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LOCOS Fabrication
Illustration
Prof. A. Mason
Page 1
LOCOS Defined
LOCOS = LOCal Oxidation of Silicon
Defines a set of fabrication technologies where
the wafer is masked to cover all active regions
thick field oxide (FOX) is grown in all non-active regions
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 2
LOCOS step 1
Form N-Well regions
Grow oxide
Deposit photoresist
NWELL mask
oxide
photoresist
p-type substrate
Layout view
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 3
LOCOS step 1
Form N-Well regions
Grow oxide
Deposit photoresist
Pattern photoresist
NWELL Mask
expose only n-well
areas
NWELL mask
oxide
photoresist
p-type substrate
Layout view
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 4
LOCOS step 1
Form N-Well regions
Grow oxide
Deposit photoresist
Pattern photoresist
NWELL Mask
expose only n-well
areas
Etch oxide
Remove photresist
oxide
p-type substrate
Layout view
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 5
LOCOS step 1
Form N-Well regions
Grow oxide
Deposit photoresist
Pattern photoresist
NWELL Mask
expose only n-well
areas
Etch oxide
Remove photoresist
Diffuse n-type
dopants through oxide
mask layer
n-well
p-type substrate
Layout view
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 6
LOCOS step 2
Form Active Regions
Deposit SiN over wafer
Deposit photoresist
over SiN layer
ACTIVE mask
n-well
SiN
photoresist
p-type substrate
ACTIVE mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 7
LOCOS step 2
Form Active Regions
Deposit SiN over wafer
Deposit photoresist
over SiN layer
Pattern photoresist
*ACTIVE MASK
ACTIVE mask
n-well
SiN
photoresist
p-type substrate
ACTIVE mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 8
LOCOS step 2
Form Active Regions
Deposit SiN over wafer
Deposit photoresist
over SiN layer
Pattern photoresist
*ACTIVE MASK
n-well
SiN
photoresist
p-type substrate
ACTIVE mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 9
LOCOS step 2
Form Active Regions
Deposit SiN over wafer
Deposit photoresist
over SiN layer
Pattern photoresist
*ACTIVE MASK
n-well
FOX
p-type substrate
Remove photoresist
Grow Field Oxide
(FOX)
ACTIVE mask
thermal oxidation
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 10
LOCOS step 2
Form Active Regions
Deposit SiN over wafer
Deposit photoresist
over SiN layer
Pattern photoresist
*ACTIVE MASK
n-well
FOX
p-type substrate
Remove photoresist
Grow Field Oxide
(FOX)
ACTIVE mask
thermal oxidation
Remove SiN
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 11
LOCOS step 3
Form Gate (Poly layer)
Grow thin Gate Oxide
over entire wafer
negligible effect on
FOX regions
LOCOS Fabrication
Illustration
gate oxide
Prof. A. Mason
Page 12
LOCOS step 3
Form Gate (Poly layer)
Grow thin Gate Oxide
POLY mask
gate oxide
polysilicon
Deposit Polysilicon
Deposit Photoresist
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 13
LOCOS step 3
Form Gate (Poly layer)
Grow thin Gate Oxide
POLY mask
gate oxide
Deposit Polysilicon
Deposit Photoresist
Pattern Photoresist
*POLY MASK
LOCOS Fabrication
Illustration
POLY mask
Prof. A. Mason
Page 14
LOCOS step 3
Form Gate (Poly layer)
Grow thin Gate Oxide
over entire wafer
negligible effect on
FOX regions
gate oxide
Deposit Polysilicon
Deposit Photoresist
Pattern Photoresist
*POLY MASK
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 15
LOCOS step 4
Form pmos S/D
Cover with photoresist
PSELECT mask
PSELECT mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 16
LOCOS step 4
Form pmos S/D
Cover with photoresist
Pattern photoresist
PSELECT mask
*PSELECT MASK
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 17
LOCOS step 4
Form pmos S/D
Cover with photoresist
Pattern photoresist
*PSELECT MASK
p+ dopant
p+ dopant
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 18
LOCOS step 5
Form nmos S/D
Cover with photoresist
NSELECT mask
p+
p+
p+
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 19
LOCOS step 5
Form nmos S/D
Cover with photoresist
Pattern photoresist
*NSELECT MASK
NSELECT mask
p+
p+
p+
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 20
LOCOS step 5
Form nmos S/D
Cover with photoresist
Pattern photoresist
*NSELECT MASK
n+
p+
p+
n+
n+
p+
n+ dopant
n+ dopant
POLY mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 21
LOCOS step 6
Form Contacts
Deposit oxide
Deposit photoresist
CONTACT mask
n+
p+
p+
n+
n+
p+
CONTACT mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 22
LOCOS step 6
Form Contacts
Deposit oxide
Deposit photoresist
Pattern photoresist
*CONTACT Mask
One mask for both
active and poly
contact shown
CONTACT mask
n+
p+
p+
n+
n+
p+
CONTACT mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 23
LOCOS step 6
Form Contacts
Deposit oxide
Deposit photoresist
Pattern photoresist
*CONTACT Mask
One mask for both
active and poly
contact shown
n+
p+
p+
n+
n+
p+
Etch oxide
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 24
LOCOS step 6
Form Contacts
Deposit oxide
Deposit photoresist
Pattern photoresist
*CONTACT Mask
One mask for both
active and poly
contact shown
n+
p+
p+
n+
n+
p+
Etch oxide
Remove photoresist
Deposit metal1
immediately after
opening contacts so
no native oxide
grows in contacts
Planerize
make top level
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 25
LOCOS step 7
Form Metal 1 Traces
Deposit photoresist
METAL1 mask
n+
p+
p+
n+
n+
p+
METAL1 mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 26
LOCOS step 7
Form Metal 1 Traces
Deposit photoresist
Pattern photoresist
*METAL1 Mask
METAL1 mask
n+
p+
p+
n+
n+
p+
METAL1 mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 27
LOCOS step 7
Form Metal 1 Traces
Deposit photoresist
Pattern photoresist
*METAL1 Mask
Etch metal
n+
p+
p+
n+
n+
p+
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 28
LOCOS step 7
Form Metal 1 Traces
Deposit photoresist
Pattern photoresist
*METAL1 Mask
Etch metal
Remove photoresist
LOCOS Fabrication
Illustration
n+
p+
p+
n+
n+
p+
Prof. A. Mason
Page 29
LOCOS step 8
Form Vias to Metal1
Deposit oxide
Planerize oxide
Deposit photoresist
VIA mask
n+
p+
p+
n+
n+
p+
VIA mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 30
LOCOS step 8
Form Vias to Metal1
Deposit oxide
Planerize
Deposit photoresist
Pattern photoresist
VIA mask
n+
p+
p+
n+
n+
p+
*VIA Mask
VIA mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 31
LOCOS step 8
Form Vias to Metal1
Deposit oxide
Planerize
Deposit photoresist
Pattern photoresist
n+
p+
p+
n+
n+
p+
*VIA Mask
Etch oxide
Remove photoresist
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 32
LOCOS step 8
Form Vias to Metal1
Deposit oxide
Planerize
Deposit photoresist
Pattern photoresist
n+
p+
p+
n+
n+
p+
*VIA Mask
Etch oxide
Remove photoresist
Deposit Metal2
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 33
LOCOS step 9
METAL2 mask
n+
p+
p+
n+
n+
p+
METAL2 mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 34
LOCOS step 9
METAL2 mask
n+
p+
p+
n+
n+
p+
METAL2 mask
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 35
LOCOS step 9
Form Metal2 Traces
Deposit photoresist
Pattern photoresist
*METAL2 Mask
Etch metal
LOCOS Fabrication
Illustration
n+
p+
p+
n+
n+
p+
Prof. A. Mason
Page 36
LOCOS step 9
Form Metal2 Traces
Deposit photoresist
Pattern photoresist
*METAL2 Mask
Etch metal
Remove photoresist
LOCOS Fabrication
Illustration
n+
p+
p+
n+
n+
p+
Prof. A. Mason
Page 37
LOCOS Fabrication
Illustration
n+
p+
p+
n+
n+
p+
p-type substrate
Prof. A. Mason
Page 38
LOCOS Fabrication
Illustration
Prof. A. Mason
Page 39