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• With zero voltage applied to the gate, two back-to-back diodes exist in series between
drain and source.
• One diode is formed by the 𝑝𝑛 junction between the n+ drain region and the p-type
substrate, and the other diode is formed by the 𝑝𝑛 junction between the p-type substrate
and the n+ source region.
The excess of 𝑣𝐺𝑆 over 𝑉𝑡 is termed the effective voltage or the overdrive voltage and is
the quantity that determines the charge in the channel.
vGS Vt vOV
𝜀
Cox = 𝑡𝑜𝑥 ( oxide capacitance), L = channel length, W = channel width
𝑜𝑥
• The voltage 𝑣𝐷𝑆 causes a current 𝑖𝐷 to flow through the induced n channel.
1 W
iD nCox 2 vGS Vt vDS vDS
2
2 L
vGS Vt vDS vDS
2
W
iD nCox vGS Vt vDS
L
W
g DS nCox vGS Vt
L
• We conclude this subsection by noting that 𝑣𝐷𝑆 with kept small, the MOSFET
behaves as a linear resistance 𝑟𝐷𝑆 whose value is controlled by the gate voltage 𝑣𝐺𝑆 .
𝑙𝑘𝑙𝑘
v
rDS DS
iD
W
rDS nCox vGS Vt 𝑟 𝐷𝑆
L
VG VG VD
• As 𝑣𝐷𝑆 is increased, the channel becomes more tapered and its resistance increases
correspondingly.
• Shows 𝑣𝐷𝑆 reaching 𝑉𝑜𝑣 and 𝑣𝐺𝐷 correspondingly reaching 𝑉𝑡 . The zero depth
of the channel at the drain end gives rise to the term channel pinch-off.
• Increasing 𝑣𝐷𝑆 beyond this value has no effect on the channel shape and
charge, and the current through the channel remains constant at the value
reached for 𝑣𝐷𝑆 = 𝑉𝑜𝑣 .
1 𝑊 2
𝑖𝐷 = 2 𝜇𝑛 𝐶𝑜𝑥 𝑉𝑜𝑣
𝐿
1 𝑊 2
= 2 𝜇𝑛 𝐶𝑜𝑥 𝑣𝐺𝑆 − 𝑉𝑡
𝐿
• Shows a cross section of a CMOS chip illustrating how the PMOS and NMOS
transistors are fabricated.
VSB 0
• The cutoff region and the triode region are useful if the MOSFET is to be utilized as a switch.
• If the MOSFET is to be used to design an amplifier, it must be operated in the saturation region.
𝑘𝑛′ = 𝜇𝑛 𝐶𝑂𝑋
non linear
Triode Region
Saturation Region
• 𝑣𝐷𝑆 is increased, the channel pinch-off point is moved slightly away from the drain, toward
the source.
• The channel length is in effect reduced, from L to L−∆𝐿, a phenomenon known as channel-
length modulation.
1 𝑊
• Then, 𝑖𝐷 = 2 𝑘𝑛′ 𝐿 𝑣𝐺𝑆 − 𝑉𝑡𝑛 2 1 + 𝜆𝑣𝐷𝑆 .
• 𝜆 is a device parameter having the units of reciprocal volts 𝑉 −1 .
𝜕𝑖𝐷 −1
𝛾𝑜 ≡ 𝜕𝑣 𝑣𝐺𝑆 𝑐𝑜𝑛𝑠𝑡𝑎𝑛𝑡
′ 𝑊 −1
𝑘𝑛 2
𝛾𝑜 = 𝜆 2 𝐿 𝑉𝐺𝑆 − 𝑉𝑡𝑛
1 1
𝛾𝑜 = 𝜆𝐼 , (𝜆 = 𝑉 )
𝐷 𝐴
𝑉𝐴
𝛾𝑜 = 𝐼𝐷
𝑊 1 2
𝐼𝐷 = 𝜇𝑛 𝐶𝑜𝑥 𝑉𝐺𝑆 − 𝑉𝑡 𝑉𝐷𝑆 − 𝑉𝐷𝑆
𝐿 2
1
𝐼𝐷 = 1 × 5 − 1 × 0.1 − × 0.01
2
= 0.395 𝑚𝐴
1 𝑊 2
𝐼𝐷 = 𝜇𝑛 𝐶𝑜𝑥 𝑉𝐺𝑆 − 𝑉𝑡
2 𝐿
1
= 0.4 × 10−3 × 4 × 0.8 − 0.5 2 , (𝑉𝐷 = 𝑉𝐺 , 𝑉𝐺𝑆 = 0.8𝑉)
×
2
= 0.072 𝑚𝐴
1.8−𝑉𝐷
𝑅=
𝐼𝐷
1.8−0.8
=
0.072
= 13.9 𝑘Ω
𝑉𝐷𝐷 𝑣
𝑖𝐷 = − 𝑅𝑂 𝑣𝑂 = 𝑣𝐷𝑆
𝑅𝐷 𝐷
vDS vGS Vt
𝑉𝐷𝐷 𝑣
𝑖𝐷 = − 𝑅𝑂 , 𝑣𝑂 = 𝑣𝐷𝑆
𝑅𝐷 𝐷
VDD
1
Slope
RD
RD
𝑣𝑂 = 𝑣𝐷𝑆 = 𝑉𝐷𝐷 − 𝑅𝐷 𝑖𝐷
Operation as a Switch
VG
RS
VG
VG
0, , VG ,0
R 1
Slope S
RS VG RS
1
Ch4 Field-Effect Transistors(FETs) 31
Biasing Using a Drain-to-Gate Feedback
Resistor
𝑉𝐺𝑆 = 𝑉𝐷𝑆 = 𝑉𝐷𝐷 − 𝑅𝐷 𝐼𝐷
𝑉𝐷𝐷 = 𝑉𝐺𝑆 + 𝑅𝐷 𝐼𝐷
1 W
iD nCox vGS Vt
2
2 L
1 W
iD nCox vGS Vt v iD
2
2 L GS
iD vGS v
GS iD
VDD (constant ) VGS RDiD
V GS iD
W
I D1 2
L
I D2
W
L 1
W
I REF L 2
W
L 1