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Modeling
– The SRAM Data Retention Voltage (DRV)
Target application:
Ultra-Low Power (ULP) wireless sensor network
Embedded memory
leakage suppression is
both crucial and effective
for deep sub-micron ultra
low power, low duty cycle 0.18um Technology
system design.
Vdd (V)
• Technology driven
• Effectively reduces
design power
consumption
(1V)
(?)
Circuit level:
– Dynamic control of Gate-Source and Substrate-Source Vbias
• Large design and area overhead
• Limited saving on leakage power
Micro-architectural level:
– Vdd gating off for idle memory sections
• Ineffective for caches with large utilization ratio
– Drowsy cache: put inactive cache lines in a low voltage
standby mode
• Achieves over 70% leakage energy saving in a data cache
• Question to be answered: how deep a snap can it be?
VDD
0 DRV Condition:
0
M1 M3
M5
V1
V2 ∂V1 ∂V1
VDD M6 VDD = , when VDD = DRV
∂V2 Left inverter
∂V2 Right inverter
M2 M4
Leakage Leakage
current current
)VV(2(V)
0.2 V =0.18V
degrade to such a level that
DD
2
V
Static Noise Margin (SNM) of 0.1 VTC
1
the SRAM cell reduces to zero. VTC
2
0
0 0.1 0.2 0.3 0.4
V (V)
ISQED 2004 H. Qin -9- 1
Modeling SRAM DRV
10 pF 10 pF 10 pF 10 pF 10 pF
0.66 0.66 0.50 0.50 0.50
Clk
Compared to magnetic-
based voltage regulators
Rmem (numbers indicate transistor w idth in microns)
IP
Module
1.4 mm of 4kB
SRAM
50
4000 40
Leakage Current (μA)
30 Measured
DRV range
20
2000
10
0
0 0.2 0.4 0.6 0.8 1
0 Supply Voltage (V)
50 150 250 350 450
DRV (mV)
• More than 90% reduction in
• Measured DRV: 80mV ~ 250mV leakage power with 350mV
(0.13 µ m CMOS, 300mV Vth ) standby Vdd (100mV guard band).
Process variation
(ΔL, ΔVth )
Chip temperature
SRAM cell sizing