavefunctions labeled 4, 6, 9. 12, 15, 19, 23, 28, 33 and the second (S2) to 5, 8, 11, 16, 20. 26, 31. The sears of one family have
form

always

the

same

shape

and

position

in the quantum dot, however, the number

of nodes of the wavefunctions increases with

trajectories
of
scars

for S1 and S2
an

are

is

indication that

increasing energy. The classical schematically shown in Fig. 6.9. The occurrence the quantum dot is already acquiring properties

106

Chapter

6.

Simulation

examples

of

disordered
as

ballistic1

structure in which conductance fluctuations

can

be

understood
a

interference of

number of distinct

phase-coherent electrons traversing the dot via classical paths. This is the dominant regime in large,
200) quantum dots.

highly populated (N

>

Figure 6.10 shows the tun neling rates calculated using the
wavefunctions in
sus

the

Fig. 6.8, eigenenergies at a

ver

par

ticular value of the gate

voltage

(V"g
ing

-400 meV). The tunnel

rates

ticular

belonging to one par scar family are linked by


can

dotted lines. It

be

seen

that

especially
which
can

the

rates

related to
same

Figure
the two

6.9:

SI have almost the


be

value
the

Approximate classical paths of wavefunctions scars SI and S2.

explained by

shape

of the wavefunctions which is similar,

leading

to similar values for the

overlap integral

between the lead and the

10

i<r
u

CD
C

05

10u
=3

10

-0,002

0.000

0.002

Energy (eV)

Figure 6.10: Funneling


Fig. 6.8
to

rates, i.

e.

elastic

couplings of the wavefunctions

in

single-particle eigenenergies. Some of the Phe dotted states with the strongest coupling are labeled for comparison. lines link the rates which belong to one of the scar families (SI and S2).
versus

die leads

the

On ballistic

structures
is

the elastic
case m

mean

fiee

path

/ of the

particles

exceeds the structure size.


mean

This, however,
part
can

al\\a\s the
microns.

smalt quantum dots at low temperatures where the

Iree

be

few

6.2. Device simulation

107

Q)
-Q

LU

-0 2 Gate

-0

voltage

(V)

Gate

voltage

(V)

Figure
two

6.11:

Electron

charging

(dotted line) and conductance G (solid

line) in units of the conductance quantum

e2/h

versus

the gate

voltage Vg

at

different temperatures.

quantum dot wavefunction. The highest values, however,


wavefunctions which
area,
are

are

related to the

more

uniformly

distributed

over

the quantum dot


states

showing

some

alignment along

the .r-axis (see for

example

18, 24,

29 and 35).

charging of the quantum dot and the con ductance versus the gate voltage. The envelope of the conductance peaks ex hibits some modulation which is more pronounced at the lower temperature 0.7 K). Over the given range the quantum dot is charged, successively (71 increasing the number of electrons from 49 to 66. One of the main reasons for envelope modulation is that at finite temperature more channels are ther 0 K, i. e. when A7 is in the middle of a shell, mally accessible then at T more channels are available for charge transport than if N is just entering or leaving the shell. In Fig. 6.11 a pronounced step in the peak height occurs at Vg 100 mV. On the other side, the conductance peaks show an over all tendency to linearly increase their peak height with an increasing number of electrons in the dot. This can be explained by the stronger coupling of the
Figure 6.11
shows the electron

quantum dot

states to the leads because of the extended size

of the ODEG. Also

visible is the thermal

dependence

of the conductance minimum between the

peaks.

In agreement with the

conductance
At this
at

predictions of Section 3.4.2 the minimum of the peaks approaches the maximum if the temperature is increased.
one notes

point,

that the values of the conductance is very low

even

the conductance

peaks

which have

heights

of

few 10

~5

c2/h.

Indeed, the

108

Chapter

6.

Simulation

examples

-0 6

-0 4

-0 2

Gate

voltage

(V)

Gate

voltage VQ (V)

Figure line) in
two

6.12:
units

Electron

charging

N (dotted line) and conductance G

(solid
at

of the

conductance quantum

c~/h

versus

the gate

voltage Vg

different temperatures.

noise level in conductance measurements


is to be found
at
~

experiments

of this structure |72]


are

10"

e2/h

which

means

that above results

below the

range which

can

be accessed in standard measurements.

Therefore, the doping


a

density

in the

quantum dot

doping sheet was changed and was adjusted to values around A'

the number of electrons in the


=

85 at

negative gate
reason

bias of

Tg

-800 mV. Now, the conductance

peaks
=

exhibit values of the order of

the conductance quantum which is

Gq

A2//?.

The

for this is the with

already
more

mentioned lateral extension of the ODEG if the dot is


The electron-wavcfunction

getting filled

coupling to the leads becomes stronger resulting in higher tunneling rates. Fig. 6.13. The overall values of the tunneling rates are some four magnitudes larger then in the previous case. This corresponds to the experimental observations [72] which show the onset
electrons.
of the oscillations at 1A
=

1000 mV with around N


starts to
at

80 electrons in the
at

quantum dot. The 2DEG below the gates

get depleted

negative gate
-

voltages
at
one

of around 200 mV. Above this value

around -200

...

100 mV

the control gate, the dot starts to extend below the gate.

Experimentally,

significant change in the spacing of the Coulomb-blockade peaks. The spacing becomes smaller because of the much larger capacitance of the extended quantum dot. In the simulations, the region where the electron
observes
a

gas is modeled

as

ODEG has to be extended below the control gate if this

happens.

The calculations here

presented explicitly

exclude this

case

and the
are

conductance calculation

only includes the

range where the gate

regions

fully depleted.
of
a

However, the

beginning

breakdown is

always

detected because

sudden change in the conductance characteristics.

6.2.

Device simulation

109

10

10

10

S1

24

I9 %A

34

40 A

45 52 47 4

59

^
.

Ai*,
A

2
CD
C

106

I
=3

104

t-

10

-0.002

0.000

0.002

0.004

Energy (eV)

Figure
to
rates

6.13:

the leads

which

Punneling rates, i. e. elastic couplings of the dot wavefunctions versus the single-particle eigenenergies. Phe dotted lines link the belong to one of the scar families (SI and S2).

The modulations visible in both


resonant
a

curves

in

Fig.
The

6.12

are

due to coherentas

transport through the quantum dot.


the electrons
are

quantum dot is acting

resonator and
a

reflected

by

the quantum

point

contacts

similar to

Fabry-Perot

interferometer.

The

period
A

of the oscillations is

roughly
can

300 mV. The oscillations attributed to shell fill


reasons.

not be

ing
at

effects for two


is

First,
N

N + 1

shell-filling

mainly

observable
dom
Ar1

low temperatures,

usually
of mK.

inating

the conductance character


a

istics at

few

tens

Sec

Vg

ond, both the upper and the lower

envelope

of the
a

peaks

are

modu
feature

lated which is

significant

also present in the measurements

172] and clearly identified


to

as

due A
A

coherent-resonant transport.

quantum-mechanical interpretation can be given considering the tunnel


ing
rates

for different wavefunction It has

Figure 6.14: Schematic of the chemical potential as function of'Vg. Phe Fermi
level in the leads,

symmetries.

already

been

ar-

E\?,

is indicated.

110

Chapter

6.

Simulation

examples

gued

that those states which


some

are more

situated in the center of the quantum

dot, showing
observed for

alignment

with the .^-direction contribute the most to the


rates

transport by having the highest tunneling

Vp. Strong coupling

can

be

(Fig. 6.13). If one takes the two-fold spin-degeneracy of the states into account, a period for the envelope modulation of around 10 peaks should be visible in Fig. 6.12. In both curves, which are taken at different temperatures, modulations of roughly this period can be observed.
Figure
and the

example

for the states labeled 24, 29, and 34

6.14 shows

schematic of the

quantum-dot
as
=

electron number N

quantum-dot
to the

chemical
orthodox

potential
theory
at

function of the gate


0 K. The chemical

Vg according
approaches
N

voltage potential
as a

the Fermi level, The

Ap, in the leads

at the

step from electron number


can
=

1 to N.

measure

for the

occurring step in the chemical potential self-capacitance of the quantum dot, i. e. Ap,

serve

e2/6\;.

Figure 6.15 shows the gate-voltage dependence of the single-particle eigenvalue spectrum close to the quantum-dot chemical potential //,. The sawtooth-like structure reflects the changes in the electrostatic and the chem ical potential at the electron charging steps. The tilling of a level pushes the energies of the already filled levels energetically lower. This requires addi2.2

56
> x
o) CD c

z
*

A'
/ \

CD

E
C

2.0

z-ry\iXXfX:AX\Xv
J

\'TT

.;

52

o
o

ULI

v/AAAAW

XA

:'\A

AA'T A

_CD

1.8
-0.8
-0.7

-0.6

48 -0.5

Gate

voltage

(V)

Figure
like

6.15:

dot chemical
curve
=

Single-particle eigenvalue spectrum (dotted lines) and quantum 0.8 K. Phe step potential (solid line) versus gate voltage at T

is the electron number in the dot. Phe Fermi energy in the leads is
occurs

FJ-p

0 eV, Phe

crosses

occupation of a previously empty level the chemical potential.

when the level

111
6.2. Device

simulation
effect is related increased. Another at some of the levels are degenerate 6.16). increasing gate voltage (Fig.
at some value

the charging tional energy and of the levels. Some


to

energy is

the

degeneracies
Vg
are

values of

but the

Other levels

This non-degenerate again. filling of states eventually becoming potential due to subsequent the quantum-dot in in the in the shape of to oscillations 6.8). This leads (see Fig. confinement, i. e. with different symmetry

degenerate non-degenerate, becoming

degeneracy

lifts with

of VA and

effect is related

to

changes

proportions
ible
are

of the

spatial dimensions
are

space-symmetries of the potential also change with the gate voltage. which
sizes shells of various

established and broken again.

of the

quantum-dot

Also vis

Figure 6.16:
age
over

at T the whole voltage range

eigenvalue spectrum Complete single-particle


=

versus

gate volt

0.8 K,

112

Chapter

6.

Simulation

examples

Gate

voltage

Vg (V)

Figure

6.17:

Gate

capacitance (A from numerically differentiating the


at

Coulomb staircase

N{VXj

T1

0.8 K in

Fig, 6.12.

The gate
to the

capacitance (A,

i.

e.

the
as

capacitive coupling

of the control gate

quantum dot may be defined


ri

Q
_

di;
where

(6.3)

Q is the quantum dot charge. Therefore, the gate capacitance is calcu lated by numerically differentiating the Coulomb-staircase. Fig. 6.17. Another method to evaluate the gate capacitance is via the spacing of the Coulombblockade peaks. The difference AA between the ATh and the (A7 A l)th peak is used and the gate capacitance is calculated as
in

XV

VJN + V.

UN)
give

(6.4)
similar results.
over

The

capacitance

is

now a

function of A7.

Both methods
to a

The gate

capacitance

increases from 5 aF

value of around 7 aF
are

the

range of the conductance calculations, lliese values


with the measured value which is
=

compared 32 aF [72]. Consequently, the spacing Cg of the conductance peaks is to wide compared \\ ith the measured results. A discussion of possible reasons for this discrepancy is given in the next section. If one now considers a factor 32 aF/5 aF 6 by which the calculated spectra
to
~

small if

are

stretched in

comparison

to

the measured ones, these results

correspond

with each other.

capacitances is only meaningful for conductors, whose electrostatic potential can be specified by one number, the voltage. The con cept of self-capacitances for a semiconductor quantum dot whose dimensions

The concept of

6.2. Device simulation

113

LL CO

cd
c

03
-*

'o
CVS co
o

<D
-I.

CD

87

93

96

99

102

Electron number N

Figure
the dot

6.18: Gate
at

capacitance CA

as a

function of the

electron

charge N

at

T- 0.8 K.

comparable with the screening length is therefore a somewhat delicate issue. One possible and still meaningful definition is based on differential ca pacitances 179], i. e. a self-capacitance Cdd is defined as the amount of work, AV, to bring fixed amount of charge, AQ, to the quantum dot. For AV one
are
uses

cAV

-=-

p{X

AN)
of the

p(N
For

(6.5)

where

p(N)

is the chemical

potential

AAparticle system.
is AN

charging the obvious choice for /Y Therefore, the capacitance can be written as
electron

1 and

singlee. AQ
--=

Gdd(X
The quantum dot

//(-V+l)- pfN),
calculated

(6.6)

self-capacitance C^N) (Fig. 6.19)

was

using

potential was extracted from the free energy minimization. The zig-zag shape of the ca pacitance curve is due to even-odd level tilling of the spin-degenerate singleparticle levels in the quantum dot (see also Eq. 2.21 in Chapter 2). This effect has previously been reported in self-consistent structure calculations of semi
conductor quantum dots

the self-consistent structure results. The quantum dot chemical

128).
a

Another method to obtain tioned here. A

quantum dot self-capacitance should be


can

men

self-capacitance C'dd

be calculated

by numerically

differ-

114

Chapter

6.

Simulation

examples

CD

S
Q

CO
CL

CO

75
en

87

90

93

96

99

102

105

108

Electron number N

Figure 6.19: Quantum


number N at the dot
at

dot

self-capacitance Caa
0.8 K.

as a

function of the

electron

entiating

the Coulomb-staircase with respect to the chemical

potential,

i.

e.

QciOg)
The

du

dp

(6.7)

capacitance is now a function of the gate voltage Vr (Fig. 6.20). Striking features in the capacitance curve are the two singularities which result from the two extrema in the quantum-dot chemical potential left and right from the conductance peak. Also, the self-capacitance is negative between the two singularities in the range of the gate voltages where Coulomb blockade is lifted and the quantum dot charge is shifted from N to N -f 1. The negative capacitances reflect the highly unstable regime during the charging of the dot. The dot is free to oscillate between two groundstate energies which correspond to the two electron numbers. Its most stable configuration is acquired between the blockade peaks, where the electron number is integer at low temperatures. In this regime the chemical potential is almost linear and consequently the self-capacitance is almost constant. There, the value of the self-capacitance is around tOO 150 aF which corresponds to the classical electrostatic limit
. ..

(for

the GaAs quantum dot In the classical limit for

13, d

200

nm.

==

27rtQtd

150 aF).

lic

properties

the

large, highly populated quantum self-capacitance is much higher then the

dots with metal


values observed

here. The consequence is that the steps in the chemical

they are proportional to C^1 and the chemical Consequently, the capacitance in the metallic regime
the steps in the

potential vanish since potential becomes a constant.


is constant
as

well since

charging

characteristics of the quantum dot vanish and the in-

6.3.

Comparison

with measurements

115

89.5
z

'

-"<(

""'

'

'

>

-Q

89.0 88.5
-

2.1

CD

E
ZJ c c

cc/
~"

2.0

o Q.

o
o

88.0
87.5

E
CD
1

CD

LU
, i

1.9
' r

i
-

T
0

o 0

CT
O
CD
O c

0.5

A
:
o

A
AXStXl>

A
s?
-x

xx V.

0.0

"

B
5
CO
Q.

-0.5

CO

^
j

-1.0

p
-o
-

O 0 0

^
c
-

-,

a
1

,->

-0 80

-0.78

0.76

-0 74

Gate volta geva

(V)

Figure 6.20: Quantum dot self-capacitance G'dd 0.8 K. voltage Vg at T


=

as

function of the gate

problems of the negative capacitances and makes them a unique feature of single-electron charging and Coulomb blockade invisible in the classical (metallic) regime.
crease

of the island

charge

is linear. This resolves the

6.3

Comparison

with measurements

The measured

linear-response
at constant

conductance

as

function of the

voltage Vc for
gates
were

the simulated structure is shown in

Fig. 6.21

control-gate [72]. All other

kept

voltages defining

The conductance shows dramatic

operating point of the device. oscillations of two orders of magnitude. The


the

peak height is of the order of the conductance quantum (c2/h). This measure ment was performed at a very low temperature of 25 mK. The number of
electrons in the quantum dot
ulated results shown in
was

estimated to be N
in the

75

...

250. The sim


a

Fig. 6.12

previous

section
...

are

obtained with
as

quantum dot with

an

electron number of N

87

110 and

such the sit-

116

Chapter

6.

Simulation

examples

-650

-680

-710

-740

-770

Vc (mV)

Figure 6.21: Coulomb-blockade oscillations measured as a function of the control-gate voltage \f. All other voltages are kept constant. (Paken from
f72]. Courtesy
P

Heinzel.)

uation should

closely
to

resemble the measured

one.

iTie main difference to the

experimental
This

results is the much

larger period of the

conductance oscillations.

corresponds

the much lower simulated gate

capacitance
at the

of 5

...

7 aF

compared
this

to the measured one which is

around 32 aF. A

possible

reason

for

exposed parts a large generally speaking, exposed influence on the general electrostatics of the device, also influencing the cou of all other gates amongst each other and the pling coupling of the gates to the substrate. This is especially evident for narrow split-gate structures as the one
of the GaAs surface. More
the surface has used here

discrepancy

is the

assumption

of Fermi-level

pinning

[75].

Figure 6.22 shows the conductance oscillations over a much wider range of gate voltages and for several temperatures. One observes pronounced enve modulations of the conductance peaks. The period of these modulations lope
is around 50
..

.80 mV. The simulated data

(Fig. 6.12)
is

show

similar mod
as

ulation of the

peak height, however,

the

period

again larger
e.

with the

measured data. Both the measured and the simulated modulations

are
a

due to

coherent-resonant transport between the two QPCs, i. Perot like behavior of the quantum dot, acting as the simulations could not be

because of
Even

cavity.

Fabrythough the

performed

for temperatures lower then 800 mK. the

6.3.

Comparison

with measurements

117

600 mK
3

JZ

350 mK

3
n

I
220 mK

100 mK

25 mK
iini.uiuih
.^

-200

-40O

-600 V.

-800

A 000

(mV)

Figure 6.22: Coulomb-blockade oscillations measured as a function of the control-gate voltage V at various temperatures. Phe conductance curves exhibit strong modulations due to coherent-resonant transport. (Paken from
[72 f. Courtesy
P. Heinzel.)

peaks for different temperatures was observed. In agreement with the theoretical predictions the measurements show a smaller amplitude for the conductance oscillations and a general trend to higher conductance values between the peaks. This trend is confirmed by
same

trend in the

height

of the conductance

the simulations
surements, the

(Fig. 6.11 and Fig. 6.12). Also in agreement envelope modulations become less pronounced.

with the

mea

"~"Tbfw,M

A-

>

H
c

I-v1

s
f

'n\ As A>
l'c

ix"A

'

A "X
t l

X "K

Chapter
Z^
come

7
eon

quel

ehe

lena

affamuita
rix a

itsato
si

fuor dal

pelago

alia

volge all'aeqnaperigliosa
as a

guaia

...

Just
now

swimmer, still with

safe upon the


turn

might

for

one

panting breath, shore, out of the deep last look at the dangerous waters,...

Dan if, Hnferno, 1

Achievements, failures and

prospects
This work describes the theoretical foundations and the numerical
used in
tor
a a

algorithms

simulation software for

has been

implemented

and its

single-electron capabilities are tested at

devices. A prototype simula


a

GaAs/AlGaAs heterostructure SET.

very limited because of its restriction

particular example, To some extend, the approach chosen is to the quasi-equilibrium. Nevertheless,
on

in the context of device simulation which relies

the drift-diffusion equa

tions, inappropriate

to

simulate

single-electron tunneling,

this work

means

considerable progress.

especially emphasized. First, the inclusion of size quantization and many-body effects in the solution of a non-linear Pois son equation and the implementation of stable numerical algorithms has been achieved. This allows for a self-consistent evaluation of single-electron tun neling. Second, a sound method for the calculation of the tunneling rates for
Some aspects should be
soft electrostatic barriers which is based
on

the transfer-Flamiltonian method is


a

included.

Finally,

these results

are

used in

free-energy

minimization proce-

119

120

Chapter

7.

Achievements,

failures and

prospects

dure which allows for the

computation of the discrete charging of the quantum dot and the linear-response characteristics of a SET at finite temperatures and for realistic geometries.
The

software, for which the preliminary


of

name

SIMNAD

(Simulation

and

Modeling

Nanodevices) is used, is embedded in the TCAD suite of TSE AG

(Zrich). This allows for the utilization of the TSE grid editor TED ise which is especially suitable for tensor-product grids. Furthermore, the visualization
of results
can

be done

output files

are

by graphical software such as INSPECT compatible with the ISE datastructures.


of the SIMNAD simulation software
some even

ise

since all

Since the in

development

was

initialized

1997,

at

lot of structures,

with chances to find device


more seems

appli

cations, have been

presented.

It

more

and

to be

clear that any

thing
on

that could be of

practical

interest for

silicon. Simulation of silicon

logical circuits should be based single-electron transistors is well within the quantized
levels for
a

scope of the SIMNAD software. The calculation of the

six-valley
entation.
rather

bandstructure is

1DEG, and

possible in all three confinement models (ODEG, 2DEG) implemented in SIMNAD and for a (100)-substrate ori
most

However, silicon SETs,


cause severe

of them in
that

complicated

three-dimensional numerical

geometries
the
a

SOI-technology, have require huge grids and

sometimes

problems. Also,

the simulation of silicon

quantum dots is often

not

possible using
that allows for

single-subband approximation speed-up


of simula

(Eq. (4.38)

and

Eq. (4.39))

considerable

tions of GaAs/AlGaAs heterostructure SETs.

Apart
gases
are

from silicon, GaAs/AlGaAs based heterostructures

are

still first

choice when

properties

of confined electrons in zero-dimensional electron

investigated. The simulation of these structures can be carried out in a numerically stable and reasonably fast manner. However, there is still need for further investigation of the role of the exposed surface and the dop ing sheet including the doping levels in order to become really predictable. It
should also be mentioned that the numerical
to

algorithms implemented
a

still fail

converge

at

very low temperatures below

few hundred mK. This

regime,

however, is experimentally of particular interest. At higher temperatures, ef


fects related to the

single-particle spectrum

are

often

disguised by

the thermal

broadening

of the levels.

Further work should start

Certainly,
ware

the direction of

by dealing with the shortcomings of this work. further work depends on what the simulation soft

will be used for. If a TCAD-oriented tool is

planned,

some

work has to be

121

devoted to goes

a more

advanced discretization scheme at unstructured

grids

which

simple tensor-product/finite-difference approach used in the present software. The use of automatic meshing, however, requires the formu lation of adequate meshing criteria, especially suitable for the Schrdingerbeyond
the Poisson system. At this consistent scheme for
box discretization for

point the author has no knowledge that a stable, selfthe Schrdinger-Poisson equation system employing a instance on a general, unstructured grid has ever been

implemented.
On the since the
ture

physics side, the inclusion of magnetic application of magnetic fields reveals a lot
magnetic

fields would be desirable


about the electronic struc

of the electronic gases in quantum dots. A whole literature of the discretization of the vector

experimen

tal data related to the effects of

fields in quantum dots is available.

Some work

on

potential
course

at

tensor-product grids

using finite differences has been clone in the test implementation using the object-oriented
is

of this

project [80].

program structure of SIMNAD

already

available.

The SIMNAD code has the tion


one

providing the advanced applica oriented research in academia as well as in industry with more insight into of the most promising branches of modern device physics. The singlecapability
for

electron concept and

single-electron devices

are

certainly beyond the they


may

ultimate

scaling
timate

limits of the conventional CMOS, however,

replacement. Computer
not

simulations and

proof to be its ul complex TCAD experiments


Goal of this work
was cer

will be of

tainly

key importance with this technology. to clarify the question whether or not

the
to

single-electron concept
expect that the basic
re or

will have any

applications.
today
will

It is

search undertaken

only eventually

reasonable
find
use

in further microelectronic-

nanoelectronic devices. Some of the effects discussed in this work may


a more

play
Oth

significant
only
to be

role for conventional

devices, intentionally

or

not.

ers

may

have the

potential
have

for niche
an

electron devices will


to

never

applications. However, that singleimpact on the industry is certainly a verdict


seems

early

proclaimed.
be

The current status of nanodevices


was no reason

somewhat
vacuum

like the situation in the 1940s when there

to

believe that

tubes could

ever

displaced.

A/,i

,v,j

a-

Appendix

Thermodynamic properties
of localized systems

Grand canonical systems at


energy

temperature T
a

arc

characterized
a

by

Fermi

E-p,

particle strictly
e.

number A\

volume

A,

and

total energy E. In

equi
is

librium the volume V

ly. the particle


constant as

number N

Ar0, and the

energy

Eq

are

constant.

The entropy of the system


well.

A0

="

^B^'ht^o

maximal, therefore being

Yq

is the dimension of the classical

phase

space, i.

gives

the number of accessible states of the system. is subdivided into


a

The system

(Fig. A.I)

reservoir R with

set of thermo

dynamic by A", V,

variables N'.

Vf E', Vf S' and

small

subsystem

A characterized

subsystem .4 is embedded in the much larger reservoir R and To, Aq, and PJq are properties of the system as a whole (A A i?).The subsystem exchanges energy and particles with the reservoir. The particle number in the reservoir changes according to the law of equilibrium changes
E, F, S. The
E
'
=

PdS

'
-

PdV

'

EFdX '.
is
so

(A. 1)
small that T
fluctuates

The
and

important assumption
Ep of

is made that the


even

subsystem A
though
the

the reservoir remain fixed


are

subsystem

among its that

possible states which En <A Eq and Ara <<T A't).

labeled

by

a.

It is furthermore assumed
states
can

Even if

some

of the

the above condition, it is

only

small number which

|a) may violate safely be ignored.

124

Appendix

A.

Thermodynamic properties

...

Using Eq. (A.I),


spect
to

one

obtains for
re

the constant derivatives with

entropy S' and the par ticle number N'

OE'
OS'

=T

OF/'
ON'
Within
this model the

(A.2)

Gibbs

NA\

distribution for the

occupation numbers of the small subsys tem in particle exchange with


the reservoir
can

Figure A.1:

Reservoir-

(R) subsystem (A)

be derived. The
states in

model and thermodynamic variables.

number of

possible
=

A is

denoted F and that in R is denoted Y'. Therefore, the total number of states
in A A R is IT'

Ft.
=

In

equilibrium

the entropy is maximal,


as a

Ft

Fo and
in
a

St

S X S'

Sq.

The

probability
one

for the system

whole of

being

particular

state

is

Peq

1/Fq.
in 1

The number of choices for the reservoir states

given the subsystem is r< ]\T'a and Ya probability of this state

particular
as

state

|cv)

(since the system is in


be written

state

\Na) En) is Y'a. With ja) by assumption), the

can

ZJCL

to
i.
e.

(A3)

out

of

F0 possible

states

of the total system, there

are

Y'a

states that

find

Ain state

\a). S'a
=

The reservoir entropy

kj^PliiY/ depends

on

the energy and the

particle

number in the

subsystem

Sa
and with

(E0

Ea, A'o

Art),

(A.4)

Sq

k-T hi Yq

it follows that
p/

Sq-S/
It has to be

-,

-kB\n-
t o

-kBlnPa.

(A-5)

emphasized

that

S{)

Sa

is not the entropy of the

subsystem

A.

The entropy of the

subsystem

is

zero,

since A is in

given

state

la).

The

125

equilibrium entropy

of A A R is the average of
a

S'a

over

all

possible

states.

The thermodynamic average of

quantity f
with

is
^^

^^
=

Y,rf<
a
=

Ep
a

1<

(A.6)

which for the entropy S

So

S'a

leads to
=

-A'b

5Z P In Pa,
a

PQ

exp

\-kB (SQ
one

ni
-

'

a.

(A.7)

With the law of


ryl

equilibrium changes, Eq. (A.I),


Ol /E1 o
TP

writes

AT

\T\

ba

(iTo

-/ifj. i\0

AcY)

(Pq^ Aq)
E.
a

-~

\<J
,

y jy/

()Ax

Nn
VAE'

const

piya

N,

(A. 8)
the Gibbs distribution
p
_.

which substituted into

Eq (A.7) gi\es

aj

Pa

pyA

exp

A'bP

kT

(A.9)

using
of the The

the normalization condition for the

Pa and Z is the partition function

grand

canonical ensemble,

i. e.

the

grand

canonical

partition function.

thermodynamic averages N N of the subsystem A Eq. (A.6) giving

of the energy E
are

E and the

particle

number

calculated

using

the Gibbs distribution in

J2EP

aild

-V"-X>aiV

(A. 10)

Inserting the Gibbs distribution A, Eq. (A.7), one obtains


k Phi
and
the

into the equation for the entropy of the system

TS" -A AV
form of the

--

N Ep

--

0,

(ATI)
0 for

consequently to an explicit subsystem A, i. e.


O
=
-

grand
P,

canonical

potential

AAP
--

A'b F In N
or

rjp

exp

kXF

(A.12)

-*wTlnZ.

(A. 13)

126

Appendix

A.

Thermodynamic properties

...

thermodynamic variables at fixed V, T, Ep of the system can now be calcu lated by thermodynamic averaging of P, 5. N if the energies and the electron numbers {Ea. Na} for all states |a) of the subsystem A are known.
All

If the

subsystem
a

contains

fixed number of electrons and

no

particle

ex

change
treated

between the reservoir and the


as

subsystem

occurs, the

system has

to be

canonical ensemble.

fixed,
namic

constant

electron number

keeping the chemical potential N for all jo) is assumed according to Nn


~

Instead of

and the

thermodynamic variables of the system are determined by thermody averaging at a particular N. P. V, The thermodynamic potential is the

Helmholtz

free

energy

F(N)
=

F{N)

-kBTTnVexp
/-V

(X

Fl

kT J

(A. 14) (A. 15)

or

F(N)

kBT hi Z{N).

with the canonical

partition function Z(N) and the Gibbs distribution


Pa
Z
x

(AI

Er
exp

kXE
E

^(AT)

5^ exp

kT

(A. 16)

To illustrate the

principle

difference between the Gibbs distribution and the

Fermi-Dirac distribution for


used. Consider
to
a

single-particle

levels, the
with X

two

level system

{Ei,E2}

following example is 1 particles. According


is

Eq. (A. 16)

the

occupation probability

for the level


Eq

given

as

exp

Pa

P{En\N=\)^~

exp

krtT

exp

(A. 17)

If cast into

slightly

different form, this results in

P
1

Fj
=

1 A exp

f\

Fj~^f

kBT*

w;rith

Ep
a

-(Pi

P2)

and

T*

~T,
a

(A. 18)
fictitious tem

which

corresponds

to

Fermi-Dirac distribution, however, at


true

perature PA which is half the

temperature of the electronic system. The

127

Fermi energy

Ep

can

be defined

as

the average of the two

energies P\

and

P2.

For

higher

electron numbers and the number of levels

approaching

infin

ity,

the Gibbs distribution becomes

equivalent

to

the Fermi-Dirac distribution.


can

Numerical
be found in

analysis confirming
[31].

this fact for semiconductor quantum dots

'

\
>

I
-

V>A-

^
v.^

>
^

v #x,

-j

Appendix B
JL JL

Transition rates

Subject

of this

appendix

are

the transition rates between the


on

many-particle

groundstates in the quantum dot. The calculation is based perturbation theory in lowest order in the tunneling terms.

time-dependent

B.l

Time-dependent perturbation theory


by
the

The evolution of the Hamiltonian operator H with time is described

time-dependent Schrdinger equation

A?.^i4/(f))
Of

P|iF(f)),
of the system.

(B.l)
The time-

where

[^(r))

is the

time-dependent
an

state vector

evolution of the state vector from


can

initial state | ty

(/, ))

to

final state

\fY(tf))

be written

as

\^(tf))^u(if.t/)fy(t/)).
with
a

(B.2)

time propagator U of the form


rtf

U(ttJ,)=exv

Jt,

dtH(f

(B.3)

129

130

Appendix

B. Transition rates

which reduces to

U(tfX,)
if the Hamiltonian operator is

exp

--n{H

tt

(B.4)

explicitly time-dependent. The propagator is usually evaluated via expansion of the exponential function in powers of the argument. The direct evaluation of the time propagator is in general a very difficult, if not impossible task. A very common procedure is to split the Hamiltonian into an time-independent part %q for which the stationary
not

Schrdinger equation

,(A
%oW\

E]

AuAO
\yy

can

be solved

exactly

and

an

time-dependent part 'Hpif)

H=--Ho-{-'Hp(t).
The

(B.5)

time-dependent part is treated as weak perturbation to the system. The time propagator is expanded in terms of 'Hp in the basis of eigenstates of PLq. The total propagator is given as a series
'

U(ifztl)=U0(tf.t1)xJ2(
where

_L

iXAtf-fc),

(B.6)

Uq is the propagator of the unperturbed system

U0(tf.tj)

exp

-jUo{if

-i,

(B.l)

andZP the /?th order correction due


Xf
An

to

the presence of the


Xj,

perturbation

U [tf,f

dtn

dtu

dUUo{tf,tn)Hp(tn)

\Uo(taJa-L)'Hp{tn-i)...Hp(tl)Uo(tl,t,).
A small

(B.8)

perturbation

of the system due to


are

Hp

can

be assumed if the matrix

elements of the operator


to evolve in

small. If, furthermore, the system is considered

'short-time'

periods
,^l

then
(0)

(v/;,\nP\v[//,)(tf^i1)/hxY

(B.9)
the lowest terms in
n

Consequently,

the series converges \ery fast and

only
a

need to be considered. Since

tunneling

is

always

isolated quantum dot, i.

e.

the

tunneling

terms are

perturbation to the always small compared to

small

B.l.

Time-dependent perturbation theory

131

the other energy scales in the system,

only the

first order term in the

expansion

ofU in

terms

does not
t

tf

perturbation PLP needs to be considered. The perturbation explicitly depend on time, it rather depends on the time difference t7. The probability amplitude. A(l), for one tunneling event is

of the

defined

as

,(0)>

-^> Itf40)>
f

AfM^ivfMt)^).

(B.10)
the trivial

The

unperturbed operator (Oth order perturbation) generates only time dependence but does not allow for transitions

ef Tf))
However,
one

exp

-X''

()

Alu'(0)).

(B.il)

is interested in transitions between different


?

many-particle
the

eigenstates

where

/ /.

In this case, the lowest

perturbation gives

proba

bility amplitude
Tk .(0)
1
III

AY{t)

(ilf'\^

Jq

di1U0(t-ti)HplMGM[r),

,SX

(B.12)

which becomes after

integrating
l

over

.(i),
Ay/(t)^Mf,t

E(0)

.(0)

exp

l-Eyt)

exp (

-E;'t
(B.l 3)

with
where

Mft1

^(^f\flp\i/0)).
as

Mf)t

is the

perturbation

calculated

the matrix element of the

eigen-

functions of the this

unperturbed

Hamiltonian

(0, Hq. The probability W\ /(f) that

perturbation has caused the transition is \A\ (t)\2, the absolute square of the probability amplitude. This leads to the final form of the transition probability
IF
At)
A

it)
=

\M A

(lA2)sin2[(P|0)^PW)4
l

(B.14)

XX
(E,

-E{

XX\

)m

Assuming 'long enough"


to the transition rate y

times reflected in the

uncertainty
the

relation between
limes leads

time and the energy difference /? AT

(Pf7
as

E) )f,

following

which is defined

It

<

lim
t -+~o

W(f^(t)F

(B.15)

132

Appendix

B.

Transition rates

and therefore

ta

2tt,,. ,.,,(0) ' v /,t| zrliJAl"^W; > h

,,(())
-

#D-

(B-16)

B.2

Effective transition rates

The
the

expression
a

derived above is

now

used to calculate the transition rates for

many-particle

dot states. The Hamiltonian of the

unperturbed system
one

con

sists of

contribution due to the quantum dot and

contribution for the

source-side reservoir and the drain-side reservoir

respectively
(B.17)
for

Po
The

PdotAP,4 Pa.

eigenvalues
are

Efot,EJ. Ef

and the

each operator the

solutions to the

eigenfunctions j</'fot), [0f), \iftf) time-independent Schrdinger equation

for
and

particular subsystems.

The total energy is


as

P)

Pfot

Pf
The

Pf

the total wavefunction lac tori zes

j*,") )

Ivf01)!^))^1)to the

tunneling

Hamiltonian which acts

as a

small

perturbation

system is
+

np
where
one term

n\

ntd
the

with

nt/d

Hl'-d

H\>/%

(b.is)

(-) describes

tunneling

out

of the dot

Ad=-EAAk>x>
k
.m

cB.i9i

and the term

(+) describes

the

tunneling

into the dot

summing

over

all dot states and lead states. Therefore, it is assumed that tran
occur

sitions between the dot states

solely
are

if

an

electron is added

or

removed

from the dot. Transitions which

keep

the number of electrons fixed and could

be due to

electron-phonon

interactions

neglected

here.

Transitions which reduce the number of electrons in the quantum dot are transitions that move one electron from the dot to the source or drain reser voir.

Inserting

the

tunneling

Hamiltonian from

Eqs. (B.20)

and

Eq. (B.19)

B.2.

Effective transition rates

133

into

Eq. (B. 13)

leads to
"

<,"

E A'A"fi<A<AA/d,(.c A'XwAx}
k,m

with the matrix elements


D
JJf,i.m
.s/d

-(rdX[\r

"~AC f
s s

xnlX
ddii
+
f

A'doA /
|
,

Ad

^Wl/,X
,d's,

_,,

vd\

=^7"A'/
/

lA/d,AlVTK/d^lV'/

,d

'a
The
or on

=^7
a

expression

for

Mb//

'

contains

product
d k

of

an

operator acting

on

the left

right reservoir

Hubert space

only (A

) and

an

operator acting exclusively


are

the dot Hilbert space


rate.

for the transition


over

all

possible

final

Eq. (B.l 6) The effective transition rate is calculated by summing states in the reservoirs which can be filled leaving an

(cm ). The matrix elements

inserted into

initial dot state empty


s,d

The

following

relations

are

used

(i)Xc \i'X ) =5,


(W \X/dk'cl/dk\vf
/,/,dott
A
i

(completeness

of

\if^u ))

)=[f-,/s/d(PA
(

-EF' )\dkV

,,

li',dot\

(j?dot\c

|CmKm|l f

) Jd\JXm

)0m m',

where

/dot

is the

occupation

distribution function for the quantum dot and


and the

/s/d

is the Fermi-Dirac distribution function for the reservoirs which contains

the reservoir chemical

potential

temperature. Since the initial and the


the electron number AA the

final state in the dot


notation is

are

characterized

by

following
-

adopted

for the transition rate IF,

TF?'~

Ws/rf(A/", iV

1).

Finally,

one

arrives at the

expression
-

Wa'd{N,N
with

1)

XXd^l/d)El- .fs/d(P;/d
m
-

<d)]/do<(0
4

17?;d(PAq d)

~\Jl

\2{IX}ot

Pfot

Ebk/d)

(B.23)

134

Appendix

B.

Transition rates

being
state

the

tunneling

rate for the transition from the rnth dot state to the
~~~

kth
in

in the reservoir. The delta function selects the wavevector k

k(E)

the reservoir and the energy of the


The
crease
same

tunneling
similar

electron is

Pdo1

Efoi.
transitions

procedure

leads to

equation

for transitions which in


are

the number of electrons in the quantum dot, i.e. which electrons from the
source or

that

move

drain reservoir into the dot

W8'd{N, N

1)

X>-d^A d).fsXi(iA/d
???

"

#f

d)H

Aiot(Pdot)J
(B.24)

The results of Eqs.

(B.23, B.24)

are

known in the literature

as

Fermi's Golden

rule.

Appendix

Density-functional theory

many-particle problem of interacting electrons in an external potential has been a key problem since the introduction of quantum mechanics in the late 1920s. A first solution in the form of a mean-field theory was provided by the Hartree theory in which the electrons are described by an effective single-particle Schrdinger equation and the effect of the other electrons, the screening, is included via an effective potential, the Hartree potential. While the Hartree theory still failed to include quantum mechanical interactions, the later introduced Hartree-Fock theory expanded the concept and included quan tum mechanical exchange.
The

theory proved to be useful for systems with small num bers of particles. However, the expansion of the many particle wavefunction in Slater-determinants, which even for small systems leads to huge numeri
The Hartree-Fock

problems, made the application to solid-state systems prohibitive [46k An early alternative to Hartree-Fock theory was the Thomas-Fermi theory [47,481 which gave, on a heuristic basis, a description of the physical properties of an
cal electron gas
an

by

use

of

density-functional.

However, it took until 1964 that

formally exact theory of the many-particle problem of a system of inter acting electrons was formulated. In their pioneering paper Flohenberg and
Kohn1 [49J proved
that the is

interacting particles
1998.

ground state properties of an arbitrary system uniquely represented by its charge density.
m

of

1W. Kohn icceivcd the Nobel pn/e

Chemistry

for his woik

on

density-functional theoiy

135

136

Appendix

C.

Density-functional theory

theory developed by Hohenberg, Kohn and Sham, the density-functional theory (DFT) is given. A more detailed presentation of density-functional concepts can be found in [50k
In the

following

section

short account of the

C.l

Hohenberg-Kohn

theorem

Consider

system of interacting particles described by the many-particle


with the Hamiltonian operator

Schrdinger equation
H

r + VAW

and

P|^)

P|4/)

(C. 1)

where P is the kinetic operator, V the operator of the external

potential, W

the

operator of the electron-electron interaction which,


systems,
can

at least

for semiconductor

assumed to be Coulombic, T' is the many

particle wave-function,
theorem states in is

and P the total energy of the system. The its first part that the external functional of the true
=

Hohenberg-Kohn
=

(T^VlT') potential V (V) ground state charge density2 n


V
=

always

unique

V[n]

X const.

(C.2)

In is

a
a

(total) energy functional PVN is postulated which unique functional of the charge density as well and which, assuming
second statement
a

charge conservation, can be minimized giving the total energy of the system, Ey Ev[n] and Pyjn] < Ey[n') if n' is not the ground state density.

Therefore, the ground

potential and the many-particle Hamilton operator and consequently all ground state properties of the electron gas in a unique way. The restriction to the ground state prop
state

density

determines the external

erties, however, is
The

one

of the mayor weaknesses of


are

properties

of excited states

beyond

the

density-functional theory. scope of the basic theory.

The second part of the

calculate the total energy

Hohenberg-Kohn theorem enables one to explicitly of the ground state. Introducing the following form

of the total energy functional

Ev [n]

fdrn{r)Y(r)
was

E[n]

(C.3)

-"Ongmally density-functional theory

only

introduced for electron gases, however, it is

applicable

to

hole gases

as

well.

C.2.

Kohn-Sham

equation

137

where

F[n)

is

universal functional
to

independent

of the external

potential.

It

contains the kinetic contribution

the total energy and the electron-electron

interaction, and therefore is the

same

for all kinds of electronic systems


n(r)'ii(r' J A^APxc,

cirdP

, i

vxc)

(C.4)

rx

where

Ps is the functional of the

kinetic energy for


term

with the

charge density
so

n,

the second

is the

non-interacting electrons Hartree energy Ph, and the


as

last term is the

called

exchange=

and correlation energy which is defined


+

tixc
The

(T)-Tshi]

{W)-EH.

(C5)
ex

exchange-

and correlation energy contains the difference between the

pectation

value of the kinetic operator in the

many-particle Hamiltonian, (P),

and the energy

Pa of the non-interacting system and the difference between the

expectation
sition of

value of the operator of the electron-electron interaction

(W)

and

the classical Hartree energy

Ph. This definition of Pxc

ensures

the

Eq. (C.4). The two functionals Ts and known from the beginning. Pxr is given within appropriate approximations the local-density approximation (EDA).
to

F[n] according

decompo Pxc are not


as

C.2

Kohn-Sham

equation
the calculation of the
to

The total

charge density. an appropriate representation One now charge density by assuming a system of non-interacting particles with the density nH. According to the Hohenberg-Kohn theorem the total energy functional is given as
the
tries to find

Hohenberg-Kohn theorem provides the basis for energy using a variational principle with respect

of this

Evjju]
where ns
tions
can

=-

Ps[ns]

dr

iu(t)V5(t)

(C.6)
wavefunc

represented by a sum over squared single-particle fy(r) weighted by an occupation factor A",
be

E^.
It
can

(C.7)

be shown

(Kohn-Sham theorem) that for


a

every system of
so

interacting
state

particles

there exists

single particle potential VB

that the

ground

138

Appendix

C.

Density-functional theory

charge density
system
ns.

/?

of the

For the

interacting system equals that of the non-interacting effective single-particle potential Fy an effective singlethe Kohn-Sham

particle Schrdinger equation,


h2
2m

equation3
=

can

be formulated

\72

_|_

yjr)

4>,(T)

tA(r).

(C8)

interacting particles in an external potential V is now projected onto a system of non-interacting particles in an effective single-particle poten tial Vg. Equation (C.8) can be solved exactly if the effective potential is known. The kinetic energy functional of non-interacting particles can be written as
The system of

Ts

^ V /dr0;(r)V2(r).
zni
l^

(C.9)

Variation of the functional of the total energy

Eq. (C.3)

with respect to the leads to


an ex

charge density

and consideration of the Kohn-Sham

equation

plicit

formulation for the effective

potential

K(r)

V(r)

dr'

r^7T
jr

Vxc(r).

(CIO)

The second term is the Hartree


trostatic

potential formally given by

as

Vu

potential Fr, which is related to the elec q. The exchange-correlation potential is

rxc(iW^#-

(cid

Equations (C.7). (C.8) and (CIO) describe in an unique manner the system of non-interacting particles w hich is related to the system of interacting particles via the identical groundstate charge density. These equations have to be solved self-consistently. Usually, one begins with an assumed n(r), constructs Vs(r) froniEq. (CIO) and Eq. (C.l 1), and finds a new n(r). The Kohn-Sham total energy (ground-state energy) is given by

#M
Hie

X>T'e<

"

.7

/ drn(r)VH(r)
are

xc-

f dr n(r)V^c(r).
e% and the

(C.12)

interpretation
the

of the

single-particle eigenvalues
the solutions of the
with
m

wavefunctions A which

single-particle Kohn-Sham equation remains


of the free election

AVe

restrict to

\acuum

problem

being

the

mass

C.3.

Local-density approximation

139

problem. They describe a system of non-interacting (quasi-) particles, but no direct physical meaning for the system of interacting particles can be attached to them4. Nevertheless, they are interpreted as single-particle (orbital-) ener gies which sufficiently accurate describe the bandstructure in the crystalline
a

solid-state.

C.3

Local-density approximation
relatively straightforward
only possible
difficult to
are

The

formulation of the Kohn-Sham formalism of

DFT is

which

many-particle properties of the electron gas describe, especially the exchange- and correlation inter
because all

action between identical functional is not

particles

are

relocated in the functional


as

PXC. This

explicitly

known and,

already mentioned,

one

depends

on

appropri ate approximation s.


The most

widely

used

approximation

is the

local-density approximation

(EDA)

PL1)A=
where 6XC is the

drexc(n)
n

n(r),
(r)

(C.13)

function of the

density (not

functional) which is defined


a

as

exchangeIt

and correlation energy per electron for

homogeneous

elec

tron gas.

locally approximates the density of the in homogeneous electron gas. This approximation is certainly good in systems where the charge den sity is spatially nearly constant. However, LDA proved to be an astonishingly good approximation
even

in systems where the

mogeneous such

as

molecules

(and of

course

charge density is strongly inhoquantum dots). The exehangeis

and correlation contribution

to

the effective

potential

given according

to

Eq. (Cll)

Ac()
n

(C14)
(r)

The function exc has been determined for


gas

by Ceperly and Alder [521 using a work a parameterized form for the three-dimensional problem was given by Perdew and Zunger [53].
An fact they
Sham effective
are

interacting homogeneous electron Quantum-Monte-Carlo method. In this


an

is

used, which

the

Lagrange-parameters of

the "variational scheme used to derive the Kohn-

potential Eq. (C. 10),

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'v%\
J

y>&

*
*,

V,

Jf

':
.

it

Curriculum Vitae
Andreas Scholze
was

born in Arnstadt

(Germany),

on

June 14, 1969. After

finishing secondary school in 1989, he studied Physics at the Universities of Jena (Germany) and Edinburgh (Scotland). He specialized in solid-state the ory submitting a thesis on density-functional based analysis of diamond sur face reconstructions. After graduating from the University of Jena, he joined the Integrated Systems Laboratory (IIS) of the Swiss Federal Institute of Tech nology in Zrich (ETHZ) working towards the Doctoral degree in Electrical Engineering. During the summer of 1997 he stayed as a visiting research as sociate at the Beckman Institute for Advanced Science and Technology at the
University
(M1NAST)
is
on

of Illinois in

K. Hess. Fie is

Urbana-Champaign (UIUC) with the group of Prof. currently working within the framework of a national project
algorithms
for the simula

in the field of nanodevice simulation. The main focus of this work

the establishment of numerical methods and

tion of single-electron devices at the solid-state level.

149

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